JP2009538540A - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
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- JP2009538540A JP2009538540A JP2009513190A JP2009513190A JP2009538540A JP 2009538540 A JP2009538540 A JP 2009538540A JP 2009513190 A JP2009513190 A JP 2009513190A JP 2009513190 A JP2009513190 A JP 2009513190A JP 2009538540 A JP2009538540 A JP 2009538540A
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- 239000000758 substrate Substances 0.000 title claims abstract description 253
- 238000012545 processing Methods 0.000 title claims abstract description 244
- 238000012546 transfer Methods 0.000 claims abstract description 563
- 238000002955 isolation Methods 0.000 claims description 19
- 230000033001 locomotion Effects 0.000 abstract description 63
- 230000013011 mating Effects 0.000 abstract description 3
- 238000004804 winding Methods 0.000 description 94
- 235000012431 wafers Nutrition 0.000 description 65
- 238000000034 method Methods 0.000 description 52
- 230000008569 process Effects 0.000 description 46
- 239000012636 effector Substances 0.000 description 39
- 230000005540 biological transmission Effects 0.000 description 31
- 239000000463 material Substances 0.000 description 29
- 230000008878 coupling Effects 0.000 description 20
- 238000010168 coupling process Methods 0.000 description 20
- 238000005859 coupling reaction Methods 0.000 description 20
- 230000007246 mechanism Effects 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 10
- 238000004891 communication Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 238000011068 loading method Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 9
- 238000001514 detection method Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 238000004320 controlled atmosphere Methods 0.000 description 7
- 230000007613 environmental effect Effects 0.000 description 7
- 238000005304 joining Methods 0.000 description 7
- 238000001459 lithography Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 230000001360 synchronised effect Effects 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 5
- 238000001465 metallisation Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000003491 array Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 210000000245 forearm Anatomy 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 238000005339 levitation Methods 0.000 description 4
- 230000005355 Hall effect Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000001939 inductive effect Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 230000002452 interceptive effect Effects 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008520 organization Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 210000000707 wrist Anatomy 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000003070 Statistical process control Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000013404 process transfer Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
-
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
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- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- Microelectronics & Electronic Packaging (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
Abstract
ンバ内に位置する基板搬送部と、を有する基板処理装置。前記チャンバは、隔離雰
囲気を保持することが可能であり、搬送チャンバに沿って縦方向に延在する、1つ
以上の実質的に直線状の搬送経路を画定する。前記チャンバ内の搬送部は、直線状
の搬送経路に沿って、基板を搬送することが可能である。搬送部は、基板の保持お
よび移動が可能である搬送装置を有する。搬送装置は、直線経路の少なくとも1つ
に沿って移動するための、搬送チャンバの壁に接合する。搬送チャンバは、搬送チ
ャンバの向かい合う端部で、他の基板保持モジュールと嵌合するための接合部分を
有する。各接合部分は、2つ以上の直線搬送経路の少なくとも1つが通って延在す
る開口部を有し、搬送チャンバは、選択的に可変である縦方向の長さを接合部分間
に有する。
Description
,351,048号、第6,355,998号に記載される、この原理は、回転デバイスに関して、本明細書に記載される装置の駆動システム701に、直線状の方式で適用され、例示的カート760を浮上させる。代替実施形態では、他の駆動システムまたは浮上システムを使用することができる。
、巻き線W1〜Wnのいずれかに選択的に接続することができる。A〜CPUは、この選択的接続を調整し、デバイスの状態を監視する。この様式で、CPUは、ツールを停止せずに、点検のため、オフラインで増幅器モジュールまたは巻き線を選択的に、得ることができる。
レートの向かい合う側部に2つの結合磁石配列1502を伴うが、プレートの向かい合う角には限定されない。ロボットベースプレート1558の向かい合う角で、2つの追加の磁石配列1502が直線ベアリングキャリッジ1560に結合され、直線ベアリングレール1562の上をスライドするようにされる。これらの直線ベアリングレール1562は、ベースプレート1558に結合される。駆動ベルト1564または直線運動を回転運動に変換する他の手段は、直線ベアリングキャリッジ1560に取り付けられる。示されるような場合において、駆動ベルト1564は、アイドラープーリ1566の周りに巻き付けられ、それからプーリテンショナー1568に巻き付けられ、駆動プーリ1570に取り付けられる。磁石配列1502を通ってベアリングキャリッジ1560に適用される直線運動は、結果として、駆動プーリ1572の回転運動をもたらす。自由度2の適用の場合、記載される機構の冗長バージョンが、ロボットカート機構の向かい合う側部に適用され、重複回路は、駆動プーリ1572に取り付けられる。この組み合わせは、同軸プーリアセンブリを産出する。固定磁石配列1502と組み合わせ磁石配列1502と直線ベアリングキャリッジ1560との相対運動は、移送アームリンケージを駆動する手段を提供する。ロボットキャリッジの直線搬送の場合、直線ベアリング/磁石配列1560/1502および結合磁石配列/カートベースプレート1502/1558は、固定されたセットとして駆動され、駆動プーリ1570&1572の回転は見られない。ベースプレート1558の駆動機構は、他の適した移送アームリンケージを操作するために使用することができ、いくつかの実施例は、図24〜24C、25〜25Cに示される)。図
23に示される実施形態での移送アーム1577は、一般的な単一のSCARAアーム構造を有する。駆動プーリ1572は、下部リンクアーム1574に結合され、駆動プーリ1570は、前腕部駆動プーリ1586に結び付けられる。前腕部プーリ1586の回転運動は、駆動ベルト1582および肘部プーリ1576を通して、前腕部1578に結合される。手首/エンドエフェクタ1584は、下部リンクアーム1574に接地されるため、結果として生じる前腕部1578の手首肘部プーリ1580に対する相対的回転運動によって駆動する。典型的には、この運動は、プーリ1572および1570の入力される駆動比率に対する、各ジョイントでのプーリ比率によって実現される。また図23A〜23Bを参照すると、移送アームリンケージ1577は、引き込みおよび延在の配置で、
それぞれ示される。引き込みおよび延在の配置間の移動は、所望通りに、ベースプレートに対して、移動可能な磁石配列1502を移動することにより、実現される(上述の様式で)。アームリンケージの移動は、カートを固定し、または搬送チャンバに対して移動して実施される。図23A〜23Bは、アーム1577を延在した場合、カートの横側部1576R(即ち、チャンバ壁に面するカートの側部)に延在するように配置された移送アーム1577を示す。これは、図13Aに示されるカート700の移送機構724A〜Bの延在/引き込み移動と同様である。理解され得るように、カート1557上の移送アーム1577は、カートベースプレートに対して任意の所望の配向へ、S回転の軸の周りで(図22参照のこと)ユニットとして回転することができる(移動可能な磁石配列1502を使用して)。例えば、図23A−23Bに示される配向から約180°回転
した場合、移送アーム1577は、図23Bに示される側部に向かい合う1575Lの側部に延在することができる。さらに、移送アームは、アームの延在がチャンバの直線方向(図22で矢印15Xで表示される)に沿うように、約90°回転することができる。任意の数のアームリンケージは、そのようなカートで用いることができる。カートで使用することができる、適したアームリンケージの他の実施例は、米国特許第5,180,276号、第5,647,724号、第5,765,983号、および第6,485,250号に記載され、その全ては全体で参照として本明細書に組み込まれる。
配列に対して移動する。この運動は、エンドエフェクタ1588´および1590´が回転することを可能にし、それにより、図23A〜23Bと同様の、前述のカートの直線方向に実質的に垂直にロボットエンドエフェクタを延在させる。図24A〜24Cは、例示目的で、1つの側部に延在するエンドエフェクタ1588´および1590´を示す。理解され得るように、しかしながら、エンドエフェクタ1588´、1590´は、ベースプレートの任意の側部に延在することができる。さらに、エンドエフェクタ1588´、1590´は、ベースプレートの任意の側部に延在することができる。さらには、エンドエフェクタ1588´、1590´は、エンドエフェクタが、図24A〜24Cに示されるように、約90°以上またはそれ以下の角度で配向される配置に延在することができる
。
´´は、エンドエフェクタが、カート1557´´のベースプレート1558´´に対して任意の方向で延在/引き込みされるように、軸S´´の周りで回転することができる。ここでさらに図2〜7Aを参照すると、多関節移送アームを伴うカート(図12、13A、22、23、24、および25に示されるカート22、122A、406、229、700、1557、1557´、1557´´等)を使用することの重大な利点は、移送アームの所定の範囲に関して、移送チャンバは、最小限の幅で提供され得るということである。異なるカート実施形態での移送アームの多軸の多関節は、多関節アームの経路に対して、カートの実質的に独立する配置を可能にし、次にそれは、搬送チャンバ18の幅が最小に減少されことを可能にする。同様に、スロットバルブおよび搬送チャンバにストレージ処理モジュールを接続する通路の幅は、最小の大きさに減少することができる。
Claims (19)
- 基板処理装置であって、
搬送チャンバであって、外部雰囲気から隔離される隔離雰囲気を保持することが可能であり、前記搬送チャンバの向かい合う壁の間で前記搬送チャンバに沿って縦方向に延在する2つ以上の実質的に直線状の搬送経路を画定する、搬送チャンバと、
前記搬送チャンバに沿う略直線状の配列の基板保持モジュールであって、それぞれが、前記チャンバに連通可能に接続され、搬送チャンバと保持モジュール間の基板の通過を可能にする、基板保持モジュールと、
前記2つ以上の実質的に直線状の搬送経路に沿って前記基板を搬送するための、前記搬送チャンバに位置し、移動可能に実装される基板搬送部であって、前記基板搬送部は、前記基板の保持および移動が可能である、少なくとも1つの搬送装置を有し、前記少なくとも1つの搬送装置は、前記2つ以上の実質的に直線状の搬送経路の少なくとも1つに沿って移動するために、前記搬送チャンバの壁に平行移動可能に接合する、基板搬送部と、を含み、
前記搬送チャンバは、前記搬送チャンバの向かい合う端部で、他の基板保持モジュールと一体となるための接合部分を有し、各接合部分は、前記2つ以上の直線搬送経路の少なくとも1つが通って延在する開口部を有し、前記搬送チャンバは、接合部分の間に選択的に可変の縦方向の長さを有する基板処理装置。 - 前記選択的に可変の縦方向の長さは、前記搬送チャンバの縦方向の長さが、第1の既定の長さと第2の既定の長さとの間で、選択的に変更されることを可能にする請求項1に記載の装置。
- 前記2つ以上の直線搬送経路のそれぞれの長さは、選択的に可変であり、経路の長さの可変性は、前記搬送チャンバの縦方向の長さの変動で、設定される請求項1に記載の装置。
- 前記2つ以上の搬送経路は、互いから横方向にオフセットされる請求項1に記載の装置。
- 前記2つ以上の搬送経路は、前記接合部分間で前記搬送チャンバを通って、実質的に連続して延在する請求項4に記載の装置。
- 前記2つ以上の搬送経路の前記少なくとも1つは、前記搬送チャンバ内で、前記2つ以上の搬送経路が通って延在する前記搬送チャンバの別の部分から隔離されるチャンバ雰囲気を保持することが可能である、前記搬送チャンバの1部分に位置する請求項1に記載の装置。
- 前記搬送チャンバの前記部分および前記もう一方の部分は、前記2つ以上の搬送経路に沿って縦方向に配置される請求項6に記載の装置。
- 前記搬送チャンバの前記部分および前記もう一方の部分は、互いから横方向にオフセットされる請求項6に記載の装置。
- 前記搬送装置は、前記搬送チャンバに沿って配列される前記基板保持モジュールの1つから、前記搬送チャンバに沿って配列される前記基板保持モジュールの別のモジュールへ、前記基板に最大1度しか触れることなく、前記基板を搬送することが可能である、ワンタッチ搬送装置である請求項1に記載の装置。
- 基板処理装置であって、
前記搬送チャンバの向かい合う壁の間で、前記搬送チャンバに沿って縦方向に延在する、2つ以上の実質的に直線状の搬送経路を画定する搬送チャンバと、
前記搬送チャンバに沿う略直線状の配列の基板保持モジュールであって、それぞれが、前記チャンバに連通可能に接続され、搬送チャンバと保持モジュールとの間の基板の通過を可能にする、基板保持モジュールと、
前記2つ以上の実質的に直線状の搬送経路に沿って、前記基板を搬送するための、前記搬送チャンバ内に位置し、移動可能に実装される基板搬送部であって、前記基板搬送部は、前記2つ以上の実質的に直線状の搬送経路の少なくとも1つの上で、基板を保持し移動することが可能である、少なくとも1つの搬送装置を有する、基板搬送部と、を含み、前記搬送チャンバは、異なる搬送管を含み、前記異なる搬送管のそれぞれは、その中に位置する前記搬送経路の少なくとも1つを有し、そのそれぞれは、前記搬送管の別の1つの中に位置する前記搬送経路の別の1つとは異なり、第1の位置で連通可能に互いに接続され、基板が異なる搬送管の異なる搬送経路の間で移送されることを可能にし、各搬送管は、各搬送管に共通し前記第1の位置から遠位である別の位置に縦方向に延在し、前記搬送管の少なくとも1つは、隔離雰囲気を保持することが可能である基板処理装置。 - 前記搬送チャンバに接続される接合部分区域をさらに含み、前記接合部分区域は前記装置から基板を積み降ろしするように適合され、前記搬送管は、それぞれ、その他の場所で、前記接合部分区域に連通可能に接続され、各搬送管から前記接合部分区域に基板を移送することを可能にする請求項10に記載の装置。
- 前記搬送管の少なくとも2つは、互いに実質的に並行である請求項10に記載の装置。
- 前記搬送管の少なくとも1つは、選択的に可変である縦方向の長さを有する請求項10に記載の装置。
- 前記2つ以上の直線搬送経路の少なくとも1つの長さは、選択的に可変であり、経路の長さの可変性は、前記搬送管の対応する1つの縦方向の長さの変動で設定される請求項10に記載の装置。
- 前記搬送管のそれぞれは、互いから分離される請求項10に記載の装置。
- 前記搬送管の少なくとも1つは、別の前記搬送管の別の内部雰囲気から隔離され、それと異なる内部雰囲気を保持することが可能である請求項10に記載の装置。
- 前記搬送管の少なくとも1つは、管部を有し、その中に前記2つ以上の搬送経路の少なくとも1つが位置し、前記少なくとも1つの搬送管の別の管部の別の雰囲気から隔離される第1の隔離雰囲気を保持することが可能であり、前記少なくとも1つの搬送経路は、他方の管部を通って延在する請求項10に記載の装置。
- 前記搬送管の少なくとも1つは、その中にロードロックを有する請求項10に記載の装置。
- 前記ロードロックは、前記ロードロックを通じて、前記2つ以上の搬送経路の1つに沿って搬送される基板の熱的調整が可能である請求項18に記載の装置。
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WO2013176025A1 (ja) * | 2012-05-22 | 2013-11-28 | 東京エレクトロン株式会社 | 搬送装置 |
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JP2015089962A (ja) * | 2013-11-07 | 2015-05-11 | 昭和電工株式会社 | インライン式成膜装置及びそれを用いた磁気記録媒体の製造方法 |
KR101789375B1 (ko) | 2014-06-17 | 2017-10-23 | 도요타지도샤가부시키가이샤 | 반도체 장치의 제조 라인 및 반도체 장치의 제조 방법 |
KR102015707B1 (ko) * | 2017-11-23 | 2019-08-28 | 박인태 | 정전척을 이용한 기판 처리 시스템 |
KR20190100148A (ko) * | 2017-11-23 | 2019-08-28 | 박인태 | 기판 처리 장치 및 방법 |
KR20190059738A (ko) * | 2017-11-23 | 2019-05-31 | 박인태 | 정전척을 이용한 기판 처리 시스템 |
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JP7205458B2 (ja) | 2019-12-25 | 2023-01-17 | 株式会社Sumco | 気相成長装置 |
KR102694811B1 (ko) * | 2019-12-25 | 2024-08-12 | 가부시키가이샤 사무코 | 기상 성장 장치 |
Also Published As
Publication number | Publication date |
---|---|
WO2007139896A3 (en) | 2008-01-31 |
US7959395B2 (en) | 2011-06-14 |
US9570330B2 (en) | 2017-02-14 |
US20140161570A1 (en) | 2014-06-12 |
TWI486999B (zh) | 2015-06-01 |
WO2007139896A2 (en) | 2007-12-06 |
JP5492553B2 (ja) | 2014-05-14 |
US20060285945A1 (en) | 2006-12-21 |
KR20090025268A (ko) | 2009-03-10 |
US8651789B2 (en) | 2014-02-18 |
KR101415708B1 (ko) | 2014-07-04 |
TW200818247A (en) | 2008-04-16 |
US20110232844A1 (en) | 2011-09-29 |
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