JP5290183B2 - スルホニウム塩光開始剤 - Google Patents

スルホニウム塩光開始剤 Download PDF

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Publication number
JP5290183B2
JP5290183B2 JP2009530839A JP2009530839A JP5290183B2 JP 5290183 B2 JP5290183 B2 JP 5290183B2 JP 2009530839 A JP2009530839 A JP 2009530839A JP 2009530839 A JP2009530839 A JP 2009530839A JP 5290183 B2 JP5290183 B2 JP 5290183B2
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JP
Japan
Prior art keywords
acid
substituted
alkyl
compound
interrupted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009530839A
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English (en)
Japanese (ja)
Other versions
JP2010505787A (ja
JP2010505787A5 (enExample
Inventor
ハヨ，パスカル
ビルボーム，ジャン−リュク
イルク，シュテファン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of JP2010505787A publication Critical patent/JP2010505787A/ja
Publication of JP2010505787A5 publication Critical patent/JP2010505787A5/ja
Application granted granted Critical
Publication of JP5290183B2 publication Critical patent/JP5290183B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/375—Thiols containing six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymerisation Methods In General (AREA)
JP2009530839A 2006-10-04 2007-09-24 スルホニウム塩光開始剤 Expired - Fee Related JP5290183B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06121699 2006-10-04
EP06121699.0 2006-10-04
PCT/EP2007/060074 WO2008040648A1 (en) 2006-10-04 2007-09-24 Sulphonium salt photoinitiators

Publications (3)

Publication Number Publication Date
JP2010505787A JP2010505787A (ja) 2010-02-25
JP2010505787A5 JP2010505787A5 (enExample) 2010-11-11
JP5290183B2 true JP5290183B2 (ja) 2013-09-18

Family

ID=37865787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009530839A Expired - Fee Related JP5290183B2 (ja) 2006-10-04 2007-09-24 スルホニウム塩光開始剤

Country Status (7)

Country Link
US (1) US8012672B2 (enExample)
EP (1) EP2125713B1 (enExample)
JP (1) JP5290183B2 (enExample)
CN (1) CN101522613B (enExample)
AT (1) ATE554065T1 (enExample)
TW (1) TWI435864B (enExample)
WO (1) WO2008040648A1 (enExample)

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CN101952269B (zh) * 2007-10-10 2014-06-25 巴斯夫欧洲公司 锍盐引发剂
US8512934B2 (en) 2007-10-10 2013-08-20 Basf Se Sulphonium salt initiators
JP5538229B2 (ja) 2007-10-10 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
KR20110025211A (ko) * 2008-06-12 2011-03-09 바스프 에스이 술포늄 유도체 및 잠재성 산으로서의 그의 용도
CN102077381B (zh) 2008-06-27 2014-10-22 通用显示公司 可交联的离子掺杂剂
JP5398246B2 (ja) * 2008-12-10 2014-01-29 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
EP2199856B1 (en) * 2008-12-18 2013-08-07 Agfa Graphics N.V. Cationic radiation curable compositions
EP2438122A1 (en) * 2009-06-02 2012-04-11 Massachusetts Institute of Technology Coatings
JP5387181B2 (ja) * 2009-07-08 2014-01-15 信越化学工業株式会社 スルホニウム塩、レジスト材料及びパターン形成方法
CN102781911B (zh) 2010-02-24 2015-07-22 巴斯夫欧洲公司 潜酸及其用途
CN102566277B (zh) * 2010-12-21 2013-11-06 北京师范大学 一种用于高感度光聚合版材的阳离子聚合成像组合物
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
JP5993626B2 (ja) * 2011-06-24 2016-09-14 住友化学株式会社 塩及び着色硬化性組成物
KR101263673B1 (ko) * 2011-08-03 2013-05-22 금호석유화학 주식회사 술포늄 화합물, 광산발생제 및 레지스트 조성물
TW201335295A (zh) 2011-11-30 2013-09-01 西克帕控股公司 經標記之塗層組成物及其認證之方法
JP6120574B2 (ja) * 2012-01-31 2017-04-26 キヤノン株式会社 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド
EP2882597B1 (en) 2012-08-01 2017-02-01 Sicpa Holding SA Optically variable security threads and stripes
EA028728B1 (ru) 2012-10-29 2017-12-29 Сикпа Холдинг Са Защитные покрытия для защищенных документов
JP5638106B2 (ja) * 2013-05-08 2014-12-10 東京応化工業株式会社 新規な化合物および酸発生剤
JP6621271B2 (ja) * 2014-09-26 2019-12-18 東京応化工業株式会社 ビニル基含有化合物を含有する硬化性組成物
TW201703879A (zh) 2015-06-02 2017-02-01 西克帕控股有限公司 用於生產光學效應層之製程
WO2017014284A1 (ja) * 2015-07-23 2017-01-26 三菱瓦斯化学株式会社 新規化合物及びその製造方法
EP3185655B8 (de) * 2015-12-22 2024-01-03 Heraeus Electronics GmbH & Co. KG Verfahren zur individuellen codierung von metall-keramik-substraten
CN105712917B (zh) * 2016-03-29 2017-12-26 同济大学 具有光引发剂与光敏化剂双重功能的共轭型硫鎓盐光引发剂、制备方法及其应用
CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN112351758B (zh) * 2018-04-25 2023-03-10 诺克斯萨诺股份有限公司 生成光活化气体递质的组合物
DK3794083T3 (da) 2018-05-15 2022-09-12 Sicpa Holding Sa Maskinlæsbare sikkerhedsfunktioner
US11281099B2 (en) * 2018-05-28 2022-03-22 Tokyo Ohka Kogyo Co., Ltd. Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound
CN111978228B (zh) * 2019-05-22 2021-10-12 中国科学院理化技术研究所 基于硫鎓盐的单分子树脂产酸剂及其光刻胶组合物
CN111978224B (zh) * 2019-05-22 2022-10-28 中国科学院理化技术研究所 含硫单分子树脂及其光刻胶组合物
TWI829917B (zh) 2019-05-28 2024-01-21 瑞士商西克帕控股有限公司 安全性墨水以及機器可讀式安全性特徵
CN112794649B (zh) * 2021-02-11 2022-07-05 福州大学 一种防雾薄膜及其制备方法
US20220291583A1 (en) * 2021-02-12 2022-09-15 Sumitomo Chemical Company, Limited Salt, acid generator, resist composition and method for producing resist pattern
JP2022123840A (ja) * 2021-02-12 2022-08-24 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
CN112961085B (zh) * 2021-02-18 2022-02-01 同济大学 Led可激发分子内敏化型硫鎓盐类化合物及制备方法和应用
AR130228A1 (es) 2022-08-23 2024-11-20 Sicpa Holding Sa Composición de tinta de seguridad y característica de seguridad legible por máquina derivada de la misma
WO2024048282A1 (ja) * 2022-08-31 2024-03-07 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法
CN117326999B (zh) * 2023-09-12 2025-11-18 辽宁靖帆新材料有限公司 一种二苯基[4-(苯硫基)苯基]全氟丁基磺酸锍盐的合成方法

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Also Published As

Publication number Publication date
TWI435864B (zh) 2014-05-01
CN101522613A (zh) 2009-09-02
CN101522613B (zh) 2013-03-06
EP2125713A1 (en) 2009-12-02
JP2010505787A (ja) 2010-02-25
EP2125713B1 (en) 2012-04-18
TW200831452A (en) 2008-08-01
US20100087563A1 (en) 2010-04-08
ATE554065T1 (de) 2012-05-15
WO2008040648A1 (en) 2008-04-10
US8012672B2 (en) 2011-09-06

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