JP2007517918A - 精製ポリマー材料及びポリマー材料の精製方法 - Google Patents
精製ポリマー材料及びポリマー材料の精製方法 Download PDFInfo
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Abstract
【選択図】 なし
Description
(a)平均粒径20μmの粒子数が濾過ポリマー材料1g当たり200個未満、
(b)平均粒径30μmの粒子数が濾過ポリマー材料1g当たり30個未満、
(c)平均粒径50μmの粒子数が濾過ポリマー材料1g当たり5個未満、
(d)平均粒径20〜100μmの粒子数が濾過ポリマー材料15g当たり50個未満、
(e)平均粒径175μm以上の粒子数が濾過ポリマー材料1g当たり0個
の少なくともいずれかを有する。本方法はさらに、
(a)濾過ポリマー組成物をペレット化する工程、
(b)ポリ(アリーレンエーテル)の溶剤への溶液を溶液濾過システムで濾過して濾液を形成し、濾液から溶剤を除去してポリ(アリーレンエーテル)を含むコンセントレートを形成する工程、
(c)押出機を約0.5kg/cm3〜約8kg/cm3の比押出量で運転し、押出機として二軸押出機を用いる工程、
(d)溶融濾過を、押出機内でのメルトの平均滞留時間が約1分以下となるように行う工程、
(e)難燃剤、離型剤、滑剤、酸化防止剤、熱安定剤、紫外線安定剤、顔料、染料、着色剤、帯電防止剤、導電剤及びこれらの添加剤の1種以上を含む組合せからなる群から選択される添加剤とメルトを溶融ブレンドする工程、
(f)メルトを耐衝撃性改良剤と溶融ブレンドする工程、
(g)溶融濾過システムを押出機のダイヘッドに配置する工程、
(h)押出機の内部自由空間を不活性ガスでガスシールする工程、
(i)溶融ポンプを使用する工程、
(j)溶融濾過を、生じる圧力降下がクリーン溶融濾過システムで得られる初期圧力降下と比較して5倍未満となるような条件下で行う工程、
(k)インライン又はオフライン品質モニターシステムを用いる工程、
(l)メルトを脱イオン化濾過水で冷却する工程、
(m)メルトをクラス100環境で溶融濾過する工程、
(n)濾過ポリマー組成物をクラス100環境内でパッケージする工程、
(o)溶融濾過システムがバイパスシステムを含む、
(p)濾過ポリマー組成物を水中ダイフェースペレタイザ装置又は水リングペレタイザ装置でペレット化する工程
の少なくともいずれかを含む。
ポリフェニレンエーテル(PPE、粉末、IV0.33、GE Advanced Materials,Plastics社製)とポリスチレン(xPS、Novacor2272、Mw214000、Mn71600、Mw/Mn2.99、Nova Chemical社製)の40/60wt%ブレンドを、真空ベント付き40mm二軸コンパウンダーでコンパウンディングした。ベントを約20インチ水銀(508mmHg)の真空に引いた。コンパウンド材料を3つのバレル(ゾーン)を有する単軸押出機に供給した。押出機には、押出機ダイヘッドの位置に焼結金属繊維フィルター(PALL、孔径3μm、キャンドル形状)を取り付けた。
Claims (11)
- 約90〜約10重量%のポリ(アリーレンエーテル)樹脂と約10〜約90重量%のポリ(アルケニル芳香族)樹脂とを含む濾過ポリマー組成物であって、
当該濾過ポリマー生成物が、5回のサンプル測定の平均値で、以下の特性:
(a)平均粒径20μmの粒子数が濾過ポリマー材料1g当たり200個未満、
(b)平均粒径30μmの粒子数が濾過ポリマー材料1g当たり30個未満、
(c)平均粒径50μmの粒子数が濾過ポリマー材料1g当たり5個未満、
(d)平均粒径20〜100μmの粒子数が濾過ポリマー材料15g当たり50個未満、
(e)平均粒径175μm以上の粒子数が濾過ポリマー材料1g当たり0個
の少なくともいずれかを有する、濾過ポリマー組成物。 - 前記ポリ(アリーレンエーテル)が(a)ポリ(2,6−ジメチル−1,4−フェニレンエーテル)及び(b)ポリ(2,6−ジメチルフェニレンエーテル−コ−2,3,6−トリメチルフェニレンエーテル)の1種以上を含み、前記ポリ(アリーレンエーテル)の固有粘度がクロロホルム中25℃で測定して約0.10〜約0.60dl/gであり、前記ポリ(アルケニル芳香族)が(i)アタクチックホモポリスチレン及び(ii)スチレンと1種以上のポリオレフィンとの非弾性ブロック共重合体の1種以上である、請求項1記載の濾過ポリマー組成物。
- ポリマー組成物の精製方法であって、当該方法が、
ポリ(アリーレンエーテル)とポリ(アルケニル芳香族)を押出機で溶融ブレンディングしてメルトを形成し、
メルトを溶融濾過システムで溶融濾過して濾過ポリマー組成物を得る工程を含んでおり、
得られる濾過ポリマー組成物が、5回のサンプル測定の平均値で、以下の特性:
(a)平均粒径20μmの粒子数が濾過ポリマー材料1g当たり200個未満、
(b)平均粒径30μmの粒子数が濾過ポリマー材料1g当たり30個未満、
(c)平均粒径50μmの粒子数が濾過ポリマー材料1g当たり5個未満、
(d)平均粒径20〜100μmの粒子数が濾過ポリマー材料15g当たり50個未満、
(e)平均粒径175μm以上の粒子数が濾過ポリマー材料1g当たり0個
の少なくともいずれかを有する、方法。 - さらに、
(a)濾過ポリマー組成物をペレット化する工程、
(b)ポリ(アリーレンエーテル)の溶剤への溶液を溶液濾過システムで濾過して濾液を形成し、濾液から溶剤を除去してポリ(アリーレンエーテル)を含むコンセントレートを形成する工程、
(c)押出機を約0.5kg/cm3〜約8kg/cm3の比押出量で運転し、押出機として二軸押出機を用いる工程、
(d)溶融濾過を、押出機内でのメルトの平均滞留時間が約1分以下となるように行う工程、
(e)難燃剤、離型剤、滑剤、酸化防止剤、熱安定剤、紫外線安定剤、顔料、染料、着色剤、帯電防止剤、導電剤及びこれらの添加剤の1種以上を含む組合せからなる群から選択される添加剤とメルトを溶融ブレンドする工程、
(f)メルトを耐衝撃性改良剤と溶融ブレンドする工程、
(g)溶融濾過システムを押出機のダイヘッドに配置する工程、
(h)押出機の内部自由空間を不活性ガスでガスシールする工程、
(i)溶融ポンプを使用する工程、
(j)溶融濾過を、生じる圧力降下がクリーン溶融濾過システムで得られる初期圧力降下と比較して5倍未満となる条件下で行う工程、
(k)インライン又はオフライン品質モニターシステムを用いる工程、
(l)メルトを脱イオン化濾過水で冷却する工程、
(m)メルトをクラス100環境で溶融濾過する工程、
(n)濾過ポリマー組成物をクラス100環境内でパッケージする工程、
(o)溶融濾過システムがバイパスシステムを含む、
(p)濾過ポリマー組成物を水中ダイフェースペレタイザ装置又は水リングペレタイザ装置でペレット化する工程
の少なくともいずれかを含む、請求項3記載の方法。 - 前記溶融濾過システムが、焼結金属フィルター、メタルメッシュフィルター、金属繊維フェルトフィルター、セラミックフィルター又はこれらのフィルターの少なくともいずれかを含む組合せを含み、溶融濾過システムが孔径約1.0〜約50μmのフィルターを含む、請求項3又は請求項4記載の方法。
- ポリマー材料の精製方法であって、当該方法が、
ポリ(アリーレンエーテル)とポリスチレンの全重量を基準にして約60〜約30重量%のポリ(アリーレンエーテル)と約40〜約70重量%のポリスチレンを押出機で溶融ブレンディングしてメルトを形成し、
メルトを溶融濾過システムで溶融濾過して濾過ポリマー材料を得る工程を含み、
得られる濾過ポリマー材料が可視粒状不純物を実質的に含まず、押出機内でのメルトの滞留時間が約1分以内である、
ポリマー材料の精製方法。 - 前記ポリ(アリーレンエーテル)が(a)ポリ(2,6−ジメチル−1,4−フェニレンエーテル)及び(b)ポリ(2,6−ジメチルフェニレンエーテル−コ−2,3,6−トリメチルフェニレンエーテル)の1種以上を含み、前記ポリ(アリーレンエーテル)の固有粘度がクロロホルム中25℃で測定して約0.10〜約0.60dl/gであり、前記ポリ(アルケニル芳香族)が(i)アタクチックホモポリスチレン及び(ii)スチレンと1種以上のポリオレフィンとの非弾性ブロック共重合体の1種以上である、請求項3乃至請求項6のいずれか1項記載の方法。
- 請求項1又は請求項2記載の濾過ポリマー組成物を含んでなる物品であって、射出成形、ブロー成形、押出、シート押出、フィルム押出、異形押出、引抜成形、圧縮成形、熱成形、圧力成形、油圧成形又は真空成形で成形した物品。
- 基板層、データ及びカバー層を含むデータ記憶媒体であって、
データが基板層とカバー層との間に位置し、
カバー層が、データの読取、書込又は読取・書込のため光源が通過できる100μm以下の厚さを有し、
基板層が濾過ポリマー組成物を含有し、
上記濾過ポリマー生成物が約90〜約10重量%のポリ(アリーレンエーテル)樹脂と約10〜約90重量%のポリ(アルケニル芳香族)樹脂を含有し、
基板層に存在する平均粒径30〜100μmの範囲の粒子の数が50個未満である、
データ記憶媒体。 - 基板層、データ及びカバー層を含むデータ記憶媒体であって、
データが基板層とカバー層との間に位置し、
カバー層が、データの読取、書込又は読取・書込のため光源が通過できる100μm以下の厚さを有し、
基板層が濾過ポリマー組成物を含有し、
上記濾過ポリマー生成物が約90〜約10重量%のポリ(アリーレンエーテル)樹脂と約10〜約90重量%のポリ(アルケニル芳香族)樹脂を含有し、
上記濾過ポリマー生成物が、5回のサンプル測定の平均値で、以下の特性:
(a)平均粒径20μmの粒子数が濾過ポリマー材料1g当たり200個未満、
(b)平均粒径30μmの粒子数が濾過ポリマー材料1g当たり30個未満、
(c)平均粒径50μmの粒子数が濾過ポリマー材料1g当たり5個未満、
(d)平均粒径20〜100μmの粒子数が濾過ポリマー材料15g当たり50個未満、
(e)平均粒径175μm以上の粒子数が濾過ポリマー材料1g当たり0個
の少なくともいずれかを有する、
データ記憶媒体。 - 前記基板層が平均粒径175μm超の粒子を含有せず、
前記ポリ(アリーレンエーテル)が(a)ポリ(2,6−ジメチル−1,4−フェニレンエーテル)及び(b)ポリ(2,6−ジメチルフェニレンエーテル−コ−2,3,6−トリメチルフェニレンエーテル)の1種以上を含み、前記ポリ(アリーレンエーテル)の固有粘度がクロロホルム中25℃で測定して約0.10〜約0.60dl/gであり、前記ポリ(アルケニル芳香族)が(i)アタクチックホモポリスチレン及び(ii)スチレンと1種以上のポリオレフィンとの非弾性ブロック共重合体の1種以上である、
請求項9又は請求項10記載のデータ記憶媒体。
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US10/648,604 US7244813B2 (en) | 2003-08-26 | 2003-08-26 | Methods of purifying polymeric material |
US10/922,194 US7314907B2 (en) | 2003-08-26 | 2004-08-19 | Purified polymeric materials and methods of purifying polymeric materials |
PCT/US2004/027237 WO2005021648A1 (en) | 2003-08-26 | 2004-08-23 | Purified polymeric materials and methods of purifying polymeric materials |
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EP (1) | EP1660580A1 (ja) |
JP (2) | JP2007517918A (ja) |
KR (1) | KR100810356B1 (ja) |
CN (2) | CN1871301B (ja) |
WO (1) | WO2005021648A1 (ja) |
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US7244813B2 (en) | 2007-07-17 |
KR20060083970A (ko) | 2006-07-21 |
US20050046070A1 (en) | 2005-03-03 |
US20050064129A1 (en) | 2005-03-24 |
US7585935B2 (en) | 2009-09-08 |
CN1871301B (zh) | 2010-12-29 |
EP1660580A1 (en) | 2006-05-31 |
US20080187753A1 (en) | 2008-08-07 |
KR100810356B1 (ko) | 2008-03-04 |
CN1871301A (zh) | 2006-11-29 |
US7314907B2 (en) | 2008-01-01 |
CN101693783A (zh) | 2010-04-14 |
JP2012224865A (ja) | 2012-11-15 |
WO2005021648A1 (en) | 2005-03-10 |
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