JP2010528334A5 - - Google Patents

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Publication number
JP2010528334A5
JP2010528334A5 JP2010508923A JP2010508923A JP2010528334A5 JP 2010528334 A5 JP2010528334 A5 JP 2010528334A5 JP 2010508923 A JP2010508923 A JP 2010508923A JP 2010508923 A JP2010508923 A JP 2010508923A JP 2010528334 A5 JP2010528334 A5 JP 2010528334A5
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Japan
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examples
wafer
filtered
film
solution
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JP2010508923A
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English (en)
Japanese (ja)
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JP5327217B2 (ja
JP2010528334A (ja
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Priority claimed from US11/752,040 external-priority patent/US20080292987A1/en
Priority claimed from US11/872,962 external-priority patent/US8017296B2/en
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Publication of JP2010528334A publication Critical patent/JP2010528334A/ja
Publication of JP2010528334A5 publication Critical patent/JP2010528334A5/ja
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Publication of JP5327217B2 publication Critical patent/JP5327217B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010508923A 2007-05-22 2008-05-20 縮合芳香族環を含む反射防止膜組成物 Expired - Fee Related JP5327217B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/752,040 US20080292987A1 (en) 2007-05-22 2007-05-22 Antireflective Coating Composition Comprising Fused Aromatic Rings
US11/752,040 2007-05-22
US11/872,962 US8017296B2 (en) 2007-05-22 2007-10-16 Antireflective coating composition comprising fused aromatic rings
US11/872,962 2007-10-16
PCT/IB2008/001284 WO2008142546A2 (en) 2007-05-22 2008-05-20 An antireflective coating composition comprising fused aromatic rings

Publications (3)

Publication Number Publication Date
JP2010528334A JP2010528334A (ja) 2010-08-19
JP2010528334A5 true JP2010528334A5 (enExample) 2011-05-26
JP5327217B2 JP5327217B2 (ja) 2013-10-30

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JP2010508923A Expired - Fee Related JP5327217B2 (ja) 2007-05-22 2008-05-20 縮合芳香族環を含む反射防止膜組成物

Country Status (7)

Country Link
US (1) US8017296B2 (enExample)
EP (1) EP2158279B1 (enExample)
JP (1) JP5327217B2 (enExample)
KR (1) KR101532102B1 (enExample)
CN (1) CN101679800B (enExample)
TW (1) TWI424033B (enExample)
WO (1) WO2008142546A2 (enExample)

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KR102004697B1 (ko) 2013-04-17 2019-07-29 닛산 가가쿠 가부시키가이샤 레지스트 하층막 형성 조성물
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TWI541611B (zh) 2013-06-26 2016-07-11 第一毛織股份有限公司 用於硬罩幕組合物的單體、包括該單體的硬罩幕組合物及使用該硬罩幕組合物形成圖案的方法
CN105555888B (zh) * 2013-09-19 2019-04-02 日产化学工业株式会社 含有脂肪族多环结构的自组装膜的下层膜形成用组合物
KR102454445B1 (ko) 2014-11-04 2022-10-14 닛산 가가쿠 가부시키가이샤 아릴렌기를 갖는 폴리머를 포함하는 레지스트 하층막 형성 조성물
CN105037106B (zh) * 2015-05-20 2016-08-17 中节能万润股份有限公司 一种联芘酚及其制备方法和用途
JP2018127505A (ja) * 2015-06-17 2018-08-16 三菱瓦斯化学株式会社 アダマンタン構造含有重合体
KR102365131B1 (ko) * 2016-11-10 2022-02-17 삼성에스디아이 주식회사 유기막 조성물, 유기막, 및 패턴형성방법
KR101940655B1 (ko) * 2016-11-22 2019-01-21 동우 화인켐 주식회사 하드마스크용 조성물
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