JP2009505421A5 - - Google Patents

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Publication number
JP2009505421A5
JP2009505421A5 JP2008526963A JP2008526963A JP2009505421A5 JP 2009505421 A5 JP2009505421 A5 JP 2009505421A5 JP 2008526963 A JP2008526963 A JP 2008526963A JP 2008526963 A JP2008526963 A JP 2008526963A JP 2009505421 A5 JP2009505421 A5 JP 2009505421A5
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JP
Japan
Prior art keywords
layer
photoresist
sidewall
deposition
features
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JP2008526963A
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English (en)
Japanese (ja)
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JP5250418B2 (ja
JP2009505421A (ja
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Priority claimed from US11/208,098 external-priority patent/US7273815B2/en
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Publication of JP2009505421A publication Critical patent/JP2009505421A/ja
Publication of JP2009505421A5 publication Critical patent/JP2009505421A5/ja
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Publication of JP5250418B2 publication Critical patent/JP5250418B2/ja
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JP2008526963A 2005-08-18 2006-08-01 ラインエッジ粗さを低減させた特徴のエッチング Active JP5250418B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/208,098 US7273815B2 (en) 2005-08-18 2005-08-18 Etch features with reduced line edge roughness
US11/208,098 2005-08-18
PCT/US2006/030028 WO2007021540A2 (en) 2005-08-18 2006-08-01 Etch features with reduced line edge roughness

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013023716A Division JP2013110437A (ja) 2005-08-18 2013-02-08 ラインエッジ粗さを低減させた特徴のエッチング

Publications (3)

Publication Number Publication Date
JP2009505421A JP2009505421A (ja) 2009-02-05
JP2009505421A5 true JP2009505421A5 (enExample) 2009-09-10
JP5250418B2 JP5250418B2 (ja) 2013-07-31

Family

ID=37758048

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008526963A Active JP5250418B2 (ja) 2005-08-18 2006-08-01 ラインエッジ粗さを低減させた特徴のエッチング
JP2013023716A Withdrawn JP2013110437A (ja) 2005-08-18 2013-02-08 ラインエッジ粗さを低減させた特徴のエッチング

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013023716A Withdrawn JP2013110437A (ja) 2005-08-18 2013-02-08 ラインエッジ粗さを低減させた特徴のエッチング

Country Status (6)

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US (2) US7273815B2 (enExample)
JP (2) JP5250418B2 (enExample)
KR (1) KR101257532B1 (enExample)
CN (2) CN101292197A (enExample)
TW (1) TWI432605B (enExample)
WO (1) WO2007021540A2 (enExample)

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CN107527797B (zh) * 2017-08-16 2022-04-05 江苏鲁汶仪器有限公司 一种改善光刻胶线条边缘粗糙度的方法
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