JP2011527381A5 - - Google Patents
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- Publication number
- JP2011527381A5 JP2011527381A5 JP2011517017A JP2011517017A JP2011527381A5 JP 2011527381 A5 JP2011527381 A5 JP 2011527381A5 JP 2011517017 A JP2011517017 A JP 2011517017A JP 2011517017 A JP2011517017 A JP 2011517017A JP 2011527381 A5 JP2011527381 A5 JP 2011527381A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- electrolyte solution
- electrolyte
- phosphonic acid
- electrolytic solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000008151 electrolyte solution Substances 0.000 claims description 22
- 150000003839 salts Chemical class 0.000 claims description 8
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 7
- 239000003792 electrolyte Substances 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 239000011135 tin Substances 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- 229910000906 Bronze Inorganic materials 0.000 claims description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 4
- JYYOBHFYCIDXHH-UHFFFAOYSA-N carbonic acid;hydrate Chemical compound O.OC(O)=O JYYOBHFYCIDXHH-UHFFFAOYSA-N 0.000 claims description 4
- 235000011180 diphosphates Nutrition 0.000 claims description 4
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 2
- 150000004820 halides Chemical class 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 2
- -1 disulfide compound Chemical class 0.000 claims 10
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 231100000252 nontoxic Toxicity 0.000 claims 3
- 230000003000 nontoxic effect Effects 0.000 claims 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- DUYCTCQXNHFCSJ-UHFFFAOYSA-N dtpmp Chemical compound OP(=O)(O)CN(CP(O)(O)=O)CCN(CP(O)(=O)O)CCN(CP(O)(O)=O)CP(O)(O)=O DUYCTCQXNHFCSJ-UHFFFAOYSA-N 0.000 claims 2
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 claims 2
- 125000005842 heteroatom Chemical group 0.000 claims 2
- 229910021645 metal ion Inorganic materials 0.000 claims 2
- 150000003007 phosphonic acid derivatives Chemical class 0.000 claims 2
- OZMCKSGKGHEMGG-UHFFFAOYSA-N (1-acetamido-2,2,2-trichloroethyl)phosphonic acid Chemical compound CC(=O)NC(C(Cl)(Cl)Cl)P(O)(O)=O OZMCKSGKGHEMGG-UHFFFAOYSA-N 0.000 claims 1
- BQIYVTCUMQVDEJ-UHFFFAOYSA-N (1-amino-1-phosphonooctyl)phosphonic acid Chemical compound CCCCCCCC(N)(P(O)(O)=O)P(O)(O)=O BQIYVTCUMQVDEJ-UHFFFAOYSA-N 0.000 claims 1
- WCJYZAIHHQFLSS-UHFFFAOYSA-N (1-benzamido-2,2,2-trichloroethyl)phosphonic acid Chemical compound OP(O)(=O)C(C(Cl)(Cl)Cl)NC(=O)C1=CC=CC=C1 WCJYZAIHHQFLSS-UHFFFAOYSA-N 0.000 claims 1
- SIXJDNRSTUBUBM-UHFFFAOYSA-N (1-benzamido-2,2-dichloroethenyl)phosphonic acid Chemical compound OP(O)(=O)C(=C(Cl)Cl)NC(=O)C1=CC=CC=C1 SIXJDNRSTUBUBM-UHFFFAOYSA-N 0.000 claims 1
- MGRVRXRGTBOSHW-UHFFFAOYSA-N (aminomethyl)phosphonic acid Chemical compound NCP(O)(O)=O MGRVRXRGTBOSHW-UHFFFAOYSA-N 0.000 claims 1
- UIQSKEDQPSEGAU-UHFFFAOYSA-N 1-Aminoethylphosphonic Acid Chemical compound CC(N)P(O)(O)=O UIQSKEDQPSEGAU-UHFFFAOYSA-N 0.000 claims 1
- DELJNDWGTWHHFA-UHFFFAOYSA-N 1-azaniumylpropyl(hydroxy)phosphinate Chemical compound CCC(N)P(O)(O)=O DELJNDWGTWHHFA-UHFFFAOYSA-N 0.000 claims 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims 1
- 208000035220 Dyserythropoietic Congenital Anemia Diseases 0.000 claims 1
- 229940120146 EDTMP Drugs 0.000 claims 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims 1
- 229910002651 NO3 Inorganic materials 0.000 claims 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims 1
- HPPXSNUAVNMIES-UHFFFAOYSA-N [(4-chlorophenyl)-hydroxymethyl]phosphonic acid Chemical compound OP(=O)(O)C(O)C1=CC=C(Cl)C=C1 HPPXSNUAVNMIES-UHFFFAOYSA-N 0.000 claims 1
- WFCQGBOETURRDK-UHFFFAOYSA-N [2-amino-1,1,1-trichloro-3-(furan-2-yl)-3-oxopropan-2-yl]phosphonic acid Chemical compound ClC(Cl)(Cl)C(P(O)(O)=O)(N)C(=O)C1=CC=CO1 WFCQGBOETURRDK-UHFFFAOYSA-N 0.000 claims 1
- KIDJHPQACZGFTI-UHFFFAOYSA-N [6-[bis(phosphonomethyl)amino]hexyl-(phosphonomethyl)amino]methylphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCCCCCN(CP(O)(O)=O)CP(O)(O)=O KIDJHPQACZGFTI-UHFFFAOYSA-N 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 239000008139 complexing agent Substances 0.000 claims 1
- 229910001431 copper ion Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 150000001991 dicarboxylic acids Chemical class 0.000 claims 1
- 229940042400 direct acting antivirals phosphonic acid derivative Drugs 0.000 claims 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 claims 1
- 238000001465 metallisation Methods 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 1
- 150000002763 monocarboxylic acids Chemical class 0.000 claims 1
- SPDJZXXKQOBLBT-UHFFFAOYSA-N n-[6-[bis[hydroxy(methoxy)phosphoryl]amino]hexyl]-n-[hydroxy(methoxy)phosphoryl]-methoxyphosphonamidic acid Chemical compound COP(O)(=O)N(P(O)(=O)OC)CCCCCCN(P(O)(=O)OC)P(O)(=O)OC SPDJZXXKQOBLBT-UHFFFAOYSA-N 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- 230000000087 stabilizing effect Effects 0.000 claims 1
- 229910001432 tin ion Inorganic materials 0.000 claims 1
- 239000010974 bronze Substances 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008032398.5 | 2008-07-10 | ||
| DE102008032398A DE102008032398A1 (de) | 2008-07-10 | 2008-07-10 | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
| PCT/EP2009/004879 WO2010003621A1 (en) | 2008-07-10 | 2009-07-06 | Improved copper-tin electrolyte and process for the deposition of bronze layers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011527381A JP2011527381A (ja) | 2011-10-27 |
| JP2011527381A5 true JP2011527381A5 (https=) | 2012-08-23 |
Family
ID=41258161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011517017A Withdrawn JP2011527381A (ja) | 2008-07-10 | 2009-07-06 | 改良された銅−錫電解液及び青銅層の析出方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20110174631A1 (https=) |
| EP (1) | EP2310558B1 (https=) |
| JP (1) | JP2011527381A (https=) |
| KR (1) | KR20110031183A (https=) |
| CN (1) | CN102089466B (https=) |
| AT (1) | ATE549434T1 (https=) |
| DE (1) | DE102008032398A1 (https=) |
| PL (1) | PL2310558T3 (https=) |
| TW (1) | TW201014935A (https=) |
| WO (1) | WO2010003621A1 (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010044551A1 (de) * | 2010-09-07 | 2012-03-08 | Coventya Gmbh | Anode sowie deren Verwendung in einem alkalischen Galvanikbad |
| DE102011121799B4 (de) * | 2011-12-21 | 2013-08-29 | Umicore Galvanotechnik Gmbh | Elektrolyt und Verfahren zur elektrolytischen Abscheidung von Cu-Zn-Sn-Legierungsschichten und Verfahren zur Herstellung einer Dünnschichtsolarzelle |
| DE102012008544A1 (de) | 2012-05-02 | 2013-11-07 | Umicore Galvanotechnik Gmbh | Verchromte Verbundwerkstoffe ohne Nickelschicht |
| AT514818B1 (de) * | 2013-09-18 | 2015-10-15 | W Garhöfer Ges M B H Ing | Abscheidung von Cu, Sn, Zn-Beschichtungen auf metallischen Substraten |
| DE102013226297B3 (de) * | 2013-12-17 | 2015-03-26 | Umicore Galvanotechnik Gmbh | Wässriger, cyanidfreier Elektrolyt für die Abscheidung von Kupfer-Zinn- und Kupfer-Zinn-Zink-Legierungen aus einem Elektrolyten und Verfahren zur elektrolytischen Abscheidung dieser Legierungen |
| CN103789803B (zh) * | 2014-01-13 | 2016-04-27 | 孙松华 | 一种无氰铜锡合金电镀液及其制备方法 |
| JP5938426B2 (ja) * | 2014-02-04 | 2016-06-22 | 株式会社豊田中央研究所 | 電気めっきセル、及び、金属皮膜の製造方法 |
| AR100422A1 (es) * | 2014-05-15 | 2016-10-05 | Nippon Steel & Sumitomo Metal Corp | Solución para deposición para conexión roscada para un caño o tubo y método de producción de la conexión roscada para un caño o tubo |
| CN106521574B (zh) * | 2016-12-05 | 2018-10-26 | 浙江工业大学 | 一种适用于宽pH和宽电流密度范围的无氰镀铜电镀液及其制备方法 |
| MY199306A (en) * | 2016-12-28 | 2023-10-24 | Atotech Deutschland Gmbh | Tin plating bath and a method for depositing tin or tin alloy onto a surface of a substrate |
| CN110344079B (zh) * | 2019-08-16 | 2021-06-08 | 广东超华科技股份有限公司 | 一种降低电解铜箔电解液中铁离子浓度的装置及方法 |
| RU2762501C1 (ru) * | 2021-05-17 | 2021-12-21 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Щелочной электролит для электролитического осаждения желтой оловянной бронзы |
| DE102021117095A1 (de) | 2021-07-02 | 2023-01-05 | Umicore Galvanotechnik Gmbh | Bronzeschichten als Edelmetallersatz |
| DE202021004169U1 (de) | 2021-07-02 | 2022-12-07 | Umicore Galvanotechnik Gmbh | Bronzeschicht als Edelmetallersatz in Smart Cards |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US3833486A (en) * | 1973-03-26 | 1974-09-03 | Lea Ronal Inc | Cyanide-free electroplating |
| US4289286A (en) * | 1978-10-16 | 1981-09-15 | East/West Industries, Inc. | Replaceable harness bracket assembly |
| US4356067A (en) * | 1979-06-13 | 1982-10-26 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
| US4417956A (en) * | 1980-07-17 | 1983-11-29 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
| US4389286A (en) * | 1980-07-17 | 1983-06-21 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
| US4347108A (en) * | 1981-05-29 | 1982-08-31 | Rohco, Inc. | Electrodeposition of copper, acidic copper electroplating baths and additives therefor |
| CN1004010B (zh) * | 1986-07-11 | 1989-04-26 | 南京大学 | 无氰仿金电镀液 |
| DE4324995C2 (de) * | 1993-07-26 | 1995-12-21 | Demetron Gmbh | Cyanidisch-alkalische Bäder zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
| US6176996B1 (en) * | 1997-10-30 | 2001-01-23 | Sungsoo Moon | Tin alloy plating compositions |
| TW577938B (en) | 1998-11-05 | 2004-03-01 | Uyemura C & Co Ltd | Tin-copper alloy electroplating bath and plating process therewith |
| JP2001181889A (ja) * | 1999-12-22 | 2001-07-03 | Nippon Macdermid Kk | 光沢錫−銅合金電気めっき浴 |
| JP3455712B2 (ja) | 2000-04-14 | 2003-10-14 | 日本ニュークローム株式会社 | 銅−スズ合金めっき用ピロリン酸浴 |
| DE10046600C2 (de) | 2000-09-20 | 2003-02-20 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Kupfer-Legierungsschichten und Verwendung des Elektrolyten |
| JP2004510053A (ja) * | 2000-09-20 | 2004-04-02 | デーエル．−イーエヌゲー．マックス シュレッター ゲーエムベーハー ウント ツェーオー．カーゲー | 錫−銅合金層を析出させるための電解質及び方法 |
| US6645364B2 (en) * | 2000-10-20 | 2003-11-11 | Shipley Company, L.L.C. | Electroplating bath control |
| JP4249438B2 (ja) * | 2002-07-05 | 2009-04-02 | 日本ニュークローム株式会社 | 銅―錫合金めっき用ピロリン酸浴 |
| DE10243139A1 (de) * | 2002-09-17 | 2004-03-25 | Omg Galvanotechnik Gmbh | Dunkle Schichten |
| ES2531163T3 (es) | 2002-10-11 | 2015-03-11 | Enthone | Procedimiento y electrolito para la deposición galvánica de bronces |
| JP4441726B2 (ja) * | 2003-01-24 | 2010-03-31 | 石原薬品株式会社 | スズ又はスズ合金の脂肪族スルホン酸メッキ浴の製造方法 |
| US7128822B2 (en) * | 2003-06-04 | 2006-10-31 | Shipley Company, L.L.C. | Leveler compounds |
| US20050067297A1 (en) * | 2003-09-26 | 2005-03-31 | Innovative Technology Licensing, Llc | Copper bath for electroplating fine circuitry on semiconductor chips |
| US20060231409A1 (en) * | 2005-03-31 | 2006-10-19 | Tdk Corporation | Plating solution, conductive material, and surface treatment method of conductive material |
| EP1870495A1 (de) * | 2006-06-21 | 2007-12-26 | Atotech Deutschland Gmbh | Wässriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- und Zinklegierungsüberzügen |
| DE502007002479D1 (de) * | 2007-02-14 | 2010-02-11 | Umicore Galvanotechnik Gmbh | Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
-
2008
- 2008-07-10 DE DE102008032398A patent/DE102008032398A1/de not_active Ceased
-
2009
- 2009-07-03 TW TW098122653A patent/TW201014935A/zh unknown
- 2009-07-06 US US13/003,209 patent/US20110174631A1/en not_active Abandoned
- 2009-07-06 CN CN2009801264856A patent/CN102089466B/zh not_active Expired - Fee Related
- 2009-07-06 EP EP09776985A patent/EP2310558B1/en not_active Not-in-force
- 2009-07-06 JP JP2011517017A patent/JP2011527381A/ja not_active Withdrawn
- 2009-07-06 AT AT09776985T patent/ATE549434T1/de active
- 2009-07-06 PL PL09776985T patent/PL2310558T3/pl unknown
- 2009-07-06 KR KR1020117000324A patent/KR20110031183A/ko not_active Withdrawn
- 2009-07-06 WO PCT/EP2009/004879 patent/WO2010003621A1/en not_active Ceased
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