|
US3968885A
(en)
*
|
1973-06-29 |
1976-07-13 |
International Business Machines Corporation |
Method and apparatus for handling workpieces
|
|
US4758127A
(en)
*
|
1983-06-24 |
1988-07-19 |
Canon Kabushiki Kaisha |
Original feeding apparatus and a cassette for containing the original
|
|
US4984953A
(en)
*
|
1987-02-20 |
1991-01-15 |
Canon Kabushiki Kaisha |
Plate-like article conveying system
|
|
JPS63258341A
(ja)
*
|
1987-04-17 |
1988-10-25 |
Hitachi Ltd |
レテイクル自動交換装置
|
|
US5080549A
(en)
*
|
1987-05-11 |
1992-01-14 |
Epsilon Technology, Inc. |
Wafer handling system with Bernoulli pick-up
|
|
US5135349A
(en)
*
|
1990-05-17 |
1992-08-04 |
Cybeq Systems, Inc. |
Robotic handling system
|
|
US6473157B2
(en)
*
|
1992-02-07 |
2002-10-29 |
Nikon Corporation |
Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate
|
|
US6712577B2
(en)
*
|
1994-04-28 |
2004-03-30 |
Semitool, Inc. |
Automated semiconductor processing system
|
|
JPH098103A
(ja)
*
|
1995-06-19 |
1997-01-10 |
Nikon Corp |
投影露光装置及び投影露光方法
|
|
DE19549045C1
(de)
|
1995-12-28 |
1997-06-05 |
Jenoptik Jena Gmbh |
Einrichtung zur Handhabung von scheibenförmigen Objekten
|
|
JPH09186072A
(ja)
*
|
1996-01-04 |
1997-07-15 |
Canon Inc |
原板搬送装置および方法
|
|
US6054029A
(en)
|
1996-02-23 |
2000-04-25 |
Singulus Technologies Gmbh |
Device for gripping, holdings and/or transporting substrates
|
|
JP3022488B2
(ja)
|
1997-06-04 |
2000-03-21 |
社団法人高等技術研究院研究組合 |
抵抗スポット溶接品質制御装置
|
|
US6589789B1
(en)
*
|
1997-07-21 |
2003-07-08 |
Quest Diagnostics Incorporated |
Automated centrifuge loading device
|
|
US6158951A
(en)
*
|
1998-07-10 |
2000-12-12 |
Asm America, Inc. |
Wafer carrier and method for handling of wafers with minimal contact
|
|
JP3863671B2
(ja)
*
|
1998-07-25 |
2006-12-27 |
株式会社ダイヘン |
搬送用ロボット装置
|
|
TW446858B
(en)
|
1999-04-21 |
2001-07-21 |
Asm Lithography Bv |
Lithographic projection apparatus, method of manufacturing a device using such a lithographic projection apparatus, and device made by such a method of manufacturing
|
|
JP2001024045A
(ja)
*
|
1999-07-08 |
2001-01-26 |
Nikon Corp |
搬送装置およびそれを用いた露光装置
|
|
US6379095B1
(en)
|
2000-04-14 |
2002-04-30 |
Applied Materials, Inc. |
Robot for handling semiconductor wafers
|
|
TW559855B
(en)
*
|
2000-09-06 |
2003-11-01 |
Olympus Optical Co |
Wafer transfer apparatus
|
|
TW512478B
(en)
*
|
2000-09-14 |
2002-12-01 |
Olympus Optical Co |
Alignment apparatus
|
|
EP1211562B1
(en)
*
|
2000-11-30 |
2005-05-11 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4201564B2
(ja)
*
|
2001-12-03 |
2008-12-24 |
日東電工株式会社 |
半導体ウエハ搬送方法およびこれを用いた半導体ウエハ搬送装置
|
|
US7004715B2
(en)
*
|
2002-01-09 |
2006-02-28 |
Asml Holding N.V. |
Apparatus for transferring and loading a reticle with a robotic reticle end-effector
|
|
US6906783B2
(en)
|
2002-02-22 |
2005-06-14 |
Asml Holding N.V. |
System for using a two part cover for protecting a reticle
|
|
US7053393B2
(en)
*
|
2002-06-04 |
2006-05-30 |
Olympus Corporation |
Alignment apparatus for object on stage
|
|
US6826451B2
(en)
|
2002-07-29 |
2004-11-30 |
Asml Holding N.V. |
Lithography tool having a vacuum reticle library coupled to a vacuum chamber
|
|
JP2004158643A
(ja)
|
2002-11-06 |
2004-06-03 |
Nikon Corp |
露光方法及び露光装置
|
|
JP4450664B2
(ja)
*
|
2003-06-02 |
2010-04-14 |
東京エレクトロン株式会社 |
基板処理装置及び基板搬送方法
|
|
US7123344B2
(en)
|
2003-09-29 |
2006-10-17 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7236233B2
(en)
*
|
2003-10-27 |
2007-06-26 |
Asml Netherlands B.V. |
Assembly of a reticle holder and a reticle
|
|
JP4564742B2
(ja)
|
2003-12-03 |
2010-10-20 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
US7078708B2
(en)
*
|
2003-12-24 |
2006-07-18 |
Asml Netherlands B.V. |
Lithographic apparatus and method of manufacturing a device and method of performing maintenance
|
|
JP2005353988A
(ja)
|
2004-06-14 |
2005-12-22 |
Canon Inc |
板状体搬送方法、搬送装置及び露光装置
|
|
ATE388787T1
(de)
*
|
2004-07-15 |
2008-03-15 |
Hermle Berthold Maschf Ag |
Bearbeitungsmaschine mit werkstückwechsler
|
|
US7167233B2
(en)
|
2004-09-20 |
2007-01-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and apparatus for processing an exchangeable object
|
|
US7394525B2
(en)
*
|
2004-10-21 |
2008-07-01 |
Asml Netherlands B.V. |
Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method
|
|
US7477358B2
(en)
|
2004-09-28 |
2009-01-13 |
Nikon Corporation |
EUV reticle handling system and method
|
|
JP2006128188A
(ja)
|
2004-10-26 |
2006-05-18 |
Nikon Corp |
基板搬送装置、基板搬送方法および露光装置
|
|
CN101006554A
(zh)
*
|
2004-10-29 |
2007-07-25 |
株式会社尼康 |
标线保护构件、标线运送装置、曝光装置及标线运送方法
|
|
JP4710308B2
(ja)
|
2004-10-29 |
2011-06-29 |
株式会社ニコン |
レチクル搬送装置、露光装置、及びレチクルの搬送方法
|
|
US7428958B2
(en)
|
2004-11-15 |
2008-09-30 |
Nikon Corporation |
Substrate conveyor apparatus, substrate conveyance method and exposure apparatus
|
|
US7136147B2
(en)
*
|
2004-12-20 |
2006-11-14 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20060138681A1
(en)
*
|
2004-12-27 |
2006-06-29 |
Asml Netherlands B.V. |
Substrate and lithography process using the same
|
|
CN1942288B
(zh)
*
|
2005-02-12 |
2010-12-22 |
应用材料公司 |
一种多轴真空电机组件
|
|
JP2006351863A
(ja)
*
|
2005-06-16 |
2006-12-28 |
Nikon Corp |
物体搬送装置及び露光装置
|
|
JP4667140B2
(ja)
|
2005-06-30 |
2011-04-06 |
キヤノン株式会社 |
露光装置およびデバイス製造方法
|
|
JP2007134575A
(ja)
|
2005-11-11 |
2007-05-31 |
Canon Inc |
レチクルカセットおよびそれを用いた露光装置
|
|
JP2007141925A
(ja)
*
|
2005-11-15 |
2007-06-07 |
Nikon Corp |
マスク収容容器、露光装置
|
|
US7808616B2
(en)
|
2005-12-28 |
2010-10-05 |
Nikon Corporation |
Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method
|
|
JP4848845B2
(ja)
*
|
2006-06-01 |
2011-12-28 |
株式会社安川電機 |
真空ロボット、処理装置、モータの製造方法、およびモータ
|
|
US20080025821A1
(en)
|
2006-07-25 |
2008-01-31 |
Applied Materials, Inc. |
Octagon transfer chamber
|
|
KR100847888B1
(ko)
*
|
2006-12-12 |
2008-07-23 |
세메스 주식회사 |
반도체 소자 제조 장치
|
|
NL1036785A1
(nl)
|
2008-04-18 |
2009-10-20 |
Asml Netherlands Bv |
Rapid exchange device for lithography reticles.
|