JP2008056521A5 - - Google Patents
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- Publication number
- JP2008056521A5 JP2008056521A5 JP2006233849A JP2006233849A JP2008056521A5 JP 2008056521 A5 JP2008056521 A5 JP 2008056521A5 JP 2006233849 A JP2006233849 A JP 2006233849A JP 2006233849 A JP2006233849 A JP 2006233849A JP 2008056521 A5 JP2008056521 A5 JP 2008056521A5
- Authority
- JP
- Japan
- Prior art keywords
- membrane
- metal container
- solid oxide
- fuel
- electrode membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012528 membrane Substances 0.000 description 20
- 239000000446 fuel Substances 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 6
- 238000010248 power generation Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006233849A JP4254823B2 (ja) | 2006-08-30 | 2006-08-30 | 反応装置及び電子機器 |
| JP2006267832A JP4466629B2 (ja) | 2006-08-30 | 2006-09-29 | 絶縁膜の製造方法 |
| JP2007133587A JP4508212B2 (ja) | 2006-08-30 | 2007-05-21 | 反応装置及び電子機器 |
| US11/893,277 US8097301B2 (en) | 2006-08-30 | 2007-08-15 | Electrical insulation film manufacturing method |
| KR1020070083183A KR100970048B1 (ko) | 2006-08-30 | 2007-08-20 | 절연막의 제조방법, 반응장치, 발전장치 및 전자기기 |
| KR1020090026504A KR100924185B1 (ko) | 2006-08-30 | 2009-03-27 | 절연막의 제조방법, 반응장치, 발전장치 및 전자기기 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006233849A JP4254823B2 (ja) | 2006-08-30 | 2006-08-30 | 反応装置及び電子機器 |
| JP2006267832A JP4466629B2 (ja) | 2006-08-30 | 2006-09-29 | 絶縁膜の製造方法 |
| JP2007133587A JP4508212B2 (ja) | 2006-08-30 | 2007-05-21 | 反応装置及び電子機器 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008056521A JP2008056521A (ja) | 2008-03-13 |
| JP2008056521A5 true JP2008056521A5 (enExample) | 2008-06-26 |
| JP4254823B2 JP4254823B2 (ja) | 2009-04-15 |
Family
ID=39151965
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006233849A Expired - Fee Related JP4254823B2 (ja) | 2006-08-30 | 2006-08-30 | 反応装置及び電子機器 |
| JP2006267832A Expired - Fee Related JP4466629B2 (ja) | 2006-08-30 | 2006-09-29 | 絶縁膜の製造方法 |
| JP2007133587A Expired - Fee Related JP4508212B2 (ja) | 2006-08-30 | 2007-05-21 | 反応装置及び電子機器 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006267832A Expired - Fee Related JP4466629B2 (ja) | 2006-08-30 | 2006-09-29 | 絶縁膜の製造方法 |
| JP2007133587A Expired - Fee Related JP4508212B2 (ja) | 2006-08-30 | 2007-05-21 | 反応装置及び電子機器 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8097301B2 (enExample) |
| JP (3) | JP4254823B2 (enExample) |
| KR (2) | KR100970048B1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE1017086A3 (fr) * | 2006-03-29 | 2008-02-05 | Ct Rech Metallurgiques Asbl | Procede de recuit et preparation en continu d'une bande en acier a haute resistance en vue de sa galvanisation au trempe. |
| JP4254823B2 (ja) | 2006-08-30 | 2009-04-15 | カシオ計算機株式会社 | 反応装置及び電子機器 |
| PL2106195T3 (pl) * | 2008-03-28 | 2010-09-30 | Braun Gmbh | Element grzewczy z czujnikiem temperatury |
| US8203105B2 (en) * | 2008-07-18 | 2012-06-19 | Advanced Materials Enterprises Company Limited | Nano thickness heating material coated food warmer devices for hospital and elsewhere daily usage |
| JP5157740B2 (ja) * | 2008-08-12 | 2013-03-06 | カシオ計算機株式会社 | サーミスタ兼電熱ヒータの製造方法 |
| DE102009037148B4 (de) | 2009-08-06 | 2014-02-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Festoxid-Brennstoffzellen-System |
| JP5729572B2 (ja) * | 2011-01-31 | 2015-06-03 | Toto株式会社 | 固体電解質材料およびこれを備えた固体酸化物形燃料電池 |
| GB201101862D0 (en) | 2011-02-03 | 2011-03-23 | Univ Muenster Wilhelms | Method and device |
| KR101818681B1 (ko) * | 2011-07-25 | 2018-01-16 | 한국전자통신연구원 | 게터 내장형 전계방출 엑스선관 장치 |
| JP6845143B2 (ja) * | 2015-09-16 | 2021-03-17 | Koa株式会社 | 水素センサ |
| US11167375B2 (en) | 2018-08-10 | 2021-11-09 | The Research Foundation For The State University Of New York | Additive manufacturing processes and additively manufactured products |
| US12406741B2 (en) | 2022-08-10 | 2025-09-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor memory devices with backside heater structure |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0617473B1 (en) * | 1993-03-26 | 1999-01-13 | Matsushita Electric Industrial Co., Ltd. | Method of fabricating an oxide superconductor |
| JPH11503489A (ja) * | 1995-02-02 | 1999-03-26 | ハイドロ−ケベック | ナノ結晶Mg基−材料及びその水素輸送と水素貯蔵への利用 |
| JP3671233B2 (ja) | 1996-07-08 | 2005-07-13 | カシオ計算機株式会社 | 発光表示素子 |
| KR20000062364A (ko) | 1996-12-27 | 2000-10-25 | 부에트너 로버트 에이 | 절연전극을 가지는 전기로 및 용융금속을 제조하는 방법 |
| JPH10269986A (ja) | 1997-03-26 | 1998-10-09 | Casio Comput Co Ltd | 冷陰極及び冷陰極の製造方法並びに冷陰極蛍光管 |
| US6281626B1 (en) * | 1998-03-24 | 2001-08-28 | Casio Computer Co., Ltd. | Cold emission electrode method of manufacturing the same and display device using the same |
| JP2000281494A (ja) | 1999-03-26 | 2000-10-10 | Sony Corp | 酸化物の結晶成長方法および酸化物積層構造 |
| US6964826B2 (en) * | 1999-04-12 | 2005-11-15 | Ovonic Battery Company, Inc. | Coated catalytic material with a metal phase in contact with a grain boundary oxide |
| US6506265B2 (en) * | 2000-06-13 | 2003-01-14 | Shin-Etsu Chemical Co., Ltd. | R-Fe-B base permanent magnet materials |
| US6734453B2 (en) * | 2000-08-08 | 2004-05-11 | Translucent Photonics, Inc. | Devices with optical gain in silicon |
| JP2004063131A (ja) | 2002-07-25 | 2004-02-26 | Casio Comput Co Ltd | 化学反応装置及び燃料電池システム並びにその製造方法 |
| JP4414780B2 (ja) * | 2003-02-06 | 2010-02-10 | 大日本印刷株式会社 | 水素製造用のマイクロリアクターおよびその製造方法 |
| JP2004283749A (ja) | 2003-03-24 | 2004-10-14 | Casio Comput Co Ltd | 反応装置 |
| JP4709005B2 (ja) * | 2003-05-07 | 2011-06-22 | 財団法人国際超電導産業技術研究センター | 希土類系酸化物超電導体及びその製造方法 |
| AU2005229044B2 (en) * | 2004-03-23 | 2010-08-12 | Velocys, Inc. | Protected alloy surfaces in microchannel apparatus and catalysts, alumina supported catalysts, catalyst intermediates, and methods of forming catalysts and microchannel apparatus |
| WO2006036193A1 (en) * | 2004-03-23 | 2006-04-06 | Velocys, Inc. | Micro-channel reactor with catalysts applied directly to thermally-grown alumina, methods using same and oxidative dehydrogenation |
| US20070089806A1 (en) * | 2005-10-21 | 2007-04-26 | Rolf Blank | Powders for rare earth magnets, rare earth magnets and methods for manufacturing the same |
| US7928317B2 (en) * | 2006-06-05 | 2011-04-19 | Translucent, Inc. | Thin film solar cell |
| JP4254823B2 (ja) * | 2006-08-30 | 2009-04-15 | カシオ計算機株式会社 | 反応装置及び電子機器 |
-
2006
- 2006-08-30 JP JP2006233849A patent/JP4254823B2/ja not_active Expired - Fee Related
- 2006-09-29 JP JP2006267832A patent/JP4466629B2/ja not_active Expired - Fee Related
-
2007
- 2007-05-21 JP JP2007133587A patent/JP4508212B2/ja not_active Expired - Fee Related
- 2007-08-15 US US11/893,277 patent/US8097301B2/en not_active Expired - Fee Related
- 2007-08-20 KR KR1020070083183A patent/KR100970048B1/ko not_active Expired - Fee Related
-
2009
- 2009-03-27 KR KR1020090026504A patent/KR100924185B1/ko not_active Expired - Fee Related
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