JP2012519950A5 - - Google Patents

Download PDF

Info

Publication number
JP2012519950A5
JP2012519950A5 JP2011554120A JP2011554120A JP2012519950A5 JP 2012519950 A5 JP2012519950 A5 JP 2012519950A5 JP 2011554120 A JP2011554120 A JP 2011554120A JP 2011554120 A JP2011554120 A JP 2011554120A JP 2012519950 A5 JP2012519950 A5 JP 2012519950A5
Authority
JP
Japan
Prior art keywords
layer
workpiece
range
condenser
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011554120A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012519950A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2010/026658 external-priority patent/WO2010104852A2/en
Publication of JP2012519950A publication Critical patent/JP2012519950A/ja
Publication of JP2012519950A5 publication Critical patent/JP2012519950A5/ja
Pending legal-status Critical Current

Links

JP2011554120A 2009-03-09 2010-03-09 電気活性層の形成方法 Pending JP2012519950A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15842209P 2009-03-09 2009-03-09
US61/158,422 2009-03-09
PCT/US2010/026658 WO2010104852A2 (en) 2009-03-09 2010-03-09 Process for forming an electroactive layer

Publications (2)

Publication Number Publication Date
JP2012519950A JP2012519950A (ja) 2012-08-30
JP2012519950A5 true JP2012519950A5 (enExample) 2013-03-28

Family

ID=42729050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011554120A Pending JP2012519950A (ja) 2009-03-09 2010-03-09 電気活性層の形成方法

Country Status (7)

Country Link
US (1) US9209398B2 (enExample)
EP (1) EP2406813A4 (enExample)
JP (1) JP2012519950A (enExample)
KR (1) KR20110139253A (enExample)
CN (1) CN102349132B (enExample)
TW (1) TW201114082A (enExample)
WO (1) WO2010104852A2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US11975546B2 (en) 2008-06-13 2024-05-07 Kateeva, Inc. Gas enclosure assembly and system
US12064979B2 (en) 2008-06-13 2024-08-20 Kateeva, Inc. Low-particle gas enclosure systems and methods
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
EP2404315A4 (en) * 2009-03-06 2012-08-08 Du Pont METHOD FOR FORMING AN ELECTROACTIVE LAYER
KR20110134461A (ko) * 2009-03-09 2011-12-14 이 아이 듀폰 디 네모아 앤드 캄파니 전기활성 층을 형성하기 위한 방법
TWI444602B (zh) * 2011-04-15 2014-07-11 Univ Chang Gung A fluorescent powder coating apparatus and a method for detecting white light color temperature in a process immediately
US10468279B2 (en) 2013-12-26 2019-11-05 Kateeva, Inc. Apparatus and techniques for thermal treatment of electronic devices
EP3975229A1 (en) 2014-01-21 2022-03-30 Kateeva, Inc. Apparatus and techniques for electronic device encapsulation
KR102315014B1 (ko) 2014-04-30 2021-10-20 카티바, 인크. 가스 쿠션 장비 및 기판 코팅 기술
US10115900B2 (en) 2015-11-16 2018-10-30 Kateeva, Inc. Systems and methods for thermal processing of a substrate
CN107940904B (zh) * 2017-11-14 2019-12-03 合肥鑫晟光电科技有限公司 一种真空干燥腔室及真空干燥装置
KR102645467B1 (ko) * 2018-10-18 2024-03-11 삼성디스플레이 주식회사 표시장치의 제조방법
CN111509144B (zh) * 2020-04-24 2022-09-30 合肥京东方卓印科技有限公司 Oled器件的制备方法及显示面板的制备方法

Family Cites Families (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3630660A (en) * 1968-10-31 1971-12-28 Burlington Industries Inc Process for removal of moisture and/or solvents from textile materials
US4421781A (en) * 1982-03-29 1983-12-20 Tri/Valley Growers Continuous vacuum curing and solvent recovery coating process
US5199187A (en) * 1991-07-31 1993-04-06 Sp Industries Freeze dryer apparatus having an interim condensing system and use thereof
US5744009A (en) * 1995-07-07 1998-04-28 The M. W. Kellogg Company Method and apparatus for recovering condensables in vapor from a urea vacuum evaporator
US5694701A (en) 1996-09-04 1997-12-09 Minnesota Mining And Manufacturing Company Coated substrate drying system
DE69627357T2 (de) * 1995-09-18 2003-10-30 Minnesota Mining And Mfg. Co., Saint Paul Verfahren und vorrichtung zur trocknung eines beschichteten substrats
US5813133A (en) 1996-09-04 1998-09-29 Minnesota Mining And Manufacturing Company Coated substrate drying system with magnetic particle orientation
JP3899566B2 (ja) 1996-11-25 2007-03-28 セイコーエプソン株式会社 有機ｅｌ表示装置の製造方法
US6303238B1 (en) 1997-12-01 2001-10-16 The Trustees Of Princeton University OLEDs doped with phosphorescent compounds
WO1999019900A2 (en) 1997-10-14 1999-04-22 Patterning Technologies Limited Method of forming an electronic device
JP3417464B2 (ja) 1998-06-24 2003-06-16 東京応化工業株式会社 平坦化膜形成用塗布液
JP2000056474A (ja) * 1998-08-05 2000-02-25 Tokyo Electron Ltd 基板処理方法
JP2000173771A (ja) * 1998-12-10 2000-06-23 Sharp Corp ライン光源及びその製造方法
US6630274B1 (en) 1998-12-21 2003-10-07 Seiko Epson Corporation Color filter and manufacturing method therefor
WO2000070655A2 (en) 1999-05-13 2000-11-23 The Trustees Of Princeton University Very high efficiency organic light emitting devices based on electrophosphorescence
EP1933395B2 (en) 1999-12-01 2019-08-07 The Trustees of Princeton University Complexes of form L2IrX
US6670645B2 (en) 2000-06-30 2003-12-30 E. I. Du Pont De Nemours And Company Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
JP3628997B2 (ja) 2000-11-27 2005-03-16 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法
JP4021177B2 (ja) * 2000-11-28 2007-12-12 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法および有機エレクトロルミネッセンス装置並びに電子機器
JP4285264B2 (ja) 2000-11-28 2009-06-24 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法
TW533446B (en) 2000-12-22 2003-05-21 Koninkl Philips Electronics Nv Electroluminescent device and a method of manufacturing thereof
EP1364420B1 (en) 2001-02-27 2012-10-10 Cambridge Display Technology Limited Formulation for depositing a material on a substrate using ink jet printing
US6875523B2 (en) 2001-07-05 2005-04-05 E. I. Du Pont De Nemours And Company Photoactive lanthanide complexes with phosphine oxides, phosphine oxide-sulfides, pyridine N-oxides, and phosphine oxide-pyridine N-oxides, and devices made with such complexes
IL158865A0 (en) 2001-07-18 2004-05-12 Du Pont Luminescent lanthanide complexes with imine ligands and devices made with such complexes
JP2003133691A (ja) 2001-10-22 2003-05-09 Seiko Epson Corp 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体
US7166368B2 (en) 2001-11-07 2007-01-23 E. I. Du Pont De Nemours And Company Electroluminescent platinum compounds and devices made with such compounds
JP4164256B2 (ja) 2001-11-27 2008-10-15 東京エレクトロン株式会社 減圧乾燥装置及び減圧乾燥方法
EP2306788A1 (en) 2001-12-26 2011-04-06 E. I. du Pont de Nemours and Company Iridium compounds and devices made therewith
US6858464B2 (en) 2002-06-19 2005-02-22 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light emitting device
US6713339B2 (en) 2002-06-21 2004-03-30 Micron Technology, Inc. Methods of forming switchable circuit devices
KR101208396B1 (ko) 2002-07-19 2012-12-05 이데미쓰 고산 가부시키가이샤 유기 전기발광 소자 및 유기 발광 매체
JP4239560B2 (ja) 2002-08-02 2009-03-18 セイコーエプソン株式会社 組成物とこれを用いた有機導電性膜の製造方法
US6963005B2 (en) 2002-08-15 2005-11-08 E. I. Du Pont De Nemours And Company Compounds comprising phosphorus-containing metal complexes
EP1546237B2 (en) 2002-09-24 2019-04-24 E. I. du Pont de Nemours and Company Water dispersible polythiophenes made with polymeric acid colloids
CN1681869B (zh) 2002-09-24 2010-05-26 E.I.内穆尔杜邦公司 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺
JP2004223354A (ja) 2003-01-21 2004-08-12 Seiko Epson Corp 液状組成物の塗布方法、ｅｌ素子の製造方法、カラーフィルタの製造方法、電気光学装置、電子機器
JP2004351272A (ja) 2003-05-27 2004-12-16 Seiko Epson Corp 薄膜パターンの形成方法及びデバイスの製造方法、電気光学装置及び電子機器
US6867081B2 (en) * 2003-07-31 2005-03-15 Hewlett-Packard Development Company, L.P. Solution-processed thin film transistor formation method
TW201219350A (en) 2003-11-17 2012-05-16 Sumitomo Chemical Co Crosslinkable arylamine compounds
JP2005158824A (ja) 2003-11-20 2005-06-16 Seiko Epson Corp 成膜方法、膜、電子デバイスおよび電子機器
JP2005172316A (ja) 2003-12-09 2005-06-30 Seiko Epson Corp 減圧乾燥装置、電気光学装置、電気光学装置の製造方法および電子機器
US20050129843A1 (en) 2003-12-11 2005-06-16 Xerox Corporation Nanoparticle deposition process
JP2005235852A (ja) 2004-02-17 2005-09-02 Seiko Epson Corp 多層膜の形成方法及びデバイスの製造方法
US7351358B2 (en) 2004-03-17 2008-04-01 E.I. Du Pont De Nemours And Company Water dispersible polypyrroles made with polymeric acid colloids for electronics applications
JP4055171B2 (ja) 2004-05-19 2008-03-05 セイコーエプソン株式会社 カラーフィルタ基板の製造方法、電気光学装置の製造方法、電気光学装置、電子機器
US7023013B2 (en) 2004-06-16 2006-04-04 Eastman Kodak Company Array of light-emitting OLED microcavity pixels
US7807741B2 (en) 2004-06-17 2010-10-05 Sharp Kabushiki Kaisha Coating liquid, film production method, production method of functional device, and functional device
US8158517B2 (en) 2004-06-28 2012-04-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing wiring substrate, thin film transistor, display device and television device
GB2416428A (en) * 2004-07-19 2006-01-25 Seiko Epson Corp Method for fabricating a semiconductor element from a dispersion of semiconductor particles
JP4148933B2 (ja) 2004-08-31 2008-09-10 シャープ株式会社 機能膜の製造方法、機能膜形成用塗液、機能素子、電子デバイス及び表示装置
US7217583B2 (en) * 2004-09-21 2007-05-15 Cree, Inc. Methods of coating semiconductor light emitting elements by evaporating solvent from a suspension
TWI247111B (en) 2004-09-22 2006-01-11 Chunghwa Picture Tubes Ltd Method of detecting foreign objects in display manufacture processes
US7268006B2 (en) 2004-12-30 2007-09-11 E.I. Du Pont De Nemours And Company Electronic device including a guest material within a layer and a process for forming the same
JP5082189B2 (ja) 2005-01-14 2012-11-28 大日本印刷株式会社 コーティング液、金属酸化物膜およびその形成方法
JP4876415B2 (ja) * 2005-03-29 2012-02-15 セイコーエプソン株式会社 有機ｅｌ装置の製造方法、デバイスの製造方法
KR100663076B1 (ko) 2005-08-31 2007-01-02 한국과학기술원 반도체 기판 상의 소정 영역에 탄소나노튜브를 형성시키는 방법, 이를 이용한 반도체 도선 형성방법 및 이를 이용하여 인덕터 소자 제조 방법
JP2007123257A (ja) 2005-09-27 2007-05-17 Mitsubishi Chemicals Corp 有機電界発光素子の製造方法
JP4396607B2 (ja) 2005-09-28 2010-01-13 セイコーエプソン株式会社 膜形成方法、有機エレクトロルミネセンス装置の製造方法、有機エレクトロルミネセンス装置及び電子機器
KR101211836B1 (ko) 2005-10-24 2012-12-12 삼성코닝정밀소재 주식회사 다공성 칼코게나이드 박막, 그 제조방법 및 이를 채용한전자소자
KR100643376B1 (ko) 2005-10-24 2006-11-10 삼성전자주식회사 표시장치와 표시장치의 제조방법
US8124172B2 (en) 2006-03-02 2012-02-28 E.I. Du Pont De Nemours And Company Process for making contained layers and devices made with same
US20070278936A1 (en) 2006-06-02 2007-12-06 Norman Herron Red emitter complexes of IR(III) and devices made with such compounds
JP2009540574A (ja) * 2006-06-05 2009-11-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー Ｏｌｅｄ印刷の分野における有機活性材料を堆積するための液体組成物
US7491646B2 (en) 2006-07-20 2009-02-17 Xerox Corporation Electrically conductive feature fabrication process
US8242223B2 (en) 2006-08-24 2012-08-14 E I Du Pont De Nemours And Company Hole transport polymers
JP4940857B2 (ja) 2006-09-26 2012-05-30 凸版印刷株式会社 有機機能性素子の製造方法
JP4560577B2 (ja) 2006-10-18 2010-10-13 パナソニック株式会社 多層情報記録媒体の製造方法、多層情報記録媒体の製造装置、および多層情報記録媒体
DE102006054481A1 (de) * 2006-11-18 2008-05-21 Eppendorf Ag Vakuumkonzentrator und Verfahren zur Vakuumkonzentration
JP5087927B2 (ja) * 2007-01-09 2012-12-05 大日本印刷株式会社 有機発光素子、有機発光トランジスタ及び発光表示装置
US20080289676A1 (en) 2007-05-25 2008-11-27 Guidotti Ronald Armand Electrode for a thermal battery and method of making the same
CN101275282B (zh) 2007-12-26 2011-06-08 中国核动力研究设计院 超晶格热电材料的制备方法
GB0803950D0 (en) * 2008-03-03 2008-04-09 Cambridge Display Technology O Solvent for printing composition

Similar Documents

Publication Publication Date Title
JP2012519950A5 (enExample)
JP2012519981A5 (enExample)
WO2010104852A3 (en) Process for forming an electroactive layer
FR2963342B1 (fr) Procede d'obtention d'un materiau comprenant un substrat muni d'un revetement
WO2009063824A1 (ja) 塗布膜の乾燥方法及び平版印刷版原版の製造方法
JP2012519941A5 (enExample)
JP2009540062A5 (enExample)
JP2001115250A5 (enExample)
WO2020089180A3 (de) Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht
JP2015122486A5 (ja) アンダーコートを形成する方法および反応チャンバ
ATE469364T1 (de) Prozess zum beschichten eines optischen artikels mit einer anti-fouling-oberflächenbeschichtung durch unterdruckverdampfung
CN107653441A (zh) 一种在塑胶上生产pvd防菌膜的方法
JP2013233644A5 (enExample)
WO2012175334A3 (de) Verfahren und vorrichtung zum abscheiden
WO2009140570A3 (en) Process for forming an electroactive layer
TW200734486A (en) High density thermal barrier coating
JP2004340932A5 (enExample)
RU2015112022A (ru) Графеновые листы и способы их изготовления
JP2016065297A5 (enExample)
WO2016153966A3 (en) Method of inkjet printing decorations on substrates
WO2010104857A3 (en) Process for forming an electroactive layer
JP2012031537A5 (enExample)
JP2018093166A5 (enExample)
JP2013510734A5 (enExample)
JP2011207751A5 (enExample)