JP2007180310A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP2007180310A JP2007180310A JP2005377841A JP2005377841A JP2007180310A JP 2007180310 A JP2007180310 A JP 2007180310A JP 2005377841 A JP2005377841 A JP 2005377841A JP 2005377841 A JP2005377841 A JP 2005377841A JP 2007180310 A JP2007180310 A JP 2007180310A
- Authority
- JP
- Japan
- Prior art keywords
- trench
- gate electrode
- conductive film
- semiconductor
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 51
- 239000011800 void material Substances 0.000 claims abstract description 39
- 239000011229 interlayer Substances 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 13
- 239000010410 layer Substances 0.000 claims description 47
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 238000009792 diffusion process Methods 0.000 claims description 7
- 230000015556 catabolic process Effects 0.000 abstract description 10
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 15
- 229920005591 polysilicon Polymers 0.000 description 15
- 230000005684 electric field Effects 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 239000008186 active pharmaceutical agent Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 description 4
- 229910021342 tungsten silicide Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- -1 tungsten silicide) Chemical compound 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0649—Dielectric regions, e.g. SiO2 regions, air gaps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42356—Disposition, e.g. buried gate electrode
- H01L29/4236—Disposition, e.g. buried gate electrode within a trench, e.g. trench gate electrode, groove gate electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4916—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a silicon layer, e.g. polysilicon doped with boron, phosphorus or nitrogen
- H01L29/4925—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a silicon layer, e.g. polysilicon doped with boron, phosphorus or nitrogen with a multiple layer structure, e.g. several silicon layers with different crystal structure or grain arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/495—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo
- H01L29/4958—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo with a multiple layer structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
- H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
Abstract
【解決手段】トレンチゲート型のMOSトランジスタにおいて、トレンチ15が形成され、このトレンチにゲート絶縁膜16を介してゲート電極が埋め込まれる。ゲート電極は、ゲート絶縁膜16に沿ってトレンチ15内部に凹部を有するように形成される第1のゲート電極17Aと、この凹部側の表面に沿って形成される層間絶縁膜18と、凹部を埋め込むように形成され第1のゲート電極17と同一の材料からなる第2のゲート電極19Aとを有する。
【選択図】図2
Description
Claims (5)
- 第1導電型の第1半導体層と、
前記第1半導体層の表面上に形成された第1導電型の第2半導体層と、
前記第2半導体層上に形成された第2導電型の半導体ベース層と、
前記半導体ベース層の表面に形成された第1導電型の半導体拡散層と、
前記半導体拡散層の表面から前記第2半導体層に達する深さに形成されたトレンチと、
前記トレンチにゲート絶縁膜を介して導電膜を埋め込んで形成されるゲート電極と、
前記半導体拡散層及び半導体ベース層にコンタクトする第1の主電極と、
前記第1半導体層の裏面に形成された第2の主電極と
を備え、
前記導電膜は、前記ゲート絶縁膜に沿って前記トレンチ内部に凹部を有するように形成される第1の導電膜と、前記凹部を埋め込むように形成される第2の導電膜とを有する
ことを特徴とする半導体装置。
- 前記第1の導電膜及び前記第2の導電膜の少なくとも一方はシリコン系の導電膜を材料として形成される請求項1記載の半導体装置。
- 前記第2の導電膜は、内部にボイドを有することを特徴とする請求項1又は2記載の半導体装置。
- 前記第1の導電膜と前記第2導電膜との間に、前記第1の導電膜の凹部の表面に沿って形成される層間膜を更に備えたことを特徴とする請求項1記載の半導体装置。
- 前記第1の導電膜がシリコン系の導電膜であり、前記第2の導電膜が金属膜である請求項1記載の半導体装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005377841A JP2007180310A (ja) | 2005-12-28 | 2005-12-28 | 半導体装置 |
US11/616,603 US7525133B2 (en) | 2005-12-28 | 2006-12-27 | Trench-gate MOS transistor composed of multiple conductors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005377841A JP2007180310A (ja) | 2005-12-28 | 2005-12-28 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2007180310A true JP2007180310A (ja) | 2007-07-12 |
Family
ID=38192573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005377841A Pending JP2007180310A (ja) | 2005-12-28 | 2005-12-28 | 半導体装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7525133B2 (ja) |
JP (1) | JP2007180310A (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008034793A (ja) * | 2006-07-31 | 2008-02-14 | Hynix Semiconductor Inc | 半導体素子及びその製造方法 |
JP2009026931A (ja) * | 2007-07-19 | 2009-02-05 | Elpida Memory Inc | 半導体装置及びその製造方法 |
US8173506B2 (en) | 2009-03-23 | 2012-05-08 | Samsung Electronics Co., Ltd. | Method of forming buried gate electrode utilizing formation of conformal gate oxide and gate electrode layers |
CN103035500A (zh) * | 2012-06-04 | 2013-04-10 | 上海华虹Nec电子有限公司 | 沟槽栅的形成方法 |
WO2013179589A1 (ja) * | 2012-05-31 | 2013-12-05 | 株式会社デンソー | 半導体装置 |
JP5935948B2 (ja) * | 2013-08-06 | 2016-06-15 | 富士電機株式会社 | トレンチゲートmos型半導体装置およびその製造方法 |
CN108257871A (zh) * | 2016-12-29 | 2018-07-06 | 台湾积体电路制造股份有限公司 | 半导体器件及其制造方法 |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7332439B2 (en) * | 2004-09-29 | 2008-02-19 | Intel Corporation | Metal gate transistors with epitaxial source and drain regions |
US7709320B2 (en) * | 2006-06-28 | 2010-05-04 | International Business Machines Corporation | Method of fabricating trench capacitors and memory cells using trench capacitors |
TWI354334B (en) | 2006-09-29 | 2011-12-11 | Hynix Semiconductor Inc | Semiconductor device with bulb-type recessed chann |
US20100308400A1 (en) * | 2008-06-20 | 2010-12-09 | Maxpower Semiconductor Inc. | Semiconductor Power Switches Having Trench Gates |
KR20100065895A (ko) * | 2008-12-09 | 2010-06-17 | 주식회사 동부하이텍 | 트렌치형 mosfet 소자의 게이트 및 게이트 형성방법 |
KR101169167B1 (ko) * | 2010-10-25 | 2012-07-30 | 에스케이하이닉스 주식회사 | 반도체 소자 및 그 형성 방법 |
CN103377907A (zh) * | 2012-04-28 | 2013-10-30 | 上海华虹Nec电子有限公司 | 深沟槽器件的栅极多晶硅的制备方法 |
CN103035499A (zh) * | 2012-05-11 | 2013-04-10 | 上海华虹Nec电子有限公司 | 成长低应力绝缘栅双极型晶体管沟槽型栅极的方法 |
CN103035498A (zh) * | 2012-05-11 | 2013-04-10 | 上海华虹Nec电子有限公司 | 成长低应力igbt沟槽型栅极的方法 |
CN103050388A (zh) * | 2012-07-27 | 2013-04-17 | 上海华虹Nec电子有限公司 | Igbt沟槽型栅极的制造方法 |
JP2014060299A (ja) * | 2012-09-18 | 2014-04-03 | Toshiba Corp | 半導体装置 |
JP6102140B2 (ja) * | 2012-09-20 | 2017-03-29 | 三菱電機株式会社 | 半導体装置 |
US8987090B2 (en) * | 2013-07-03 | 2015-03-24 | Infineon Technologies Dresden Gmbh | Method of manufacturing a semiconductor device with device separation structures |
KR102181609B1 (ko) | 2014-02-04 | 2020-11-23 | 삼성전자주식회사 | 반도체 장치 및 그 제조 방법 |
EP3032586A1 (en) * | 2014-12-10 | 2016-06-15 | Nxp B.V. | Semiconductor arrangement comprising a trench and method of manufacturing the same |
CN106328697B (zh) * | 2015-07-02 | 2019-02-15 | 无锡华润上华科技有限公司 | 具有沟槽栅极结构的半导体器件及其制造方法 |
US10049927B2 (en) * | 2016-06-10 | 2018-08-14 | Applied Materials, Inc. | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient |
KR102527904B1 (ko) | 2016-11-18 | 2023-04-28 | 삼성전자주식회사 | 반도체 장치 및 그 제조 방법 |
US10622214B2 (en) | 2017-05-25 | 2020-04-14 | Applied Materials, Inc. | Tungsten defluorination by high pressure treatment |
KR102399497B1 (ko) * | 2017-05-29 | 2022-05-19 | 에스케이하이닉스 주식회사 | 매립게이트구조를 구비한 반도체장치 및 그 제조 방법 |
CN109216357B (zh) | 2017-06-30 | 2021-04-20 | 联华电子股份有限公司 | 半导体结构及其制作方法 |
US10276411B2 (en) | 2017-08-18 | 2019-04-30 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
KR102405723B1 (ko) | 2017-08-18 | 2022-06-07 | 어플라이드 머티어리얼스, 인코포레이티드 | 고압 및 고온 어닐링 챔버 |
KR102396319B1 (ko) | 2017-11-11 | 2022-05-09 | 마이크로머티어리얼즈 엘엘씨 | 고압 프로세싱 챔버를 위한 가스 전달 시스템 |
JP2021503714A (ja) | 2017-11-17 | 2021-02-12 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 高圧処理システムのためのコンデンサシステム |
KR20230079236A (ko) | 2018-03-09 | 2023-06-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 금속 함유 재료들을 위한 고압 어닐링 프로세스 |
JP6818712B2 (ja) * | 2018-03-22 | 2021-01-20 | 株式会社東芝 | 半導体装置 |
DE102018107417B4 (de) * | 2018-03-28 | 2024-02-08 | Infineon Technologies Austria Ag | Nadelzellengraben-MOSFET und Verfahren zur Herstellung desselben |
US10950429B2 (en) | 2018-05-08 | 2021-03-16 | Applied Materials, Inc. | Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom |
US10748783B2 (en) | 2018-07-25 | 2020-08-18 | Applied Materials, Inc. | Gas delivery module |
WO2020117462A1 (en) | 2018-12-07 | 2020-06-11 | Applied Materials, Inc. | Semiconductor processing system |
CN112992682A (zh) * | 2019-12-13 | 2021-06-18 | 华润微电子(重庆)有限公司 | 沟槽型场效应晶体管结构及其制备方法 |
JP7249269B2 (ja) * | 2019-12-27 | 2023-03-30 | 株式会社東芝 | 半導体装置およびその製造方法 |
US11901222B2 (en) | 2020-02-17 | 2024-02-13 | Applied Materials, Inc. | Multi-step process for flowable gap-fill film |
CN111785627B (zh) * | 2020-06-28 | 2023-03-14 | 上海华虹宏力半导体制造有限公司 | 具有沟槽栅的igbt器件的制造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000068505A (ja) * | 1998-08-20 | 2000-03-03 | Toshiba Corp | 半導体装置およびその製造方法 |
JP2000243952A (ja) * | 1999-02-19 | 2000-09-08 | Nec Corp | 半導体装置及びその製造方法 |
JP2001244325A (ja) * | 2000-02-28 | 2001-09-07 | Denso Corp | 半導体装置の製造方法及び絶縁ゲート型パワー素子 |
JP2001320051A (ja) * | 2000-05-10 | 2001-11-16 | Sanyo Electric Co Ltd | 絶縁ゲート型半導体装置 |
JP2003324197A (ja) * | 2002-04-30 | 2003-11-14 | Rohm Co Ltd | 半導体装置およびその製造方法 |
JP2005236160A (ja) * | 2004-02-23 | 2005-09-02 | Toyota Motor Corp | 半導体装置およびその製造方法 |
JP2005243932A (ja) * | 2004-02-26 | 2005-09-08 | Toshiba Corp | 半導体装置およびその製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3167457B2 (ja) * | 1992-10-22 | 2001-05-21 | 株式会社東芝 | 半導体装置 |
US20070004134A1 (en) * | 1996-05-29 | 2007-01-04 | Vora Madhukar B | Vertically integrated flash EPROM for greater density and lower cost |
JP3264264B2 (ja) * | 1999-03-01 | 2002-03-11 | 日本電気株式会社 | 相補型集積回路とその製造方法 |
JP2001284587A (ja) | 2000-03-28 | 2001-10-12 | Kaga Toshiba Electron Kk | 半導体装置およびその製造方法 |
JP4852792B2 (ja) * | 2001-03-30 | 2012-01-11 | 株式会社デンソー | 半導体装置の製造方法 |
-
2005
- 2005-12-28 JP JP2005377841A patent/JP2007180310A/ja active Pending
-
2006
- 2006-12-27 US US11/616,603 patent/US7525133B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000068505A (ja) * | 1998-08-20 | 2000-03-03 | Toshiba Corp | 半導体装置およびその製造方法 |
JP2000243952A (ja) * | 1999-02-19 | 2000-09-08 | Nec Corp | 半導体装置及びその製造方法 |
JP2001244325A (ja) * | 2000-02-28 | 2001-09-07 | Denso Corp | 半導体装置の製造方法及び絶縁ゲート型パワー素子 |
JP2001320051A (ja) * | 2000-05-10 | 2001-11-16 | Sanyo Electric Co Ltd | 絶縁ゲート型半導体装置 |
JP2003324197A (ja) * | 2002-04-30 | 2003-11-14 | Rohm Co Ltd | 半導体装置およびその製造方法 |
JP2005236160A (ja) * | 2004-02-23 | 2005-09-02 | Toyota Motor Corp | 半導体装置およびその製造方法 |
JP2005243932A (ja) * | 2004-02-26 | 2005-09-08 | Toshiba Corp | 半導体装置およびその製造方法 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008034793A (ja) * | 2006-07-31 | 2008-02-14 | Hynix Semiconductor Inc | 半導体素子及びその製造方法 |
US8933509B2 (en) | 2006-07-31 | 2015-01-13 | SK Hynix Inc. | Semiconductor device and method for fabricating the same |
JP2009026931A (ja) * | 2007-07-19 | 2009-02-05 | Elpida Memory Inc | 半導体装置及びその製造方法 |
US8173506B2 (en) | 2009-03-23 | 2012-05-08 | Samsung Electronics Co., Ltd. | Method of forming buried gate electrode utilizing formation of conformal gate oxide and gate electrode layers |
WO2013179589A1 (ja) * | 2012-05-31 | 2013-12-05 | 株式会社デンソー | 半導体装置 |
JP2013251397A (ja) * | 2012-05-31 | 2013-12-12 | Denso Corp | 半導体装置 |
CN103035500A (zh) * | 2012-06-04 | 2013-04-10 | 上海华虹Nec电子有限公司 | 沟槽栅的形成方法 |
JP5935948B2 (ja) * | 2013-08-06 | 2016-06-15 | 富士電機株式会社 | トレンチゲートmos型半導体装置およびその製造方法 |
US9461154B2 (en) | 2013-08-06 | 2016-10-04 | Fuji Electric Co., Ltd. | Trench gate MOS semiconductor device and method for manufacturing the same |
CN108257871A (zh) * | 2016-12-29 | 2018-07-06 | 台湾积体电路制造股份有限公司 | 半导体器件及其制造方法 |
CN108257871B (zh) * | 2016-12-29 | 2021-09-03 | 台湾积体电路制造股份有限公司 | 半导体器件及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20070145416A1 (en) | 2007-06-28 |
US7525133B2 (en) | 2009-04-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2007180310A (ja) | 半導体装置 | |
JP5449094B2 (ja) | 半導体装置 | |
US11257944B2 (en) | Semiconductor device and semiconductor device manufacturing method | |
JP4744958B2 (ja) | 半導体素子及びその製造方法 | |
US9917183B2 (en) | Semiconductor device | |
US8653589B2 (en) | Low Qgd trench MOSFET integrated with schottky rectifier | |
US20100264488A1 (en) | Low Qgd trench MOSFET integrated with schottky rectifier | |
US20120037983A1 (en) | Trench mosfet with integrated schottky rectifier in same cell | |
US20100237414A1 (en) | MSD integrated circuits with shallow trench | |
US8564052B2 (en) | Trench MOSFET with trenched floating gates in termination | |
JP2011124464A (ja) | 半導体装置及びその製造方法 | |
US20150325696A1 (en) | Semiconductor device | |
JP5795452B1 (ja) | 炭化ケイ素半導体装置、炭化ケイ素半導体装置の製造方法及び炭化ケイ素半導体装置の設計方法 | |
JP6571467B2 (ja) | 絶縁ゲート型スイッチング素子とその製造方法 | |
JP5223291B2 (ja) | 半導体装置の製造方法 | |
JP2007207784A (ja) | 半導体装置 | |
JP2012089824A (ja) | 半導体素子およびその製造方法 | |
JP5556863B2 (ja) | ワイドバンドギャップ半導体縦型mosfet | |
JP2009246225A (ja) | 半導体装置 | |
JP2017191817A (ja) | スイッチング素子の製造方法 | |
JP2008306022A (ja) | 半導体装置 | |
JP2009016480A (ja) | 半導体装置、及び半導体装置の製造方法 | |
TW200945586A (en) | Semiconductor device and method of manufacturing the same | |
JP2008060416A (ja) | 半導体装置 | |
JP7051890B2 (ja) | ワイドギャップ半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080801 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111213 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111215 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120208 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20121106 |