JP2008046632A5 - - Google Patents
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- Publication number
- JP2008046632A5 JP2008046632A5 JP2007207219A JP2007207219A JP2008046632A5 JP 2008046632 A5 JP2008046632 A5 JP 2008046632A5 JP 2007207219 A JP2007207219 A JP 2007207219A JP 2007207219 A JP2007207219 A JP 2007207219A JP 2008046632 A5 JP2008046632 A5 JP 2008046632A5
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- layer
- plasma assisted
- chemical process
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 38
- 238000004519 manufacturing process Methods 0.000 claims 25
- 238000001311 chemical methods and process Methods 0.000 claims 12
- 230000007704 transition Effects 0.000 claims 9
- 238000007254 oxidation reaction Methods 0.000 claims 8
- 230000003647 oxidation Effects 0.000 claims 7
- 238000000137 annealing Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 150000004767 nitrides Chemical class 0.000 claims 3
- 230000000737 periodic effect Effects 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 230000010287 polarization Effects 0.000 claims 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 230000007423 decrease Effects 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/500,321 | 2006-08-08 | ||
| US11/500,321 US7674573B2 (en) | 2006-08-08 | 2006-08-08 | Method for manufacturing layered periodic structures |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008046632A JP2008046632A (ja) | 2008-02-28 |
| JP2008046632A5 true JP2008046632A5 (enExample) | 2010-08-12 |
| JP5080900B2 JP5080900B2 (ja) | 2012-11-21 |
Family
ID=39051300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007207219A Expired - Fee Related JP5080900B2 (ja) | 2006-08-08 | 2007-08-08 | 偏光分離部材の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7674573B2 (enExample) |
| JP (1) | JP5080900B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7524073B2 (en) * | 2006-11-16 | 2009-04-28 | Canon Kabushiki Kaisha | Layered periodic structures with peripheral supports |
| JP5590828B2 (ja) * | 2008-07-28 | 2014-09-17 | キヤノン株式会社 | 光学素子の製造方法および光学素子 |
| CN103500763B (zh) * | 2013-10-15 | 2017-03-15 | 苏州晶湛半导体有限公司 | Ⅲ族氮化物半导体器件及其制造方法 |
| KR101581533B1 (ko) * | 2014-03-14 | 2015-12-31 | 한국기계연구원 | 광결정 및 광결정의 제어방법 |
| JP7213642B2 (ja) * | 2018-09-05 | 2023-01-27 | 東京エレクトロン株式会社 | レジスト膜の製造方法 |
| CN116040961B (zh) * | 2022-12-29 | 2024-03-12 | 中建材玻璃新材料研究院集团有限公司 | 一种减少观测角度影响的结构蓝色玻璃的制备方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3875026A (en) * | 1974-05-22 | 1975-04-01 | Rca Corp | Method for producing aluminum holographic masters |
| JPH1073722A (ja) * | 1996-08-30 | 1998-03-17 | Sony Corp | 偏光光学素子及びその製造方法 |
| US5998298A (en) * | 1998-04-28 | 1999-12-07 | Sandia Corporation | Use of chemical-mechanical polishing for fabricating photonic bandgap structures |
| US6611085B1 (en) * | 2001-08-27 | 2003-08-26 | Sandia Corporation | Photonically engineered incandescent emitter |
| US6968096B2 (en) * | 2003-07-18 | 2005-11-22 | Nippon Sheet Glass Co., Ltd. | Diffraction device using photonic crystal |
| JP4303084B2 (ja) * | 2003-10-23 | 2009-07-29 | 日立マクセル株式会社 | 偏光子、偏光子の製造方法、および投射型液晶表示装置 |
| US7405880B2 (en) * | 2004-02-12 | 2008-07-29 | Api Nanofabrication And Research Corporation | Multilayer optical filter |
| JP4642527B2 (ja) * | 2004-04-12 | 2011-03-02 | キヤノン株式会社 | 積層型3次元フォトニック結晶及び発光素子及び画像表示装置 |
| JP4541757B2 (ja) * | 2004-05-19 | 2010-09-08 | キヤノン株式会社 | 偏光素子 |
| JP4537115B2 (ja) * | 2004-05-07 | 2010-09-01 | キヤノン株式会社 | 偏光分離プリズム |
| JP2006133402A (ja) * | 2004-11-04 | 2006-05-25 | Canon Inc | 偏光分離素子及びそれを有する光学系 |
| JP2006163291A (ja) * | 2004-12-10 | 2006-06-22 | Canon Inc | 光学素子及びその製造方法 |
| US7314772B2 (en) * | 2005-03-14 | 2008-01-01 | Hewlett-Packard Development Company, L.P. | Photonic device |
-
2006
- 2006-08-08 US US11/500,321 patent/US7674573B2/en not_active Expired - Fee Related
-
2007
- 2007-08-08 JP JP2007207219A patent/JP5080900B2/ja not_active Expired - Fee Related
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