GB2148017B - Apparatus for projecting a series of images onto dies of a semiconductor wafer - Google Patents

Apparatus for projecting a series of images onto dies of a semiconductor wafer

Info

Publication number
GB2148017B
GB2148017B GB08425489A GB8425489A GB2148017B GB 2148017 B GB2148017 B GB 2148017B GB 08425489 A GB08425489 A GB 08425489A GB 8425489 A GB8425489 A GB 8425489A GB 2148017 B GB2148017 B GB 2148017B
Authority
GB
United Kingdom
Prior art keywords
projecting
series
semiconductor wafer
images onto
onto dies
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08425489A
Other versions
GB8425489D0 (en
GB2148017A (en
Inventor
Martin E Lee
Ronald S Hershel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPX Corp
Original Assignee
General Signal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/378,370 external-priority patent/US4425037A/en
Priority claimed from GB08232136A external-priority patent/GB2121552B/en
Application filed by General Signal Corp filed Critical General Signal Corp
Publication of GB8425489D0 publication Critical patent/GB8425489D0/en
Publication of GB2148017A publication Critical patent/GB2148017A/en
Application granted granted Critical
Publication of GB2148017B publication Critical patent/GB2148017B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB08425489A 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer Expired GB2148017B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US26424981A 1981-05-15 1981-05-15
US26417181A 1981-05-15 1981-05-15
US06/378,370 US4425037A (en) 1981-05-15 1982-05-14 Apparatus for projecting a series of images onto dies of a semiconductor wafer
GB08232136A GB2121552B (en) 1981-05-15 1982-05-17 Apparatus for projecting a series of images onto dies of a semiconductor wafer
PCT/US1982/000668 WO1982004133A1 (en) 1981-05-15 1982-05-17 Apparatus for projecting a series of images onto dies of a semiconductor wafer

Publications (3)

Publication Number Publication Date
GB8425489D0 GB8425489D0 (en) 1984-11-14
GB2148017A GB2148017A (en) 1985-05-22
GB2148017B true GB2148017B (en) 1986-04-09

Family

ID=27449406

Family Applications (2)

Application Number Title Priority Date Filing Date
GB08425489A Expired GB2148017B (en) 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer
GB08425488A Expired GB2146454B (en) 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB08425488A Expired GB2146454B (en) 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer

Country Status (1)

Country Link
GB (2) GB2148017B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
GB2347227A (en) * 1995-12-11 2000-08-30 Hyundai Electronics Ind Apparatus for light exposure in making thin film transistors
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (en) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー Objective lens for microlithography projection with crystal elements
JP2022189083A (en) * 2021-06-10 2022-12-22 株式会社エビデント Observation device, reflector, and method for observing phase object

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB688067A (en) * 1949-10-11 1953-02-25 Optische Ind De Oude Delft Nv Improvements in or relating to optical systems comprising two reflecting spherical surfaces
NL6503242A (en) * 1965-03-15 1966-09-16
US3917399A (en) * 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system

Also Published As

Publication number Publication date
GB8425489D0 (en) 1984-11-14
GB2148017A (en) 1985-05-22
GB8425488D0 (en) 1984-11-14
GB2146454A (en) 1985-04-17
GB2146454B (en) 1986-04-16

Similar Documents

Publication Publication Date Title
GB2099270B (en) Apparatus for baking resist on semiconductor wafers
GB2099951B (en) Apparatus for cleaning semiconductor wafers
DE3379297D1 (en) Substrate for semiconductor apparatus
DE3265339D1 (en) Method for manufacturing semiconductor device
DE3380240D1 (en) A method for producing a semiconductor device
DE3278840D1 (en) Apparatus for aligning a wafer
DE3071324D1 (en) Apparatus for prealignment of a wafer
DE3271995D1 (en) Method of manufacturing a semiconductor device
DE3279012D1 (en) A method of forming an electrode of a semiconductor device
PT77853B (en) Process and apparatus for obtaining silicon from fluosilic acid
DE3366564D1 (en) Method for manufacturing semiconductor device
IL75207A (en) Apparatus for transferring semiconductor wafers
JPS57169245A (en) Method of producing semiconductor device
JPS57173936A (en) Device and method for forming semiconductor film
DE3062975D1 (en) Method and apparatus for removing a semiconductor chip from a substrate
EP0070713A3 (en) A semiconductor device comprising a bulk-defect region and a process for producing such a semiconductor device
DE3271027D1 (en) Apparatus for nondestructively measuring characteristics of a semiconductor wafer having a junction
IL68357A0 (en) Method of exposure of semiconductor wafers
GB2119680B (en) Apparatus for heat treating a semiconductor wafer
DE3375054D1 (en) Masking process for semiconductor device manufacture
JPS57138142A (en) Method and device for coating semiconductor wafer
JPS57139936A (en) Method of characterizing semiconductor wafer
DE3280026D1 (en) Process for preparing amorphous silicon semiconductor
GB8803604D0 (en) Apparatus for processing semiconductor wafers &c
EP0060676A3 (en) A method for the production of a semiconductor device comprising annealing a silicon wafer

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19920517