JP2008536669A - 均等な薄い液体層を基板に塗布する装置および方法 - Google Patents
均等な薄い液体層を基板に塗布する装置および方法 Download PDFInfo
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Abstract
Description
Claims (20)
- 液体水槽(16)および液体を液体ミスト(15)に変換する高周波音響装置(11)を備えるプロセス室(14)と、前記プロセス室(14)の液体ミスト降下シャフト(25)の下方に配置された基板(12)の搬送装置(13)とを有する、均等な薄い液体層特にリン酸層を、前記基板(12)特に光起電用のシリコンセルに塗布する装置(10)において、
前記プロセス室(14)の前記液体ミスト降下シャフト(25)は前記搬送装置(13)に向ってその内のり断面が先細りになっていると共に、前記搬送装置(13)を覆う前記基板(12)の通過シャフト構造(40)に連通しており、前記液体ミスト降下シャフト(25)および前記通過シャフト構造(40)の連通端部のそれぞれの内のり断面は互いに適合化、特に実質的には等しくされている、装置。 - 前記液体ミスト降下シャフト(25)は、前記通過シャフト構造(40)に向って楔形に構成されている、請求項1に記載の装置。
- 前記通過シャフト構造(40)には、通過方向(A)で見て前記降下シャフト(25)の後に前記液体水槽(16)と接続された帰還シャフト(52)が配置されており、その連通部と反対を向いている方の後側端部は液体タンク(19)と接続されている、請求項1または2に記載の装置。
- 前記高周波音響装置(11)の上方の領域で第1の制御装置(32)と接続された給気管(31)が連通している、請求項1から3の少なくとも1項に記載の装置。
- 前記通過シャフト構造(40)の端部に第2の制御装置(47)を備える排気通路(46)が設けられている、請求項1から4の少なくとも1項に記載の装置。
- 前記通過シャフト構造(40)と前記排気通路(46)との間に、吸引ファン(48)と接続された層流形成器(45)を備える吸出しボックス(43)が配置されている、請求項5に記載の装置。
- 前記第1および前記第2の制御装置(32,47)は、前記プロセス室(14)から前記通過シャフト構造(40)を通るミスト輸送の速度と、前記基板(12)の前記搬送装置(13)の速度とについて相互に適合化可能であり、特に同期化可能である、請求項1から6の少なくとも1項に記載の装置。
- 前記プロセス室(14)の中には前記高周波音響装置(11)の上方または前記液体水槽(16)の上方に織物(30)を有する、特にプラスチック織物を有する衝突部材(28)が設けられている、請求項1から7の少なくとも1項に記載の装置。
- 前記降下シャフト(25)と反対を向いている方のプロセス室壁(22)を起点として傾いている前記衝突部材(28)の自由端と、前記プロセス室壁(22)と反対と向いている方の前記液体水槽(16)の端部に配置された堰(27)との間に、液体ミストのための貫通部(29)が設けられている、請求項8に記載の装置。
- 前記プロセス室(14)の天井(24)は、前記降下シャフト(25)と反対を向いている方の前記プロセス室壁(22)を起点として上昇するように傾いている、請求項1から9の少なくとも1項に記載の装置。
- 楔形をした前記液体ミスト降下シャフト(25)は、仕切壁(23,26)に織物上張り(34)を備えている、請求項1から10の少なくとも1項に記載の装置。
- 前記降下シャフト(25)の前記仕切壁(23,26)は、前記通過シャフト構造(40)の連通領域において排出溝(36,37)の上で終わっている、請求項11に記載の装置。
- 前記通過方向(A)に対して横向きに設けられている前記搬送装置(13)の幅に応じて、およびこれに伴う前記プロセス室(14)の幅に応じて、当該方向に所定の間隔をおいて配置された複数の高周波音響装置(11)が設けられている、請求項1から12の少なくとも1項に記載の装置。
- 液体水槽(16)および液体を液体ミスト(15)に変換する高周波音響装置(11)を備えるプロセス室(14)を有する、特に請求項1および場合によりそれ以後のいずれかの請求項に記載された、均等な薄い液体層特にリン酸層を、基板(12)特に光起電用のシリコンセルに塗布する装置(10)において、
前記高周波音響装置(11)は、液体を霧状化するために特に水晶ガラスからなるノズル(68)を備えており、その下方に高周波音響生成器(65)が配置されている、装置。 - 液体水位(20)から前記液体水槽(16)へ突入する前記ノズル(68)と前記高周波音響生成器(65)との間に、前記水槽(16)から前記ノズル(68)への液体の供給部(69)が設けられている、請求項14に記載の装置。
- 前記ノズル(68)は特にプラスチックからなるハウジング(61)に保持されており、前記ハウジングは前記液体水槽(16)の底面に取り付けられると共に前記液体水槽(16)を液密に貫通しており、前記水槽の底面(21)の領域で前記高周波音響生成器(65)が前記ハウジング(61)の中に取り付けられており、前記液体水槽(16)の内部にある前記ハウジング(61)の部分(67)には多数の半径方向の供給穴(69)が設けられている、請求項14または15に記載の装置。
- 前記高周波音響生成器は圧電素子(65)であり、該圧電素子の上には前記ノズル(68)の方を向いくように、音響周波数に合わせて適合化された水晶ガラス板(66)が取り付けられており、特に接着されている、請求項14から16までの少なくとも1項に記載の装置。
- プロセス室の内部で高周波音響装置によって液体ミストが生成され、前記液体ミストが特に搬送装置によって移動していく基板の上に降下または沈積する、均等な薄い液体層特にリン酸層を、基板特に光起電用のシリコンセルに塗布する方法において、
前記液体ミストは前記プロセス室から前記基板までの途上で能動的に移動させられ、前記液体ミストは前記プロセス室の後に続く降下シャフトの中で濃縮されて均質化され、移動していく前記基板の上に配置された通過シャフト構造の中へと案内されて前記基板の上に沈積し、前記液体ミストの能動的な移動は前記基板の速度と適合化され、特に同期化される、方法。 - 沈積されるべき前記液体ミストを案内する前記通過シャフト構造で加熱された液体が、直接フィードバックされる、請求項18に記載の方法。
- 前記液体ミストは、前記通過シャフト構造の端部で残留物として均等に吸い出される、請求項18または19に記載の方法。
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DE102005019686.1 | 2005-04-22 | ||
DE102005019686A DE102005019686B3 (de) | 2005-04-22 | 2005-04-22 | Einrichtung und Verfahren zum Aufbringen einer gleichmäßigen, dünnen Flüssigkeitsschicht auf Substrate |
PCT/EP2006/002797 WO2006111247A1 (de) | 2005-04-22 | 2006-03-28 | Einrichtung und verfahren zum aufbringen einer gleichmässigen, dünnen flüssigkeitsschicht auf substrate |
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US (1) | US8136478B2 (ja) |
EP (1) | EP1872386B1 (ja) |
JP (1) | JP4955656B2 (ja) |
KR (1) | KR20080009132A (ja) |
CN (1) | CN100594583C (ja) |
AT (1) | ATE481732T1 (ja) |
AU (1) | AU2006237053B8 (ja) |
BR (1) | BRPI0608389A2 (ja) |
CA (1) | CA2604256A1 (ja) |
DE (2) | DE102005019686B3 (ja) |
ES (1) | ES2349656T3 (ja) |
IL (1) | IL186720A0 (ja) |
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DE102009059042A1 (de) * | 2009-12-10 | 2011-06-16 | Schmid Technology Gmbh | Verfahren und Vorrichtung zur Übertragung von Drucksubstanz von einem Drucksubstanzträger auf ein Substrat |
CN102284393B (zh) * | 2010-06-17 | 2014-04-02 | 海洋王照明科技股份有限公司 | 一种荧光粉涂覆装置及使用该涂覆装置的涂覆方法 |
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AT512219B1 (de) * | 2011-12-02 | 2016-06-15 | Braincon Handels-Gmbh | Zerstäubungsvorrichtung |
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JP5680604B2 (ja) * | 2012-10-29 | 2015-03-04 | 株式会社川熱 | 防食被膜付き鉄筋棒の製造装置 |
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- 2006-03-28 ES ES06707647T patent/ES2349656T3/es active Active
- 2006-03-28 WO PCT/EP2006/002797 patent/WO2006111247A1/de active Application Filing
- 2006-03-28 US US11/918,981 patent/US8136478B2/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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WO2006111247A1 (de) | 2006-10-26 |
BRPI0608389A2 (pt) | 2009-12-29 |
AU2006237053A1 (en) | 2006-10-26 |
AU2006237053A8 (en) | 2011-07-07 |
KR20080009132A (ko) | 2008-01-24 |
DE502006007888D1 (de) | 2010-10-28 |
ES2349656T3 (es) | 2011-01-10 |
IL186720A0 (en) | 2008-02-09 |
DE102005019686B3 (de) | 2006-04-13 |
EP1872386B1 (de) | 2010-09-15 |
AU2006237053B2 (en) | 2011-06-02 |
US8136478B2 (en) | 2012-03-20 |
ATE481732T1 (de) | 2010-10-15 |
EP1872386A1 (de) | 2008-01-02 |
CA2604256A1 (en) | 2006-10-26 |
CN101164139A (zh) | 2008-04-16 |
JP4955656B2 (ja) | 2012-06-20 |
US20090053397A1 (en) | 2009-02-26 |
AU2006237053B8 (en) | 2011-07-07 |
RU2007137829A (ru) | 2009-05-27 |
CN100594583C (zh) | 2010-03-17 |
RU2405227C2 (ru) | 2010-11-27 |
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