KR101738515B1 - 리소그래피 레티클용 급속 교환 디바이스 - Google Patents

리소그래피 레티클용 급속 교환 디바이스 Download PDF

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KR101738515B1
KR101738515B1 KR1020167011398A KR20167011398A KR101738515B1 KR 101738515 B1 KR101738515 B1 KR 101738515B1 KR 1020167011398 A KR1020167011398 A KR 1020167011398A KR 20167011398 A KR20167011398 A KR 20167011398A KR 101738515 B1 KR101738515 B1 KR 101738515B1
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South Korea
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base plate
reticle
arm
red
loading
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KR20160052804A (ko
Inventor
로베르트 가브리엘 마리아 란스베르겐
조지 힐러리 해롤드
리처드 존 존슨
휴고 야코부스 게라르두스 반 데르 베이덴
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에이에스엠엘 네델란즈 비.브이.
에이에스엠엘 홀딩 엔.브이.
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Publication of KR20160052804A publication Critical patent/KR20160052804A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H01L21/0274—
    • H01L21/67742—
    • H01L21/67778—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3302—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3411—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Library & Information Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020167011398A 2008-04-18 2009-04-14 리소그래피 레티클용 급속 교환 디바이스 Active KR101738515B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US7126808P 2008-04-18 2008-04-18
US61/071,268 2008-04-18
PCT/EP2009/002719 WO2009127391A1 (en) 2008-04-18 2009-04-14 Rapid exchange device for lithography reticles

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020107025812A Division KR20110004876A (ko) 2008-04-18 2009-04-14 리소그래피 레티클용 급속 교환 디바이스

Publications (2)

Publication Number Publication Date
KR20160052804A KR20160052804A (ko) 2016-05-12
KR101738515B1 true KR101738515B1 (ko) 2017-05-22

Family

ID=40846172

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KR1020167011398A Active KR101738515B1 (ko) 2008-04-18 2009-04-14 리소그래피 레티클용 급속 교환 디바이스
KR1020107025812A Ceased KR20110004876A (ko) 2008-04-18 2009-04-14 리소그래피 레티클용 급속 교환 디바이스

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KR1020107025812A Ceased KR20110004876A (ko) 2008-04-18 2009-04-14 리소그래피 레티클용 급속 교환 디바이스

Country Status (7)

Country Link
US (2) US9268241B2 (https=)
JP (1) JP5669723B2 (https=)
KR (2) KR101738515B1 (https=)
CN (2) CN103713475B (https=)
NL (1) NL1036785A1 (https=)
TW (1) TWI488007B (https=)
WO (1) WO2009127391A1 (https=)

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NL1036785A1 (nl) 2008-04-18 2009-10-20 Asml Netherlands Bv Rapid exchange device for lithography reticles.
JP5827827B2 (ja) 2010-06-29 2015-12-02 エーエスエムエル ネザーランズ ビー．ブイ． アクチュエータ
WO2012123144A1 (en) 2011-03-11 2012-09-20 Asml Netherlands B.V. Electrostatic clamp apparatus and lithographic apparatus
KR101633369B1 (ko) * 2011-12-06 2016-07-08 고쿠리츠켄큐카이하츠호진 상교기쥬츠 소고켄큐쇼 옐로 룸 시스템
CN105093836B (zh) * 2014-05-06 2017-08-29 上海微电子装备（集团）股份有限公司 Euv光刻装置及其曝光方法
US10283456B2 (en) 2015-10-26 2019-05-07 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography engraving machine for forming water identification marks and aligment marks
JP7097872B2 (ja) 2016-07-29 2022-07-08 エーエスエムエル ホールディング エヌ．ブイ． ステージ装置
NL2020502A (en) * 2017-03-30 2018-10-03 Asml Netherlands Bv Apparatus, substrate handler, patterning device handler, damping system and method of manufacturing
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US10598832B2 (en) * 2018-01-09 2020-03-24 Varian Semiconductor Equipment Associates, Inc. System and method for forming diffracted optical element having varied gratings
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CN115477138A (zh) * 2022-09-16 2022-12-16 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 掩模传输装置及掩模传输系统
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CN119717408B (zh) * 2024-12-31 2025-11-11 上海新毅东半导体科技有限公司 掩膜版传送装置及光刻机

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Also Published As

Publication number Publication date
CN103713475B (zh) 2015-09-30
US9983487B2 (en) 2018-05-29
US20160077443A1 (en) 2016-03-17
NL1036785A1 (nl) 2009-10-20
KR20110004876A (ko) 2011-01-14
WO2009127391A1 (en) 2009-10-22
KR20160052804A (ko) 2016-05-12
CN102007455A (zh) 2011-04-06
TW201001090A (en) 2010-01-01
US9268241B2 (en) 2016-02-23
JP5669723B2 (ja) 2015-02-12
CN103713475A (zh) 2014-04-09
JP2011517128A (ja) 2011-05-26
CN102007455B (zh) 2014-02-12
TWI488007B (zh) 2015-06-11
US20110020104A1 (en) 2011-01-27

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