CN101243360B - 具有大孔径和平面端面的投影物镜 - Google Patents

具有大孔径和平面端面的投影物镜 Download PDF

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Publication number
CN101243360B
CN101243360B CN2006800296926A CN200680029692A CN101243360B CN 101243360 B CN101243360 B CN 101243360B CN 2006800296926 A CN2006800296926 A CN 2006800296926A CN 200680029692 A CN200680029692 A CN 200680029692A CN 101243360 B CN101243360 B CN 101243360B
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China
Prior art keywords
lens
projection objective
refractive index
aspheric
plane
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Expired - Fee Related
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CN2006800296926A
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English (en)
Chinese (zh)
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CN101243360A (zh
Inventor
S·贝德
W·辛格
K·-H·舒斯特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Lenses (AREA)
CN2006800296926A 2005-06-14 2006-05-26 具有大孔径和平面端面的投影物镜 Expired - Fee Related CN101243360B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/151,465 2005-06-14
US11/151,465 US7466489B2 (en) 2003-12-15 2005-06-14 Projection objective having a high aperture and a planar end surface
PCT/EP2006/005079 WO2006133801A1 (en) 2005-06-14 2006-05-26 Projection objective having a high aperture and a planar end surface

Publications (2)

Publication Number Publication Date
CN101243360A CN101243360A (zh) 2008-08-13
CN101243360B true CN101243360B (zh) 2011-04-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800296926A Expired - Fee Related CN101243360B (zh) 2005-06-14 2006-05-26 具有大孔径和平面端面的投影物镜

Country Status (5)

Country Link
US (2) US7466489B2 (enExample)
EP (1) EP1891481A1 (enExample)
JP (1) JP2008547039A (enExample)
CN (1) CN101243360B (enExample)
WO (1) WO2006133801A1 (enExample)

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US7385764B2 (en) 2003-12-15 2008-06-10 Carl Zeiss Smt Ag Objectives as a microlithography projection objective with at least one liquid lens
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WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
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CN101727021A (zh) * 2004-02-13 2010-06-09 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
CN100592210C (zh) * 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
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KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
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WO2006053751A2 (de) * 2004-11-18 2006-05-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
EP1820050A1 (en) * 2004-12-09 2007-08-22 Carl Zeiss SMT AG Transmitting optical element and objective for a microlithographic projection exposure apparatus
US20060198029A1 (en) * 2005-03-01 2006-09-07 Karl-Heinz Schuster Microlithography projection objective and projection exposure apparatus
US20080186466A1 (en) * 2005-04-12 2008-08-07 Sirat Gabriel Y Element for defocusing tm mode for lithography
DE102006013560A1 (de) * 2005-04-19 2006-10-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung
JP2006309220A (ja) * 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
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WO2007017089A1 (en) * 2005-07-25 2007-02-15 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus
EP1913445B1 (de) * 2005-08-10 2011-05-25 Carl Zeiss SMT GmbH Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
US7535644B2 (en) * 2005-08-12 2009-05-19 Asml Netherlands B.V. Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7666226B2 (en) * 2005-08-16 2010-02-23 Benvenue Medical, Inc. Spinal tissue distraction devices
WO2007020004A1 (de) * 2005-08-17 2007-02-22 Carl Zeiss Smt Ag Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs
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US20090091728A1 (en) * 2007-09-28 2009-04-09 Carl Zeiss Smt Ag Compact High Aperture Folded Catadioptric Projection Objective
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US8649094B2 (en) * 2010-05-21 2014-02-11 Eastman Kodak Company Low thermal stress birefringence imaging lens
CN102279459B (zh) * 2010-06-09 2014-06-18 上海微电子装备有限公司 一种投影物镜
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CN103278912B (zh) * 2013-06-19 2015-07-08 中国科学院光电技术研究所 一种折反式紫外光刻物镜
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CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
CN110058387B (zh) * 2019-04-01 2021-04-23 广景视睿科技（深圳）有限公司 一种双远心投影镜头及投影系统
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