JP2012041217A - 無アルカリガラス - Google Patents
無アルカリガラス Download PDFInfo
- Publication number
- JP2012041217A JP2012041217A JP2010182068A JP2010182068A JP2012041217A JP 2012041217 A JP2012041217 A JP 2012041217A JP 2010182068 A JP2010182068 A JP 2010182068A JP 2010182068 A JP2010182068 A JP 2010182068A JP 2012041217 A JP2012041217 A JP 2012041217A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- alkali
- free glass
- temperature
- thermal expansion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 122
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims abstract description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 238000007500 overflow downdraw method Methods 0.000 claims description 9
- 239000003513 alkali Substances 0.000 claims description 3
- 238000004031 devitrification Methods 0.000 abstract description 23
- 238000004519 manufacturing process Methods 0.000 abstract description 18
- 238000000034 method Methods 0.000 abstract description 16
- 230000008569 process Effects 0.000 abstract description 2
- 239000000565 sealant Substances 0.000 abstract 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- 239000003566 sealing material Substances 0.000 description 16
- 239000013078 crystal Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 229910006404 SnO 2 Inorganic materials 0.000 description 6
- 238000000137 annealing Methods 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000007791 liquid phase Substances 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 239000006025 fining agent Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000005191 phase separation Methods 0.000 description 4
- 208000013201 Stress fracture Diseases 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229910052661 anorthite Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000006066 glass batch Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- -1 F 2 Substances 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 239000008395 clarifying agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001631 strontium chloride Inorganic materials 0.000 description 1
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 1
- 229910052917 strontium silicate Inorganic materials 0.000 description 1
- QSQXISIULMTHLV-UHFFFAOYSA-N strontium;dioxido(oxo)silane Chemical compound [Sr+2].[O-][Si]([O-])=O QSQXISIULMTHLV-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/361—Temperature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
【解決手段】本発明の無アルカリガラスは、実質的にアルカリ金属酸化物を含有せず、歪点が680℃より高く、30〜380℃の温度範囲における平均熱膨張係数が40〜55×10−7/℃であり、液相温度が1200℃より低いことを特徴とする。また、本発明の無アルカリガラスは、ガラス組成として、質量%で、SiO2 55〜70%、Al2O3 10〜20%、B2O3 0.1〜4.5%、MgO 0〜1%、CaO 5〜15%、SrO 0.5〜5%、BaO 5〜15%を含有することを特徴とする。
【選択図】なし
Description
(1)熱処理工程で成膜された半導体物質中にアルカリイオンが拡散する事態を防止するため、実質的にアルカリ金属酸化物を含有しないこと、
(2)ガラス板を低廉化するため、生産性に優れること、特に耐失透性や溶融性に優れること、
(3)p−Si・TFTの製造工程において、熱収縮を低減するため、歪点が高いこと。
Claims (9)
- 実質的にアルカリ金属酸化物を含有せず、歪点が680℃より高く、30〜380℃の温度範囲における平均熱膨張係数が40〜60×10−7/℃であり、液相温度が1220℃より低いことを特徴とする無アルカリガラス。
- ガラス組成として、質量%で、SiO2 55〜70%、Al2O3 10〜20%、B2O3 0.1〜4.5%、MgO 0〜1%、CaO 5〜15%、SrO 0.5〜5%、BaO 5〜15%を含有することを特徴とする請求項1に記載の無アルカリガラス。
- モル比SiO2/Al2O3が4.5〜8であることを特徴とする請求項1又は2に記載の無アルカリガラス。
- モル比CaO/BaOが0.5〜10であることを特徴とする請求項1〜3のいずれかに記載の無アルカリガラス。
- 更に、SnOを0.001〜1質量%含むことを特徴とする請求項1〜4のいずれかに記載の無アルカリガラス。
- 102.5ポアズにおける温度が1660℃以下であることを特徴とする請求項1〜5のいずれかに記載の無アルカリガラス。
- 液相温度における粘度が104.8ポアズ以上であることを特徴とする請求項1〜6のいずれかに記載の無アルカリガラス。
- オーバーフローダウンドロー法で成形されてなることを特徴とする請求項1〜7のいずれかに記載の無アルカリガラス。
- 有機ELデバイスに用いることを特徴とする請求項1〜8のいずれかに記載の無アルカリガラス。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010182068A JP5751439B2 (ja) | 2010-08-17 | 2010-08-17 | 無アルカリガラス |
PCT/JP2011/068252 WO2012023470A1 (ja) | 2010-08-17 | 2011-08-10 | 無アルカリガラス |
CN201180039911.XA CN103068758B (zh) | 2010-08-17 | 2011-08-10 | 无碱玻璃 |
US13/817,196 US9023744B2 (en) | 2010-08-17 | 2011-08-10 | Alkali-free glass |
EP11818112.2A EP2607326B1 (en) | 2010-08-17 | 2011-08-10 | Alkali-free glass |
KR1020137004364A KR101779033B1 (ko) | 2010-08-17 | 2011-08-10 | 무알칼리 유리 |
TW100129090A TWI593653B (zh) | 2010-08-17 | 2011-08-15 | 無鹼玻璃 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010182068A JP5751439B2 (ja) | 2010-08-17 | 2010-08-17 | 無アルカリガラス |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014225780A Division JP5988059B2 (ja) | 2014-11-06 | 2014-11-06 | 無アルカリガラス |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012041217A true JP2012041217A (ja) | 2012-03-01 |
JP5751439B2 JP5751439B2 (ja) | 2015-07-22 |
Family
ID=45605124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010182068A Expired - Fee Related JP5751439B2 (ja) | 2010-08-17 | 2010-08-17 | 無アルカリガラス |
Country Status (7)
Country | Link |
---|---|
US (1) | US9023744B2 (ja) |
EP (1) | EP2607326B1 (ja) |
JP (1) | JP5751439B2 (ja) |
KR (1) | KR101779033B1 (ja) |
CN (1) | CN103068758B (ja) |
TW (1) | TWI593653B (ja) |
WO (1) | WO2012023470A1 (ja) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013216551A (ja) * | 2012-04-11 | 2013-10-24 | Avanstrate Inc | ガラス板の製造方法 |
WO2013183681A1 (ja) | 2012-06-07 | 2013-12-12 | 旭硝子株式会社 | 無アルカリガラスおよびこれを用いた無アルカリガラス板 |
KR20140086915A (ko) * | 2012-12-28 | 2014-07-08 | 아반스트레이트 가부시키가이샤 | 디스플레이용 유리 기판 및 그 제조 방법 |
JP2015078092A (ja) * | 2013-10-17 | 2015-04-23 | 日本電気硝子株式会社 | 無アルカリガラス |
KR20150093681A (ko) | 2012-12-05 | 2015-08-18 | 아사히 가라스 가부시키가이샤 | 무알칼리 유리 기판 |
KR101559198B1 (ko) * | 2012-04-11 | 2015-10-13 | 아반스트레이트 가부시키가이샤 | 글래스판의 제조 방법 |
KR20160055814A (ko) | 2013-09-20 | 2016-05-18 | 아사히 가라스 가부시키가이샤 | 무알칼리 유리 |
WO2016159345A1 (ja) * | 2015-04-03 | 2016-10-06 | 日本電気硝子株式会社 | ガラス |
WO2018116953A1 (ja) * | 2016-12-20 | 2018-06-28 | 日本電気硝子株式会社 | ガラス |
KR20180136443A (ko) | 2016-04-27 | 2018-12-24 | 에이지씨 가부시키가이샤 | 무알칼리 유리 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2639205B1 (en) * | 2010-11-08 | 2019-03-06 | Nippon Electric Glass Co., Ltd. | Alkali-free glass |
JP6037117B2 (ja) * | 2012-12-14 | 2016-11-30 | 日本電気硝子株式会社 | ガラス及びガラス基板 |
CN105377783B (zh) | 2013-05-10 | 2019-03-08 | 康宁股份有限公司 | 采用低熔融玻璃或薄吸收膜对透明玻璃片进行激光焊接 |
JP6365826B2 (ja) * | 2013-07-11 | 2018-08-01 | 日本電気硝子株式会社 | ガラス |
TW201704175A (zh) | 2015-06-02 | 2017-02-01 | 康寧公司 | 具有著色層的積層玻璃製品 |
US11572303B2 (en) | 2016-05-04 | 2023-02-07 | Corning Incorporated | Tinted aluminosilicate glass compositions and glass articles including same |
WO2018025727A1 (ja) * | 2016-08-05 | 2018-02-08 | 旭硝子株式会社 | 無アルカリガラス基板、積層基板、およびガラス基板の製造方法 |
JP7113827B2 (ja) * | 2016-12-29 | 2022-08-05 | コーニング インコーポレイテッド | 耐ソラリゼーション性の希土類ドープガラス |
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EP2639205B1 (en) * | 2010-11-08 | 2019-03-06 | Nippon Electric Glass Co., Ltd. | Alkali-free glass |
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- 2011-08-10 KR KR1020137004364A patent/KR101779033B1/ko active IP Right Grant
- 2011-08-10 EP EP11818112.2A patent/EP2607326B1/en active Active
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- 2011-08-15 TW TW100129090A patent/TWI593653B/zh active
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KR101513793B1 (ko) * | 2012-04-11 | 2015-04-20 | 아반스트레이트 가부시키가이샤 | 유리판의 제조 방법 |
JP2013216551A (ja) * | 2012-04-11 | 2013-10-24 | Avanstrate Inc | ガラス板の製造方法 |
KR101559198B1 (ko) * | 2012-04-11 | 2015-10-13 | 아반스트레이트 가부시키가이샤 | 글래스판의 제조 방법 |
WO2013183681A1 (ja) | 2012-06-07 | 2013-12-12 | 旭硝子株式会社 | 無アルカリガラスおよびこれを用いた無アルカリガラス板 |
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KR20180136443A (ko) | 2016-04-27 | 2018-12-24 | 에이지씨 가부시키가이샤 | 무알칼리 유리 |
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JP2022121511A (ja) * | 2016-12-20 | 2022-08-19 | 日本電気硝子株式会社 | ガラス |
Also Published As
Publication number | Publication date |
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JP5751439B2 (ja) | 2015-07-22 |
US9023744B2 (en) | 2015-05-05 |
EP2607326B1 (en) | 2018-03-07 |
TW201219332A (en) | 2012-05-16 |
KR101779033B1 (ko) | 2017-09-18 |
WO2012023470A1 (ja) | 2012-02-23 |
EP2607326A4 (en) | 2014-10-08 |
CN103068758A (zh) | 2013-04-24 |
CN103068758B (zh) | 2017-06-13 |
EP2607326A1 (en) | 2013-06-26 |
US20130244859A1 (en) | 2013-09-19 |
TWI593653B (zh) | 2017-08-01 |
KR20140000197A (ko) | 2014-01-02 |
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