JP2008503365A - 耐溶剤性高分子バインダーを有する画像形成可能要素 - Google Patents
耐溶剤性高分子バインダーを有する画像形成可能要素 Download PDFInfo
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- JP2008503365A JP2008503365A JP2007516525A JP2007516525A JP2008503365A JP 2008503365 A JP2008503365 A JP 2008503365A JP 2007516525 A JP2007516525 A JP 2007516525A JP 2007516525 A JP2007516525 A JP 2007516525A JP 2008503365 A JP2008503365 A JP 2008503365A
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- Prior art keywords
- imageable
- polymeric binder
- pendant
- copolymer
- imageable element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011230 binding agent Substances 0.000 title claims abstract description 79
- 239000002904 solvent Substances 0.000 title abstract description 19
- 238000007639 printing Methods 0.000 claims abstract description 65
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 239000003999 initiator Substances 0.000 claims abstract description 27
- 229920000233 poly(alkylene oxides) Polymers 0.000 claims abstract description 25
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 23
- 230000005855 radiation Effects 0.000 claims abstract description 22
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 21
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 18
- 229920001577 copolymer Polymers 0.000 claims description 68
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 53
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 26
- 238000003384 imaging method Methods 0.000 claims description 23
- 238000006243 chemical reaction Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 18
- 239000002245 particle Substances 0.000 claims description 15
- 229920001223 polyethylene glycol Polymers 0.000 claims description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 14
- 239000000470 constituent Substances 0.000 claims description 13
- 150000005215 alkyl ethers Chemical class 0.000 claims description 7
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims description 7
- 229920005604 random copolymer Polymers 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 description 68
- 239000010410 layer Substances 0.000 description 55
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 49
- 239000002243 precursor Substances 0.000 description 44
- 239000000243 solution Substances 0.000 description 42
- 239000000178 monomer Substances 0.000 description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 35
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 29
- 239000008199 coating composition Substances 0.000 description 29
- 229920000642 polymer Polymers 0.000 description 25
- -1 polyethylene terephthalate Polymers 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 18
- 229910052782 aluminium Inorganic materials 0.000 description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 17
- 239000007787 solid Substances 0.000 description 17
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- 150000003254 radicals Chemical class 0.000 description 16
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- 238000011161 development Methods 0.000 description 14
- 239000002202 Polyethylene glycol Substances 0.000 description 13
- 239000000975 dye Substances 0.000 description 13
- 238000003786 synthesis reaction Methods 0.000 description 13
- 229920002125 Sokalan® Polymers 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 229920001451 polypropylene glycol Polymers 0.000 description 12
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 10
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
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- 229910021641 deionized water Inorganic materials 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 7
- 238000002048 anodisation reaction Methods 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 229920000578 graft copolymer Polymers 0.000 description 7
- 230000008569 process Effects 0.000 description 7
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 6
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 6
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 6
- DUDCYUDPBRJVLG-UHFFFAOYSA-N ethoxyethane methyl 2-methylprop-2-enoate Chemical compound CCOCC.COC(=O)C(C)=C DUDCYUDPBRJVLG-UHFFFAOYSA-N 0.000 description 6
- 230000005660 hydrophilic surface Effects 0.000 description 6
- 229920001427 mPEG Polymers 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 5
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 229920005596 polymer binder Polymers 0.000 description 5
- 239000002491 polymer binding agent Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 239000003755 preservative agent Substances 0.000 description 4
- 230000002335 preservative effect Effects 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000005520 diaryliodonium group Chemical group 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229960004592 isopropanol Drugs 0.000 description 3
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
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- 230000035484 reaction time Effects 0.000 description 3
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- QKOWXXDOHMJOMQ-UHFFFAOYSA-N 1,3,5-tris(6-isocyanatohexyl)biuret Chemical compound O=C=NCCCCCCNC(=O)N(CCCCCCN=C=O)C(=O)NCCCCCCN=C=O QKOWXXDOHMJOMQ-UHFFFAOYSA-N 0.000 description 2
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- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- 239000004375 Dextrin Substances 0.000 description 2
- 229920001353 Dextrin Polymers 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
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- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
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- 239000004721 Polyphenylene oxide Substances 0.000 description 2
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- 125000003545 alkoxy group Chemical group 0.000 description 2
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- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
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- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000001768 carboxy methyl cellulose Substances 0.000 description 2
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- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
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- 125000005842 heteroatom Chemical group 0.000 description 2
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
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- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 2
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- 230000000977 initiatory effect Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
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- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
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- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
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- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
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- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/498—Photothermographic systems, e.g. dry silver
- G03C1/49836—Additives
- G03C1/49863—Inert additives, e.g. surfactants, binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/08—Developable by water or the fountain solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/10—Developable by an acidic solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/872,209 US7261998B2 (en) | 2001-04-04 | 2004-06-17 | Imageable element with solvent-resistant polymeric binder |
| PCT/US2005/019391 WO2006007270A1 (en) | 2004-06-17 | 2005-06-02 | Imageable element with solvent-resistant polymeric binder |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012203991A Division JP5395238B2 (ja) | 2004-06-17 | 2012-09-18 | 耐溶剤性高分子バインダーを有する画像形成可能要素 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008503365A true JP2008503365A (ja) | 2008-02-07 |
| JP2008503365A5 JP2008503365A5 (OSRAM) | 2008-07-10 |
Family
ID=35262049
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007516525A Withdrawn JP2008503365A (ja) | 2004-06-17 | 2005-06-02 | 耐溶剤性高分子バインダーを有する画像形成可能要素 |
| JP2012203991A Expired - Lifetime JP5395238B2 (ja) | 2004-06-17 | 2012-09-18 | 耐溶剤性高分子バインダーを有する画像形成可能要素 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012203991A Expired - Lifetime JP5395238B2 (ja) | 2004-06-17 | 2012-09-18 | 耐溶剤性高分子バインダーを有する画像形成可能要素 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7261998B2 (OSRAM) |
| EP (1) | EP1765593B1 (OSRAM) |
| JP (2) | JP2008503365A (OSRAM) |
| CN (1) | CN100537235C (OSRAM) |
| BR (1) | BRPI0512217B1 (OSRAM) |
| DE (1) | DE602005005058T2 (OSRAM) |
| WO (1) | WO2006007270A1 (OSRAM) |
Cited By (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008230208A (ja) * | 2007-03-23 | 2008-10-02 | Fujifilm Corp | 機上現像可能な平版印刷版原版 |
| JP2009258579A (ja) * | 2008-03-26 | 2009-11-05 | Fujifilm Corp | 平版印刷版原版の製版方法 |
| JP2010061042A (ja) * | 2008-09-05 | 2010-03-18 | Fujifilm Corp | 平版印刷版の作製方法 |
| JP2011073212A (ja) * | 2009-09-29 | 2011-04-14 | Fujifilm Corp | 新聞印刷用平版印刷版原版及び製版方法 |
| JP2011152711A (ja) * | 2010-01-27 | 2011-08-11 | Fujifilm Corp | 平版印刷版原版及びその製版方法 |
| JP2011177983A (ja) * | 2010-02-26 | 2011-09-15 | Fujifilm Corp | 新聞印刷用平版印刷版原版及びその製造方法 |
| JP2012071590A (ja) * | 2010-08-30 | 2012-04-12 | Fujifilm Corp | 平版印刷版原版 |
| JP2013504632A (ja) * | 2009-09-15 | 2013-02-07 | マイラン・グループ | ネガ型輻射線感応性リソグラフィック印刷プレートのための輻射線感応性コーティング組成物用のコポリマー、前記コポリマーを含むポリマー粒子、及びコポリマーバインダー |
| WO2015156065A1 (en) | 2014-04-11 | 2015-10-15 | Eastman Kodak Company | Lithographic printing plate precursor |
| US9822206B2 (en) | 2010-09-14 | 2017-11-21 | Mylan Group | Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
| JPWO2017150039A1 (ja) * | 2016-02-29 | 2018-07-05 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の製版方法 |
| WO2018221134A1 (ja) | 2017-05-31 | 2018-12-06 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版原版作製用樹脂組成物、及び、平版印刷版の作製方法 |
| JP6454057B1 (ja) * | 2017-03-31 | 2019-01-16 | 富士フイルム株式会社 | 平版印刷版原版及びその製造方法、平版印刷版原版積層体、並びに、平版印刷方法 |
| JP6454058B1 (ja) * | 2017-03-31 | 2019-01-16 | 富士フイルム株式会社 | 平版印刷版原版及びその製造方法、平版印刷版原版積層体、平版印刷版の製版方法、並びに、平版印刷方法 |
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| WO2023032868A1 (ja) | 2021-08-31 | 2023-03-09 | 富士フイルム株式会社 | 機上現像型平版印刷版原版、及び印刷版の作製方法 |
| WO2023145972A1 (ja) | 2022-01-31 | 2023-08-03 | 富士フイルム株式会社 | 機上現像型平版印刷版原版、平版印刷版の作製方法、平版印刷方法、及び、積層体 |
| WO2023145971A1 (ja) | 2022-01-31 | 2023-08-03 | 富士フイルム株式会社 | 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
| EP4245542A1 (en) | 2022-03-18 | 2023-09-20 | FUJIFILM Corporation | Lithographic printing plate precursor, method of preparing lithographic printing plate, and lithographic printing method |
| WO2024048451A1 (ja) | 2022-08-31 | 2024-03-07 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製造方法、印刷方法 |
| EP4360880A1 (en) | 2022-10-25 | 2024-05-01 | FUJIFILM Corporation | Lithographic printing plate precursor, method of preparing a lithographic printing plate, and lithographic printing method |
| EP4438300A1 (en) | 2023-03-30 | 2024-10-02 | FUJIFILM Corporation | On-press development type lithographic printing plate precursor, method of preparing lithographic printing plate, lithographic printing method, and compound |
| EP4438301A1 (en) | 2023-03-30 | 2024-10-02 | FUJIFILM Corporation | On-press development type lithographic printing plate precursor, method of preparing lithographic printing plate, and lithographic printing method |
Families Citing this family (121)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7534543B2 (en) * | 1996-04-15 | 2009-05-19 | 3M Innovative Properties Company | Texture control of thin film layers prepared via laser induced thermal imaging |
| US7592128B2 (en) * | 2001-04-04 | 2009-09-22 | Eastman Kodak Company | On-press developable negative-working imageable elements |
| US7172850B2 (en) * | 2002-04-10 | 2007-02-06 | Eastman Kodak Company | Preparation of solvent-resistant binder for an imageable element |
| US7189494B2 (en) * | 2005-05-26 | 2007-03-13 | Eastman Kodak Company | On-press developable imageable element comprising a tetraarylborate salt |
| US7153632B1 (en) | 2005-08-03 | 2006-12-26 | Eastman Kodak Company | Radiation-sensitive compositions and imageable materials |
| US7396631B2 (en) * | 2005-10-07 | 2008-07-08 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
| US7678526B2 (en) * | 2005-10-07 | 2010-03-16 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
| DE602005013398D1 (de) | 2005-11-18 | 2009-04-30 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
| PL1788443T3 (pl) | 2005-11-18 | 2014-12-31 | Agfa Nv | Sposób wytwarzania litograficznej płyty drukowej |
| ES2320561T3 (es) | 2005-11-18 | 2009-05-25 | Agfa Graphics N.V. | Metodo para fabricar una plancha de impresion litografica. |
| ES2322655T5 (es) | 2005-11-18 | 2019-06-27 | Agfa Nv | Método para fabricar una plancha de impresión litográfica |
| DE602005013399D1 (de) | 2005-11-18 | 2009-04-30 | Agfa Graphics Nv | Verfahren zur Herstellung einer lithographischen Druckplatte |
| PL1788442T3 (pl) | 2005-11-18 | 2011-01-31 | Agfa Graphics Nv | Sposób wytwarzania litograficznej formy drukowej |
| ATE422253T1 (de) | 2005-11-18 | 2009-02-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckform |
| EP1788444B1 (en) | 2005-11-18 | 2011-01-26 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| EP1788449A1 (en) | 2005-11-21 | 2007-05-23 | Agfa Graphics N.V. | Method for making a lithographic printing plate |
| DE602005014249D1 (de) | 2005-11-21 | 2009-06-10 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
| EP1788435B1 (en) | 2005-11-21 | 2013-05-01 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| US20080008957A1 (en) * | 2006-06-27 | 2008-01-10 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable elements |
| US7332253B1 (en) * | 2006-07-27 | 2008-02-19 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| DE602006009919D1 (de) * | 2006-08-03 | 2009-12-03 | Agfa Graphics Nv | Flachdruckplattenträger |
| US7452638B2 (en) | 2006-09-18 | 2008-11-18 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US20080145789A1 (en) * | 2006-10-13 | 2008-06-19 | Elizabeth Knight | Method of making lithographic printing plates |
| US7883826B2 (en) * | 2006-12-07 | 2011-02-08 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US7429445B1 (en) * | 2007-03-07 | 2008-09-30 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
| ATE441534T1 (de) * | 2007-03-19 | 2009-09-15 | Agfa Graphics Nv | Verfahren zur herstellung eines lithographischen druckplattenträgers |
| US7732118B2 (en) * | 2007-05-10 | 2010-06-08 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
| US20080311520A1 (en) * | 2007-06-13 | 2008-12-18 | Jianfei Yu | On-press developable negative-working imageable elements and methods of use |
| US7622241B2 (en) * | 2007-06-26 | 2009-11-24 | Eastman Kodak Company | Initiator compositions, negative-working imageable elements, and methods of use |
| ATE484386T1 (de) * | 2007-07-02 | 2010-10-15 | Fujifilm Corp | Flachdruckplattenvorläufer und flachdruckverfahren damit |
| WO2009063024A1 (en) * | 2007-11-16 | 2009-05-22 | Agfa Graphics Nv | Method of making a lithographic printing plate |
| EP2065211B1 (en) | 2007-11-30 | 2010-05-26 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| ES2430562T3 (es) | 2008-03-04 | 2013-11-21 | Agfa Graphics N.V. | Método para la fabricación de un soporte de una plancha de impresión litográfica |
| EP2098367A1 (en) | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| JP2009236942A (ja) * | 2008-03-25 | 2009-10-15 | Fujifilm Corp | 平版印刷版原版及びその製版方法 |
| ATE514561T1 (de) * | 2008-03-31 | 2011-07-15 | Agfa Graphics Nv | Verfahren zur behandlung einer lithografischen druckplatte |
| US8084182B2 (en) * | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
| EP2186637B1 (en) | 2008-10-23 | 2012-05-02 | Agfa Graphics N.V. | A lithographic printing plate |
| US20100151385A1 (en) * | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8883401B2 (en) | 2009-09-24 | 2014-11-11 | Fujifilm Corporation | Lithographic printing original plate |
| US8426104B2 (en) | 2009-10-08 | 2013-04-23 | Eastman Kodak Company | Negative-working imageable elements |
| BRPI1010588A2 (pt) | 2009-10-29 | 2015-08-25 | Mylan Group | Compostos galotânicos para composições de revestimentos de placa de impressão litográfica |
| US8329383B2 (en) * | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| JP2011148292A (ja) * | 2009-12-25 | 2011-08-04 | Fujifilm Corp | 平版印刷版原版及びその製版方法 |
| EP2610067B1 (en) * | 2010-08-27 | 2014-11-26 | FUJIFILM Corporation | Master planographic printing plate for on-press development, and plate-making method using said master planographic printing plate |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| JP5705584B2 (ja) | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| KR101256067B1 (ko) * | 2011-03-24 | 2013-04-18 | 삼성에스디아이 주식회사 | 리튬 이차 전지용 음극, 이의 제조 방법 및 이를 포함하는 리튬 이차 전지 |
| CN103562794B (zh) | 2011-03-28 | 2016-07-13 | 富士胶片株式会社 | 平版印刷版的制版方法 |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8703381B2 (en) | 2011-08-31 | 2014-04-22 | Eastman Kodak Company | Lithographic printing plate precursors for on-press development |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| JP5732012B2 (ja) | 2011-09-26 | 2015-06-10 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| BR112014007143A2 (pt) | 2011-09-26 | 2017-06-13 | Fujifilm Corp | processo para fabricar chapa de impressão litográfica |
| CN102504137B (zh) * | 2011-11-11 | 2015-05-06 | 乐凯华光印刷科技有限公司 | 一种热塑性纳微米颗粒 |
| CN102582312B (zh) * | 2011-12-23 | 2016-06-29 | 乐凯华光印刷科技有限公司 | 一种低化学处理紫激光光聚合型平版印刷版 |
| JP5463346B2 (ja) | 2011-12-26 | 2014-04-09 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| IN2014DN07816A (OSRAM) | 2012-06-05 | 2015-05-15 | Agfa Graphics Nv | |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| EP2902214B1 (en) | 2012-09-26 | 2017-09-27 | FUJIFILM Corporation | Lithographic presensitized plate and method for making lithographic printing plate |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9568822B2 (en) | 2013-06-14 | 2017-02-14 | Agfa Graphics Nv | Lithographic printing plate precursor |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| EP2883699B1 (en) | 2013-12-11 | 2017-05-03 | Agfa Graphics Nv | A lithographic printing plate precursor and monomer |
| EP2916171B1 (en) | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | A method for making a lithographic printing plate precursor |
| EP3032334B1 (en) | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | A system for reducing ablation debris |
| US9417524B1 (en) | 2015-03-10 | 2016-08-16 | Eastman Kodak Company | Infrared radiation-sensitive lithographic printing plate precursors |
| US9366962B1 (en) | 2015-03-10 | 2016-06-14 | Eastman Kodak Company | Negative-working lithographic printing plate precursor and use |
| US20170021656A1 (en) | 2015-07-24 | 2017-01-26 | Kevin Ray | Lithographic imaging and printing with negative-working photoresponsive printing members |
| US20170217149A1 (en) | 2016-01-28 | 2017-08-03 | Eastman Kodak Company | Negatively-working lithographic printing plate precursor and method |
| CN108778747A (zh) | 2016-03-16 | 2018-11-09 | 爱克发有限公司 | 加工平版印刷版的方法 |
| TWI629564B (zh) * | 2016-06-17 | 2018-07-11 | 長興材料工業股份有限公司 | 可聚合組合物及其應用 |
| CN106313870B (zh) | 2016-08-19 | 2018-06-15 | 浙江康尔达新材料股份有限公司 | 一种可成像涂层、热敏阴图平版印刷版及其制版方法 |
| US20180157176A1 (en) | 2016-12-02 | 2018-06-07 | Eastman Kodak Company | Lithographic printing plate precursor and use |
| CN110121680B (zh) | 2017-01-04 | 2022-10-04 | 伊斯曼柯达公司 | 阴图制版平版印刷版前体和用途 |
| US10828884B2 (en) | 2017-03-02 | 2020-11-10 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
| EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
| US10576730B2 (en) | 2017-07-19 | 2020-03-03 | Eastman Kodak Company | Method for preparing lithographic printing plates |
| CN109776737B (zh) * | 2017-11-11 | 2023-01-06 | 乐凯华光印刷科技有限公司 | 耐溶剂树脂、含有该树脂的感光组合物及该组合物的应用 |
| EP3587113B1 (en) | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3587112B1 (en) | 2018-06-21 | 2024-04-03 | Eco3 Bv | A lithographic printing plate precursor |
| US20200096865A1 (en) | 2018-09-21 | 2020-03-26 | Eastman Kodak Company | Lithographic printing plate precursor and color-forming composition |
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| US11117412B2 (en) | 2019-10-01 | 2021-09-14 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
| EP3815900A1 (en) | 2019-10-31 | 2021-05-05 | Agfa Nv | A lithographic printing plate precursor and method for making hydrophobic resin particles |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| EP3875271B1 (en) | 2020-03-04 | 2025-10-15 | Eco3 Bv | A lithographic printing plate precursor |
| US11714354B2 (en) | 2020-03-25 | 2023-08-01 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP3892469B1 (en) | 2020-04-10 | 2023-11-08 | Eco3 Bv | Lithographic printing plate precursor |
| ES3037727T3 (en) | 2020-08-31 | 2025-10-06 | Eco3 Bv | A lithographic printing plate precursor, a method for making a lithographic printing plate precursor and a method for making a lithographic printing plate |
| US11760081B2 (en) | 2020-09-04 | 2023-09-19 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| WO2022073849A1 (en) | 2020-10-09 | 2022-04-14 | Agfa Offset Bv | A lithographic printing plate precursor |
| JP2022086645A (ja) * | 2020-11-30 | 2022-06-09 | 日本精工株式会社 | 食用油劣化抑制フィルターその製造方法 |
| CN116490365B (zh) | 2020-12-04 | 2025-08-12 | 伊斯曼柯达公司 | 平版印版前体和使用方法 |
| EP4263224A1 (en) | 2020-12-16 | 2023-10-25 | Eco3 Bv | Lithographic printing press make-ready method |
| WO2022132444A1 (en) | 2020-12-17 | 2022-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
| EP4035897A1 (en) | 2021-01-28 | 2022-08-03 | Agfa Offset Bv | A lithographic printing plate precursor |
| WO2022212032A1 (en) | 2021-04-01 | 2022-10-06 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4101830A1 (en) | 2021-06-10 | 2022-12-14 | FEW Chemicals GmbH | Novel diaryliodonium salt mixtures as low molecular weight photoinitiators with minimized crystallization behavior and elevated solubility |
| US20230091079A1 (en) | 2021-07-23 | 2023-03-23 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| CN117881549A (zh) | 2021-08-31 | 2024-04-12 | 富士胶片株式会社 | 平版印刷版用支承体、平版印刷版原版、平版印刷版的制造方法 |
| CN113942289B (zh) | 2021-10-26 | 2023-02-28 | 浙江康尔达新材料股份有限公司 | 一种用于光敏阴图型平版印刷版的可成像组合物及其制版方法 |
| US12222645B2 (en) | 2022-03-03 | 2025-02-11 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4239411A1 (en) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Method and apparatus for processing a lithographic printing plate precursor |
| US12429774B2 (en) | 2022-08-04 | 2025-09-30 | Eastman Kodak Company | Lithographic printing plate precursors, methods of using and manufacture |
| US20240069439A1 (en) | 2022-08-12 | 2024-02-29 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
| US12429770B2 (en) | 2023-06-27 | 2025-09-30 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003087939A2 (en) * | 2002-04-10 | 2003-10-23 | Kodak Polychrome Graphics Llc | On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4565769A (en) | 1984-11-21 | 1986-01-21 | E. I. Du Pont De Nemours And Company | Polymeric sensitizers for photopolymer composition |
| US4973572A (en) | 1987-12-21 | 1990-11-27 | Eastman Kodak Company | Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer |
| JPH0820734B2 (ja) | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | 感光性組成物及びそれを用いた光重合性組成物 |
| US5075192A (en) | 1988-08-30 | 1991-12-24 | E. I. Du Pont De Nemours And Company | Aqueous processible photosensitive compositions containing core shell microgels |
| US5242779A (en) | 1989-06-21 | 1993-09-07 | Hoechst Aktiengesellschaft | Photosensitive mixture containing photocurable compound and polyurethane binder with grafted vinyl alcohol units, carboxylic acid vinyl ester units and vinyl acetal units |
| GB9004337D0 (en) | 1990-02-27 | 1990-04-25 | Minnesota Mining & Mfg | Preparation and use of dyes |
| US5107063A (en) | 1990-10-31 | 1992-04-21 | E. I. Du Pont De Nemours And Company | Aqueous soluble infrared antihalation dyes |
| JP2677457B2 (ja) | 1991-01-22 | 1997-11-17 | 日本ペイント株式会社 | 光重合性組成物 |
| GB9110417D0 (en) | 1991-05-14 | 1991-07-03 | Du Pont Howson Ltd | Improvements in or relating to the formation of images |
| GB9110418D0 (en) | 1991-05-14 | 1991-07-03 | Du Pont Howson Ltd | Radiation-sensitive material |
| US5330884A (en) | 1993-05-26 | 1994-07-19 | E. I. Du Pont De Nemours And Company | Photographic element with near-infrared antihalation layer |
| US5616449A (en) | 1993-11-01 | 1997-04-01 | Polaroid Corporation | Lithographic printing plates with dispersed rubber additives |
| JP3321288B2 (ja) | 1994-04-25 | 2002-09-03 | 日本ペイント株式会社 | 近赤外光重合性組成物 |
| US5629354A (en) | 1995-02-28 | 1997-05-13 | Eastman Kodak Company | Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator |
| US5599650A (en) | 1995-04-28 | 1997-02-04 | Polaroid Corporation | Photoreaction quenchers in on-press developable lithographic printing plates |
| US6489078B1 (en) | 1996-07-19 | 2002-12-03 | Agfa-Gevaert | IR radiation-sensitive imaging element and a method for producing lithographic plates therewith |
| JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| US5811220A (en) | 1996-10-10 | 1998-09-22 | Polaroid Corporation | On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel |
| US6017673A (en) | 1997-04-15 | 2000-01-25 | Agfa-Gevaert, N.V. | Lithographic printing plate and treating liquids for such plate comprising a hydrophilic amphoretic block copolymer |
| JPH10339951A (ja) | 1997-06-09 | 1998-12-22 | Toyobo Co Ltd | 感光性樹脂組成物 |
| US6249311B1 (en) * | 1998-02-24 | 2001-06-19 | Inframetrics Inc. | Lens assembly with incorporated memory module |
| US5972838A (en) | 1998-06-24 | 1999-10-26 | Eastman Kodak Company | Infrared-absorbing cyanine colorants for laser-colorant transfer |
| ATE520528T1 (de) | 1999-06-04 | 2011-09-15 | Fujifilm Corp | Vorläufer für eine flachdruckplatte sowie verfahren zu seiner herstellung |
| US6071675A (en) | 1999-06-05 | 2000-06-06 | Teng; Gary Ganghui | On-press development of a lithographic plate comprising dispersed solid particles |
| US6550387B1 (en) | 1999-08-31 | 2003-04-22 | Agfa-Gevaert | Processless thermal printing plate with well defined nanostructure |
| US6294311B1 (en) | 1999-12-22 | 2001-09-25 | Kodak Polychrome Graphics Llc | Lithographic printing plate having high chemical resistance |
| JP2001270919A (ja) | 2000-01-17 | 2001-10-02 | Toyo Gosei Kogyo Kk | 高分子化合物及びその製造方法並びに感光性組成物及びパターン形成方法 |
| US6187502B1 (en) | 2000-01-28 | 2001-02-13 | Eastman Kodak Company | Stabilizer for infrared-absorbing cyanine colorant for laser-colorant transfer |
| US6309792B1 (en) | 2000-02-18 | 2001-10-30 | Kodak Polychrome Graphics Llc | IR-sensitive composition and use thereof for the preparation of printing plate precursors |
| US6884568B2 (en) | 2000-10-17 | 2005-04-26 | Kodak Polychrome Graphics, Llc | Stabilized infrared-sensitive polymerizable systems |
| EP1216831B1 (en) | 2000-12-13 | 2003-10-29 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
| US6740470B2 (en) | 2001-02-08 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
| JP2002251008A (ja) | 2001-02-23 | 2002-09-06 | Fuji Photo Film Co Ltd | 画像記録材料 |
| US6641976B2 (en) | 2001-03-20 | 2003-11-04 | Agfa-Gevaert | Method of making a negative-working heat-sensitive lithographic printing plate precursor |
| US7045271B2 (en) * | 2004-05-10 | 2006-05-16 | Eastman Kodak Company | On press developable imageable element |
| US6582882B2 (en) | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
| US20040091811A1 (en) | 2002-10-30 | 2004-05-13 | Munnelly Heidi M. | Hetero-substituted aryl acetic acid co-initiators for IR-sensitive compositions |
| US6846614B2 (en) | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
| ATE381432T1 (de) | 2001-08-01 | 2008-01-15 | Fujifilm Corp | Flachdruckplattenvorläufer |
| JP2003057830A (ja) | 2001-08-15 | 2003-02-28 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4152656B2 (ja) * | 2002-04-02 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版用原版 |
| US6902865B2 (en) | 2002-07-22 | 2005-06-07 | Gary Ganghui Teng | Non-alkaline aqueous development of thermosensitive lithographic printing plates |
-
2004
- 2004-06-17 US US10/872,209 patent/US7261998B2/en not_active Expired - Lifetime
-
2005
- 2005-06-02 BR BRPI0512217-1A patent/BRPI0512217B1/pt active IP Right Grant
- 2005-06-02 CN CNB200580019851XA patent/CN100537235C/zh not_active Expired - Lifetime
- 2005-06-02 JP JP2007516525A patent/JP2008503365A/ja not_active Withdrawn
- 2005-06-02 EP EP05784260A patent/EP1765593B1/en not_active Expired - Lifetime
- 2005-06-02 DE DE602005005058T patent/DE602005005058T2/de not_active Expired - Lifetime
- 2005-06-02 WO PCT/US2005/019391 patent/WO2006007270A1/en not_active Ceased
-
2012
- 2012-09-18 JP JP2012203991A patent/JP5395238B2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003087939A2 (en) * | 2002-04-10 | 2003-10-23 | Kodak Polychrome Graphics Llc | On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments |
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Also Published As
| Publication number | Publication date |
|---|---|
| WO2006007270A1 (en) | 2006-01-19 |
| CN100537235C (zh) | 2009-09-09 |
| US20050003285A1 (en) | 2005-01-06 |
| JP5395238B2 (ja) | 2014-01-22 |
| DE602005005058D1 (de) | 2008-04-10 |
| BRPI0512217B1 (pt) | 2018-02-06 |
| JP2013047004A (ja) | 2013-03-07 |
| BRPI0512217A (pt) | 2008-02-19 |
| EP1765593A1 (en) | 2007-03-28 |
| HK1102187A1 (zh) | 2007-11-09 |
| EP1765593B1 (en) | 2008-02-27 |
| CN1972803A (zh) | 2007-05-30 |
| US7261998B2 (en) | 2007-08-28 |
| DE602005005058T2 (de) | 2009-03-19 |
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