JP2014522131A5 - - Google Patents

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Publication number
JP2014522131A5
JP2014522131A5 JP2014526134A JP2014526134A JP2014522131A5 JP 2014522131 A5 JP2014522131 A5 JP 2014522131A5 JP 2014526134 A JP2014526134 A JP 2014526134A JP 2014526134 A JP2014526134 A JP 2014526134A JP 2014522131 A5 JP2014522131 A5 JP 2014522131A5
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JP
Japan
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region
forming
type
elongated channel
doped
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JP2014526134A
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Japanese (ja)
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JP2014522131A (ja
JP5877246B2 (ja
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Priority claimed from US13/211,033 external-priority patent/US8742481B2/en
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Publication of JP2014522131A5 publication Critical patent/JP2014522131A5/ja
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JP2014526134A 2011-08-16 2012-08-14 異なった少数キャリア寿命を有するチャネル領域を含む装置および方法 Active JP5877246B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/211,033 2011-08-16
US13/211,033 US8742481B2 (en) 2011-08-16 2011-08-16 Apparatuses and methods comprising a channel region having different minority carrier lifetimes
PCT/US2012/050796 WO2013025719A2 (en) 2011-08-16 2012-08-14 Apparatuses and methods comprising a channel region having different minority carrier lifetimes

Publications (3)

Publication Number Publication Date
JP2014522131A JP2014522131A (ja) 2014-08-28
JP2014522131A5 true JP2014522131A5 (enExample) 2015-09-24
JP5877246B2 JP5877246B2 (ja) 2016-03-02

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ID=47712018

Family Applications (1)

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JP2014526134A Active JP5877246B2 (ja) 2011-08-16 2012-08-14 異なった少数キャリア寿命を有するチャネル領域を含む装置および方法

Country Status (7)

Country Link
US (2) US8742481B2 (enExample)
EP (1) EP2745321A4 (enExample)
JP (1) JP5877246B2 (enExample)
KR (1) KR102044045B1 (enExample)
CN (1) CN103828049A (enExample)
TW (1) TWI538165B (enExample)
WO (1) WO2013025719A2 (enExample)

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US10727244B2 (en) 2017-06-12 2020-07-28 Samsung Electronics Co., Ltd. Semiconductor memory devices and methods of fabricating the same
SG10201803464XA (en) 2017-06-12 2019-01-30 Samsung Electronics Co Ltd Semiconductor memory device and method of manufacturing the same
US10923493B2 (en) 2018-09-06 2021-02-16 Micron Technology, Inc. Microelectronic devices, electronic systems, and related methods
CN112956030A (zh) 2018-10-09 2021-06-11 美光科技公司 包含具有增加阈值电压的晶体管的半导体装置及其相关方法与系统

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