JP2008066567A - 配線パターンとこれを用いた電子素子、有機半導体素子、積層配線パターンおよび積層配線基板 - Google Patents

配線パターンとこれを用いた電子素子、有機半導体素子、積層配線パターンおよび積層配線基板 Download PDF

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Publication number
JP2008066567A
JP2008066567A JP2006243988A JP2006243988A JP2008066567A JP 2008066567 A JP2008066567 A JP 2008066567A JP 2006243988 A JP2006243988 A JP 2006243988A JP 2006243988 A JP2006243988 A JP 2006243988A JP 2008066567 A JP2008066567 A JP 2008066567A
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JP
Japan
Prior art keywords
layer
pattern
wiring pattern
conductive
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006243988A
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English (en)
Japanese (ja)
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JP2008066567A5 (enExample
Inventor
Hidenori Tomono
英紀 友野
Ikue Kawashima
伊久▲衛▼ 川島
Yukie Suzuki
幸栄 鈴木
Zenichi Akiyama
善一 秋山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP2006243988A priority Critical patent/JP2008066567A/ja
Priority to DE602007011546T priority patent/DE602007011546D1/de
Priority to US11/846,092 priority patent/US7816672B2/en
Priority to EP07115110A priority patent/EP1898478B1/en
Publication of JP2008066567A publication Critical patent/JP2008066567A/ja
Publication of JP2008066567A5 publication Critical patent/JP2008066567A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1208—Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/464—Lateral top-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H10K71/611—Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/09218—Conductive traces
    • H05K2201/09272—Layout details of angles or corners
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1173—Differences in wettability, e.g. hydrophilic or hydrophobic areas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Thin Film Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Electroluminescent Light Sources (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2006243988A 2006-09-08 2006-09-08 配線パターンとこれを用いた電子素子、有機半導体素子、積層配線パターンおよび積層配線基板 Pending JP2008066567A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006243988A JP2008066567A (ja) 2006-09-08 2006-09-08 配線パターンとこれを用いた電子素子、有機半導体素子、積層配線パターンおよび積層配線基板
DE602007011546T DE602007011546D1 (de) 2006-09-08 2007-08-28 Verdrahtungsmuster, elektronische Vorrichtung, organisches Halbleiterbauelement, geschichtetes Verdrahtungsmuster und geschichtetes Verdrahtungssubstrat mit dem Verdrahtungsmuster
US11/846,092 US7816672B2 (en) 2006-09-08 2007-08-28 Wiring pattern, electronic device, organic semiconductor device, layered wiring pattern, and layered wiring substrate using the wiring pattern
EP07115110A EP1898478B1 (en) 2006-09-08 2007-08-28 Wiring pattern, electronic device, organic semiconductor device, layered wiring pattern, and layered wiring substrate using the wiring pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006243988A JP2008066567A (ja) 2006-09-08 2006-09-08 配線パターンとこれを用いた電子素子、有機半導体素子、積層配線パターンおよび積層配線基板

Publications (2)

Publication Number Publication Date
JP2008066567A true JP2008066567A (ja) 2008-03-21
JP2008066567A5 JP2008066567A5 (enExample) 2009-08-13

Family

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Family Applications (1)

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JP2006243988A Pending JP2008066567A (ja) 2006-09-08 2006-09-08 配線パターンとこれを用いた電子素子、有機半導体素子、積層配線パターンおよび積層配線基板

Country Status (4)

Country Link
US (1) US7816672B2 (enExample)
EP (1) EP1898478B1 (enExample)
JP (1) JP2008066567A (enExample)
DE (1) DE602007011546D1 (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8269216B2 (en) 2010-02-19 2012-09-18 Seiko Epson Corporation Semiconductor device, method of manufacturing semiconductor device, and electronic apparatus
JP2014053587A (ja) * 2012-08-09 2014-03-20 Denso Corp 有機半導体薄膜の製造方法、それを適用した有機半導体装置の製造方法および有機半導体装置
US8779434B2 (en) 2007-10-15 2014-07-15 Ricoh Company, Ltd. Thin film transistor array and displaying apparatus
KR101557102B1 (ko) 2009-03-12 2015-10-13 삼성전자주식회사 반도체 소자의 금속 연결배선
US9224763B2 (en) 2011-03-28 2015-12-29 Samsung Display Co., Ltd. Display device and method of manufacturing the same
WO2016080263A1 (ja) * 2014-11-21 2016-05-26 デクセリアルズ株式会社 配線基板の製造方法、及び配線基板
KR20170045287A (ko) 2014-09-26 2017-04-26 후지필름 가부시키가이샤 도포 재료, 패턴 형성 방법 및 전자 디바이스의 그 제조 방법

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US8963126B2 (en) * 2008-01-07 2015-02-24 The Johns Hopkins University Low-voltage, N-channel transistors including a hybrid semiconductor-dielectric material
JP5386852B2 (ja) * 2008-05-07 2014-01-15 株式会社リコー 積層構造体、半導体装置、積層構造体の製造方法及び半導体装置の製造方法
JP4971241B2 (ja) * 2008-05-09 2012-07-11 株式会社リコー 画像表示装置
EP2313415A4 (en) * 2008-07-21 2011-11-02 Univ Johns Hopkins ORGANIC PYROMELLITE ACID DIAMIDE SUBSTITUTES AND DEVICES
GB0913456D0 (en) 2009-08-03 2009-09-16 Cambridge Entpr Ltd Printed electronic device
JP5899606B2 (ja) * 2010-03-04 2016-04-06 株式会社リコー 積層構造体の製造方法
JP6115008B2 (ja) 2011-06-09 2017-04-19 株式会社リコー 配線部材、および、電子素子の製造方法と、それを用いた配線部材、積層配線、電子素子、電子素子アレイ及び表示装置。
US8679984B2 (en) * 2011-06-30 2014-03-25 Samsung Electronics Co., Ltd. Method of manufacturing electric device, array of electric devices, and manufacturing method therefor
CN112268840B (zh) * 2020-11-05 2023-02-03 国网山东省电力公司电力科学研究院 一种检验涂层抗润湿性的试验装置及方法
KR102980008B1 (ko) * 2021-12-06 2026-06-22 삼성디스플레이 주식회사 표시 패널 및 이를 포함하는 전자 장치

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8779434B2 (en) 2007-10-15 2014-07-15 Ricoh Company, Ltd. Thin film transistor array and displaying apparatus
KR101557102B1 (ko) 2009-03-12 2015-10-13 삼성전자주식회사 반도체 소자의 금속 연결배선
US8269216B2 (en) 2010-02-19 2012-09-18 Seiko Epson Corporation Semiconductor device, method of manufacturing semiconductor device, and electronic apparatus
US9224763B2 (en) 2011-03-28 2015-12-29 Samsung Display Co., Ltd. Display device and method of manufacturing the same
JP2014053587A (ja) * 2012-08-09 2014-03-20 Denso Corp 有機半導体薄膜の製造方法、それを適用した有機半導体装置の製造方法および有機半導体装置
KR20170045287A (ko) 2014-09-26 2017-04-26 후지필름 가부시키가이샤 도포 재료, 패턴 형성 방법 및 전자 디바이스의 그 제조 방법
WO2016080263A1 (ja) * 2014-11-21 2016-05-26 デクセリアルズ株式会社 配線基板の製造方法、及び配線基板
JP2016100490A (ja) * 2014-11-21 2016-05-30 デクセリアルズ株式会社 配線基板の製造方法、及び配線基板
US10136521B2 (en) 2014-11-21 2018-11-20 Dexerials Corporation Wiring board and method for manufacturing the same

Also Published As

Publication number Publication date
DE602007011546D1 (de) 2011-02-10
US20080061288A1 (en) 2008-03-13
EP1898478A1 (en) 2008-03-12
US7816672B2 (en) 2010-10-19
EP1898478B1 (en) 2010-12-29

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