JP2010232679A - 液浸リソグラフィ用ウェハテーブル - Google Patents
液浸リソグラフィ用ウェハテーブル Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
Abstract
【解決手段】本発明の一態様に従えば、露光装置はレンズとウェハテーブルアセンブリを含む。ウェハテーブルアセンブリは上面を有し、ウェハを支持して、レンズ及び少なくとも1つのコンポーネントに対して動かされるように配置されている。ウェハの上面とコンポーネントの上面は各々、ウェハテーブルアセンブリの上面とほぼ同じ高さである。ウェハの上面、ウェハテーブルアセンブリの上面及び少なくとも一つのコンポーネントの上面を含むウェハテーブルアセンブリの全上面は、実質的に平面状である。
【選択図】図5
Description
本願は2003年7月8日に出願された米国特許仮出願第60/485,868号の優先権を主張し、その全体を援用して本文の記載の一部とする。
本発明は概して半導体処理装置に関する。より詳細には、本発明は液浸リソグラフィシステムにおいて、レンズの表面とレンズに相対して移動される平面との間に液体を効率的に収容することを可能とするための方法及び装置に関する。
半導体処理に用いられるフォトリソグラフィ機のような精密機器について、精密機器の例えば精度のような性能に影響を及ぼす因子は一般に対処しなければならず、かつ、可能な限り取り除かなければならない。液浸リソグラフィ露光システムのような精密機器の性能に悪影響が及ぼされるときは、精密機器を用いて作られた製品は不適切に製作されるかもしれず、それによって機能が不適切になるであろう。
Claims (33)
- レンズと、
ウェハテーブルアセンブリと少なくとも一つのコンポーネントとを備え、前記ウェハテーブルアセンブリは表面を有し、前記ウェハテーブルアセンブリは、前記レンズに対して移動されるべきウェハと少なくとも一つのコンポーネントを支持するように配置され、前記ウェハの表面及び前記少なくとも1つのコンポーネントの表面は各々前記ウェハテーブルアセンブリの前記表面とほぼ同じ高さであって、
前記ウェハテーブルアセンブリは液浸の用途に好適である装置。 - 前記ウェハの前記表面、前記ウェハテーブルアセンブリの前記表面及び前記少なくとも一つのコンポーネントの前記表面を含む前記ウェハテーブルアセンブリの全上面はほぼ平面状である請求項1に記載の装置。
- 前記少なくとも一つのコンポーネントがセンサーである請求項1に記載の装置。
- 前記少なくとも一つのコンポーネントが、基準平面、空間像センサー、ドーズセンサー及びドーズムラセンサーの少なくとも一つである請求項1に記載の装置。
- 前記ウェハテーブルアセンブリはさらに基準マークを支持するように配置され、前記基準マークは上面を有し、前記基準マークの前記上面は前記ウェハテーブルアセンブリの前記表面とほぼ同じ高さである請求項4に記載の装置。
- 前記ウェハテーブルアセンブリは複数の開口を画成し、前記複数の開口の第1の開口は前記ウェハを実質的に支持するように配置され、前記複数の開口の第2の開口は前記少なくとも一つのコンポーネントを実質的に支持するように配置されている請求項1に記載の装置。
- 前記ウェハテーブルアセンブリはウェハホルダを支持するように配置され、前記ウェハホルダは、前記ウェハの前記表面が前記ウェハテーブルアセンブリの前記表面とほぼ同じ高さになるように前記ウェハを保持するために配置されている請求項1に記載の装置。
- さらに、保持リングを含み、前記保持リングは前記レンズの第1表面と前記ウェハテーブルアセンブリの全上面との間に液体を実質的に保持できるように配置され、前記ウェハテーブルアセンブリの前記全上面は、前記ウェハの前記表面と、前記ウェハテーブルアセンブリの前記表面と、前記少なくとも一つのコンポーネントの前記表面とを含む請求項1に記載の装置。
- 請求項1に記載の装置で製造されたデバイス。
- 請求項1に記載の装置によって像が形成された物体。
- レンズと、
表面を有し、前記レンズに対して走査されるべき物体と少なくとも一つのコンポーネントとを支持するように配置されたテーブルアセンブリとを含み、前記物体の表面と前記少なくとも一つのコンポーネントの表面は各々前記テーブルアセンブリの前記表面とほぼ同じ高さであり、前記テーブルアセンブリは液浸の用途で使用するのに好適である装置。 - 前記少なくとも一つのコンポーネントがセンサーである請求項11に記載の装置。
- 前記少なくとも一つのコンポーネントが、基準平面、空間像センサー、ドーズセンサー及びドーズムラセンサーの少なくとも一つである請求項11に記載の装置。
- 前記テーブルアセンブリはさらに、基準マークを支持するように配置され、前記基準マークは表面を有し、前記基準マークの前記表面は前記テーブルアセンブリの前記表面とほぼ同じ高さである請求項13に記載の装置。
- 前記テーブルアセンブリの全上面は、前記基準マークの上面、前記物体の前記表面、前記テーブルアセンブリの前記表面及び前記少なくとも一つのコンポーネントの前記表面を含む請求項14に記載の装置。
- さらに、保持リングを含み、前記保持リングは前記レンズの第1表面と前記テーブルアセンブリ の全上面との間に液体を実質的に保持できるように配置され、前記テーブルアセンブリの前記全上面は、前記物体の上面と、前記テーブルアセンブリの上面と、前記少なくとも一つのコンポーネントの上面とを含む請求項11に記載の装置。
- 請求項11に記載の装置で製造されたデバイス。
- 請求項11に記載の装置によって像が形成されたウェハ。
- 液浸リソグラフィ装置であって、
第1表面及び関連有効開口数を有するレンズと、
前記レンズの前記有効開口数を向上させるために好適である液体と、
テーブル構造体とを備え、前記テーブル構造体はほぼ平坦な上面を有し、前記ほぼ平坦な上面は前記第1表面にほぼ対向するように配置され、前記液体は実質的に前記ほぼ平坦な上面と前記第1表面との間に配置され、前記ほぼ平坦な上面は走査される物体の上面と少なくとも一つのセンサーの上面とを含む液浸リソグラフィ装置。 - 前記少なくとも一つのセンサーが基準平面、空間像センサー、ドーズセンサー及びドーズムラセンサーの少なくとも一つである請求項19に記載の液浸リソグラフィ装置。
- 前記テーブル構造体はさらに、上面を有する基準マークを支持するように配置され、前記ほぼ平坦な上面は、さらに前記基準マークの前記上面を含む請求項20に記載の液浸リソグラフィ装置。
- 前記物体がウェハである請求項19に記載の液浸リソグラフィ装置。
- 請求項19に記載の液浸リソグラフィ装置で製造されたデバイス。
- 請求項19に記載の液浸リソグラフィ装置を用いて像が形成されたウェハ。
- レンズと、
ウェハテーブルアセンブリとを備え、前記ウェハテーブルアセンブリは基部及びプレート面を有するプレートを含み、前記基部は前記プレート、少なくとも一つのコンポーネント、及びウェハを支持して前記レンズに対して移動されるように配置され、前記ウェハの表面と前記少なくとも一つのコンポーネントの表面は各々前記プレートの表面とほぼ同じ高さであって、前記レンズ及び前記ウェハテーブルアセンブリは液浸の用途に用いられるように配置されている装置。 - 前記ウェハの表面、前記プレートの表面及び前記コンポーネントの表面を含む前記ウェハテーブルアセンブリの全上面はほぼ平面状である請求項25に記載の装置。
- 前記少なくとも一つのコンポーネントがセンサーである請求項25に記載の装置。
- 前記少なくとも一つのコンポーネントが、基準平面、空間像センサー、ドーズセンサー及びドーズムラセンサーの少なくとも一つである請求項25に記載の装置。
- 前記ウェハテーブルアセンブリはさらに、基準マークを支持するように配置され、前記基準マークは基準マーク面を有し、前記基準マーク面は前記プレート面とほぼ同じ高さである請求項28に記載の装置。
- 前記プレートは複数の開口を画成し、前記ウェハは前記複数の開口の第1の開口内に配置され、前記少なくとも一つのコンポーネントは前記複数の開口の第2の開口内に配置される請求項25に記載の装置。
- 前記ウェハテーブルアセンブリはウェハホルダを支持するように配置され、前記ウェハホルダは、前記ウェハの上面が前記ウェハテーブルアセンブリの前記表面とほぼ同じ高さとなるように前記ウェハを保持するために配置されている請求項25に記載の装置。
- さらに、保持リングを含み、前記保持リングは前記レンズの第1表面と前記ウェハテーブルアセンブリの全上面との間に液体を実質的に保持できるように配置され、前記ウェハテーブルアセンブリの前記全上面は、前記物体の前記表面と、前記テーブルアセンブリの前記表面と、前記少なくとも一つのコンポーネントの前記表面とを含む請求項25に記載の装置。
- 請求項25に記載の装置で製造されたデバイス。
Applications Claiming Priority (2)
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US48586803P | 2003-07-08 | 2003-07-08 | |
US60/485,868 | 2003-07-08 |
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JP2006518633A Division JP4697138B2 (ja) | 2003-07-08 | 2004-06-02 | 液浸リソグラフィ装置、液浸リソグラフィ方法、デバイス製造方法 |
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JP2012078273A Division JP5472355B2 (ja) | 2003-07-08 | 2012-03-29 | 液浸露光装置、液浸露光方法、デバイス製造方法、及び液浸露光装置の製造方法 |
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JP2010232679A true JP2010232679A (ja) | 2010-10-14 |
JP5381910B2 JP5381910B2 (ja) | 2014-01-08 |
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JP2006518633A Expired - Fee Related JP4697138B2 (ja) | 2003-07-08 | 2004-06-02 | 液浸リソグラフィ装置、液浸リソグラフィ方法、デバイス製造方法 |
JP2010140980A Expired - Fee Related JP5381910B2 (ja) | 2003-07-08 | 2010-06-21 | 液浸露光装置、液浸露光方法、及びデバイス製造方法 |
JP2012078273A Expired - Fee Related JP5472355B2 (ja) | 2003-07-08 | 2012-03-29 | 液浸露光装置、液浸露光方法、デバイス製造方法、及び液浸露光装置の製造方法 |
JP2013222780A Expired - Fee Related JP5708755B2 (ja) | 2003-07-08 | 2013-10-25 | 液浸リソグラフィ用ウェハテーブル |
JP2013222782A Expired - Fee Related JP5708756B2 (ja) | 2003-07-08 | 2013-10-25 | 液浸リソグラフィ用ウェハテーブル |
JP2014173383A Expired - Fee Related JP5761435B2 (ja) | 2003-07-08 | 2014-08-28 | 液浸リソグラフィ用ウェハテーブル |
JP2014173592A Expired - Fee Related JP5761436B2 (ja) | 2003-07-08 | 2014-08-28 | 液浸リソグラフィ用ウェハテーブル |
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JP2013222780A Expired - Fee Related JP5708755B2 (ja) | 2003-07-08 | 2013-10-25 | 液浸リソグラフィ用ウェハテーブル |
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JP2014173383A Expired - Fee Related JP5761435B2 (ja) | 2003-07-08 | 2014-08-28 | 液浸リソグラフィ用ウェハテーブル |
JP2014173592A Expired - Fee Related JP5761436B2 (ja) | 2003-07-08 | 2014-08-28 | 液浸リソグラフィ用ウェハテーブル |
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US (5) | US7301607B2 (ja) |
EP (6) | EP2853943B1 (ja) |
JP (7) | JP4697138B2 (ja) |
HK (2) | HK1206111A1 (ja) |
TW (6) | TWI476503B (ja) |
WO (1) | WO2005010611A2 (ja) |
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