JP2008547039A - 高開口かつ平面的な端面を有する投影対物レンズ - Google Patents

高開口かつ平面的な端面を有する投影対物レンズ Download PDF

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Publication number
JP2008547039A
JP2008547039A JP2008516160A JP2008516160A JP2008547039A JP 2008547039 A JP2008547039 A JP 2008547039A JP 2008516160 A JP2008516160 A JP 2008516160A JP 2008516160 A JP2008516160 A JP 2008516160A JP 2008547039 A JP2008547039 A JP 2008547039A
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Prior art keywords
lens
projection objective
aspheric
refractive index
image
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JP2008516160A
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Japanese (ja)
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JP2008547039A5 (enExample
Inventor
ベーデル スザンネ
ズィンガー ヴォルフガング
シュースター カール・ハインツ
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カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2008547039A5 publication Critical patent/JP2008547039A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Lenses (AREA)
JP2008516160A 2005-06-14 2006-05-26 高開口かつ平面的な端面を有する投影対物レンズ Pending JP2008547039A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/151,465 US7466489B2 (en) 2003-12-15 2005-06-14 Projection objective having a high aperture and a planar end surface
PCT/EP2006/005079 WO2006133801A1 (en) 2005-06-14 2006-05-26 Projection objective having a high aperture and a planar end surface

Publications (2)

Publication Number Publication Date
JP2008547039A true JP2008547039A (ja) 2008-12-25
JP2008547039A5 JP2008547039A5 (enExample) 2009-07-16

Family

ID=36950067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008516160A Pending JP2008547039A (ja) 2005-06-14 2006-05-26 高開口かつ平面的な端面を有する投影対物レンズ

Country Status (5)

Country Link
US (2) US7466489B2 (enExample)
EP (1) EP1891481A1 (enExample)
JP (1) JP2008547039A (enExample)
CN (1) CN101243360B (enExample)
WO (1) WO2006133801A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020016679A (ja) * 2018-07-23 2020-01-30 株式会社ニコン 光学系、光学機器、光学系の製造方法

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7385764B2 (en) 2003-12-15 2008-06-10 Carl Zeiss Smt Ag Objectives as a microlithography projection objective with at least one liquid lens
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101150037B1 (ko) * 2004-01-14 2012-07-02 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
CN101727021A (zh) * 2004-02-13 2010-06-09 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
CN100592210C (zh) * 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
US20060244938A1 (en) * 2004-05-04 2006-11-02 Karl-Heinz Schuster Microlitographic projection exposure apparatus and immersion liquid therefore
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7209213B2 (en) * 2004-10-07 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1803036A2 (en) * 2004-10-22 2007-07-04 Carl Zeiss SMT AG Projection exposure apparatus for microlithography
WO2006053751A2 (de) * 2004-11-18 2006-05-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
EP1820050A1 (en) * 2004-12-09 2007-08-22 Carl Zeiss SMT AG Transmitting optical element and objective for a microlithographic projection exposure apparatus
US20060198029A1 (en) * 2005-03-01 2006-09-07 Karl-Heinz Schuster Microlithography projection objective and projection exposure apparatus
US20080186466A1 (en) * 2005-04-12 2008-08-07 Sirat Gabriel Y Element for defocusing tm mode for lithography
DE102006013560A1 (de) * 2005-04-19 2006-10-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung
JP2006309220A (ja) * 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
JP4591379B2 (ja) * 2005-05-12 2010-12-01 ソニー株式会社 光記録媒体及び光記録再生方法
WO2007017089A1 (en) * 2005-07-25 2007-02-15 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus
EP1913445B1 (de) * 2005-08-10 2011-05-25 Carl Zeiss SMT GmbH Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
US7535644B2 (en) * 2005-08-12 2009-05-19 Asml Netherlands B.V. Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7666226B2 (en) * 2005-08-16 2010-02-23 Benvenue Medical, Inc. Spinal tissue distraction devices
WO2007020004A1 (de) * 2005-08-17 2007-02-22 Carl Zeiss Smt Ag Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs
WO2007025643A1 (en) * 2005-08-30 2007-03-08 Carl Zeiss Smt Ag High-na projection objective with aspheric lens surfaces
JP2007080953A (ja) * 2005-09-12 2007-03-29 Hitachi Via Mechanics Ltd 照明装置及び露光装置
EP1980890B1 (en) * 2006-01-30 2011-09-28 Nikon Corporation Cata-dioptric imaging system, exposure device, and device manufacturing method
US7764427B2 (en) 2006-02-21 2010-07-27 Carl Zeiss Smt Ag Microlithography optical system
DE102006011098A1 (de) * 2006-03-08 2007-09-27 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
EP1852745A1 (en) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
US7393699B2 (en) 2006-06-12 2008-07-01 Tran Bao Q NANO-electronics
DE102006027958A1 (de) * 2006-06-14 2007-12-20 Schott Ag Optokeramiken, daraus hergestellte optische Elemente sowie Abbildungsoptiken
DE102006027957A1 (de) * 2006-06-14 2007-12-20 Schott Ag Optische Elemente sowie Abbildungsoptiken
EP1927877A1 (de) * 2006-08-10 2008-06-04 MEKRA Lang GmbH & Co. KG Weitwinkelobjektiv und Weitwinkelkamera
US7557997B2 (en) * 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
DE102008001800A1 (de) 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
US20090091728A1 (en) * 2007-09-28 2009-04-09 Carl Zeiss Smt Ag Compact High Aperture Folded Catadioptric Projection Objective
US20090086338A1 (en) * 2007-09-28 2009-04-02 Carl Zeiss Smt Ag High Aperture Folded Catadioptric Projection Objective
DE102008054682A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Linse, insbesondere für ein Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
FR2927708A1 (fr) * 2008-02-19 2009-08-21 Commissariat Energie Atomique Procede de photolithographie ultraviolette a immersion
EP2136231A1 (en) 2008-06-17 2009-12-23 Carl Zeiss SMT AG High aperture catadioptric system
DE102009011329A1 (de) 2009-03-05 2010-09-09 Carl Zeiss Smt Ag Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
US8649094B2 (en) * 2010-05-21 2014-02-11 Eastman Kodak Company Low thermal stress birefringence imaging lens
CN102279459B (zh) * 2010-06-09 2014-06-18 上海微电子装备有限公司 一种投影物镜
DE102012206153A1 (de) 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102013203628B4 (de) * 2013-03-04 2020-06-10 Leica Microsystems Cms Gmbh Immersionsobjektiv für Mikroskope und seine Verwendung
CN103278912B (zh) * 2013-06-19 2015-07-08 中国科学院光电技术研究所 一种折反式紫外光刻物镜
DE102013112212B4 (de) * 2013-11-06 2022-03-10 Carl Zeiss Smt Gmbh Optische Zoomeinrichtung, optische Abbildungseinrichtung, optisches Zoomverfahren und Abbildungsverfahren für die Mikroskopie
US10606049B2 (en) * 2015-11-06 2020-03-31 Zhejiang Crystal-Optech.Co., Ltd. Ultra-short distance projection lens with refractive meridional image surface and refractive sagittal image surface being isolated
US10656098B2 (en) 2016-02-03 2020-05-19 Kla-Tencor Corporation Wafer defect inspection and review systems
EP3411694A4 (en) * 2016-02-03 2019-09-04 Kla-Tencor Corporation WAFER DEFECT INSPECTION AND TESTING SYSTEMS
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
CN110058387B (zh) * 2019-04-01 2021-04-23 广景视睿科技（深圳）有限公司 一种双远心投影镜头及投影系统
DE102024204450A1 (de) 2024-05-14 2025-11-20 Carl Zeiss Smt Gmbh Optisches Element, optisches System und Verfahren zum Herstellen eines optischen Elements

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05196875A (ja) * 1991-09-12 1993-08-06 Olympus Optical Co Ltd 近紫外対物レンズ
JPH10161021A (ja) * 1996-10-01 1998-06-19 Nikon Corp 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
JP2001015431A (ja) * 1999-06-26 2001-01-19 Carl Zeiss Stiftung Trading As Carl Zeiss 対物レンズ、特に、半導体リソグラフィー投影露光装置の対物レンズ、およびその製造方法
WO2004114380A1 (ja) * 2003-06-19 2004-12-29 Nikon Corporation 露光装置及びデバイス製造方法
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Family Cites Families (168)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US599310A (en) * 1898-02-22 Henry robert angel
US2380887A (en) 1941-05-22 1945-07-31 Taylor Taylor & Hobson Ltd Optical system
NL269391A (enExample) 1961-09-19
JPS6019484B2 (ja) 1975-11-07 1985-05-16 キヤノン株式会社 複写用レンズ
US4293186A (en) 1977-02-11 1981-10-06 The Perkin-Elmer Corporation Restricted off-axis field optical system
CH624776A5 (enExample) 1977-12-08 1981-08-14 Kern & Co Ag
US4241390A (en) 1978-02-06 1980-12-23 The Perkin-Elmer Corporation System for illuminating an annular field
CH651943A5 (de) 1980-08-16 1985-10-15 Ludvik Dr Canzek Katadioptrisches objektiv hoher oeffnung.
JPS5744115A (en) 1980-08-30 1982-03-12 Asahi Optical Co Ltd Reflex telephoto zoom lens system
US4346164A (en) 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
GB2146454B (en) 1981-05-15 1986-04-16 Gen Signal Corp Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4469414A (en) 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
JPS60184223A (ja) 1984-03-01 1985-09-19 Nippon Kogaku Kk <Nikon> 反射屈折式望遠レンズ
US4812028A (en) 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
US4834515A (en) 1984-11-29 1989-05-30 Lockheed Missiles & Space Company, Inc. Catadioptric imaging system with dioptric assembly of the petzval type
US4779966A (en) 1984-12-21 1988-10-25 The Perkin-Elmer Corporation Single mirror projection optical system
JPS61156737A (ja) 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US4711535A (en) 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
US4861148A (en) 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
US4757354A (en) 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
EP0252734B1 (en) 1986-07-11 2000-05-03 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
GB2197962A (en) 1986-11-10 1988-06-02 Compact Spindle Bearing Corp Catoptric reduction imaging apparatus
US4951078A (en) 1988-05-16 1990-08-21 Minolta Camera Kabushiki Kaisha Camera system including catadioptric lens and catadioptric lens system used therein
US5004331A (en) 1989-05-03 1991-04-02 Hughes Aircraft Company Catadioptric projector, catadioptric projection system and process
US5063586A (en) 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5114238A (en) 1990-06-28 1992-05-19 Lockheed Missiles & Space Company, Inc. Infrared catadioptric zoom relay telescope
US5031976A (en) 1990-09-24 1991-07-16 Kla Instruments, Corporation Catadioptric imaging system
GB9020902D0 (en) 1990-09-26 1990-11-07 Optics & Vision Ltd Optical systems,telescopes and binoculars
US5315629A (en) 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5734496A (en) 1991-06-03 1998-03-31 Her Majesty The Queen In Right Of New Zealand Lens system
US5121256A (en) 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
US5212588A (en) 1991-04-09 1993-05-18 The United States Of America As Represented By The United States Department Of Energy Reflective optical imaging system for extreme ultraviolet wavelengths
JP3203719B2 (ja) 1991-12-26 2001-08-27 株式会社ニコン 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
US5353322A (en) 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5220590A (en) 1992-05-05 1993-06-15 General Signal Corporation X-ray projection lithography camera
JP3246615B2 (ja) 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
JPH06188169A (ja) 1992-08-24 1994-07-08 Canon Inc 結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法
AU4953993A (en) 1992-08-28 1994-03-29 Optics & Vision Limited Optical system especially for binoculars and other viewing instruments
US5477304A (en) 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
US6078381A (en) 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
US5636066A (en) 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
JP3635684B2 (ja) 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
US5410434A (en) 1993-09-09 1995-04-25 Ultratech Stepper, Inc. Reflective projection system comprising four spherical mirrors
US5515207A (en) 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
US5488229A (en) 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
JPH08166542A (ja) 1994-10-13 1996-06-25 Nisshin Koki Kk 反射屈折式光学系及びこれを用いた光学装置
IL113350A (en) 1995-04-12 1998-06-15 State Rafaelel Ministry Of Def Catadioptric optics working staring detector system
JP3711586B2 (ja) 1995-06-02 2005-11-02 株式会社ニコン 走査露光装置
US6512631B2 (en) 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US5650877A (en) 1995-08-14 1997-07-22 Tropel Corporation Imaging system for deep ultraviolet lithography
US5805365A (en) 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera
JP3456323B2 (ja) 1995-11-01 2003-10-14 株式会社ニコン 顕微鏡対物レンズ
JPH09148241A (ja) 1995-11-27 1997-06-06 Canon Inc 走査露光装置及びそれを用いたデバイスの製造方法
US5815310A (en) 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
JPH09251097A (ja) 1996-03-15 1997-09-22 Nikon Corp Ｘ線リソグラフィー用反射縮小結像光学系
US5686728A (en) 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements
US5729376A (en) 1996-07-01 1998-03-17 The United States Of America As Represented By The Secretary Of The Army Catadioptric multi-functional optical assembly
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
DE19633128A1 (de) 1996-08-16 1998-02-19 Zeiss Carl Fa Achromatisches Linsensystem für Ultraviolettstrahlen mit Germaniumdioxid-Glas
US6169627B1 (en) 1996-09-26 2001-01-02 Carl-Zeiss-Stiftung Catadioptric microlithographic reduction objective
US6631036B2 (en) 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
JP4029182B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 露光方法
JP4029183B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 投影露光装置及び投影露光方法
CN1244018C (zh) 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
US7130129B2 (en) * 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
DE69717975T2 (de) 1996-12-24 2003-05-28 Asml Netherlands B.V., Veldhoven In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
JPH10284408A (ja) 1997-04-08 1998-10-23 Nikon Corp 露光方法
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
US5956192A (en) 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
US6199991B1 (en) 1997-11-13 2001-03-13 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US5920380A (en) 1997-12-19 1999-07-06 Sandia Corporation Apparatus and method for generating partially coherent illumination for photolithography
US6014252A (en) 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
KR100577476B1 (ko) 1998-03-06 2006-05-10 가부시키가이샤 니콘 노광 장치 및 이 장치를 이용한 반도체 장치의 제조 방법
US6097537A (en) 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
JPH11316343A (ja) 1998-05-01 1999-11-16 Nikon Corp カタディオプトリックレンズ
US6859328B2 (en) * 1998-05-05 2005-02-22 Carl Zeiss Semiconductor Illumination system particularly for microlithography
US6396067B1 (en) 1998-05-06 2002-05-28 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
DE19923609A1 (de) 1998-05-30 1999-12-02 Zeiss Carl Fa Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie
EP1293832A1 (en) 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
EP0989434B1 (en) 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
US6213610B1 (en) 1998-09-21 2001-04-10 Nikon Corporation Catoptric reduction projection optical system and exposure apparatus and method using same
JP2000100694A (ja) 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
US6220713B1 (en) * 1998-10-23 2001-04-24 Compaq Computer Corporation Projection lens and system
JP4345232B2 (ja) 1998-12-25 2009-10-14 株式会社ニコン 反射屈折結像光学系および該光学系を備えた投影露光装置
EP1035445B1 (de) 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US6188513B1 (en) 1999-03-15 2001-02-13 Russell Hudyma High numerical aperture ring field projection system for extreme ultraviolet lithography
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
US6426506B1 (en) 1999-05-27 2002-07-30 The Regents Of The University Of California Compact multi-bounce projection system for extreme ultraviolet projection lithography
US6630117B2 (en) 1999-06-04 2003-10-07 Corning Incorporated Making a dispersion managing crystal
US6867922B1 (en) 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
DE10029938A1 (de) 1999-07-09 2001-07-05 Zeiss Carl Optisches System für das Vakuum-Ultraviolett
JP4717974B2 (ja) 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
EP1093021A3 (en) 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
US7187503B2 (en) 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
US7160530B2 (en) * 2000-01-19 2007-01-09 Midwest Research Institute Metal-doped single-walled carbon nanotubes and production thereof
US6285737B1 (en) 2000-01-21 2001-09-04 Euv Llc Condenser for extreme-UV lithography with discharge source
JP2005233979A (ja) 2000-02-09 2005-09-02 Nikon Corp 反射屈折光学系
JP2001228401A (ja) 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
DE10010131A1 (de) * 2000-03-03 2001-09-06 Zeiss Carl Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion
JP2001343589A (ja) 2000-03-31 2001-12-14 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
JP2004512552A (ja) 2000-10-20 2004-04-22 カール　ツァイス　シュティフトゥング　トレイディング　アズ　カール　ツァイス ８反射鏡型マイクロリソグラフィ用投影光学系
JP4245286B2 (ja) 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2002217095A (ja) 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
JP2002208551A (ja) 2001-01-10 2002-07-26 Nikon Corp 反射屈折光学系及び投影露光装置
WO2002091078A1 (en) 2001-05-07 2002-11-14 Massachusetts Institute Of Technology Methods and apparatus employing an index matching medium
DE10210782A1 (de) 2002-03-12 2003-10-09 Zeiss Carl Smt Ag Objektiv mit Kristall-Linsen
WO2002093209A2 (de) 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
JP4780364B2 (ja) 2001-06-14 2011-09-28 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
KR20030023761A (ko) 2001-06-21 2003-03-19 코닌클리케 필립스 일렉트로닉스 엔.브이. 광학 주사장치
JP2003114387A (ja) 2001-10-04 2003-04-18 Nikon Corp 反射屈折光学系および該光学系を備える投影露光装置
TW559885B (en) 2001-10-19 2003-11-01 Nikon Corp Projection optical system and exposure device having the projection optical system
US7140699B2 (en) 2002-02-14 2006-11-28 Continental Teves Ag & Co. Ohg Method for regulating a predetermined modifiable brake pressure
JP4016179B2 (ja) 2002-02-28 2007-12-05 ソニー株式会社 露光装置及び収束レンズの制御方法
DE10332112A1 (de) 2003-07-09 2005-01-27 Carl Zeiss Smt Ag Projektionsbelichtungsverfahren und Projektionsbelichtungssystem
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
US6912042B2 (en) 2002-03-28 2005-06-28 Carl Zeiss Smt Ag 6-mirror projection objective with few lenses
JP2003297729A (ja) 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
JP2003309059A (ja) 2002-04-17 2003-10-31 Nikon Corp 投影光学系、その製造方法、露光装置および露光方法
JP2003307680A (ja) 2002-04-17 2003-10-31 Nikon Corp 反射屈折光学系
JP4292497B2 (ja) 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
JP2005533288A (ja) 2002-07-17 2005-11-04 カール・ツアイス・エスエムテイ・アーゲー 投影リソグラフィのためのカタディオプトリック複数鏡系
JP4217437B2 (ja) * 2002-07-22 2009-02-04 キヤノン株式会社 ズームレンズ及びそれを有する画像投射装置
TWI249082B (en) 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US6788477B2 (en) 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
US8675276B2 (en) 2003-02-21 2014-03-18 Kla-Tencor Corporation Catadioptric imaging system for broad band microscopy
US20050164522A1 (en) 2003-03-24 2005-07-28 Kunz Roderick R. Optical fluids, and systems and methods of making and using the same
JP2004317534A (ja) 2003-04-11 2004-11-11 Nikon Corp 反射屈折型の結像光学系、露光装置、および露光方法
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2004333761A (ja) 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
SG10201405231YA (en) 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
US6882804B2 (en) 2003-05-13 2005-04-19 Hewlett-Packard Development Company, Lp. Fuser and fusing roller useable in a printing process, laser printer, and method of printing
TWI282487B (en) 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method
JP2005003982A (ja) 2003-06-12 2005-01-06 Nikon Corp 投影光学系、露光装置および露光方法
WO2005013009A1 (en) 2003-08-01 2005-02-10 E.I. Dupont De Nemours And Company Use of perfluoro-n-alkanes in vacuum ultraviolet applications
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
WO2005015316A2 (en) 2003-08-12 2005-02-17 Carl Zeiss Smt Ag Projection objective for microlithography
WO2005040890A2 (en) 2003-10-17 2005-05-06 Carl Zeiss Smt Ag Catadioptric projection objective with real intermediate images
EP1692240A2 (en) 2003-12-12 2006-08-23 3M Innovative Properties Company Pressure sensitive adhesive composition and article
US7385764B2 (en) 2003-12-15 2008-06-10 Carl Zeiss Smt Ag Objectives as a microlithography projection objective with at least one liquid lens
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
KR101150037B1 (ko) 2004-01-14 2012-07-02 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
CN101727021A (zh) 2004-02-13 2010-06-09 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
JP2007523383A (ja) 2004-02-18 2007-08-16 コーニング インコーポレイテッド 深紫外光による大開口数結像のための反射屈折結像光学系
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
US20060244938A1 (en) 2004-05-04 2006-11-02 Karl-Heinz Schuster Microlitographic projection exposure apparatus and immersion liquid therefore
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP2189848B1 (en) 2004-07-14 2012-03-28 Carl Zeiss SMT GmbH Catadioptric projection objective
US7224520B2 (en) 2004-09-28 2007-05-29 Wavefront Research, Inc. Compact fast catadioptric imager
US7697198B2 (en) 2004-10-15 2010-04-13 Carl Zeiss Smt Ag Catadioptric projection objective
DE102005045862A1 (de) 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
US20060198018A1 (en) 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
DE102005056721A1 (de) 2005-04-28 2006-11-09 Carl Zeiss Smt Ag Projektionsbelichtungsobjektiv mit zentraler Obskuration und Zwischenbildern zwischen den Spiegeln
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
WO2007025643A1 (en) 2005-08-30 2007-03-08 Carl Zeiss Smt Ag High-na projection objective with aspheric lens surfaces
EP1980890B1 (en) 2006-01-30 2011-09-28 Nikon Corporation Cata-dioptric imaging system, exposure device, and device manufacturing method
US7557997B2 (en) 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05196875A (ja) * 1991-09-12 1993-08-06 Olympus Optical Co Ltd 近紫外対物レンズ
JPH10161021A (ja) * 1996-10-01 1998-06-19 Nikon Corp 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
JP2001015431A (ja) * 1999-06-26 2001-01-19 Carl Zeiss Stiftung Trading As Carl Zeiss 対物レンズ、特に、半導体リソグラフィー投影露光装置の対物レンズ、およびその製造方法
WO2004114380A1 (ja) * 2003-06-19 2004-12-29 Nikon Corporation 露光装置及びデバイス製造方法
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020016679A (ja) * 2018-07-23 2020-01-30 株式会社ニコン 光学系、光学機器、光学系の製造方法
JP7217858B2 (ja) 2018-07-23 2023-02-06 株式会社ニコン 光学系、光学機器

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