JP2008088462A5 - - Google Patents

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Publication number
JP2008088462A5
JP2008088462A5 JP2006267832A JP2006267832A JP2008088462A5 JP 2008088462 A5 JP2008088462 A5 JP 2008088462A5 JP 2006267832 A JP2006267832 A JP 2006267832A JP 2006267832 A JP2006267832 A JP 2006267832A JP 2008088462 A5 JP2008088462 A5 JP 2008088462A5
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JP
Japan
Prior art keywords
film
view
membrane
solid oxide
metal container
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Application number
JP2006267832A
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English (en)
Japanese (ja)
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JP2008088462A (ja
JP4466629B2 (ja
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Publication date
Priority claimed from JP2006233849A external-priority patent/JP4254823B2/ja
Priority to JP2006233849A priority Critical patent/JP4254823B2/ja
Application filed filed Critical
Priority to JP2006267832A priority patent/JP4466629B2/ja
Priority to JP2007133587A priority patent/JP4508212B2/ja
Priority to US11/893,277 priority patent/US8097301B2/en
Priority to KR1020070083183A priority patent/KR100970048B1/ko
Publication of JP2008088462A publication Critical patent/JP2008088462A/ja
Publication of JP2008088462A5 publication Critical patent/JP2008088462A5/ja
Priority to KR1020090026504A priority patent/KR100924185B1/ko
Publication of JP4466629B2 publication Critical patent/JP4466629B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006267832A 2006-08-30 2006-09-29 絶縁膜の製造方法 Expired - Fee Related JP4466629B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006233849A JP4254823B2 (ja) 2006-08-30 2006-08-30 反応装置及び電子機器
JP2006267832A JP4466629B2 (ja) 2006-08-30 2006-09-29 絶縁膜の製造方法
JP2007133587A JP4508212B2 (ja) 2006-08-30 2007-05-21 反応装置及び電子機器
US11/893,277 US8097301B2 (en) 2006-08-30 2007-08-15 Electrical insulation film manufacturing method
KR1020070083183A KR100970048B1 (ko) 2006-08-30 2007-08-20 절연막의 제조방법, 반응장치, 발전장치 및 전자기기
KR1020090026504A KR100924185B1 (ko) 2006-08-30 2009-03-27 절연막의 제조방법, 반응장치, 발전장치 및 전자기기

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006233849A JP4254823B2 (ja) 2006-08-30 2006-08-30 反応装置及び電子機器
JP2006267832A JP4466629B2 (ja) 2006-08-30 2006-09-29 絶縁膜の製造方法
JP2007133587A JP4508212B2 (ja) 2006-08-30 2007-05-21 反応装置及び電子機器

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008310560A Division JP5233626B2 (ja) 2008-12-05 2008-12-05 絶縁膜の製造方法、反応装置、発電装置及び電子機器

Publications (3)

Publication Number Publication Date
JP2008088462A JP2008088462A (ja) 2008-04-17
JP2008088462A5 true JP2008088462A5 (enExample) 2008-06-26
JP4466629B2 JP4466629B2 (ja) 2010-05-26

Family

ID=39151965

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2006233849A Expired - Fee Related JP4254823B2 (ja) 2006-08-30 2006-08-30 反応装置及び電子機器
JP2006267832A Expired - Fee Related JP4466629B2 (ja) 2006-08-30 2006-09-29 絶縁膜の製造方法
JP2007133587A Expired - Fee Related JP4508212B2 (ja) 2006-08-30 2007-05-21 反応装置及び電子機器

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2006233849A Expired - Fee Related JP4254823B2 (ja) 2006-08-30 2006-08-30 反応装置及び電子機器

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2007133587A Expired - Fee Related JP4508212B2 (ja) 2006-08-30 2007-05-21 反応装置及び電子機器

Country Status (3)

Country Link
US (1) US8097301B2 (enExample)
JP (3) JP4254823B2 (enExample)
KR (2) KR100970048B1 (enExample)

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BE1017086A3 (fr) 2006-03-29 2008-02-05 Ct Rech Metallurgiques Asbl Procede de recuit et preparation en continu d'une bande en acier a haute resistance en vue de sa galvanisation au trempe.
JP4254823B2 (ja) * 2006-08-30 2009-04-15 カシオ計算機株式会社 反応装置及び電子機器
ATE467329T1 (de) * 2008-03-28 2010-05-15 Braun Gmbh Heizelement mit temperatursensor
US8203105B2 (en) * 2008-07-18 2012-06-19 Advanced Materials Enterprises Company Limited Nano thickness heating material coated food warmer devices for hospital and elsewhere daily usage
JP5157740B2 (ja) * 2008-08-12 2013-03-06 カシオ計算機株式会社 サーミスタ兼電熱ヒータの製造方法
DE102009037148B4 (de) * 2009-08-06 2014-02-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Festoxid-Brennstoffzellen-System
CN103477482A (zh) * 2011-01-31 2013-12-25 Toto株式会社 固体电解质材料及具备该固体电解质材料的固体氧化物型燃料电池
GB201101862D0 (en) 2011-02-03 2011-03-23 Univ Muenster Wilhelms Method and device
KR101818681B1 (ko) * 2011-07-25 2018-01-16 한국전자통신연구원 게터 내장형 전계방출 엑스선관 장치
CN108027333B (zh) * 2015-09-16 2021-06-25 Koa株式会社 氢传感器
US11167375B2 (en) 2018-08-10 2021-11-09 The Research Foundation For The State University Of New York Additive manufacturing processes and additively manufactured products
US12406741B2 (en) 2022-08-10 2025-09-02 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor memory devices with backside heater structure

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69415846T2 (de) * 1993-03-26 1999-08-05 Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka Verfahren zur Herstellung eines Oxid-Supraleiters
EP0815273B1 (en) * 1995-02-02 2001-05-23 Hydro-Quebec NANOCRYSTALLINE Mg-BASED MATERIALS AND USE THEREOF FOR THE TRANSPORTATION AND STORAGE OF HYDROGEN
JP3671233B2 (ja) 1996-07-08 2005-07-13 カシオ計算機株式会社 発光表示素子
KR20000062364A (ko) 1996-12-27 2000-10-25 부에트너 로버트 에이 절연전극을 가지는 전기로 및 용융금속을 제조하는 방법
JPH10269986A (ja) 1997-03-26 1998-10-09 Casio Comput Co Ltd 冷陰極及び冷陰極の製造方法並びに冷陰極蛍光管
US6281626B1 (en) * 1998-03-24 2001-08-28 Casio Computer Co., Ltd. Cold emission electrode method of manufacturing the same and display device using the same
JP2000281494A (ja) 1999-03-26 2000-10-10 Sony Corp 酸化物の結晶成長方法および酸化物積層構造
US6964826B2 (en) * 1999-04-12 2005-11-15 Ovonic Battery Company, Inc. Coated catalytic material with a metal phase in contact with a grain boundary oxide
EP1164599B1 (en) * 2000-06-13 2007-12-05 Shin-Etsu Chemical Co., Ltd. R-Fe-B base permanent magnet materials
US6734453B2 (en) * 2000-08-08 2004-05-11 Translucent Photonics, Inc. Devices with optical gain in silicon
JP2004063131A (ja) 2002-07-25 2004-02-26 Casio Comput Co Ltd 化学反応装置及び燃料電池システム並びにその製造方法
JP4414780B2 (ja) * 2003-02-06 2010-02-10 大日本印刷株式会社 水素製造用のマイクロリアクターおよびその製造方法
JP2004283749A (ja) 2003-03-24 2004-10-14 Casio Comput Co Ltd 反応装置
JP4709005B2 (ja) * 2003-05-07 2011-06-22 財団法人国際超電導産業技術研究センター 希土類系酸化物超電導体及びその製造方法
CN101052463B (zh) * 2004-03-23 2013-07-10 维罗西股份有限公司 有直接应用于氧化铝的催化剂的微通道反应器，使用该反应器方法和氧化脱氢
WO2006036193A1 (en) * 2004-03-23 2006-04-06 Velocys, Inc. Micro-channel reactor with catalysts applied directly to thermally-grown alumina, methods using same and oxidative dehydrogenation
US20070089806A1 (en) * 2005-10-21 2007-04-26 Rolf Blank Powders for rare earth magnets, rare earth magnets and methods for manufacturing the same
US7928317B2 (en) * 2006-06-05 2011-04-19 Translucent, Inc. Thin film solar cell
JP4254823B2 (ja) * 2006-08-30 2009-04-15 カシオ計算機株式会社 反応装置及び電子機器

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