JP2010505787A5 - - Google Patents
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- Publication number
- JP2010505787A5 JP2010505787A5 JP2009530839A JP2009530839A JP2010505787A5 JP 2010505787 A5 JP2010505787 A5 JP 2010505787A5 JP 2009530839 A JP2009530839 A JP 2009530839A JP 2009530839 A JP2009530839 A JP 2009530839A JP 2010505787 A5 JP2010505787 A5 JP 2010505787A5
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen
- substituted
- interrupted
- alkyl
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052739 hydrogen Inorganic materials 0.000 claims 19
- 239000001257 hydrogen Substances 0.000 claims 19
- 150000001875 compounds Chemical class 0.000 claims 14
- 125000000217 alkyl group Chemical group 0.000 claims 12
- 150000002431 hydrogen Chemical class 0.000 claims 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 9
- 125000000392 cycloalkenyl group Chemical group 0.000 claims 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims 8
- 238000000576 coating method Methods 0.000 claims 6
- 239000002253 acid Substances 0.000 claims 5
- 229910052760 oxygen Inorganic materials 0.000 claims 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 5
- 229910052717 sulfur Inorganic materials 0.000 claims 5
- 239000000203 mixture Substances 0.000 claims 4
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 3
- 229910052736 halogen Inorganic materials 0.000 claims 3
- 150000002367 halogens Chemical class 0.000 claims 3
- 239000000976 ink Substances 0.000 claims 3
- 238000007639 printing Methods 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 229920002554 vinyl polymer Polymers 0.000 claims 3
- 239000003377 acid catalyst Substances 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 150000001449 anionic compounds Chemical class 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 239000008199 coating composition Substances 0.000 claims 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 150000002891 organic anions Chemical class 0.000 claims 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims 2
- 238000005727 Friedel-Crafts reaction Methods 0.000 claims 1
- 230000004913 activation Effects 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 150000001767 cationic compounds Chemical class 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 239000011350 dental composite resin Substances 0.000 claims 1
- 238000009472 formulation Methods 0.000 claims 1
- 238000007641 inkjet printing Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 claims 1
- 150000002892 organic cations Chemical class 0.000 claims 1
- GJVFBWCTGUSGDD-UHFFFAOYSA-L pentamethonium bromide Chemical compound [Br-].[Br-].C[N+](C)(C)CCCCC[N+](C)(C)C GJVFBWCTGUSGDD-UHFFFAOYSA-L 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 239000006120 scratch resistant coating Substances 0.000 claims 1
- 238000006467 substitution reaction Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 1
- 0 Cc(cc1)ccc1C(*)=C(*)* Chemical compound Cc(cc1)ccc1C(*)=C(*)* 0.000 description 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06121699 | 2006-10-04 | ||
| EP06121699.0 | 2006-10-04 | ||
| PCT/EP2007/060074 WO2008040648A1 (en) | 2006-10-04 | 2007-09-24 | Sulphonium salt photoinitiators |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010505787A JP2010505787A (ja) | 2010-02-25 |
| JP2010505787A5 true JP2010505787A5 (enExample) | 2010-11-11 |
| JP5290183B2 JP5290183B2 (ja) | 2013-09-18 |
Family
ID=37865787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009530839A Expired - Fee Related JP5290183B2 (ja) | 2006-10-04 | 2007-09-24 | スルホニウム塩光開始剤 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8012672B2 (enExample) |
| EP (1) | EP2125713B1 (enExample) |
| JP (1) | JP5290183B2 (enExample) |
| CN (1) | CN101522613B (enExample) |
| AT (1) | ATE554065T1 (enExample) |
| TW (1) | TWI435864B (enExample) |
| WO (1) | WO2008040648A1 (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101952269B (zh) * | 2007-10-10 | 2014-06-25 | 巴斯夫欧洲公司 | 锍盐引发剂 |
| US8512934B2 (en) | 2007-10-10 | 2013-08-20 | Basf Se | Sulphonium salt initiators |
| JP5538229B2 (ja) | 2007-10-10 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | スルホニウム塩開始剤 |
| KR20110025211A (ko) * | 2008-06-12 | 2011-03-09 | 바스프 에스이 | 술포늄 유도체 및 잠재성 산으로서의 그의 용도 |
| CN102077381B (zh) | 2008-06-27 | 2014-10-22 | 通用显示公司 | 可交联的离子掺杂剂 |
| JP5398246B2 (ja) * | 2008-12-10 | 2014-01-29 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
| EP2199856B1 (en) * | 2008-12-18 | 2013-08-07 | Agfa Graphics N.V. | Cationic radiation curable compositions |
| EP2438122A1 (en) * | 2009-06-02 | 2012-04-11 | Massachusetts Institute of Technology | Coatings |
| JP5387181B2 (ja) * | 2009-07-08 | 2014-01-15 | 信越化学工業株式会社 | スルホニウム塩、レジスト材料及びパターン形成方法 |
| CN102781911B (zh) | 2010-02-24 | 2015-07-22 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| CN102566277B (zh) * | 2010-12-21 | 2013-11-06 | 北京师范大学 | 一种用于高感度光聚合版材的阳离子聚合成像组合物 |
| US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| JP5993626B2 (ja) * | 2011-06-24 | 2016-09-14 | 住友化学株式会社 | 塩及び着色硬化性組成物 |
| KR101263673B1 (ko) * | 2011-08-03 | 2013-05-22 | 금호석유화학 주식회사 | 술포늄 화합물, 광산발생제 및 레지스트 조성물 |
| TW201335295A (zh) | 2011-11-30 | 2013-09-01 | 西克帕控股公司 | 經標記之塗層組成物及其認證之方法 |
| JP6120574B2 (ja) * | 2012-01-31 | 2017-04-26 | キヤノン株式会社 | 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド |
| EP2882597B1 (en) | 2012-08-01 | 2017-02-01 | Sicpa Holding SA | Optically variable security threads and stripes |
| EA028728B1 (ru) | 2012-10-29 | 2017-12-29 | Сикпа Холдинг Са | Защитные покрытия для защищенных документов |
| JP5638106B2 (ja) * | 2013-05-08 | 2014-12-10 | 東京応化工業株式会社 | 新規な化合物および酸発生剤 |
| JP6621271B2 (ja) * | 2014-09-26 | 2019-12-18 | 東京応化工業株式会社 | ビニル基含有化合物を含有する硬化性組成物 |
| TW201703879A (zh) | 2015-06-02 | 2017-02-01 | 西克帕控股有限公司 | 用於生產光學效應層之製程 |
| WO2017014284A1 (ja) * | 2015-07-23 | 2017-01-26 | 三菱瓦斯化学株式会社 | 新規化合物及びその製造方法 |
| EP3185655B8 (de) * | 2015-12-22 | 2024-01-03 | Heraeus Electronics GmbH & Co. KG | Verfahren zur individuellen codierung von metall-keramik-substraten |
| CN105712917B (zh) * | 2016-03-29 | 2017-12-26 | 同济大学 | 具有光引发剂与光敏化剂双重功能的共轭型硫鎓盐光引发剂、制备方法及其应用 |
| CN107698477B (zh) | 2016-08-08 | 2020-05-12 | 常州强力电子新材料股份有限公司 | 一种新型阳离子型光引发剂及其制备方法和应用 |
| CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
| CN112351758B (zh) * | 2018-04-25 | 2023-03-10 | 诺克斯萨诺股份有限公司 | 生成光活化气体递质的组合物 |
| DK3794083T3 (da) | 2018-05-15 | 2022-09-12 | Sicpa Holding Sa | Maskinlæsbare sikkerhedsfunktioner |
| US11281099B2 (en) * | 2018-05-28 | 2022-03-22 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound |
| CN111978228B (zh) * | 2019-05-22 | 2021-10-12 | 中国科学院理化技术研究所 | 基于硫鎓盐的单分子树脂产酸剂及其光刻胶组合物 |
| CN111978224B (zh) * | 2019-05-22 | 2022-10-28 | 中国科学院理化技术研究所 | 含硫单分子树脂及其光刻胶组合物 |
| TWI829917B (zh) | 2019-05-28 | 2024-01-21 | 瑞士商西克帕控股有限公司 | 安全性墨水以及機器可讀式安全性特徵 |
| CN112794649B (zh) * | 2021-02-11 | 2022-07-05 | 福州大学 | 一种防雾薄膜及其制备方法 |
| US20220291583A1 (en) * | 2021-02-12 | 2022-09-15 | Sumitomo Chemical Company, Limited | Salt, acid generator, resist composition and method for producing resist pattern |
| JP2022123840A (ja) * | 2021-02-12 | 2022-08-24 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| CN112961085B (zh) * | 2021-02-18 | 2022-02-01 | 同济大学 | Led可激发分子内敏化型硫鎓盐类化合物及制备方法和应用 |
| AR130228A1 (es) | 2022-08-23 | 2024-11-20 | Sicpa Holding Sa | Composición de tinta de seguridad y característica de seguridad legible por máquina derivada de la misma |
| WO2024048282A1 (ja) * | 2022-08-31 | 2024-03-07 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法 |
| CN117326999B (zh) * | 2023-09-12 | 2025-11-18 | 辽宁靖帆新材料有限公司 | 一种二苯基[4-(苯硫基)苯基]全氟丁基磺酸锍盐的合成方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2833827A (en) | 1955-01-17 | 1958-05-06 | Bayer Ag | Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same |
| ZA805273B (en) | 1979-09-28 | 1981-11-25 | Gen Electric | Process of deep section curing photocurable compositions |
| US4451409A (en) | 1982-02-08 | 1984-05-29 | The Dow Chemical Company | Sulfonium organosulfonates |
| US4694029A (en) | 1985-04-09 | 1987-09-15 | Cook Paint And Varnish Company | Hybrid photocure system |
| JP3063615B2 (ja) | 1995-03-16 | 2000-07-12 | 信越化学工業株式会社 | トリアリールスルホニウム塩の製造方法 |
| TW513399B (en) * | 1996-03-05 | 2002-12-11 | Shinetsu Chemical Co | Method for preparing triarylsulfonium salts |
| KR100320773B1 (ko) * | 1999-05-31 | 2002-01-17 | 윤종용 | 포토레지스트 조성물 |
| US6723483B1 (en) * | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
| US6749987B2 (en) | 2000-10-20 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| CA2452566C (en) * | 2001-07-19 | 2011-08-23 | Lamberti Spa | Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
| GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
| US20030235775A1 (en) | 2002-06-13 | 2003-12-25 | Munirathna Padmanaban | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| WO2004029037A1 (ja) * | 2002-09-25 | 2004-04-08 | Asahi Denka Co.Ltd. | 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法 |
| CN1603957A (zh) * | 2003-10-03 | 2005-04-06 | 住友化学工业株式会社 | 化学放大型正光刻胶组合物及其树脂 |
| TWI392969B (zh) | 2005-03-22 | 2013-04-11 | Fujifilm Corp | 正型光阻組成物及使用它之圖案形成方法 |
| JP4696009B2 (ja) * | 2005-03-22 | 2011-06-08 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| ATE473209T1 (de) | 2005-07-01 | 2010-07-15 | Basf Se | Sulfoniumsalzinitiatoren |
| JP4866605B2 (ja) * | 2005-12-28 | 2012-02-01 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
| US8067643B2 (en) | 2006-04-13 | 2011-11-29 | Basf Se | Sulphonium salt initiators |
-
2007
- 2007-09-24 JP JP2009530839A patent/JP5290183B2/ja not_active Expired - Fee Related
- 2007-09-24 AT AT07820481T patent/ATE554065T1/de active
- 2007-09-24 WO PCT/EP2007/060074 patent/WO2008040648A1/en not_active Ceased
- 2007-09-24 CN CN2007800372746A patent/CN101522613B/zh not_active Expired - Fee Related
- 2007-09-24 US US12/442,823 patent/US8012672B2/en not_active Expired - Fee Related
- 2007-09-24 EP EP07820481A patent/EP2125713B1/en not_active Not-in-force
- 2007-10-03 TW TW096137050A patent/TWI435864B/zh not_active IP Right Cessation
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