JP4273085B2 - 白金−コバルト合金めっき液及びめっき方法 - Google Patents
白金−コバルト合金めっき液及びめっき方法 Download PDFInfo
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- JP4273085B2 JP4273085B2 JP2005025857A JP2005025857A JP4273085B2 JP 4273085 B2 JP4273085 B2 JP 4273085B2 JP 2005025857 A JP2005025857 A JP 2005025857A JP 2005025857 A JP2005025857 A JP 2005025857A JP 4273085 B2 JP4273085 B2 JP 4273085B2
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- Prior art keywords
- platinum
- cobalt
- plating solution
- salt
- plating
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- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Description
Claims (4)
- 白金塩とコバルト塩を含む白金−コバルト合金めっき液において、
前記白金塩として、Na2[Pt(C2O4)2]、K2[Pt(C2O4)2]、[Pt(NH3)4]Cl2、[Pt(NH3)4]SO4、[Pt(NH3)4](NO3)2、[Pt(NO3)2(NH3)2]、K2PtCl4のいずれか1種の2価の白金塩を白金濃度で1〜30g/L含み、
前記コバルト塩として、硫酸コバルト又は塩化コバルトの少なくともいずれかをコバルト濃度で1〜60g/L含み、
緩衝剤として、クエン酸三アンモニウム又はホウ酸のいずれかと、EDTAとを合計で1〜200g/L含むことを特徴とする白金−コバルト合金めっき液。 - 伝導塩として、硫酸イオン又はスルファミン酸イオンのいずれかを、めっき液全体に対し0.1〜10重量%含む請求項1に記載の白金−コバルト合金めっき液。
- 更に、沈澱防止剤として、アンモニア又はポリアミンのいずれかを含む請求項1又は請求項2に記載の白金−コバルト合金めっき液。
- 請求項1〜請求項3のいずれか1項に記載の白金−コバルト合金めっき液を用いて白金−コバルト膜形成のめっき処理を行う方法であって、
電流密度0.1〜20A/dm2、めっき液pH1〜5、液温20〜80℃でめっき処理を行うめっき方法。
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JP2005025857A JP4273085B2 (ja) | 2005-02-02 | 2005-02-02 | 白金−コバルト合金めっき液及びめっき方法 |
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JP2005025857A JP4273085B2 (ja) | 2005-02-02 | 2005-02-02 | 白金−コバルト合金めっき液及びめっき方法 |
Publications (2)
Publication Number | Publication Date |
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JP2006213945A JP2006213945A (ja) | 2006-08-17 |
JP4273085B2 true JP4273085B2 (ja) | 2009-06-03 |
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JP2005025857A Expired - Fee Related JP4273085B2 (ja) | 2005-02-02 | 2005-02-02 | 白金−コバルト合金めっき液及びめっき方法 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4979328B2 (ja) * | 2006-10-03 | 2012-07-18 | 日進化成株式会社 | イリジウム・コバルト合金めっき液 |
FR3079242B1 (fr) * | 2018-03-20 | 2020-04-10 | Aveni | Procede d'electrodeposition de cobalt |
US10612149B1 (en) * | 2019-09-05 | 2020-04-07 | Chow Sang Sang Jewellery Company Limited | Platinum electrodeposition bath and uses thereof |
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2005
- 2005-02-02 JP JP2005025857A patent/JP4273085B2/ja not_active Expired - Fee Related
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