TWI425121B - 由三價鉻電鍍浴電鍍鉻之方法 - Google Patents
由三價鉻電鍍浴電鍍鉻之方法 Download PDFInfo
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- TWI425121B TWI425121B TW098136448A TW98136448A TWI425121B TW I425121 B TWI425121 B TW I425121B TW 098136448 A TW098136448 A TW 098136448A TW 98136448 A TW98136448 A TW 98136448A TW I425121 B TWI425121 B TW I425121B
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- chromium
- anode
- manganese
- cerium oxide
- plating
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 26
- 238000000034 method Methods 0.000 title claims description 24
- 238000007747 plating Methods 0.000 title claims description 23
- 229910052804 chromium Inorganic materials 0.000 title description 18
- 239000011651 chromium Substances 0.000 title description 18
- 238000009713 electroplating Methods 0.000 claims description 19
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 17
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 17
- 229910001437 manganese ion Inorganic materials 0.000 claims description 14
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 12
- -1 sulfonate ion Chemical class 0.000 claims description 12
- 229910001430 chromium ion Inorganic materials 0.000 claims description 11
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 229910000978 Pb alloy Inorganic materials 0.000 claims description 2
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 19
- 229910052748 manganese Inorganic materials 0.000 description 8
- 239000011572 manganese Substances 0.000 description 8
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 6
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 229940099596 manganese sulfate Drugs 0.000 description 5
- 235000007079 manganese sulphate Nutrition 0.000 description 5
- 239000011702 manganese sulphate Substances 0.000 description 5
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910021653 sulphate ion Inorganic materials 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- BFGKITSFLPAWGI-UHFFFAOYSA-N chromium(3+) Chemical compound [Cr+3] BFGKITSFLPAWGI-UHFFFAOYSA-N 0.000 description 2
- 229910000356 chromium(III) sulfate Inorganic materials 0.000 description 2
- 235000015217 chromium(III) sulphate Nutrition 0.000 description 2
- 239000011696 chromium(III) sulphate Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 1
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- DSHWASKZZBZKOE-UHFFFAOYSA-K chromium(3+);hydroxide;sulfate Chemical compound [OH-].[Cr+3].[O-]S([O-])(=O)=O DSHWASKZZBZKOE-UHFFFAOYSA-K 0.000 description 1
- XHFVDZNDZCNTLT-UHFFFAOYSA-H chromium(3+);tricarbonate Chemical compound [Cr+3].[Cr+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O XHFVDZNDZCNTLT-UHFFFAOYSA-H 0.000 description 1
- 235000007831 chromium(III) chloride Nutrition 0.000 description 1
- 239000011636 chromium(III) chloride Substances 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- XVHFYNOGAFYRJV-UHFFFAOYSA-L chromium(ii) oxalate Chemical compound [Cr+2].[O-]C(=O)C([O-])=O XVHFYNOGAFYRJV-UHFFFAOYSA-L 0.000 description 1
- VQWFNAGFNGABOH-UHFFFAOYSA-K chromium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Cr+3] VQWFNAGFNGABOH-UHFFFAOYSA-K 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L magnesium sulphate Substances [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 229940049920 malate Drugs 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 235000006748 manganese carbonate Nutrition 0.000 description 1
- 239000011656 manganese carbonate Substances 0.000 description 1
- 229940093474 manganese carbonate Drugs 0.000 description 1
- 235000002867 manganese chloride Nutrition 0.000 description 1
- 239000011565 manganese chloride Substances 0.000 description 1
- 229940099607 manganese chloride Drugs 0.000 description 1
- 229910000016 manganese(II) carbonate Inorganic materials 0.000 description 1
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
Description
本發明係關於一種鍍鉻的方法,其利用的是在電鍍浴中的三價鉻離子及不溶性陽極。在使用該種電鍍浴的同時,所主張用於電鍍浴之添加劑將可使得陽極生成的六價鉻離子降至最低。
自1970年代後期開始,現在所用的三價鉻系電解質就已經在產業上使用多年了。基於健康及對環境的安全和毒性之考量,這些方法具有優於六價鉻系之諸多優點。然而,用於這些三價方法之陽極的適當選擇可能出現重大的問題。由於此方法的陰極效率非常低,所以必須使用不溶性陽極。如果使用的是由鉻製成的可溶性陽極,低陰極效率會造成鉻金屬在浴液中累積。同時,鉻在電解液中為惰性的,直到陽極電位達到足以將鉻溶解成Cr(VI)為止。這意味著,如果使用的是鉻金屬陽極,鉻將會溶解成六價而非三價的形式。六價鉻在三價方法中是一種嚴重的污染物,因此,避免這種物種的形成是很重要的。過去己有數種方法來處理這個問題:氯化物系的電解質(由不溶性陽極釋放出的氯也可能成為問題)利用溴化物離子來催化化學物種(如甲酸鹽離子或銨離子)的陽極氧化反應,而非將鉻(III)氧化成鉻(VI)(例如,可參考美國專利3,954,574)。
由於用於硫酸鹽系三價方法中之添加劑型態,這種策略無法被使用。在硫酸鹽系方法中,有兩種可能的方法來避免鉻氧化。起初是在這些方法中使用隔離室配置(例如英國專利1,602,404)。一般而言,在硫酸的陽極電解液中係使用鉛陽極,其係以滲透膜與電鍍浴分隔開來。電鍍電流係藉由穿透陽離子滲透膜的氫陽離子來攜帶。這樣可有效避免三價鉻與陽極表面的任何接觸,因而避免了三價鉻被氧化成六價鉻。然而,這種型態的配置相當昂貴並且很難維修。同時,薄膜的有限壽命也會導致不利的花費。在由硫酸鹽系電解液進行三價鉻電鍍技術的後續發展方面係使用塗覆了氧化銥/氧化鉭的陽極(例如,可參美國專利5,560,815)。這些被直接用於三價鉻溶液中,並且這些陽極表面已被發現具有相當低的氧過電位(因此有利於氧氣在最低可能陽極電位釋出)。然而,經過一段操作時間之後,就會促進三價鉻在這些陽極上氧化成六價鉻。因為上面所陳列的這些問題,目前在硫酸鹽系三價鉻電鍍方法中仍需要一種適合且具成本效益的陽極。
本發明人提出一種將鉻金屬電鍍在基板上之方法,該方法包括使基板與電鍍溶液接觸,該電鍍浴包含:
(a)三價鉻離子;
(b)硫酸鹽離子和/或磺酸鹽離子;以及
(c)錳離子;
其中基板被製成陰極,並且使用包含氧化銥、氧化釕和/或鉑之表面塗層之不溶性陽極。
用於本發明之陽極可以直接置於電鍍浴中,或者是利用半透膜做為隔離膜,將陽極置於隔室中,而與電鍍浴隔開。然而,由成本和效率的觀點來看,較佳係將陽極直接置於電鍍浴中。
本發明人已發現:將錳離子添加至使用不溶性陽極之三價電鍍浴中可實質改善此方法的功能及大幅提高陽極的壽命。可用於本發明之電鍍浴的電解質類型之非限制性實例可參考美國專利4,141,803;4,374,007;4,417,955;4,448,649;4,472,250;4,507,175;4,502,927和4,473,448。添加至浴液中的離子數量較佳至少為10ppm,且可高達溶解度的極限。然而,在實務上,我們發現有大量的錳(超過700ppm)共沈積在陰極,而已達到無法接受的程度,並且會造成表面外觀及在其上所沈積鉻之腐蝕性能的問題。因此,添加錳離子的較佳數量係在10至700ppm的範圍內,並且更佳為100至300ppm。可以任何適合的可溶性浴鹽的形式來添加錳離子。硫酸錳為較佳的鹽類,因為硫酸鹽陰離子可與電鍍浴的組成物相容。
不希望受到理論的限制,我們認為錳(II)離子會在比鉻(III)/鉻(VI)反應之氧化電位還要低的電位下,被氧化成二氧化錳,因而在不溶性陽極的表面上形成二氧化錳塗層。這些塗覆了二氧化錳的陽極接著會藉由加速氧氣釋出和/或抑制鉻氧化的方式來操作。當關掉電流時,二氧化錳逐漸還原成錳(II)離子並且釋放出氧。當重新施加電流時,又在陽極上再次形成二氧化錳塗層。因此,將少量錳離子添加至電鍍浴中,可避免過量六價鉻的形成。
結果,本發明人提出一種將鉻金屬電鍍於基板上之電鍍方法,該方法包括使基板與電鍍浴接觸,該電鍍浴包含:
(a)三價鉻離子;
(b)硫酸鹽離子和/或磺酸鹽離子;以及
(c)錳離子;
其中基板被製成陰極,並且使用不溶性陽極。
三價鉻離子源可以是任何一種三價鉻離子的可溶性來源。較佳係使用硫酸鉻(III)。然而,也可以使用氯化鉻(III)、草酸鉻(III)、碳酸鉻(III)、氫氧化鉻(III)和其它類似的三價鉻離子鹽或錯合物。電鍍浴中三價鉻離子的濃度較佳為5至40克/升,最佳為10至15克/升。六價鉻離子對於電鍍浴的適當運作是有害的,因此,電鍍浴中六價鉻離子的濃度愈低愈好,最佳係小於0.1克/升。
同樣的,硫酸鹽和/或磺酸鹽離子源可以是任何一種這些陰離子的可溶性來源。較佳係使用硫酸。其它替代選擇包括烷磺酸、硫酸的鹽類或烷磺酸的鹽類。電鍍浴中的硫酸鹽和/或磺酸鹽陰離子濃度較佳為50至150克/升,最佳為90至110克/升。電鍍浴的pH值較佳係維持在3至4的範圍內。
錳離子源可以是任何一種可溶性含錳鹽類。較佳係使用硫酸錳。然而,也可以使用其它鹽類,如氯化錳、磺酸錳或碳酸錳。電鍍浴中的錳離子濃度較佳為0.01至0.7克/升,最佳為0.02至0.3克/升。
如上所述,所使用之陽極必須不溶於電鍍浴中。在這方面來說,不溶性陽極係指不會溶解或實質上不溶於電鍍浴之基質中的陽極。適當之不溶性陽極的實例包括鉛、鉛合金、鍍鉑的鈦陽極,或包含氧化銥、氧化釕或混合氧化銥/氧化鉭之混合物之表面塗層的金屬陽極。這種陽極較佳為包含氧化銥、氧化釕或混合氧化銥/氧化鉭之表面塗層的金屬陽極。這種塗覆了氧化銥/氧化釕或混合氧化銥/氧化鉭之陽極的金屬基板可以是任何一種不溶於浴液之金屬,如鈦、鉭、鈮、鋯、鉬或鎢。較佳係使用鈦。這些較佳的陽極已為人所熟知,且曾在美國專利5,560,815中述及,其完整內容將倂入本文中參照。
一般而言,電鍍浴係在55至65℃的溫度範圍內操作。pH值較佳應為3至4。陰極電流密度一般應為每平方公寸2至10安培。
如果使用的是鍍鉑的鈦或鉛(合金)陽極,電鍍浴中的錳離子濃度可提高至建議範圍的上限附近。在此情況下,錳離子濃度建議為0.6至0.7克/升。
可用於本發明電鍍浴之其它添加劑包括羧酸陰離子,如甲酸鹽、草酸鹽、蘋果酸鹽、醋酸鹽和硼酸。
為了測試本發明的有效性,我們使用了塗覆氧化銥之鉭陽極,其將被使用至有效壽命的最後,並且會產生相當數量的六價鉻。將其置入裝有陽離子交換膜的電池室中。電池室的兩側皆裝填了三價鉻電鍍電解液。電池室的目的係為了使陽極和陰極的反應得以分開進行,因而使得陽極所產生的六價鉻不能在陰極被還原。因此,我們認為這將呈現出”最糟狀況”的情境。
第1圖顯示的是我們使用含有下列成分之三價鉻電解液所得之結果:
7克/升 以鹼性硫酸鉻形式添加之鉻金屬
160克/升 硫酸鈉
75克/升 硼酸
10克/升 蘋果酸
電池室是在60度C下操作,所使用的陽極電流密度為5安培/平方公寸且pH值為3.4。陽極電解液的體積為350毫升。
由這個圖中可看出,在比較實施例中(未添加錳),六價鉻增加的非常快速,在60分鐘之電解時間之後就達到了245ppm的數值。在添加100ppm硫酸錳(相當於30ppm的錳)的情況下,所產生六價鉻的數量在60分鐘之後會持續增加至130ppm。即使在這種錳濃度之下,與比較實施例相比時,六價鉻的生成速率已明顯降低。同時也說明了更高硫酸錳濃度的效果(分別為0.25克/升和0.5克/升)。這些實施例說明經過80分鐘連續電解之後,在0.5克/升硫酸錳(相當於150ppm的錳)的濃度下,所測得之六價鉻未再進一步增加。這表示在此週期之後,陽極實質上抑制了六價鉻的產生。
第1圖錳在三價鉻電鍍浴中對六價鉻的效果
Claims (6)
- 一種將鉻金屬電鍍在基板上之方法,該方法包括使基板與電鍍溶液接觸電鍍,該電鍍溶液包含:(a)三價鉻離子;(b)硫酸鹽或磺酸鹽離子;以及(c)錳離子;其中基板被製成陰極,並且使用不溶性陽極,及其中該電鍍溶液中之錳離子濃度為0.01至0.7克/升,及其中於該電鍍過程中,二氧化錳形成於不可溶的陽極之上。
- 如申請專利範圍第1項之方法,其中不溶性陽極係選自由下列所構成之群組:(i)鍍鉑的鈦陽極,(ii)鉛或鉛合金陽極,及(iii)鍍上一層包含氧化銥、氧化釕或氧化銥和氧化鉭之混合物之表面塗層的金屬陽極。
- 如申請專利範圍第1項之方法,其中不溶性陽極包括塗覆了一層包含氧化銥和氧化鉭之混合物之表面塗層的金屬陽極。
- 如申請專利範圍第1項之方法,其中不溶性陽極包括塗覆了一層包含氧化銥和氧化釕之表面塗層的金屬陽極。
- 如申請專利範圍第1項之方法,其中錳離子的濃度為0.05至0.7克/升。
- 如申請專利範圍第3項之方法,其中錳離子的濃度為0.05至0.5克/升。
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WO2014079911A2 (en) | 2012-11-21 | 2014-05-30 | Tata Steel Ijmuiden B.V. | Method for electrodeposition of chromium containing coatings from trivalent chromium based electrolytes |
JP6142198B2 (ja) * | 2013-05-31 | 2017-06-07 | 奥野製薬工業株式会社 | 3価クロムめっき用アノードの再生処理方法 |
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