JP2011207751A5 - - Google Patents
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- Publication number
- JP2011207751A5 JP2011207751A5 JP2011051537A JP2011051537A JP2011207751A5 JP 2011207751 A5 JP2011207751 A5 JP 2011207751A5 JP 2011051537 A JP2011051537 A JP 2011051537A JP 2011051537 A JP2011051537 A JP 2011051537A JP 2011207751 A5 JP2011207751 A5 JP 2011207751A5
- Authority
- JP
- Japan
- Prior art keywords
- silica
- group
- alkoxysilanes
- alkoxysilane compound
- compound selected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 84
- 239000000377 silicon dioxide Substances 0.000 claims description 42
- 150000001875 compounds Chemical class 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 13
- 239000003960 organic solvent Substances 0.000 claims description 13
- 239000012528 membrane Substances 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 239000002243 precursor Substances 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 239000003595 mist Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011051537A JP5652270B2 (ja) | 2010-03-11 | 2011-03-09 | シリカ系多孔質膜の製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010054735 | 2010-03-11 | ||
| JP2010054735 | 2010-03-11 | ||
| JP2011051537A JP5652270B2 (ja) | 2010-03-11 | 2011-03-09 | シリカ系多孔質膜の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011207751A JP2011207751A (ja) | 2011-10-20 |
| JP2011207751A5 true JP2011207751A5 (enExample) | 2014-04-24 |
| JP5652270B2 JP5652270B2 (ja) | 2015-01-14 |
Family
ID=44939219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011051537A Active JP5652270B2 (ja) | 2010-03-11 | 2011-03-09 | シリカ系多孔質膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5652270B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016001200A (ja) * | 2012-10-15 | 2016-01-07 | 旭硝子株式会社 | 防汚性反射防止膜、物品およびその製造方法 |
| JP2016001711A (ja) * | 2014-06-12 | 2016-01-07 | 日本電信電話株式会社 | 熱電変換材料およびその製造方法 |
| CN109923183A (zh) * | 2016-11-30 | 2019-06-21 | 富士胶片株式会社 | 涂布组合物、防反射膜、层叠体及层叠体的制造方法、以及太阳能电池模块 |
| EP3745015B1 (en) * | 2018-01-26 | 2025-09-24 | Nitto Denko Corporation | Film for led lighting equipment, and led lighting equipment |
| WO2019151073A1 (ja) * | 2018-02-02 | 2019-08-08 | 日東電工株式会社 | Ｌｅｄバックライト用フィルム、ｌｅｄバックライト |
| JP2024016433A (ja) * | 2022-07-26 | 2024-02-07 | ハニー化成株式会社 | 防眩防汚積層処理の工程短縮および耐久性向上を実現する処理剤および塗装方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001118841A (ja) * | 1999-10-22 | 2001-04-27 | Asahi Kasei Corp | 多孔性シリカ |
| WO2006132351A1 (ja) * | 2005-06-09 | 2006-12-14 | Hitachi Chemical Company, Ltd. | 反射防止膜の形成方法 |
| CN102351201B (zh) * | 2007-03-13 | 2013-07-31 | 三菱化学株式会社 | 二氧化硅多孔质体、光学用途层积体和组合物、以及二氧化硅多孔质体的制造方法 |
| JP5437662B2 (ja) * | 2008-03-03 | 2014-03-12 | 学校法人慶應義塾 | 反射防止膜及びその形成方法 |
-
2011
- 2011-03-09 JP JP2011051537A patent/JP5652270B2/ja active Active
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