JP2010502542A5 - - Google Patents

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Publication number
JP2010502542A5
JP2010502542A5 JP2009526595A JP2009526595A JP2010502542A5 JP 2010502542 A5 JP2010502542 A5 JP 2010502542A5 JP 2009526595 A JP2009526595 A JP 2009526595A JP 2009526595 A JP2009526595 A JP 2009526595A JP 2010502542 A5 JP2010502542 A5 JP 2010502542A5
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JP
Japan
Prior art keywords
gas stream
vent gas
trichlorosilane
hydrogen
fluidized bed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2009526595A
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English (en)
Japanese (ja)
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JP5367573B2 (ja
JP2010502542A (ja
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Publication date
Priority claimed from US11/512,853 external-priority patent/US7935327B2/en
Application filed filed Critical
Publication of JP2010502542A publication Critical patent/JP2010502542A/ja
Publication of JP2010502542A5 publication Critical patent/JP2010502542A5/ja
Application granted granted Critical
Publication of JP5367573B2 publication Critical patent/JP5367573B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009526595A 2006-08-30 2007-06-14 シーメンスタイププロセスに組み込まれた流動床反応器によるシリコンの製造 Expired - Fee Related JP5367573B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/512,853 2006-08-30
US11/512,853 US7935327B2 (en) 2006-08-30 2006-08-30 Silicon production with a fluidized bed reactor integrated into a siemens-type process
PCT/US2007/013905 WO2008027101A1 (en) 2006-08-30 2007-06-14 Silicon production with a fluidized bed reactor integrated into a siemens-type process

Publications (3)

Publication Number Publication Date
JP2010502542A JP2010502542A (ja) 2010-01-28
JP2010502542A5 true JP2010502542A5 (enExample) 2010-04-02
JP5367573B2 JP5367573B2 (ja) 2013-12-11

Family

ID=38820284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009526595A Expired - Fee Related JP5367573B2 (ja) 2006-08-30 2007-06-14 シーメンスタイププロセスに組み込まれた流動床反応器によるシリコンの製造

Country Status (10)

Country Link
US (2) US7935327B2 (enExample)
EP (1) EP2057095A1 (enExample)
JP (1) JP5367573B2 (enExample)
KR (1) KR101447494B1 (enExample)
CN (1) CN101541678A (enExample)
AU (1) AU2007290858B2 (enExample)
CA (1) CA2661985C (enExample)
RU (1) RU2428377C2 (enExample)
UA (1) UA95974C2 (enExample)
WO (1) WO2008027101A1 (enExample)

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