FR3079242B1 - Procede d'electrodeposition de cobalt - Google Patents

Procede d'electrodeposition de cobalt Download PDF

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Publication number
FR3079242B1
FR3079242B1 FR1852386A FR1852386A FR3079242B1 FR 3079242 B1 FR3079242 B1 FR 3079242B1 FR 1852386 A FR1852386 A FR 1852386A FR 1852386 A FR1852386 A FR 1852386A FR 3079242 B1 FR3079242 B1 FR 3079242B1
Authority
FR
France
Prior art keywords
cobalt
electrodeposition process
electrolyte
cobalt electrodeposition
additives
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1852386A
Other languages
English (en)
Other versions
FR3079242A1 (fr
Inventor
Vincent Mevellec
Dominique SUHR
Mikailou THIAM
Louis Caillard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aveni SA
Original Assignee
Aveni SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aveni SA filed Critical Aveni SA
Priority to FR1852386A priority Critical patent/FR3079242B1/fr
Priority to FR1855300A priority patent/FR3079241A1/fr
Priority to PCT/EP2019/056593 priority patent/WO2019179897A1/fr
Priority to JP2020550759A priority patent/JP7244533B2/ja
Priority to KR1020207025940A priority patent/KR102562157B1/ko
Priority to US16/982,421 priority patent/US11384445B2/en
Priority to EP19710697.4A priority patent/EP3768880A1/fr
Priority to CN201980015252.2A priority patent/CN111771016B/zh
Priority to TW108109546A priority patent/TWI804593B/zh
Publication of FR3079242A1 publication Critical patent/FR3079242A1/fr
Application granted granted Critical
Publication of FR3079242B1 publication Critical patent/FR3079242B1/fr
Priority to IL276902A priority patent/IL276902A/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
    • H01L21/76879—Filling of holes, grooves or trenches, e.g. vias, with conductive material by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

La présente invention se rapporte à un procédé de fabrication d'interconnexions en cobalt et à un électrolyte permettant sa mise en œuvre. L'électrolyte de pH inférieur à 4,0 comprend des ions cobalt, des ions chlorure et au plus deux additifs organiques de faible masse moléculaire. Un de ces additifs peut être un acide carboxylique alpha-hydroxylé.
FR1852386A 2018-03-20 2018-03-20 Procede d'electrodeposition de cobalt Active FR3079242B1 (fr)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FR1852386A FR3079242B1 (fr) 2018-03-20 2018-03-20 Procede d'electrodeposition de cobalt
FR1855300A FR3079241A1 (fr) 2018-03-20 2018-06-15 Procede d'electrodeposition de cobalt
JP2020550759A JP7244533B2 (ja) 2018-03-20 2019-03-15 コバルト電着プロセス
KR1020207025940A KR102562157B1 (ko) 2018-03-20 2019-03-15 코발트 전착 공정
US16/982,421 US11384445B2 (en) 2018-03-20 2019-03-15 Process for electrodeposition of cobalt
EP19710697.4A EP3768880A1 (fr) 2018-03-20 2019-03-15 Procédé d'électrodéposition de cobalt
PCT/EP2019/056593 WO2019179897A1 (fr) 2018-03-20 2019-03-15 Procédé d'électrodéposition de cobalt
CN201980015252.2A CN111771016B (zh) 2018-03-20 2019-03-15 用于钴的电沉积的方法
TW108109546A TWI804593B (zh) 2018-03-20 2019-03-20 電鍍鈷之方法
IL276902A IL276902A (en) 2018-03-20 2020-08-24 Process for electrodeposition of cobalt

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1852386 2018-03-20
FR1852386A FR3079242B1 (fr) 2018-03-20 2018-03-20 Procede d'electrodeposition de cobalt

Publications (2)

Publication Number Publication Date
FR3079242A1 FR3079242A1 (fr) 2019-09-27
FR3079242B1 true FR3079242B1 (fr) 2020-04-10

Family

ID=62948205

Family Applications (2)

Application Number Title Priority Date Filing Date
FR1852386A Active FR3079242B1 (fr) 2018-03-20 2018-03-20 Procede d'electrodeposition de cobalt
FR1855300A Pending FR3079241A1 (fr) 2018-03-20 2018-06-15 Procede d'electrodeposition de cobalt

Family Applications After (1)

Application Number Title Priority Date Filing Date
FR1855300A Pending FR3079241A1 (fr) 2018-03-20 2018-06-15 Procede d'electrodeposition de cobalt

Country Status (4)

Country Link
US (1) US11384445B2 (fr)
JP (1) JP7244533B2 (fr)
KR (1) KR102562157B1 (fr)
FR (2) FR3079242B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11230778B2 (en) * 2019-12-13 2022-01-25 Macdermid Enthone Inc. Cobalt chemistry for smooth topology

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905776A (en) * 1973-07-05 1975-09-16 Nico Magnetics Inc Method of making a thin, ferro-magnetic memory layer and article made thereby
US4441969A (en) * 1982-03-29 1984-04-10 Omi International Corporation Coumarin process and nickel electroplating bath
JPS60190588A (ja) * 1984-03-12 1985-09-28 Toyo Kohan Co Ltd 亜鉛または亜鉛合金めつき鋼板の黒色処理方法
JPS62109991A (ja) * 1985-07-29 1987-05-21 C Uyemura & Co Ltd 電気めつき液
US4904353A (en) * 1988-08-31 1990-02-27 Martin Marietta Corporation Optically black cobalt surface
JP2004031586A (ja) * 2002-06-25 2004-01-29 Sony Corp 半導体装置の製造方法
JP4273085B2 (ja) * 2005-02-02 2009-06-03 田中貴金属工業株式会社 白金−コバルト合金めっき液及びめっき方法
US8372744B2 (en) * 2007-04-20 2013-02-12 International Business Machines Corporation Fabricating a contact rhodium structure by electroplating and electroplating composition
EP2528698A1 (fr) * 2010-01-29 2012-12-05 Research Triangle Institute Procédés permettant de former des transducteurs ultrasoniques piézoélectriques et appareils associés
US20110253545A1 (en) * 2010-04-19 2011-10-20 International Business Machines Corporation Method of direct electrodeposition on semiconductors
JP2012009473A (ja) * 2010-06-22 2012-01-12 Panasonic Corp 半導体装置及びその製造方法
JP6422658B2 (ja) * 2014-02-27 2018-11-14 新光電気工業株式会社 電気めっき浴及び電気めっき方法
US9758896B2 (en) * 2015-02-12 2017-09-12 Applied Materials, Inc. Forming cobalt interconnections on a substrate
US9777386B2 (en) * 2015-03-19 2017-10-03 Lam Research Corporation Chemistry additives and process for cobalt film electrodeposition
US11035048B2 (en) * 2017-07-05 2021-06-15 Macdermid Enthone Inc. Cobalt filling of interconnects

Also Published As

Publication number Publication date
FR3079242A1 (fr) 2019-09-27
KR20200117024A (ko) 2020-10-13
FR3079241A1 (fr) 2019-09-27
KR102562157B1 (ko) 2023-08-01
JP2021518487A (ja) 2021-08-02
JP7244533B2 (ja) 2023-03-22
US11384445B2 (en) 2022-07-12
US20210079547A1 (en) 2021-03-18

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