JP2009224580A5 - - Google Patents
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- JP2009224580A5 JP2009224580A5 JP2008067806A JP2008067806A JP2009224580A5 JP 2009224580 A5 JP2009224580 A5 JP 2009224580A5 JP 2008067806 A JP2008067806 A JP 2008067806A JP 2008067806 A JP2008067806 A JP 2008067806A JP 2009224580 A5 JP2009224580 A5 JP 2009224580A5
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- cleaning
- processing
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Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008067806A JP5220447B2 (ja) | 2008-03-17 | 2008-03-17 | 基板処理システムの洗浄方法、記憶媒体及び基板処理システム |
| KR1020090018091A KR101227235B1 (ko) | 2008-03-17 | 2009-03-03 | 기판 처리 시스템의 세정 방법, 기억 매체 및 기판 처리 시스템 |
| US12/398,587 US8382910B2 (en) | 2008-03-17 | 2009-03-05 | Cleaning method for substrate processing system, storage medium, and substrate processing system |
| TW098108460A TWI464792B (zh) | 2008-03-17 | 2009-03-16 | Substrate processing system cleaning method, memory media and substrate processing system |
| CN2009101284480A CN101540274B (zh) | 2008-03-17 | 2009-03-17 | 基板处理系统的洗净方法和基板处理系统 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008067806A JP5220447B2 (ja) | 2008-03-17 | 2008-03-17 | 基板処理システムの洗浄方法、記憶媒体及び基板処理システム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009224580A JP2009224580A (ja) | 2009-10-01 |
| JP2009224580A5 true JP2009224580A5 (enExample) | 2011-04-28 |
| JP5220447B2 JP5220447B2 (ja) | 2013-06-26 |
Family
ID=41061644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008067806A Active JP5220447B2 (ja) | 2008-03-17 | 2008-03-17 | 基板処理システムの洗浄方法、記憶媒体及び基板処理システム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8382910B2 (enExample) |
| JP (1) | JP5220447B2 (enExample) |
| KR (1) | KR101227235B1 (enExample) |
| CN (1) | CN101540274B (enExample) |
| TW (1) | TWI464792B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101097912B1 (ko) * | 2006-01-27 | 2011-12-23 | 가부시키가이샤 히다치 고쿠사이 덴키 | 기판 처리 장치 |
| JP5947030B2 (ja) | 2010-12-28 | 2016-07-06 | キヤノンアネルバ株式会社 | 基板処理方法、基板処理装置 |
| CN103215572B (zh) * | 2012-01-19 | 2016-12-14 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 半导体设备工艺控制方法和半导体设备工艺控制装置 |
| JP5954108B2 (ja) * | 2012-10-23 | 2016-07-20 | 東京エレクトロン株式会社 | 基板処理装置 |
| JP2016103496A (ja) * | 2014-11-27 | 2016-06-02 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP6956147B2 (ja) * | 2019-07-23 | 2021-10-27 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 半導体装置の製造方法、基板処理装置およびプログラム |
| CN111118458B (zh) * | 2019-12-04 | 2022-03-22 | 北京北方华创微电子装备有限公司 | 腔室清洁方法及装置 |
| JP7013618B2 (ja) | 2020-02-03 | 2022-01-31 | 株式会社日立ハイテク | プラズマ処理装置およびプラズマ処理方法 |
| US20240209500A1 (en) * | 2021-05-06 | 2024-06-27 | Applied Materials, Inc. | Processing system and methods for forming void-free and seam-free tungsten features |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3350264B2 (ja) * | 1994-12-22 | 2002-11-25 | 松下電器産業株式会社 | プラズマクリーニング方法 |
| JPH09298152A (ja) * | 1996-05-07 | 1997-11-18 | Nikon Corp | 加工方法 |
| JPH10135094A (ja) * | 1996-10-28 | 1998-05-22 | Canon Sales Co Inc | 半導体製造装置 |
| JPH10199817A (ja) * | 1997-01-10 | 1998-07-31 | Kokusai Electric Co Ltd | 成膜装置 |
| JPH10270396A (ja) | 1997-03-26 | 1998-10-09 | Super Silicon Kenkyusho:Kk | ウエハ表面洗浄方法およびウエハの総合研磨洗浄装置 |
| US6168672B1 (en) * | 1998-03-06 | 2001-01-02 | Applied Materials Inc. | Method and apparatus for automatically performing cleaning processes in a semiconductor wafer processing system |
| JP2002299315A (ja) * | 2001-03-29 | 2002-10-11 | Toshiba Corp | 半導体装置の製造方法 |
| JP4017463B2 (ja) * | 2002-07-11 | 2007-12-05 | 株式会社荏原製作所 | 洗浄方法 |
| JP2006319041A (ja) * | 2005-05-11 | 2006-11-24 | Tokyo Electron Ltd | プラズマクリーニング方法、成膜方法 |
| JP4822048B2 (ja) * | 2005-12-08 | 2011-11-24 | 富士通セミコンダクター株式会社 | 半導体製造装置のプリメンテナンス方法 |
| JP4963842B2 (ja) * | 2006-02-13 | 2012-06-27 | 東京エレクトロン株式会社 | 基板処理室の洗浄方法、記憶媒体及び基板処理装置 |
| US20070215180A1 (en) * | 2006-03-15 | 2007-09-20 | Tokyo Electron Limited | Cleaning method of substrate processing equipment, substrate processing equipment, and recording medium for recording program thereof |
| JP4671355B2 (ja) * | 2006-03-15 | 2011-04-13 | 東京エレクトロン株式会社 | 基板処理装置のクリーニング方法，基板処理装置，プログラムを記録した記録媒体 |
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2008
- 2008-03-17 JP JP2008067806A patent/JP5220447B2/ja active Active
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2009
- 2009-03-03 KR KR1020090018091A patent/KR101227235B1/ko not_active Expired - Fee Related
- 2009-03-05 US US12/398,587 patent/US8382910B2/en active Active
- 2009-03-16 TW TW098108460A patent/TWI464792B/zh active
- 2009-03-17 CN CN2009101284480A patent/CN101540274B/zh active Active