DE102008032398A1 - Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten - Google Patents
Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten Download PDFInfo
- Publication number
- DE102008032398A1 DE102008032398A1 DE102008032398A DE102008032398A DE102008032398A1 DE 102008032398 A1 DE102008032398 A1 DE 102008032398A1 DE 102008032398 A DE102008032398 A DE 102008032398A DE 102008032398 A DE102008032398 A DE 102008032398A DE 102008032398 A1 DE102008032398 A1 DE 102008032398A1
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- Prior art keywords
- electrolyte
- acid
- tin
- phosphonic acid
- electrolyte according
- Prior art date
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- 239000003792 electrolyte Substances 0.000 title claims abstract description 98
- 229910000906 Bronze Inorganic materials 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000000151 deposition Methods 0.000 title claims description 20
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 title abstract description 34
- 239000010974 bronze Substances 0.000 title abstract description 24
- 239000002253 acid Substances 0.000 claims abstract description 11
- 231100000252 nontoxic Toxicity 0.000 claims abstract description 11
- 230000003000 nontoxic effect Effects 0.000 claims abstract description 11
- -1 disulfide compound Chemical class 0.000 claims description 34
- 150000003839 salts Chemical class 0.000 claims description 24
- 239000011135 tin Substances 0.000 claims description 23
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- 229910052718 tin Inorganic materials 0.000 claims description 20
- 235000011180 diphosphates Nutrition 0.000 claims description 19
- 150000002739 metals Chemical class 0.000 claims description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 16
- 229910052802 copper Inorganic materials 0.000 claims description 16
- 239000010949 copper Substances 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 12
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims description 11
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 10
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 10
- 150000002500 ions Chemical class 0.000 claims description 10
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical class OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 9
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 claims description 9
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 7
- DUYCTCQXNHFCSJ-UHFFFAOYSA-N dtpmp Chemical compound OP(=O)(O)CN(CP(O)(O)=O)CCN(CP(O)(=O)O)CCN(CP(O)(O)=O)CP(O)(O)=O DUYCTCQXNHFCSJ-UHFFFAOYSA-N 0.000 claims description 6
- 125000005842 heteroatom Chemical group 0.000 claims description 6
- 229940120146 EDTMP Drugs 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 5
- 229940042400 direct acting antivirals phosphonic acid derivative Drugs 0.000 claims description 5
- 150000003007 phosphonic acid derivatives Chemical class 0.000 claims description 5
- 208000035220 Dyserythropoietic Congenital Anemia Diseases 0.000 claims description 4
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 4
- JYYOBHFYCIDXHH-UHFFFAOYSA-N carbonic acid;hydrate Chemical class O.OC(O)=O JYYOBHFYCIDXHH-UHFFFAOYSA-N 0.000 claims description 4
- 238000009713 electroplating Methods 0.000 claims description 4
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 claims description 4
- 150000004679 hydroxides Chemical class 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- YAWYUSRBDMEKHZ-UHFFFAOYSA-N [2-hydroxyethyl(phosphonomethyl)amino]methylphosphonic acid Chemical compound OCCN(CP(O)(O)=O)CP(O)(O)=O YAWYUSRBDMEKHZ-UHFFFAOYSA-N 0.000 claims description 3
- KIDJHPQACZGFTI-UHFFFAOYSA-N [6-[bis(phosphonomethyl)amino]hexyl-(phosphonomethyl)amino]methylphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCCCCCN(CP(O)(O)=O)CP(O)(O)=O KIDJHPQACZGFTI-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 3
- 239000008139 complexing agent Substances 0.000 claims description 3
- 150000004820 halides Chemical class 0.000 claims description 3
- QSIBMCLAMXSMRM-UHFFFAOYSA-N hexane-1,6-diamine methylphosphonic acid Chemical compound CP(O)(O)=O.CP(O)(O)=O.CP(O)(O)=O.CP(O)(O)=O.NCCCCCCN QSIBMCLAMXSMRM-UHFFFAOYSA-N 0.000 claims description 3
- OZMCKSGKGHEMGG-UHFFFAOYSA-N (1-acetamido-2,2,2-trichloroethyl)phosphonic acid Chemical compound CC(=O)NC(C(Cl)(Cl)Cl)P(O)(O)=O OZMCKSGKGHEMGG-UHFFFAOYSA-N 0.000 claims description 2
- BQIYVTCUMQVDEJ-UHFFFAOYSA-N (1-amino-1-phosphonooctyl)phosphonic acid Chemical compound CCCCCCCC(N)(P(O)(O)=O)P(O)(O)=O BQIYVTCUMQVDEJ-UHFFFAOYSA-N 0.000 claims description 2
- WCJYZAIHHQFLSS-UHFFFAOYSA-N (1-benzamido-2,2,2-trichloroethyl)phosphonic acid Chemical compound OP(O)(=O)C(C(Cl)(Cl)Cl)NC(=O)C1=CC=CC=C1 WCJYZAIHHQFLSS-UHFFFAOYSA-N 0.000 claims description 2
- SIXJDNRSTUBUBM-UHFFFAOYSA-N (1-benzamido-2,2-dichloroethenyl)phosphonic acid Chemical compound OP(O)(=O)C(=C(Cl)Cl)NC(=O)C1=CC=CC=C1 SIXJDNRSTUBUBM-UHFFFAOYSA-N 0.000 claims description 2
- MGRVRXRGTBOSHW-UHFFFAOYSA-N (aminomethyl)phosphonic acid Chemical compound NCP(O)(O)=O MGRVRXRGTBOSHW-UHFFFAOYSA-N 0.000 claims description 2
- UIQSKEDQPSEGAU-UHFFFAOYSA-N 1-Aminoethylphosphonic Acid Chemical compound CC(N)P(O)(O)=O UIQSKEDQPSEGAU-UHFFFAOYSA-N 0.000 claims description 2
- DELJNDWGTWHHFA-UHFFFAOYSA-N 1-azaniumylpropyl(hydroxy)phosphinate Chemical compound CCC(N)P(O)(O)=O DELJNDWGTWHHFA-UHFFFAOYSA-N 0.000 claims description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- HPPXSNUAVNMIES-UHFFFAOYSA-N [(4-chlorophenyl)-hydroxymethyl]phosphonic acid Chemical compound OP(=O)(O)C(O)C1=CC=C(Cl)C=C1 HPPXSNUAVNMIES-UHFFFAOYSA-N 0.000 claims description 2
- WFCQGBOETURRDK-UHFFFAOYSA-N [2-amino-1,1,1-trichloro-3-(furan-2-yl)-3-oxopropan-2-yl]phosphonic acid Chemical compound ClC(Cl)(Cl)C(P(O)(O)=O)(N)C(=O)C1=CC=CO1 WFCQGBOETURRDK-UHFFFAOYSA-N 0.000 claims description 2
- 229960003237 betaine Drugs 0.000 claims description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 claims description 2
- 150000002763 monocarboxylic acids Chemical class 0.000 claims description 2
- 150000002823 nitrates Chemical class 0.000 claims description 2
- 150000002826 nitrites Chemical class 0.000 claims description 2
- 235000021317 phosphate Nutrition 0.000 claims description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 1
- 229910021645 metal ion Inorganic materials 0.000 claims 1
- 230000000087 stabilizing effect Effects 0.000 claims 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 abstract description 22
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 abstract description 4
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000004070 electrodeposition Methods 0.000 abstract description 2
- 229940048084 pyrophosphate Drugs 0.000 description 16
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical class CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 231100000331 toxic Toxicity 0.000 description 7
- 230000002588 toxic effect Effects 0.000 description 7
- 229910001128 Sn alloy Inorganic materials 0.000 description 6
- HAXFWIACAGNFHA-UHFFFAOYSA-N aldrithiol Chemical compound C=1C=CC=NC=1SSC1=CC=CC=N1 HAXFWIACAGNFHA-UHFFFAOYSA-N 0.000 description 6
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 150000002019 disulfides Chemical class 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229940098779 methanesulfonic acid Drugs 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 150000003460 sulfonic acids Chemical class 0.000 description 4
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 3
- 125000005913 (C3-C6) cycloalkyl group Chemical group 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 150000001342 alkaline earth metals Chemical class 0.000 description 3
- 125000005213 alkyl heteroaryl group Chemical group 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 150000003009 phosphonic acids Chemical class 0.000 description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 description 3
- 235000011181 potassium carbonates Nutrition 0.000 description 3
- 239000000080 wetting agent Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 150000001879 copper Chemical class 0.000 description 2
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000383 hazardous chemical Substances 0.000 description 2
- 125000004475 heteroaralkyl group Chemical group 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 235000015497 potassium bicarbonate Nutrition 0.000 description 2
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 2
- 229910000597 tin-copper alloy Inorganic materials 0.000 description 2
- 231100000925 very toxic Toxicity 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- LBEMXJWGHIEXRA-UHFFFAOYSA-N 2-[(2-carboxyphenyl)disulfanyl]benzoic acid Chemical compound OC(=O)C1=CC=CC=C1SSC1=CC=CC=C1C(O)=O LBEMXJWGHIEXRA-UHFFFAOYSA-N 0.000 description 1
- GEZAUFNYMZVOFV-UHFFFAOYSA-J 2-[(2-oxo-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetan-2-yl)oxy]-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetane 2-oxide Chemical compound [Sn+2].[Sn+2].[O-]P([O-])(=O)OP([O-])([O-])=O GEZAUFNYMZVOFV-UHFFFAOYSA-J 0.000 description 1
- WRBSVISDQAINGQ-UHFFFAOYSA-N 3-(dimethylcarbamothioylsulfanyl)propane-1-sulfonic acid Chemical compound CN(C)C(=S)SCCCS(O)(=O)=O WRBSVISDQAINGQ-UHFFFAOYSA-N 0.000 description 1
- OBDVFOBWBHMJDG-UHFFFAOYSA-N 3-mercapto-1-propanesulfonic acid Chemical compound OS(=O)(=O)CCCS OBDVFOBWBHMJDG-UHFFFAOYSA-N 0.000 description 1
- UHBAPGWWRFVTFS-UHFFFAOYSA-N 4,4'-dipyridyl disulfide Chemical compound C=1C=NC=CC=1SSC1=CC=NC=C1 UHBAPGWWRFVTFS-UHFFFAOYSA-N 0.000 description 1
- MERLDGDYUMSLAY-UHFFFAOYSA-N 4-[(4-aminophenyl)disulfanyl]aniline Chemical class C1=CC(N)=CC=C1SSC1=CC=C(N)C=C1 MERLDGDYUMSLAY-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical class [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- ROUFCTKIILEETD-UHFFFAOYSA-N 5-nitro-2-[(5-nitropyridin-2-yl)disulfanyl]pyridine Chemical compound N1=CC([N+](=O)[O-])=CC=C1SSC1=CC=C([N+]([O-])=O)C=N1 ROUFCTKIILEETD-UHFFFAOYSA-N 0.000 description 1
- GSASOFRDSIKDSN-UHFFFAOYSA-N 6-[(5-carboxypyridin-2-yl)disulfanyl]pyridine-3-carboxylic acid Chemical compound N1=CC(C(=O)O)=CC=C1SSC1=CC=C(C(O)=O)C=N1 GSASOFRDSIKDSN-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- LEVWYRKDKASIDU-QWWZWVQMSA-N D-cystine Chemical compound OC(=O)[C@H](N)CSSC[C@@H](N)C(O)=O LEVWYRKDKASIDU-QWWZWVQMSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- LEVWYRKDKASIDU-IMJSIDKUSA-N L-cystine Chemical compound [O-]C(=O)[C@@H]([NH3+])CSSC[C@H]([NH3+])C([O-])=O LEVWYRKDKASIDU-IMJSIDKUSA-N 0.000 description 1
- 239000004158 L-cystine Substances 0.000 description 1
- 235000019393 L-cystine Nutrition 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- XESYMJCPMBBYHP-UHFFFAOYSA-N OS(C(CCSSCCC([Na])S(O)(=O)=O)[Na])(=O)=O Chemical compound OS(C(CCSSCCC([Na])S(O)(=O)=O)[Na])(=O)=O XESYMJCPMBBYHP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- PDYXSJSAMVACOH-UHFFFAOYSA-N [Cu].[Zn].[Sn] Chemical compound [Cu].[Zn].[Sn] PDYXSJSAMVACOH-UHFFFAOYSA-N 0.000 description 1
- HJPBEXZMTWFZHY-UHFFFAOYSA-N [Ti].[Ru].[Ir] Chemical compound [Ti].[Ru].[Ir] HJPBEXZMTWFZHY-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 239000013566 allergen Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- UMGDCJDMYOKAJW-UHFFFAOYSA-N aminothiocarboxamide Natural products NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000002648 azanetriyl group Chemical group *N(*)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- DDISVBZQSSOXFA-UHFFFAOYSA-L copper carbonate dihydrate Chemical compound O.O.[Cu++].[O-]C([O-])=O DDISVBZQSSOXFA-UHFFFAOYSA-L 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- LEVWYRKDKASIDU-UHFFFAOYSA-N cystine Chemical compound OC(=O)C(N)CSSCC(N)C(O)=O LEVWYRKDKASIDU-UHFFFAOYSA-N 0.000 description 1
- 229960003067 cystine Drugs 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- AFZSMODLJJCVPP-UHFFFAOYSA-N dibenzothiazol-2-yl disulfide Chemical compound C1=CC=C2SC(SSC=3SC4=CC=CC=C4N=3)=NC2=C1 AFZSMODLJJCVPP-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- CJTCBBYSPFAVFL-UHFFFAOYSA-N iridium ruthenium Chemical compound [Ru].[Ir] CJTCBBYSPFAVFL-UHFFFAOYSA-N 0.000 description 1
- ULFQGKXWKFZMLH-UHFFFAOYSA-N iridium tantalum Chemical compound [Ta].[Ir] ULFQGKXWKFZMLH-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 150000008427 organic disulfides Chemical class 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- PTMHPRAIXMAOOB-UHFFFAOYSA-N phosphoramidic acid Chemical compound NP(O)(O)=O PTMHPRAIXMAOOB-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-M propane-1-sulfonate Chemical compound CCCS([O-])(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-M 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000002510 pyrogen Substances 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- OMSYGYSPFZQFFP-UHFFFAOYSA-J zinc pyrophosphate Chemical compound [Zn+2].[Zn+2].[O-]P([O-])(=O)OP([O-])([O-])=O OMSYGYSPFZQFFP-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008032398A DE102008032398A1 (de) | 2008-07-10 | 2008-07-10 | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
| TW098122653A TW201014935A (en) | 2008-07-10 | 2009-07-03 | Improved copper-tin electrolyte and process for the deposition of bronze layers |
| CN2009801264856A CN102089466B (zh) | 2008-07-10 | 2009-07-06 | 改良的铜-锡电解液和沉积青铜层的方法 |
| EP09776985A EP2310558B1 (en) | 2008-07-10 | 2009-07-06 | Improved copper-tin electrolyte and process for the deposition of tin-bronze layers |
| PL09776985T PL2310558T3 (pl) | 2008-07-10 | 2009-07-06 | Ulepszony elektrolit miedziowo-cynowy i sposób osadzania warstw cyny i brązu |
| AT09776985T ATE549434T1 (de) | 2008-07-10 | 2009-07-06 | Verbesserter kupfer-zinn-elektrolyt und verfahren zur auftragung von zinn-bronzeschichten |
| JP2011517017A JP2011527381A (ja) | 2008-07-10 | 2009-07-06 | 改良された銅−錫電解液及び青銅層の析出方法 |
| PCT/EP2009/004879 WO2010003621A1 (en) | 2008-07-10 | 2009-07-06 | Improved copper-tin electrolyte and process for the deposition of bronze layers |
| KR1020117000324A KR20110031183A (ko) | 2008-07-10 | 2009-07-06 | 개선된 구리-주석 전해질 및 청동층의 침착 방법 |
| US13/003,209 US20110174631A1 (en) | 2008-07-10 | 2009-07-06 | Copper-tin electrolyte and process for the deposition of bronze layers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008032398A DE102008032398A1 (de) | 2008-07-10 | 2008-07-10 | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102008032398A1 true DE102008032398A1 (de) | 2010-01-14 |
Family
ID=41258161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102008032398A Ceased DE102008032398A1 (de) | 2008-07-10 | 2008-07-10 | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20110174631A1 (https=) |
| EP (1) | EP2310558B1 (https=) |
| JP (1) | JP2011527381A (https=) |
| KR (1) | KR20110031183A (https=) |
| CN (1) | CN102089466B (https=) |
| AT (1) | ATE549434T1 (https=) |
| DE (1) | DE102008032398A1 (https=) |
| PL (1) | PL2310558T3 (https=) |
| TW (1) | TW201014935A (https=) |
| WO (1) | WO2010003621A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012031753A1 (de) * | 2010-09-07 | 2012-03-15 | Coventya Gmbh | Anode sowie deren verwendung in einem alkalischen galvanikbad |
| WO2013092312A1 (en) * | 2011-12-21 | 2013-06-27 | Umicore Galvanotechnik Gmbh | Deposition of copper-tin-zinc alloys from an electrolyte |
| WO2013164165A1 (de) | 2012-05-02 | 2013-11-07 | Umicore Galvanotechnik Gmbh | Mehrschichtige oberflächenbeschichtung mit chromdeckschicht ohne nickelschicht |
| WO2015039152A1 (de) * | 2013-09-18 | 2015-03-26 | Ing.W.Garhöfer Gesellschaft M.B.H. | Abscheidung von cu, sn, zn-beschichtungen auf metallischen substraten |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013226297B3 (de) * | 2013-12-17 | 2015-03-26 | Umicore Galvanotechnik Gmbh | Wässriger, cyanidfreier Elektrolyt für die Abscheidung von Kupfer-Zinn- und Kupfer-Zinn-Zink-Legierungen aus einem Elektrolyten und Verfahren zur elektrolytischen Abscheidung dieser Legierungen |
| CN103789803B (zh) * | 2014-01-13 | 2016-04-27 | 孙松华 | 一种无氰铜锡合金电镀液及其制备方法 |
| JP5938426B2 (ja) * | 2014-02-04 | 2016-06-22 | 株式会社豊田中央研究所 | 電気めっきセル、及び、金属皮膜の製造方法 |
| AR100422A1 (es) * | 2014-05-15 | 2016-10-05 | Nippon Steel & Sumitomo Metal Corp | Solución para deposición para conexión roscada para un caño o tubo y método de producción de la conexión roscada para un caño o tubo |
| CN106521574B (zh) * | 2016-12-05 | 2018-10-26 | 浙江工业大学 | 一种适用于宽pH和宽电流密度范围的无氰镀铜电镀液及其制备方法 |
| MY199306A (en) * | 2016-12-28 | 2023-10-24 | Atotech Deutschland Gmbh | Tin plating bath and a method for depositing tin or tin alloy onto a surface of a substrate |
| CN110344079B (zh) * | 2019-08-16 | 2021-06-08 | 广东超华科技股份有限公司 | 一种降低电解铜箔电解液中铁离子浓度的装置及方法 |
| RU2762501C1 (ru) * | 2021-05-17 | 2021-12-21 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Щелочной электролит для электролитического осаждения желтой оловянной бронзы |
| DE102021117095A1 (de) | 2021-07-02 | 2023-01-05 | Umicore Galvanotechnik Gmbh | Bronzeschichten als Edelmetallersatz |
| DE202021004169U1 (de) | 2021-07-02 | 2022-12-07 | Umicore Galvanotechnik Gmbh | Bronzeschicht als Edelmetallersatz in Smart Cards |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3833486A (en) * | 1973-03-26 | 1974-09-03 | Lea Ronal Inc | Cyanide-free electroplating |
| US4289286A (en) * | 1978-10-16 | 1981-09-15 | East/West Industries, Inc. | Replaceable harness bracket assembly |
| EP0636713A2 (de) | 1993-07-26 | 1995-02-01 | Degussa Aktiengesellschaft | Cyanidisch-alkalische Bäder zur galvanischen Abscheidung von Kupfer-Zinn-Legierunsüberzügen |
| EP1001054A2 (en) | 1998-11-05 | 2000-05-17 | C. Uyemura & Co, Ltd | Tin-copper alloy electroplating bath and plating process therewith |
| EP1111097A2 (en) | 1999-12-22 | 2001-06-27 | Nippon MacDermid Co., Ltd. | Bright tin-copper alloy electroplating solution |
| EP1146148A2 (en) | 2000-04-14 | 2001-10-17 | Nihon New Chrome Co. Ltd. | Cyanide-free pyrophosphoric acid bath for use in copper-tin alloy plating |
| DE10046600A1 (de) | 2000-09-20 | 2002-04-25 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Kupfer-Legierungsschichten |
| WO2004005528A2 (en) | 2002-07-05 | 2004-01-15 | Nihon New Chrome Co., Ltd. | Pyrophosphoric acid bath for use in copper-tin alloy plating |
| EP1408141A1 (de) | 2002-10-11 | 2004-04-14 | Enthone Inc. | Verfahren zur galvanischen Abscheidung von Bronzen |
| EP1591563A1 (en) * | 2003-01-24 | 2005-11-02 | Ishihara Chemical Co., Ltd. | Tin-containing plating bath |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4356067A (en) * | 1979-06-13 | 1982-10-26 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
| US4417956A (en) * | 1980-07-17 | 1983-11-29 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
| US4389286A (en) * | 1980-07-17 | 1983-06-21 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
| US4347108A (en) * | 1981-05-29 | 1982-08-31 | Rohco, Inc. | Electrodeposition of copper, acidic copper electroplating baths and additives therefor |
| CN1004010B (zh) * | 1986-07-11 | 1989-04-26 | 南京大学 | 无氰仿金电镀液 |
| US6176996B1 (en) * | 1997-10-30 | 2001-01-23 | Sungsoo Moon | Tin alloy plating compositions |
| JP2004510053A (ja) * | 2000-09-20 | 2004-04-02 | デーエル.−イーエヌゲー.マックス シュレッター ゲーエムベーハー ウント ツェーオー.カーゲー | 錫−銅合金層を析出させるための電解質及び方法 |
| US6645364B2 (en) * | 2000-10-20 | 2003-11-11 | Shipley Company, L.L.C. | Electroplating bath control |
| DE10243139A1 (de) * | 2002-09-17 | 2004-03-25 | Omg Galvanotechnik Gmbh | Dunkle Schichten |
| US7128822B2 (en) * | 2003-06-04 | 2006-10-31 | Shipley Company, L.L.C. | Leveler compounds |
| US20050067297A1 (en) * | 2003-09-26 | 2005-03-31 | Innovative Technology Licensing, Llc | Copper bath for electroplating fine circuitry on semiconductor chips |
| US20060231409A1 (en) * | 2005-03-31 | 2006-10-19 | Tdk Corporation | Plating solution, conductive material, and surface treatment method of conductive material |
| EP1870495A1 (de) * | 2006-06-21 | 2007-12-26 | Atotech Deutschland Gmbh | Wässriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- und Zinklegierungsüberzügen |
| DE502007002479D1 (de) * | 2007-02-14 | 2010-02-11 | Umicore Galvanotechnik Gmbh | Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
-
2008
- 2008-07-10 DE DE102008032398A patent/DE102008032398A1/de not_active Ceased
-
2009
- 2009-07-03 TW TW098122653A patent/TW201014935A/zh unknown
- 2009-07-06 US US13/003,209 patent/US20110174631A1/en not_active Abandoned
- 2009-07-06 CN CN2009801264856A patent/CN102089466B/zh not_active Expired - Fee Related
- 2009-07-06 EP EP09776985A patent/EP2310558B1/en not_active Not-in-force
- 2009-07-06 JP JP2011517017A patent/JP2011527381A/ja not_active Withdrawn
- 2009-07-06 AT AT09776985T patent/ATE549434T1/de active
- 2009-07-06 PL PL09776985T patent/PL2310558T3/pl unknown
- 2009-07-06 KR KR1020117000324A patent/KR20110031183A/ko not_active Withdrawn
- 2009-07-06 WO PCT/EP2009/004879 patent/WO2010003621A1/en not_active Ceased
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3833486A (en) * | 1973-03-26 | 1974-09-03 | Lea Ronal Inc | Cyanide-free electroplating |
| US4289286A (en) * | 1978-10-16 | 1981-09-15 | East/West Industries, Inc. | Replaceable harness bracket assembly |
| EP0636713A2 (de) | 1993-07-26 | 1995-02-01 | Degussa Aktiengesellschaft | Cyanidisch-alkalische Bäder zur galvanischen Abscheidung von Kupfer-Zinn-Legierunsüberzügen |
| EP1001054A2 (en) | 1998-11-05 | 2000-05-17 | C. Uyemura & Co, Ltd | Tin-copper alloy electroplating bath and plating process therewith |
| EP1111097A2 (en) | 1999-12-22 | 2001-06-27 | Nippon MacDermid Co., Ltd. | Bright tin-copper alloy electroplating solution |
| EP1146148A2 (en) | 2000-04-14 | 2001-10-17 | Nihon New Chrome Co. Ltd. | Cyanide-free pyrophosphoric acid bath for use in copper-tin alloy plating |
| DE10046600A1 (de) | 2000-09-20 | 2002-04-25 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Kupfer-Legierungsschichten |
| WO2004005528A2 (en) | 2002-07-05 | 2004-01-15 | Nihon New Chrome Co., Ltd. | Pyrophosphoric acid bath for use in copper-tin alloy plating |
| EP1408141A1 (de) | 2002-10-11 | 2004-04-14 | Enthone Inc. | Verfahren zur galvanischen Abscheidung von Bronzen |
| EP1591563A1 (en) * | 2003-01-24 | 2005-11-02 | Ishihara Chemical Co., Ltd. | Tin-containing plating bath |
Non-Patent Citations (5)
| Title |
|---|
| Bayer-Walter, Lehrbuch der Organischen Chemie, S. Hirzel Verlag, 22. Auflage, S. 703 ff. |
| Die galvanische Abscheidung von Zinn und Zinnlegierungen, Saulgau 1993, Seite 156 |
| EU-Richtlinie 94/27/EC |
| Jordan, Manfred, Die galvanische Abscheidung von Zinn und Zinnlegierungen, Saulgau 1993 |
| Jordan, Manfred, Die galvanische Abscheidung von Zinn und Zinnlegierungen, Saulgau 1993, Seite 156 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012031753A1 (de) * | 2010-09-07 | 2012-03-15 | Coventya Gmbh | Anode sowie deren verwendung in einem alkalischen galvanikbad |
| WO2013092312A1 (en) * | 2011-12-21 | 2013-06-27 | Umicore Galvanotechnik Gmbh | Deposition of copper-tin-zinc alloys from an electrolyte |
| WO2013164165A1 (de) | 2012-05-02 | 2013-11-07 | Umicore Galvanotechnik Gmbh | Mehrschichtige oberflächenbeschichtung mit chromdeckschicht ohne nickelschicht |
| DE102012008544A1 (de) | 2012-05-02 | 2013-11-07 | Umicore Galvanotechnik Gmbh | Verchromte Verbundwerkstoffe ohne Nickelschicht |
| WO2015039152A1 (de) * | 2013-09-18 | 2015-03-26 | Ing.W.Garhöfer Gesellschaft M.B.H. | Abscheidung von cu, sn, zn-beschichtungen auf metallischen substraten |
Also Published As
| Publication number | Publication date |
|---|---|
| ATE549434T1 (de) | 2012-03-15 |
| EP2310558B1 (en) | 2012-03-14 |
| CN102089466B (zh) | 2012-11-07 |
| TW201014935A (en) | 2010-04-16 |
| EP2310558A1 (en) | 2011-04-20 |
| WO2010003621A1 (en) | 2010-01-14 |
| CN102089466A (zh) | 2011-06-08 |
| PL2310558T3 (pl) | 2012-09-28 |
| KR20110031183A (ko) | 2011-03-24 |
| JP2011527381A (ja) | 2011-10-27 |
| US20110174631A1 (en) | 2011-07-21 |
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