JP2008522029A5 - - Google Patents
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- Publication number
- JP2008522029A5 JP2008522029A5 JP2007543039A JP2007543039A JP2008522029A5 JP 2008522029 A5 JP2008522029 A5 JP 2008522029A5 JP 2007543039 A JP2007543039 A JP 2007543039A JP 2007543039 A JP2007543039 A JP 2007543039A JP 2008522029 A5 JP2008522029 A5 JP 2008522029A5
- Authority
- JP
- Japan
- Prior art keywords
- wall
- membrane precursor
- support assembly
- tray
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002243 precursor Substances 0.000 claims 37
- 239000012528 membrane Substances 0.000 claims 31
- 239000007787 solid Substances 0.000 claims 7
- 239000012159 carrier gas Substances 0.000 claims 4
- 230000008020 evaporation Effects 0.000 claims 4
- 238000001704 evaporation Methods 0.000 claims 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/998,420 | 2004-11-29 | ||
| US10/998,420 US7638002B2 (en) | 2004-11-29 | 2004-11-29 | Multi-tray film precursor evaporation system and thin film deposition system incorporating same |
| US11/007,962 US7484315B2 (en) | 2004-11-29 | 2004-12-09 | Replaceable precursor tray for use in a multi-tray solid precursor delivery system |
| US11/007,962 | 2004-12-09 | ||
| PCT/US2005/035583 WO2006057710A1 (en) | 2004-11-29 | 2005-10-03 | A solid precursor delivery system comprising replaceable stackable trays |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008522029A JP2008522029A (ja) | 2008-06-26 |
| JP2008522029A5 true JP2008522029A5 (enExample) | 2008-11-20 |
| JP4975639B2 JP4975639B2 (ja) | 2012-07-11 |
Family
ID=36096210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007543039A Expired - Lifetime JP4975639B2 (ja) | 2004-11-29 | 2005-10-03 | 交換式の積み重ね可能なトレイを備える固体前駆体供給システム |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7484315B2 (enExample) |
| JP (1) | JP4975639B2 (enExample) |
| KR (1) | KR101172931B1 (enExample) |
| WO (1) | WO2006057710A1 (enExample) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6921062B2 (en) | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US7708835B2 (en) * | 2004-11-29 | 2010-05-04 | Tokyo Electron Limited | Film precursor tray for use in a film precursor evaporation system and method of using |
| US7638002B2 (en) * | 2004-11-29 | 2009-12-29 | Tokyo Electron Limited | Multi-tray film precursor evaporation system and thin film deposition system incorporating same |
| US20060185597A1 (en) * | 2004-11-29 | 2006-08-24 | Kenji Suzuki | Film precursor evaporation system and method of using |
| US7644512B1 (en) * | 2006-01-18 | 2010-01-12 | Akrion, Inc. | Systems and methods for drying a rotating substrate |
| JP4960720B2 (ja) * | 2006-02-10 | 2012-06-27 | 東京エレクトロン株式会社 | 膜前駆体蒸発システムにおいて使用される膜前駆体のトレーおよびその使用方法 |
| US8268078B2 (en) * | 2006-03-16 | 2012-09-18 | Tokyo Electron Limited | Method and apparatus for reducing particle contamination in a deposition system |
| JP4847365B2 (ja) * | 2006-03-22 | 2011-12-28 | キヤノン株式会社 | 蒸着源および蒸着装置 |
| EP1862788A1 (en) * | 2006-06-03 | 2007-12-05 | Applied Materials GmbH & Co. KG | Evaporator for organic material, coating installation, and method for use thereof |
| US7877895B2 (en) * | 2006-06-26 | 2011-02-01 | Tokyo Electron Limited | Substrate processing apparatus |
| US20080241805A1 (en) | 2006-08-31 | 2008-10-02 | Q-Track Corporation | System and method for simulated dosimetry using a real time locating system |
| KR101480971B1 (ko) * | 2006-10-10 | 2015-01-09 | 에이에스엠 아메리카, 인코포레이티드 | 전구체 전달 시스템 |
| US7846256B2 (en) * | 2007-02-23 | 2010-12-07 | Tokyo Electron Limited | Ampule tray for and method of precursor surface area |
| DE102007038278B4 (de) * | 2007-08-08 | 2013-09-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Stofftransport und Ereigniskontrolle in Systemen mit piezoelektrisch aktivierter Tröpfchenemission und Kombinationsmöglichkeiten von Trägermatrix und zu dosierendem Stoff |
| JP4731580B2 (ja) | 2008-03-27 | 2011-07-27 | 東京エレクトロン株式会社 | 成膜方法および成膜装置 |
| KR20110004081A (ko) * | 2009-07-07 | 2011-01-13 | 삼성모바일디스플레이주식회사 | 증착 장치용 캐니스터, 이를 이용한 증착 장치 및 증착 방법 |
| JP5244723B2 (ja) * | 2009-07-10 | 2013-07-24 | 株式会社日立ハイテクノロジーズ | 成膜装置 |
| KR101287113B1 (ko) * | 2010-06-30 | 2013-07-17 | 삼성디스플레이 주식회사 | 증착 장치용 캐니스터 및 이를 이용한 증착 장치 |
| US20130105483A1 (en) * | 2011-10-28 | 2013-05-02 | Applied Materials, Inc. | Apparatus for sublimating solid state precursors |
| JP2015519478A (ja) | 2012-05-31 | 2015-07-09 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | バッチ蒸着のための高材料流束によるソース試薬に基づく流体の送出 |
| JP5933372B2 (ja) | 2012-07-02 | 2016-06-08 | 東京エレクトロン株式会社 | 原料容器および原料容器の使用方法 |
| CN103234328B (zh) * | 2013-03-28 | 2015-04-08 | 京东方科技集团股份有限公司 | 一种基板减压干燥方法及装置 |
| KR101742172B1 (ko) | 2013-07-03 | 2017-05-31 | 무라다기카이가부시끼가이샤 | 보관 용기 |
| US9334566B2 (en) * | 2013-11-25 | 2016-05-10 | Lam Research Corporation | Multi-tray ballast vapor draw systems |
| US9863041B2 (en) * | 2014-10-08 | 2018-01-09 | Lam Research Corporation | Internally heated porous filter for defect reduction with liquid or solid precursors |
| US10526697B2 (en) | 2015-03-06 | 2020-01-07 | Entegris, Inc. | High-purity tungsten hexacarbonyl for solid source delivery |
| EP3162914A1 (en) * | 2015-11-02 | 2017-05-03 | IMEC vzw | Apparatus and method for delivering a gaseous precursor to a reaction chamber |
| US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| JP6849368B2 (ja) * | 2016-09-30 | 2021-03-24 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
| US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| JP6324609B1 (ja) * | 2017-06-21 | 2018-05-16 | 日本エア・リキード株式会社 | 固体材料容器およびその固体材料容器に固体材料が充填されている固体材料製品 |
| US11166441B2 (en) * | 2018-07-13 | 2021-11-09 | Versum Materials Us, Llc | Vapor delivery container with flow distributor |
| JP7376278B2 (ja) | 2018-08-16 | 2023-11-08 | エーエスエム・アイピー・ホールディング・ベー・フェー | 固体原料昇華器 |
| CN110885970B (zh) * | 2018-09-11 | 2024-06-21 | 北京北方华创微电子装备有限公司 | 固体前驱体蒸汽的稳压和纯化装置以及ald沉积设备 |
| JP6887688B2 (ja) * | 2019-02-07 | 2021-06-16 | 株式会社高純度化学研究所 | 蒸発原料用容器、及びその蒸発原料用容器を用いた固体気化供給システム |
| JP6901153B2 (ja) * | 2019-02-07 | 2021-07-14 | 株式会社高純度化学研究所 | 薄膜形成用金属ハロゲン化合物の固体気化供給システム。 |
| WO2020251696A1 (en) | 2019-06-10 | 2020-12-17 | Applied Materials, Inc. | Processing system for forming layers |
| FI129579B (en) * | 2019-06-28 | 2022-05-13 | Beneq Oy | Precursor source arrangement and atomic layer growth equipment |
| JP7240993B2 (ja) * | 2019-08-27 | 2023-03-16 | 東京エレクトロン株式会社 | 原料ガス供給システム及び原料ガス供給方法 |
| US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| WO2021060083A1 (ja) * | 2019-09-24 | 2021-04-01 | 東京エレクトロン株式会社 | 原料供給装置及び原料供給方法 |
| US11661653B2 (en) | 2019-12-18 | 2023-05-30 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Vapor delivery systems for solid and liquid materials |
| JP7519829B2 (ja) * | 2020-03-17 | 2024-07-22 | 東京エレクトロン株式会社 | 原料供給システム及び原料供給方法 |
| KR20220152274A (ko) * | 2020-03-17 | 2022-11-15 | 도쿄엘렉트론가부시키가이샤 | 원료 공급 시스템 |
| CN119020757B (zh) * | 2024-10-24 | 2025-01-10 | 内蒙古工业大学 | 固态源等离子体增强化学气相沉积设备及方法 |
| KR102866784B1 (ko) | 2024-10-25 | 2025-10-01 | 주식회사 엠더블유코퍼레이션 | 다공성 촉매가 구비된 고체전구체 기화시스템의 고체 전구체 소스 용기 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3801294A (en) | 1971-12-15 | 1974-04-02 | Corning Glass Works | Method of producing glass |
| US4190965A (en) | 1979-01-15 | 1980-03-04 | Alternative Pioneering Systems, Inc. | Food dehydrator |
| US4817557A (en) | 1983-05-23 | 1989-04-04 | Anicon, Inc. | Process and apparatus for low pressure chemical vapor deposition of refractory metal |
| US4948623A (en) * | 1987-06-30 | 1990-08-14 | International Business Machines Corporation | Method of chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl/metal complex |
| US4938999A (en) * | 1988-07-11 | 1990-07-03 | Jenkin William C | Process for coating a metal substrate by chemical vapor deposition using a metal carbonyl |
| JP3194971B2 (ja) | 1990-01-08 | 2001-08-06 | エルエスアイ ロジック コーポレーション | Cvdチャンバに導入されるプロセスガスをcvdチャンバへの導入前に濾過するための装置 |
| JPH0598445A (ja) | 1991-07-05 | 1993-04-20 | Chodendo Hatsuden Kanren Kiki Zairyo Gijutsu Kenkyu Kumiai | 有機金属化学気相蒸着用原料容器 |
| JPH06306584A (ja) | 1993-04-21 | 1994-11-01 | Asahi Glass Co Ltd | 真空蒸着用原料成形体の製造方法 |
| US6024915A (en) | 1993-08-12 | 2000-02-15 | Agency Of Industrial Science & Technology | Coated metal particles, a metal-base sinter and a process for producing same |
| JPH1025576A (ja) * | 1996-04-05 | 1998-01-27 | Dowa Mining Co Ltd | Cvd成膜法における原料化合物の昇華方法 |
| AU6954300A (en) | 1999-07-12 | 2001-01-30 | Asml Us, Inc. | Method and system for in situ cleaning of semiconductor manufacturing equipment using combination chemistries |
| JP3909792B2 (ja) * | 1999-08-20 | 2007-04-25 | パイオニア株式会社 | 化学気相成長法における原料供給装置及び原料供給方法 |
| US6380080B2 (en) | 2000-03-08 | 2002-04-30 | Micron Technology, Inc. | Methods for preparing ruthenium metal films |
| US6429127B1 (en) | 2000-06-08 | 2002-08-06 | Micron Technology, Inc. | Methods for forming rough ruthenium-containing layers and structures/methods using same |
| US6903005B1 (en) | 2000-08-30 | 2005-06-07 | Micron Technology, Inc. | Method for the formation of RuSixOy-containing barrier layers for high-k dielectrics |
| US20040161545A1 (en) | 2000-11-28 | 2004-08-19 | Shipley Company, L.L.C. | Adhesion method |
| US6718126B2 (en) | 2001-09-14 | 2004-04-06 | Applied Materials, Inc. | Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition |
| US6812143B2 (en) | 2002-04-26 | 2004-11-02 | International Business Machines Corporation | Process of forming copper structures |
| US7300038B2 (en) | 2002-07-23 | 2007-11-27 | Advanced Technology Materials, Inc. | Method and apparatus to help promote contact of gas with vaporized material |
| US6921062B2 (en) | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US6915592B2 (en) | 2002-07-29 | 2005-07-12 | Applied Materials, Inc. | Method and apparatus for generating gas to a processing chamber |
| WO2004011695A2 (en) | 2002-07-30 | 2004-02-05 | Asm America, Inc. | Sublimation system employing carrier gas |
| JP2004137480A (ja) | 2002-09-20 | 2004-05-13 | Tdk Corp | 蛍光体薄膜およびその製造方法ならびにelパネル |
| JP4126219B2 (ja) * | 2002-11-06 | 2008-07-30 | 東京エレクトロン株式会社 | 成膜方法 |
| US7638002B2 (en) | 2004-11-29 | 2009-12-29 | Tokyo Electron Limited | Multi-tray film precursor evaporation system and thin film deposition system incorporating same |
| US20060115590A1 (en) | 2004-11-29 | 2006-06-01 | Tokyo Electron Limited; International Business Machines Corporation | Method and system for performing in-situ cleaning of a deposition system |
| US8435351B2 (en) | 2004-11-29 | 2013-05-07 | Tokyo Electron Limited | Method and system for measuring a flow rate in a solid precursor delivery system |
| US7396766B2 (en) | 2005-03-31 | 2008-07-08 | Tokyo Electron Limited | Low-temperature chemical vapor deposition of low-resistivity ruthenium layers |
| US7482269B2 (en) | 2005-09-28 | 2009-01-27 | Tokyo Electron Limited | Method for controlling the step coverage of a ruthenium layer on a patterned substrate |
| US7473634B2 (en) | 2006-09-28 | 2009-01-06 | Tokyo Electron Limited | Method for integrated substrate processing in copper metallization |
-
2004
- 2004-12-09 US US11/007,962 patent/US7484315B2/en not_active Expired - Lifetime
-
2005
- 2005-10-03 JP JP2007543039A patent/JP4975639B2/ja not_active Expired - Lifetime
- 2005-10-03 WO PCT/US2005/035583 patent/WO2006057710A1/en not_active Ceased
- 2005-10-03 KR KR1020077014437A patent/KR101172931B1/ko not_active Expired - Lifetime
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