JP5080900B2 - 偏光分離部材の製造方法 - Google Patents

偏光分離部材の製造方法 Download PDF

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Publication number
JP5080900B2
JP5080900B2 JP2007207219A JP2007207219A JP5080900B2 JP 5080900 B2 JP5080900 B2 JP 5080900B2 JP 2007207219 A JP2007207219 A JP 2007207219A JP 2007207219 A JP2007207219 A JP 2007207219A JP 5080900 B2 JP5080900 B2 JP 5080900B2
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layer
exemplary embodiment
manufacturing
present
pattern
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JP2007207219A
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Japanese (ja)
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JP2008046632A5 (enExample
JP2008046632A (ja
Inventor
守 宮脇
カオ ジャン−ロン，
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3008—Polarising elements comprising dielectric particles, e.g. birefringent crystals embedded in a matrix

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Micromachines (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2007207219A 2006-08-08 2007-08-08 偏光分離部材の製造方法 Expired - Fee Related JP5080900B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/500,321 US7674573B2 (en) 2006-08-08 2006-08-08 Method for manufacturing layered periodic structures
US11/500,321 2006-08-08

Publications (3)

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JP2008046632A JP2008046632A (ja) 2008-02-28
JP2008046632A5 JP2008046632A5 (enExample) 2010-08-12
JP5080900B2 true JP5080900B2 (ja) 2012-11-21

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JP2007207219A Expired - Fee Related JP5080900B2 (ja) 2006-08-08 2007-08-08 偏光分離部材の製造方法

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US (1) US7674573B2 (enExample)
JP (1) JP5080900B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7524073B2 (en) * 2006-11-16 2009-04-28 Canon Kabushiki Kaisha Layered periodic structures with peripheral supports
JP5590828B2 (ja) * 2008-07-28 2014-09-17 キヤノン株式会社 光学素子の製造方法および光学素子
CN103500763B (zh) * 2013-10-15 2017-03-15 苏州晶湛半导体有限公司 Ⅲ族氮化物半导体器件及其制造方法
KR101581533B1 (ko) * 2014-03-14 2015-12-31 한국기계연구원 광결정 및 광결정의 제어방법
JP7213642B2 (ja) * 2018-09-05 2023-01-27 東京エレクトロン株式会社 レジスト膜の製造方法
CN116040961B (zh) * 2022-12-29 2024-03-12 中建材玻璃新材料研究院集团有限公司 一种减少观测角度影响的结构蓝色玻璃的制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3875026A (en) * 1974-05-22 1975-04-01 Rca Corp Method for producing aluminum holographic masters
JPH1073722A (ja) * 1996-08-30 1998-03-17 Sony Corp 偏光光学素子及びその製造方法
US5998298A (en) * 1998-04-28 1999-12-07 Sandia Corporation Use of chemical-mechanical polishing for fabricating photonic bandgap structures
US6611085B1 (en) * 2001-08-27 2003-08-26 Sandia Corporation Photonically engineered incandescent emitter
US6968096B2 (en) * 2003-07-18 2005-11-22 Nippon Sheet Glass Co., Ltd. Diffraction device using photonic crystal
JP4303084B2 (ja) * 2003-10-23 2009-07-29 日立マクセル株式会社 偏光子、偏光子の製造方法、および投射型液晶表示装置
US20050181128A1 (en) * 2004-02-12 2005-08-18 Nikolov Anguel N. Films for optical use and methods of making such films
JP4642527B2 (ja) * 2004-04-12 2011-03-02 キヤノン株式会社 積層型３次元フォトニック結晶及び発光素子及び画像表示装置
JP4537115B2 (ja) * 2004-05-07 2010-09-01 キヤノン株式会社 偏光分離プリズム
JP4541757B2 (ja) * 2004-05-19 2010-09-08 キヤノン株式会社 偏光素子
JP2006133402A (ja) * 2004-11-04 2006-05-25 Canon Inc 偏光分離素子及びそれを有する光学系
JP2006163291A (ja) * 2004-12-10 2006-06-22 Canon Inc 光学素子及びその製造方法
US7314772B2 (en) * 2005-03-14 2008-01-01 Hewlett-Packard Development Company, L.P. Photonic device

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Publication number Publication date
US7674573B2 (en) 2010-03-09
US20080038852A1 (en) 2008-02-14
JP2008046632A (ja) 2008-02-28

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