JP2009152577A5 - - Google Patents

Download PDF

Info

Publication number
JP2009152577A5
JP2009152577A5 JP2008301981A JP2008301981A JP2009152577A5 JP 2009152577 A5 JP2009152577 A5 JP 2009152577A5 JP 2008301981 A JP2008301981 A JP 2008301981A JP 2008301981 A JP2008301981 A JP 2008301981A JP 2009152577 A5 JP2009152577 A5 JP 2009152577A5
Authority
JP
Japan
Prior art keywords
semiconductor layer
layer
oxide
photoelectric conversion
conversion device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008301981A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009152577A (ja
JP5577030B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008301981A priority Critical patent/JP5577030B2/ja
Priority claimed from JP2008301981A external-priority patent/JP5577030B2/ja
Publication of JP2009152577A publication Critical patent/JP2009152577A/ja
Publication of JP2009152577A5 publication Critical patent/JP2009152577A5/ja
Application granted granted Critical
Publication of JP5577030B2 publication Critical patent/JP5577030B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008301981A 2007-11-29 2008-11-27 光電変換装置及びその製造方法 Expired - Fee Related JP5577030B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008301981A JP5577030B2 (ja) 2007-11-29 2008-11-27 光電変換装置及びその製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007308488 2007-11-29
JP2007308488 2007-11-29
JP2008301981A JP5577030B2 (ja) 2007-11-29 2008-11-27 光電変換装置及びその製造方法

Publications (3)

Publication Number Publication Date
JP2009152577A JP2009152577A (ja) 2009-07-09
JP2009152577A5 true JP2009152577A5 (enExample) 2012-01-26
JP5577030B2 JP5577030B2 (ja) 2014-08-20

Family

ID=40674508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008301981A Expired - Fee Related JP5577030B2 (ja) 2007-11-29 2008-11-27 光電変換装置及びその製造方法

Country Status (2)

Country Link
US (1) US20090139558A1 (enExample)
JP (1) JP5577030B2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2075850A3 (en) * 2007-12-28 2011-08-24 Semiconductor Energy Laboratory Co, Ltd. Photoelectric conversion device and manufacturing method thereof
US8017429B2 (en) * 2008-02-19 2011-09-13 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing photoelectric conversion device
US20120138134A1 (en) * 2009-08-26 2012-06-07 Makoto Higashikawa Stack-type photovoltaic element and method of manufacturing stack-type photovoltaic element
US8704083B2 (en) * 2010-02-11 2014-04-22 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and fabrication method thereof
JP5247748B2 (ja) * 2010-03-17 2013-07-24 三菱電機株式会社 光電変換装置、及び光電変換装置の製造方法
US8975509B2 (en) 2010-06-07 2015-03-10 The Governing Council Of The University Of Toronto Photovoltaic devices with multiple junctions separated by a graded recombination layer
JP5753445B2 (ja) 2010-06-18 2015-07-22 株式会社半導体エネルギー研究所 光電変換装置
US20120024357A1 (en) * 2010-08-02 2012-02-02 Yao-Tung Chen Laminated solar-cell module
TWI436490B (zh) * 2010-09-03 2014-05-01 Univ Tatung 光伏電池結構
JP5421218B2 (ja) * 2010-10-26 2014-02-19 出光興産株式会社 光電変換装置、及び光電変換装置の製造方法
KR20120095790A (ko) * 2011-02-21 2012-08-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 광전 변환 장치
US20120211065A1 (en) * 2011-02-21 2012-08-23 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device
US9159939B2 (en) 2011-07-21 2015-10-13 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device
JP2013058562A (ja) 2011-09-07 2013-03-28 Semiconductor Energy Lab Co Ltd 光電変換装置
US9112086B2 (en) 2011-11-10 2015-08-18 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device
JP6108858B2 (ja) 2012-02-17 2017-04-05 株式会社半導体エネルギー研究所 p型半導体材料および半導体装置
JP5769668B2 (ja) * 2012-06-12 2015-08-26 三菱電機株式会社 太陽電池の製造方法および太陽電池製造装置
KR102083249B1 (ko) * 2012-07-19 2020-03-02 히타치가세이가부시끼가이샤 패시베이션층 형성용 조성물, 패시베이션층이 형성된 반도체 기판, 패시베이션층이 형성된 반도체 기판의 제조 방법, 태양 전지 소자, 태양 전지 소자의 제조 방법 및 태양 전지
JP6139731B2 (ja) * 2016-03-23 2017-05-31 株式会社半導体エネルギー研究所 光電変換装置の作製方法
KR102690582B1 (ko) * 2023-05-31 2024-07-30 세종대학교산학협력단 텐덤 태양전지

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US591743A (en) * 1897-10-12 Adjustable wrench
JPS58180069A (ja) * 1982-04-15 1983-10-21 Agency Of Ind Science & Technol 半導体装置
US4496788A (en) * 1982-12-29 1985-01-29 Osaka Transformer Co., Ltd. Photovoltaic device
US4510344A (en) * 1983-12-19 1985-04-09 Atlantic Richfield Company Thin film solar cell substrate
CA1303194C (en) * 1987-07-21 1992-06-09 Katsumi Nakagawa Photovoltaic element with a semiconductor layer comprising non-single crystal material containing at least zn, se and h in an amount of 1 to40 atomic %
EP0317350B1 (en) * 1987-11-20 1995-06-21 Canon Kabushiki Kaisha A pin function photovoltaic element, tandem und triple cells
JP2829653B2 (ja) * 1989-01-21 1998-11-25 キヤノン株式会社 光起電力素子
US5002617A (en) * 1989-01-21 1991-03-26 Canon Kabushiki Kaisha Pin heterojunction photovoltaic elements with polycrystal AlAs(H,F) semiconductor film
JPH02192771A (ja) * 1989-01-21 1990-07-30 Canon Inc 光起電力素子
US5002618A (en) * 1989-01-21 1991-03-26 Canon Kabushiki Kaisha Pin heterojunction photovoltaic elements with polycrystal BAs(H,F) semiconductor film
FR2681472B1 (fr) * 1991-09-18 1993-10-29 Commissariat Energie Atomique Procede de fabrication de films minces de materiau semiconducteur.
JP3073327B2 (ja) * 1992-06-30 2000-08-07 キヤノン株式会社 堆積膜形成方法
JP2761156B2 (ja) * 1992-06-30 1998-06-04 キヤノン株式会社 光起電力素子及びその製造方法、並びにそれを用いた発電装置
JP2701709B2 (ja) * 1993-02-16 1998-01-21 株式会社デンソー 2つの材料の直接接合方法及び材料直接接合装置
JP3360919B2 (ja) * 1993-06-11 2003-01-07 三菱電機株式会社 薄膜太陽電池の製造方法,及び薄膜太陽電池
JP3571785B2 (ja) * 1993-12-28 2004-09-29 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
JP2984537B2 (ja) * 1994-03-25 1999-11-29 キヤノン株式会社 光起電力素子
US5635408A (en) * 1994-04-28 1997-06-03 Canon Kabushiki Kaisha Method of producing a semiconductor device
US6906383B1 (en) * 1994-07-14 2005-06-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacture thereof
US5780160A (en) * 1994-10-26 1998-07-14 Donnelly Corporation Electrochromic devices with improved processability and methods of preparing the same
US5736431A (en) * 1995-02-28 1998-04-07 Semiconductor Energy Laboratory Co., Ltd. Method for producing thin film solar battery
JPH08255762A (ja) * 1995-03-17 1996-10-01 Nec Corp 半導体デバイスの製造方法
TW448584B (en) * 1995-03-27 2001-08-01 Semiconductor Energy Lab Semiconductor device and a method of manufacturing the same
US7075002B1 (en) * 1995-03-27 2006-07-11 Semiconductor Energy Laboratory Company, Ltd. Thin-film photoelectric conversion device and a method of manufacturing the same
JPH09255487A (ja) * 1996-03-18 1997-09-30 Sony Corp 薄膜半導体の製造方法
JPH1093122A (ja) * 1996-09-10 1998-04-10 Nippon Telegr & Teleph Corp <Ntt> 薄膜太陽電池の製造方法
US6756289B1 (en) * 1996-12-27 2004-06-29 Canon Kabushiki Kaisha Method of producing semiconductor member and method of producing solar cell
EP0851513B1 (en) * 1996-12-27 2007-11-21 Canon Kabushiki Kaisha Method of producing semiconductor member and method of producing solar cell
JPH10335683A (ja) * 1997-05-28 1998-12-18 Ion Kogaku Kenkyusho:Kk タンデム型太陽電池およびその製造方法
JP3116085B2 (ja) * 1997-09-16 2000-12-11 東京農工大学長 半導体素子形成法
JPH11288858A (ja) * 1998-01-30 1999-10-19 Canon Inc Soi基板の再生方法及び再生基板
SG71903A1 (en) * 1998-01-30 2000-04-18 Canon Kk Process of reclamation of soi substrate and reproduced substrate
JP4208281B2 (ja) * 1998-02-26 2009-01-14 キヤノン株式会社 積層型光起電力素子
US6077722A (en) * 1998-07-14 2000-06-20 Bp Solarex Producing thin film photovoltaic modules with high integrity interconnects and dual layer contacts
JP2000150837A (ja) * 1998-11-13 2000-05-30 Canon Inc 半導体基体の作製方法
JP2000150940A (ja) * 1998-11-18 2000-05-30 Denso Corp 半導体微粒子集合体及びその製造方法
KR100319681B1 (ko) * 1998-12-02 2002-01-09 가네꼬 히사시 전계 효과 트랜지스터 및 그 제조 방법
JP3381690B2 (ja) * 1998-12-02 2003-03-04 日本電気株式会社 電界効果トランジスタおよびその製造方法
EP1039513A3 (en) * 1999-03-26 2008-11-26 Canon Kabushiki Kaisha Method of producing a SOI wafer
JP2001160540A (ja) * 1999-09-22 2001-06-12 Canon Inc 半導体装置の製造方法、液相成長法及び液相成長装置、太陽電池
JP3513592B2 (ja) * 2000-09-25 2004-03-31 独立行政法人産業技術総合研究所 太陽電池の製造方法
JP2002222972A (ja) * 2001-01-29 2002-08-09 Sharp Corp 積層型太陽電池
US6818529B2 (en) * 2002-09-12 2004-11-16 Applied Materials, Inc. Apparatus and method for forming a silicon film across the surface of a glass substrate
JP2004296650A (ja) * 2003-03-26 2004-10-21 Canon Inc 積層型光起電力素子
JP2005050905A (ja) * 2003-07-30 2005-02-24 Sharp Corp シリコン薄膜太陽電池の製造方法
JPWO2005096397A1 (ja) * 2004-03-31 2008-02-21 ローム株式会社 積層型薄膜太陽電池およびその製法
US7781673B2 (en) * 2005-07-14 2010-08-24 Konarka Technologies, Inc. Polymers with low band gaps and high charge mobility
US20070267055A1 (en) * 2005-07-14 2007-11-22 Konarka Technologies, Inc. Tandem Photovoltaic Cells
US20080006324A1 (en) * 2005-07-14 2008-01-10 Konarka Technologies, Inc. Tandem Photovoltaic Cells
US8158881B2 (en) * 2005-07-14 2012-04-17 Konarka Technologies, Inc. Tandem photovoltaic cells
US7772485B2 (en) * 2005-07-14 2010-08-10 Konarka Technologies, Inc. Polymers with low band gaps and high charge mobility
US20070131270A1 (en) * 2005-07-14 2007-06-14 Russell Gaudiana Window with photovoltaic cell
US20070181179A1 (en) * 2005-12-21 2007-08-09 Konarka Technologies, Inc. Tandem photovoltaic cells
WO2007014320A2 (en) * 2005-07-27 2007-02-01 Silicon Genesis Corporation Method and structure for fabricating multiple tile regions onto a plate using a controlled cleaving process
US7674687B2 (en) * 2005-07-27 2010-03-09 Silicon Genesis Corporation Method and structure for fabricating multiple tiled regions onto a plate using a controlled cleaving process
US20070193621A1 (en) * 2005-12-21 2007-08-23 Konarka Technologies, Inc. Photovoltaic cells
JP5064693B2 (ja) * 2006-02-13 2012-10-31 信越化学工業株式会社 Soi基板の製造方法
JP5324425B2 (ja) * 2006-04-11 2013-10-23 メルク パテント ゲーエムベーハー タンデム型光電池
US8153513B2 (en) * 2006-07-25 2012-04-10 Silicon Genesis Corporation Method and system for continuous large-area scanning implantation process
US8008421B2 (en) * 2006-10-11 2011-08-30 Konarka Technologies, Inc. Photovoltaic cell with silole-containing polymer
US8008424B2 (en) * 2006-10-11 2011-08-30 Konarka Technologies, Inc. Photovoltaic cell with thiazole-containing polymer
JP4985929B2 (ja) * 2006-10-31 2012-07-25 スタンレー電気株式会社 有機薄膜素子およびタンデム型光電変換素子
EP2135295A4 (en) * 2007-04-06 2014-05-21 Semiconductor Energy Lab Photovoltaic module and method for its production
EP2143146A1 (en) * 2007-04-13 2010-01-13 Semiconductor Energy Laboratory Co, Ltd. Photovoltaic device and method for manufacturing the same
CN101842910B (zh) * 2007-11-01 2013-03-27 株式会社半导体能源研究所 用于制造光电转换器件的方法
WO2009060808A1 (en) * 2007-11-09 2009-05-14 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and method for manufacturing the same
JP5315008B2 (ja) * 2007-11-16 2013-10-16 株式会社半導体エネルギー研究所 光電変換装置

Similar Documents

Publication Publication Date Title
JP2009152577A5 (enExample)
JP2009177158A5 (enExample)
TWI464890B (zh) 光電轉換裝置和其製造方法
TWI376814B (enExample)
US10186674B2 (en) Thin-film device having barrier film and manufacturing method thereof
JP2010034539A5 (ja) 光電変換装置モジュールの作製方法
JP2010153823A5 (enExample)
EP2065943A3 (en) Method of manufacturing photoelectric conversion device
MX2010009367A (es) Célula solar que tiene homounión p-n de silicio cristalino y heterouniones de silio amorfo para pasivación de superficie.
WO2011078521A3 (ko) 후면전계형 이종접합 태양전지 및 그 제조방법
WO2010141814A3 (en) Passivation process for solar cell fabrication
WO2011109146A3 (en) Semiconductor-metal-on-insulator structures, methods of forming such structures, and semiconductor devices including such structures
CN105374829B (zh) 一种柔性显示基板及其制备方法
WO2011063228A3 (en) Betavoltaic apparatus and method
JP2012191187A5 (enExample)
WO2011025631A3 (en) Semiconductor crystal based radiation detector and method of producing the same
JP4439477B2 (ja) 光起電力素子及びその製造方法
Liu et al. Two-in-one method for graphene transfer: simplified fabrication process for organic light-emitting diodes
TW201019395A (en) Method of fabricating thin film device
TW201528481A (zh) 電子裝置之製造方法
KR20130042922A (ko) 플렉서블 표시장치의 제조방법
TW201543698A (zh) 薄膜太陽電池之製造方法及薄膜太陽電池
TWI373849B (en) Stacked-layered thin film solar cell and manufacturing method thereof
TW201019494A (en) Photoelectric conversion device manufacturing method and photoelectric conversion device
KR20090120937A (ko) 3차원 반도체 장치의 제조 방법