WO2018116953A1 - ガラス - Google Patents
ガラス Download PDFInfo
- Publication number
- WO2018116953A1 WO2018116953A1 PCT/JP2017/044919 JP2017044919W WO2018116953A1 WO 2018116953 A1 WO2018116953 A1 WO 2018116953A1 JP 2017044919 W JP2017044919 W JP 2017044919W WO 2018116953 A1 WO2018116953 A1 WO 2018116953A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- glass
- content
- less
- temperature
- strain point
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 106
- 239000000203 mixture Substances 0.000 claims abstract description 14
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 15
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 13
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 4
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 description 27
- 239000006060 molten glass Substances 0.000 description 23
- 238000010438 heat treatment Methods 0.000 description 18
- 238000002844 melting Methods 0.000 description 18
- 230000008018 melting Effects 0.000 description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 18
- 239000013078 crystal Substances 0.000 description 14
- 238000004031 devitrification Methods 0.000 description 12
- 230000007423 decrease Effects 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000005530 etching Methods 0.000 description 9
- 229910052697 platinum Inorganic materials 0.000 description 9
- 239000003513 alkali Substances 0.000 description 8
- 238000007500 overflow downdraw method Methods 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 238000000137 annealing Methods 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000007791 liquid phase Substances 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 4
- 239000006066 glass batch Substances 0.000 description 4
- 229910052863 mullite Inorganic materials 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 3
- 229910052661 anorthite Inorganic materials 0.000 description 3
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 3
- 239000006025 fining agent Substances 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- -1 F 2 Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000010433 feldspar Substances 0.000 description 2
- 239000002803 fossil fuel Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910001631 strontium chloride Inorganic materials 0.000 description 1
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
Definitions
- the present invention relates to glass, and more particularly to glass suitable for a substrate of an organic EL display.
- Organic EL displays are thin and excellent in moving picture display and have low power consumption. Therefore, they are used for applications such as mobile phone displays.
- Glass plates are widely used as substrates for organic EL displays.
- the glass plate for this application is mainly required to have the following characteristics. (1) In order to prevent a situation where alkali ions are diffused in the semiconductor material formed in the heat treatment step, the content of the alkali metal oxide is small. (2) In order to reduce the cost of the glass plate, it is excellent in productivity, particularly excellent in devitrification resistance and meltability, (3) In the manufacturing process of p-Si.TFT, in order to reduce thermal shrinkage, the strain point is high. (4) The specific Young's modulus is high in order to reduce the self-weight deflection in the transport process.
- Patent Document 1 discloses a glass plate having a high strain point. However, if the strain point is high, the productivity tends to decrease.
- the present invention has been made in view of the above circumstances, and its technical problems are excellent productivity (particularly devitrification resistance), a high specific Young's modulus, and heat in the manufacturing process of p-Si TFT.
- the idea is to create a glass with low shrinkage.
- the present inventor has found that the above technical problem can be solved by strictly regulating the glass composition and strain point of low alkali glass and non-alkali glass, and proposed as the present invention.
- the glass of the present invention has a glass composition in terms of mass% of SiO 2 55 to 70%, Al 2 O 3 15 to 25%, B 2 O 3 1 to 5%, Li 2 O + Na 2 O + K 2 O 0 to It contains 0.5%, MgO 0-4%, CaO 3-11%, SrO 0-4%, BaO 0-11%, and has a strain point higher than 715 ° C.
- “Li 2 O + Na 2 O + K 2 O” refers to the total amount of Li 2 O, Na 2 O and K 2 O.
- strain point refers to a value measured based on the method of ASTM C336.
- the glass of the present invention has a glass composition in terms of mass% of SiO 2 55 to 70%, Al 2 O 3 15 to 25%, B 2 O 3 1.5 to 4%, Li 2 O + Na 2 O + K. 2 O 0 to less than 0.1%, MgO 0 to 3%, CaO 4 to 10%, SrO 1 to 4%, BaO 4 to 11% are preferably contained.
- the glass of the present invention preferably has a SiO 2 / Al 2 O 3 ratio of 2.5 to 3.1 by mass ratio.
- the glass of the present invention preferably has a CaO / BaO ratio of 4.0 or less in terms of mass%.
- the glass of the present invention preferably further contains 0.001 to 1% by mass of SnO 2 .
- the glass of the present invention preferably has a specific Young's modulus, that is, a value obtained by dividing Young's modulus by density, greater than 29.5 GPa / g ⁇ cm ⁇ 3 .
- the glass of the present invention preferably has a temperature at a high temperature viscosity of 10 2.5 dPa ⁇ s of 1650 ° C. or lower.
- the “temperature at a high temperature viscosity of 10 2.5 poise” can be measured by a platinum ball pulling method.
- the glass of the present invention preferably has a liquidus temperature lower than 1310 ° C.
- the “liquid phase temperature” is obtained by passing the standard sieve 30 mesh (500 ⁇ m) and putting the glass powder remaining on the 50 mesh (300 ⁇ m) in a platinum boat, and holding it in a temperature gradient furnace for 24 hours. It can be calculated by measuring the temperature at which precipitation occurs.
- the glass of the present invention preferably has a viscosity at a liquidus temperature of 10 4.2 dPa ⁇ s or more.
- the “viscosity at the liquidus temperature” can be measured by a platinum ball pulling method.
- the glass of the present invention has a flat plate shape and has an overflow merging surface at the center in the thickness direction. That is, it is preferably formed by an overflow downdraw method.
- the glass of the present invention is preferably used for an organic EL device.
- the glass of the present invention has a glass composition of SiO 2 55-70%, Al 2 O 3 15-25%, B 2 O 3 1-5%, Li 2 O + Na 2 O + K 2 O 0-0. 5%, MgO 0-4%, CaO 3-11%, SrO 0-4%, BaO 0-11%.
- the reason for limiting the content of each component as described above will be described below.
- % display represents mass%.
- SiO 2 is a component that forms a glass skeleton and increases the strain point.
- the content of SiO 2 is 55 to 70%, preferably 58 to 64%, especially 59 to 62%.
- the strain point and acid resistance are likely to be lowered, and the density is likely to be increased.
- the content of SiO 2 is large, the viscosity at high temperature becomes high and the meltability is likely to be lowered.
- the balance of the glass components is lost, and devitrification crystals such as cristobalite are precipitated, and the liquid phase Temperature tends to be high. Furthermore, the etching rate by HF tends to decrease.
- Al 2 O 3 is a component that increases the strain point and further increases the Young's modulus.
- the content of Al 2 O 3 is 15 to 25%, preferably 17 to 23%, particularly 18 to 22%.
- the strain point and specific Young's modulus tends to decrease.
- the content of Al 2 O 3 is large, mullite and feldspar-based devitrified crystals are precipitated, and the liquidus temperature tends to be high.
- the mass% ratio SiO 2 / Al 2 O 3 is an important component ratio in order to achieve both a high strain point and high devitrification resistance. Both components have the effect of increasing the strain point as described above, but when the amount of SiO 2 is relatively large, devitrified crystals such as cristobalite are likely to precipitate. On the other hand, when the amount of Al 2 O 3 is relatively large, alkaline earth aluminosilicate devitrified crystals such as mullite and anorthite are likely to precipitate. Therefore, the molar ratio SiO 2 / Al 2 O 3 is preferably 2.5 to 4, 2.6 to 3.5, 2.7 to 3.3, particularly 2.7 to 3.1.
- B 2 O 3 is a component that enhances meltability and devitrification resistance.
- the content of B 2 O 3 is 1 to 5%, preferably 1.5 to 4%, more than 1.5 to 3%, especially 2 to less than 3%.
- BHF resistance buffered hydrofluoric acid resistance
- the content of B 2 O 3 is large, the strain point, acid resistance, specific Young's modulus tends to decrease.
- moisture tends to be mixed into the glass from the B 2 O 3 introduced raw material, and the ⁇ -OH value tends to increase.
- the content of B 2 O 3 is preferably 1 to less than 3%.
- the content of B 2 O 3 is 3%. More than 5% is preferable.
- Li 2 O, Na 2 O, and K 2 O are components that increase the meltability and reduce the electrical resistivity of the molten glass.
- the content of Li 2 O + Na 2 O + K 2 O is 0 to 0.5%, preferably 0.01 to 0.3%, 0.02 to 0.2%, particularly 0.03 to 0.1. %.
- the content of Na 2 O is preferably 0 to 0.3%, 0.01 to 0.3%, 0.02 to 0.2%, particularly 0.03 to less than 0.1%.
- MgO is a component that increases meltability and Young's modulus.
- the content of MgO is 0 to 4%, preferably 0 to 3%, 1 to 3%, especially 2 to 3%.
- the content of MgO is small, it is difficult to ensure rigidity and the meltability is easily lowered.
- the content of MgO is large, devitrified crystals of mullite and cristobalite are likely to precipitate, and the strain point may be significantly reduced.
- CaO is a component that lowers the high-temperature viscosity without lowering the strain point and significantly increases the meltability.
- CaO is a component that lowers the raw material cost because the introduced raw material is relatively inexpensive among alkaline earth metal oxides. Furthermore, it is a component that increases the Young's modulus.
- the content of CaO is 3 to 11%, preferably 4 to 10%, 5 to 10%, particularly 5 to 9%. When there is little content of CaO, it will become difficult to enjoy the said effect. On the other hand, when the content of CaO is large, the glass is easily devitrified and the density is easily increased.
- SrO is a component that suppresses phase separation and increases devitrification resistance. Furthermore, it is a component that increases the meltability by lowering the high temperature viscosity without lowering the strain point. On the other hand, when the content of SrO is large, the balance of the glass components is lost, and feldspar-based devitrification crystals are likely to be precipitated, and the devitrification resistance is liable to be lowered. Therefore, the SrO content is 0 to 4%, preferably 0 to 3%, 0 to 2.5%, particularly 0.5 to 2.5%.
- BaO is a component that has a high effect of suppressing precipitation of mullite-based and anorthite-based devitrified crystals among alkaline earth metal oxides.
- the content of BaO is preferably 0 to 11%, 2 to 11%, 3 to 11%, 4 to 9%, in particular 5 to 8%.
- the content of BaO is small, mullite-type and anorthite-type devitrified crystals are likely to precipitate.
- crystallization containing Ba will precipitate easily, while high temperature viscosity will become high too much and a meltability will fall easily.
- the mass% ratio CaO / BaO is an important component ratio for suppressing the precipitation temperature of anorthite crystals.
- the mass% ratio CaO / BaO is preferably 4.0 or less, 3.5 or less, 3.0 or less, 2.5 or less, particularly 0.1 to 2.0.
- ZnO is a component that enhances the meltability.
- the content of ZnO is preferably 0 to 5%, 0 to 3%, 0 to 0.5%, particularly 0 to 0.2%.
- P 2 O 5 is a component that increases the strain point.
- the content of P 2 O 5 is preferably 0 to 1.5%, 0 to 1.2%, particularly 0 to less than 0.1%.
- TiO 2 is a component that lowers the viscosity at high temperature and increases the meltability, and is a component that suppresses the resistance to solarization. However, if TiO 2 is contained in a large amount, the glass is colored and the transmittance decreases. It becomes easy. Therefore, the content of TiO 2 is preferably 0 to 5%, 0 to 3%, 0 to 1%, particularly 0 to 0.02%.
- ZrO 2 , Y 2 O 3 , Nb 2 O 5 , and La 2 O 3 have a function of increasing the strain point, Young's modulus, and the like. However, when the content of these components is large, the density tends to increase. Therefore, the contents of ZrO 2 , Y 2 O 3 , Nb 2 O 5 and La 2 O 3 are 0 to 5%, 0 to 3%, 0 to 1%, 0 to less than 0.1%, particularly 0 It is preferably less than 0.05%. Furthermore, the total amount of Y 2 O 3 and La 2 O 3 is preferably less than 0.1%.
- Fe 2 O 3 is a component that lowers the electrical resistivity of the molten glass.
- the content of Fe 2 O 3 is preferably 0.001 to 0.1%, 0.005 to 0.05%, particularly 0.008 to 0.015%.
- the content of Fe 2 O 3 is small, it becomes difficult to enjoy the effect of the above.
- the content of Fe 2 O 3 is large, the transmittance of the glass plate is liable to lower.
- SnO 2 is a component that has a good clarification action in a high temperature range, a component that increases the strain point, and a component that decreases high temperature viscosity.
- the content of SnO 2 is preferably 0 to 1%, 0.001 to 1%, 0.01 to 0.5%, particularly 0.05 to 0.3%.
- the devitrification crystal SnO 2 is likely to precipitate. Incidentally, when the content of SnO 2 is small, it becomes difficult to enjoy the above-mentioned effects.
- metal powder such as F 2 , Cl 2 , SO 3 , C, Al, Si or the like can be added up to 5% as a fining agent. Further, it can be added as a refining agent, also CeO 2, etc. up to 1%.
- the glass of the present invention does not completely eliminate the introduction of these components, but these components are used as much as possible from an environmental point of view. Preferably not. Furthermore, when a large amount of As 2 O 3 is contained in the glass, the solarization resistance tends to be lowered. Therefore, the content is preferably 0.1% or less, and it is desirable that the glass does not contain substantially.
- “substantially does not contain As 2 O 3 ” refers to the case where the content of As 2 O 3 in the glass composition is less than 0.05%.
- the content of Sb 2 O 3 is preferably 0.2% or less, particularly preferably 0.1% or less, and it is desirable that the Sb 2 O 3 content is not substantially contained.
- “substantially does not contain Sb 2 O 3 ” refers to a case where the content of Sb 2 O 3 in the glass composition is less than 0.05%.
- Cl has an effect of promoting the melting of the low alkali glass. If Cl is added, the melting temperature can be lowered and the action of the fining agent can be promoted. It also has the effect of reducing the ⁇ -OH value of the molten glass. However, if the Cl content is too large, the strain point tends to decrease. Therefore, the Cl content is preferably 0.5% or less, particularly 0.001 to 0.2%.
- a raw material for introducing Cl a raw material such as an alkaline earth metal oxide chloride such as strontium chloride or aluminum chloride can be used as a raw material for introducing Cl.
- the glass of the present invention preferably has the following glass characteristics.
- the strain point is higher than 715 ° C., preferably 720 ° C. or higher, 730 ° C. or higher, particularly 740 to 850 ° C. If the strain point is low, the glass plate is likely to be thermally contracted in the manufacturing process of the p-Si • TFT.
- Density is preferably 2.65 g / cm 3 or less, 2.60 g / cm 3 or less, in particular 2.57 g / cm 3 or less.
- the specific Young's modulus is high, and the glass is easily bent by its own weight.
- the average coefficient of thermal expansion in the temperature range of 30 to 380 ° C. is preferably 33 ⁇ 10 ⁇ 7 to 43 ⁇ 10 ⁇ 7 / ° C., in particular 35 ⁇ 10 ⁇ 7 to 39 ⁇ 10 ⁇ 7 / ° C. If the average thermal expansion coefficient in the temperature range of 30 to 380 ° C. is outside the above range, it does not match the thermal expansion coefficient of the peripheral member, and the peripheral member is likely to be peeled off or the glass plate is warped.
- “average thermal expansion coefficient in the temperature range of 30 to 380 ° C.” refers to a value measured with a dilatometer.
- the etching rate by HF is preferably 0.8 ⁇ m / min or more, 0.9 ⁇ m / min or more, particularly 1 ⁇ m / min or more.
- the “HF etching rate” is based on the etching depth when a part of the mirror-polished glass surface is masked with a polyimide tape and then etched with a 5 mass% HF aqueous solution at 20 ° C. for 30 minutes. Refers to the calculated value.
- the liquidus temperature is preferably less than 1310 ° C., 1280 ° C. or less, particularly 1260 ° C. or less.
- the liquidus temperature is high, devitrification crystals are generated at the time of forming by the overflow downdraw method or the like, and the productivity of the glass plate tends to be lowered.
- the viscosity at the liquidus temperature is preferably 10 4.2 dPa ⁇ s or more, 10 4.4 dPa ⁇ s or more, 10 4.6 dPa ⁇ s or more, 10 4.8 dPa ⁇ s or more, particularly 10 4.5. dPa ⁇ s or more.
- the temperature at a high temperature viscosity of 10 2.5 dPa ⁇ s is preferably 1650 ° C. or lower, 1620 ° C. or lower, 1610 ° C. or lower, particularly 1600 ° C. or lower.
- the temperature at a high temperature viscosity of 10 2.5 dPa ⁇ s increases, glass melting becomes difficult and the production cost of the glass plate increases.
- Specific modulus is preferably 29.5GPa / g ⁇ cm -3 greater, 30GPa / g ⁇ cm -3 or more, 30.5GPa / g ⁇ cm -3 or more, particularly 31GPa / g ⁇ cm -3 or more.
- specific Young's modulus is high, the glass plate is easily bent by its own weight.
- the strain point can be increased by lowering the ⁇ -OH value.
- the ⁇ -OH value is preferably 0.30 / mm or less, 0.25 / mm or less, 0.20 / mm or less, particularly 0.15 / mm or less. If the ⁇ -OH value is too large, the strain point tends to decrease. If the ⁇ -OH value is too small, the meltability tends to be lowered. Therefore, the ⁇ -OH value is preferably 0.01 / mm or more, particularly 0.05 / mm or more.
- the following methods may be mentioned.
- ⁇ -OH value refers to a value obtained by measuring the transmittance of glass using FT-IR and using the following equation.
- ⁇ -OH value (1 / X) log (T 1 / T 2 )
- X Glass wall thickness (mm)
- T 1 Transmittance (%) at a reference wavelength of 3846 cm ⁇ 1
- T 2 Minimum transmittance (%) in the vicinity of a hydroxyl group absorption wavelength of 3600 cm ⁇ 1
- the glass of the present invention has a flat plate shape and preferably has an overflow merging surface at the center in the thickness direction. That is, it is preferably formed by an overflow downdraw method.
- the overflow down draw method is a method in which molten glass overflows from both sides of a wedge-shaped refractory, and the molten glass overflows and merges at the lower end of the wedge shape, and is stretched downward to form a flat plate shape.
- the surface to be the surface of the glass plate is not in contact with the refractory, and is formed in a free surface state. For this reason, it is possible to produce an unpolished glass plate with good surface quality at low cost, and it is easy to increase the area and thickness.
- a glass plate by, for example, a slot downdraw method, a redraw method, a float method, or a rollout method.
- the thickness in the case of a flat plate
- the thickness is not particularly limited, but is preferably 1.0 mm or less, 0.7 mm or less, 0.5 mm or less, particularly 0.4 mm or less.
- the wall thickness can be adjusted by the flow rate and the drawing speed during glass production.
- the glass of the present invention As a method for industrially producing the glass of the present invention, as a glass composition, SiO 2 55 to 70%, Al 2 O 3 15 to 25%, B 2 O 3 1 to 5%, Li 2 O + Na in mass%. 2 O + K 2 O 0 to 0.5%, MgO 0 to 4%, CaO 3 to 11%, SrO 0 to 4%, BaO 0 to 11%, and a method for producing a glass plate having a strain point higher than 715 ° C Then, the prepared glass batch is put into a melting furnace, and a heating process is performed by a heating electrode to obtain a molten glass, and the obtained molten glass has a thickness of 0.1 by an overflow down draw method. And a forming step of forming into a flat plate-shaped glass of 0.7 mm.
- the manufacturing process of a glass plate generally includes a melting process, a fining process, a supplying process, a stirring process, and a forming process.
- the melting step is a step of obtaining a molten glass by melting a glass batch prepared by mixing glass raw materials.
- the clarification step is a step of clarifying the molten glass obtained in the melting step by the action of a clarifier or the like.
- a supply process is a process of transferring a molten glass between each process.
- the stirring step is a step of stirring and homogenizing the molten glass.
- the forming step is a step of forming molten glass into flat glass. If necessary, a step other than the above, for example, a state adjusting step for adjusting the molten glass to a state suitable for molding may be introduced after the stirring step.
- the ⁇ -OH value is 0.40 / mm or less, 0.30 / mm or less, 0.20 / mm or less, particularly 0.15 / mm or less. It becomes easy to regulate. Furthermore, when conducting heating with a heating electrode, the amount of energy per mass for obtaining molten glass is reduced and the amount of molten volatiles is reduced, so that the environmental load can be reduced.
- the electric heating by the heating electrode is performed by applying an AC voltage to the heating electrode provided at the bottom or side of the melting kiln so as to contact the molten glass in the melting kiln.
- the material used for the heating electrode is preferably one having heat resistance and corrosion resistance against molten glass.
- tin oxide, molybdenum, platinum, rhodium, etc. can be used, and molybdenum is particularly preferable.
- the glass of the present invention has a small amount of alkali metal oxide, the electrical resistivity is higher than that of a high alkali-containing glass. Therefore, when applying current heating by the heating electrode to the low alkali glass, current flows not only in the molten glass but also in the refractory constituting the melting kiln, and the refractory constituting the melting kiln may be damaged early. is there.
- a zirconia refractory having a high electrical resistivity, particularly a zirconia electroformed brick, as a refractory in the furnace, and a component that lowers the electrical resistivity in molten glass (glass composition) It is preferable to introduce a small amount of Li 2 O, Na 2 O, K 2 O, Fe 2 O 3 and the like, and it is particularly preferable to introduce a small amount of Li 2 O, Na 2 O, K 2 O and the like.
- the content of Fe 2 O 3 is preferably 0.005 to 0.03% by mass, 0.008 to 0.025% by mass, and particularly preferably 0.01 to 0.02% by mass.
- the content of ZrO 2 in the zirconia refractory is preferably 85% by mass or more, particularly 90% by mass or more.
- Tables 1 and 2 show examples of the present invention (sample Nos. 1 to 32).
- “NA” means not measured.
- the Fe 2 O 3 content of each sample is not clearly shown, but each sample contains 0.001 to 0.008 mass% of Fe 2 O 3 as a trace component in the glass composition. It is out.
- the ⁇ -OH value of each sample is not clearly shown, but the ⁇ -OH value of each sample was 0.05 to 0.15 / mm.
- a glass batch in which glass raw materials were prepared so as to have the glass composition shown in the table was placed in a platinum crucible and melted at 1600 to 1650 ° C. for 24 hours.
- the mixture was stirred and homogenized using a platinum stirrer.
- the molten glass was poured out onto a carbon plate, formed into a plate shape, and then gradually cooled at a temperature near the annealing point for 30 minutes.
- the average thermal expansion coefficient ⁇ , density (Density), ⁇ -OH value, HF etching rate (HF etching rate), strain point Ps, annealing point Ta in the temperature range of 30 to 380 ° C.
- Softening point Ts temperature at a high temperature viscosity of 10 4.5 dPa ⁇ s, temperature at a high temperature viscosity of 10 4.0 dPa ⁇ s, temperature at a high temperature viscosity of 10 3.0 dPa ⁇ s, temperature at a high temperature viscosity of 10 2.5 dPa ⁇ s
- Temperature, liquid phase temperature TL, liquid phase viscosity log ⁇ at TL, Young's modulus, and specific modulus were evaluated.
- the average coefficient of thermal expansion ⁇ in the temperature range of 30 to 380 ° C. is a value measured with a dilatometer.
- the density is a value measured by the well-known Archimedes method.
- the ⁇ -OH value is a value measured by the above method.
- the etching rate of HF is a value calculated from the etching depth when a part of the mirror-polished glass surface is masked with a polyimide tape and then etched with a 5 mass% HF aqueous solution at 20 ° C. for 30 minutes. .
- strain point Ps, annealing point Ta, and softening point Ts are values measured based on the methods of ASTM C336 and C338.
- the temperatures at high temperature viscosities of 10 4.5 dPa ⁇ s, 10 4.0 dPa ⁇ s, 10 3.0 dPa ⁇ s, and 10 2.5 dPa ⁇ s are values measured by the platinum ball pulling method.
- the liquid phase temperature TL passes through a standard sieve 30 mesh (a sieve opening of 500 ⁇ m), puts the glass powder remaining in 50 mesh (a sieve opening of 300 ⁇ m) in a platinum boat, and holds it in a temperature gradient furnace for 24 hours. This is a value obtained by measuring the temperature at which crystals (initial phase) precipitate.
- the liquidus viscosity log 10 ⁇ TL is a value obtained by measuring the viscosity of the glass at the liquidus temperature TL by a platinum ball pulling method.
- the Young's modulus is a value measured using a well-known resonance method. Specific Young's modulus is a value obtained by dividing Young's modulus by density.
- Sample No. 1 to 32 have a low alkali metal oxide content, a strain point of 725 ° C. or higher, a temperature at a high temperature viscosity of 10 2.5 dPa ⁇ s of 1640 ° C. or lower, a liquidus temperature of 1302 ° C. or lower, and a liquidus temperature of The viscosity was 10 4.32 dPa ⁇ s or more, and the specific Young's modulus was 30.4 GPa / g ⁇ cm ⁇ 3 or more. Therefore, sample no. It is considered that 1 to 32 can be suitably used as a substrate for an organic EL display.
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Abstract
Description
(1)熱処理工程で成膜された半導体物質中にアルカリイオンが拡散する事態を防止するため、アルカリ金属酸化物の含有量が少ないこと、
(2)ガラス板を低廉化するため、生産性に優れること、特に耐失透性や溶融性に優れること、
(3)p-Si・TFTの製造工程において、熱収縮を低減するため、歪点が高いこと、
(4)搬送工程での自重撓みを軽減するため、比ヤング率が高いこと。
β-OH値 = (1/X)log(T1/T2)
X:ガラス肉厚(mm)
T1:参照波長3846cm-1における透過率(%)
T2:水酸基吸収波長3600cm-1付近における最小透過率(%)
Claims (11)
- ガラス組成として、質量%で、SiO2 55~70%、Al2O3 15~25%、B2O3 1~5%、Li2O+Na2O+K2O 0~0.5%、MgO 0~4%、CaO 3~11%、SrO 0~4%、BaO 0~11%を含有し、歪点が715℃より高いことを特徴とするガラス。
- ガラス組成として、質量%で、SiO2 55~70%、Al2O3 15~25%、B2O3 1.5~4%、Li2O+Na2O+K2O 0~0.1%未満、MgO 0~3%、CaO 4~10%、SrO 1~4%、BaO 4~11%を含有することを特徴とする請求項1に記載のガラス。
- 質量%比でSiO2/Al2O3が2.5~3.1であることを特徴とする請求項1又は2に記載のガラス。
- 質量%比でCaO/BaOが4.0以下であることを特徴とする請求項1~3の何れかに記載のガラス。
- 更にSnO2を0.001~1質量%含むことを特徴とする請求項1~4の何れかに記載のガラス。
- 比ヤング率が29.5GPa/g・cm-3より大きいことを特徴とする請求項1~5の何れかに記載のガラス。
- 高温粘度102.5dPa・sにおける温度が1650℃以下であることを特徴とする請求項1~6のいずれかに記載のガラス。
- 液相温度が1310℃より低いことを特徴とする請求項1~7の何れかに記載のガラス。
- 液相温度における粘度が104.2dPa・s以上であることを特徴とする請求項1~8の何れかに記載のガラス。
- 平板形状であり、板厚方向の中央部にオーバーフロー合流面を有することを特徴とする請求項1~9の何れかに記載のガラス。
- 有機ELデバイスに用いることを特徴とする請求項1~10の何れかに記載のガラス。
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CN201780063611.2A CN109843817B (zh) | 2016-12-20 | 2017-12-14 | 玻璃 |
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US17/346,663 US20210300813A1 (en) | 2016-12-20 | 2021-06-14 | Glass |
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WO2021261445A1 (ja) * | 2020-06-23 | 2021-12-30 | 日本電気硝子株式会社 | 無アルカリガラス板 |
WO2022054738A1 (ja) * | 2020-09-10 | 2022-03-17 | 日本電気硝子株式会社 | 低アルカリガラス板の製造方法及び低アルカリガラス板 |
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JP7333159B2 (ja) * | 2016-12-26 | 2023-08-24 | 日本電気硝子株式会社 | 無アルカリガラス基板の製造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009525942A (ja) * | 2006-02-10 | 2009-07-16 | コーニング インコーポレイテッド | 熱および化学安定性が高いガラス組成物ならびにその製造方法 |
JP2012041217A (ja) * | 2010-08-17 | 2012-03-01 | Nippon Electric Glass Co Ltd | 無アルカリガラス |
WO2012063643A1 (ja) * | 2010-11-08 | 2012-05-18 | 日本電気硝子株式会社 | 無アルカリガラス |
JP2012236759A (ja) * | 2011-04-25 | 2012-12-06 | Nippon Electric Glass Co Ltd | 液晶レンズ用ガラス基板 |
JP2014503465A (ja) * | 2011-01-25 | 2014-02-13 | コーニング インコーポレイテッド | 熱安定性および化学安定性の高いガラス組成物 |
JP2015512849A (ja) * | 2012-02-28 | 2015-04-30 | コーニング インコーポレイテッド | 高歪点アルミノシリケートガラス |
JP2016505502A (ja) * | 2012-12-21 | 2016-02-25 | コーニング インコーポレイテッド | トータルピッチ安定性が改善されているガラス |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100262116B1 (ko) * | 1995-09-28 | 2000-07-15 | 기시다 기요사쿠 | 무알칼리유리기판 |
DE19603698C1 (de) * | 1996-02-02 | 1997-08-28 | Schott Glaswerke | Alkalifreies Aluminoborosilicatglas und dessen Verwendung |
JP2002003240A (ja) * | 2000-06-19 | 2002-01-09 | Nippon Electric Glass Co Ltd | 液晶ディスプレイ用ガラス基板 |
JP5757451B2 (ja) * | 2009-03-18 | 2015-07-29 | 日本電気硝子株式会社 | 無アルカリガラス |
CN101531458A (zh) * | 2009-04-01 | 2009-09-16 | 河南安飞电子玻璃有限公司 | 无碱铍铈锌硼硅酸盐玻璃料配方 |
JP5729673B2 (ja) * | 2010-12-06 | 2015-06-03 | 日本電気硝子株式会社 | 無アルカリガラス |
TWI469945B (zh) * | 2011-07-01 | 2015-01-21 | Avanstrate Inc | 平面顯示器用玻璃基板及其製造方法 |
KR101654753B1 (ko) * | 2011-12-28 | 2016-09-08 | 아반스트레이트 가부시키가이샤 | 플랫 패널 디스플레이용 유리 기판 및 그 제조 방법 |
KR20150030653A (ko) * | 2012-06-07 | 2015-03-20 | 아사히 가라스 가부시키가이샤 | 무알칼리 유리 및 이것을 사용한 무알칼리 유리판 |
JP5914453B2 (ja) * | 2012-12-28 | 2016-05-11 | AvanStrate株式会社 | ディスプレイ用ガラス基板およびその製造方法 |
JP6365826B2 (ja) * | 2013-07-11 | 2018-08-01 | 日本電気硝子株式会社 | ガラス |
JP6256744B2 (ja) * | 2013-10-17 | 2018-01-10 | 日本電気硝子株式会社 | 無アルカリガラス板 |
FR3025793B1 (fr) * | 2014-09-12 | 2016-12-02 | Eurokera | Plaque en vitroceramique |
CN116375339A (zh) * | 2014-10-23 | 2023-07-04 | Agc株式会社 | 无碱玻璃 |
WO2016069821A1 (en) * | 2014-10-31 | 2016-05-06 | Corning Incorporated | Dimensionally stable fast etching glasses |
JP6802966B2 (ja) * | 2014-12-17 | 2020-12-23 | 日本電気硝子株式会社 | 支持ガラス基板及びこれを用いた積層体 |
JP7004488B2 (ja) * | 2015-03-10 | 2022-01-21 | 日本電気硝子株式会社 | ガラス基板 |
US10590026B2 (en) * | 2015-05-18 | 2020-03-17 | Nippon Electric Glass Co., Ltd. | Non-alkali glass substrate |
WO2016194693A1 (ja) * | 2015-06-02 | 2016-12-08 | 日本電気硝子株式会社 | ガラス |
KR20190091437A (ko) * | 2016-12-20 | 2019-08-06 | 니폰 덴키 가라스 가부시키가이샤 | 유리 |
-
2017
- 2017-12-14 KR KR1020197008513A patent/KR20190091437A/ko not_active IP Right Cessation
- 2017-12-14 WO PCT/JP2017/044919 patent/WO2018116953A1/ja active Application Filing
- 2017-12-14 US US16/470,765 patent/US11066326B2/en active Active
- 2017-12-14 CN CN202111267693.7A patent/CN113800764A/zh active Pending
- 2017-12-14 JP JP2018557722A patent/JPWO2018116953A1/ja active Pending
- 2017-12-14 KR KR1020247002352A patent/KR20240016446A/ko not_active Application Discontinuation
- 2017-12-14 CN CN201780063611.2A patent/CN109843817B/zh active Active
- 2017-12-18 TW TW106144299A patent/TWI812605B/zh active
- 2017-12-18 TW TW112126813A patent/TW202342390A/zh unknown
-
2021
- 2021-06-14 US US17/346,663 patent/US20210300813A1/en active Pending
-
2022
- 2022-06-20 JP JP2022098618A patent/JP2022121511A/ja active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009525942A (ja) * | 2006-02-10 | 2009-07-16 | コーニング インコーポレイテッド | 熱および化学安定性が高いガラス組成物ならびにその製造方法 |
JP2012041217A (ja) * | 2010-08-17 | 2012-03-01 | Nippon Electric Glass Co Ltd | 無アルカリガラス |
WO2012063643A1 (ja) * | 2010-11-08 | 2012-05-18 | 日本電気硝子株式会社 | 無アルカリガラス |
JP2014503465A (ja) * | 2011-01-25 | 2014-02-13 | コーニング インコーポレイテッド | 熱安定性および化学安定性の高いガラス組成物 |
JP2012236759A (ja) * | 2011-04-25 | 2012-12-06 | Nippon Electric Glass Co Ltd | 液晶レンズ用ガラス基板 |
JP2015512849A (ja) * | 2012-02-28 | 2015-04-30 | コーニング インコーポレイテッド | 高歪点アルミノシリケートガラス |
JP2016505502A (ja) * | 2012-12-21 | 2016-02-25 | コーニング インコーポレイテッド | トータルピッチ安定性が改善されているガラス |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021261445A1 (ja) * | 2020-06-23 | 2021-12-30 | 日本電気硝子株式会社 | 無アルカリガラス板 |
WO2022054738A1 (ja) * | 2020-09-10 | 2022-03-17 | 日本電気硝子株式会社 | 低アルカリガラス板の製造方法及び低アルカリガラス板 |
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US20190345055A1 (en) | 2019-11-14 |
CN109843817A (zh) | 2019-06-04 |
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