JP2006503972A5 - - Google Patents

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Publication number
JP2006503972A5
JP2006503972A5 JP2005501654A JP2005501654A JP2006503972A5 JP 2006503972 A5 JP2006503972 A5 JP 2006503972A5 JP 2005501654 A JP2005501654 A JP 2005501654A JP 2005501654 A JP2005501654 A JP 2005501654A JP 2006503972 A5 JP2006503972 A5 JP 2006503972A5
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JP
Japan
Prior art keywords
weight
aqueous
acid
residue
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005501654A
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English (en)
Japanese (ja)
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JP2006503972A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2003/033500 external-priority patent/WO2004037962A2/en
Publication of JP2006503972A publication Critical patent/JP2006503972A/ja
Publication of JP2006503972A5 publication Critical patent/JP2006503972A5/ja
Pending legal-status Critical Current

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JP2005501654A 2002-10-22 2003-10-21 半導体デバイスを洗浄するための水性リン酸組成物 Pending JP2006503972A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US41996802P 2002-10-22 2002-10-22
US43036502P 2002-12-03 2002-12-03
PCT/US2003/033500 WO2004037962A2 (en) 2002-10-22 2003-10-21 Aqueous phosphoric acid compositions for cleaning semiconductor devices

Publications (2)

Publication Number Publication Date
JP2006503972A JP2006503972A (ja) 2006-02-02
JP2006503972A5 true JP2006503972A5 (enExample) 2006-12-07

Family

ID=32179772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005501654A Pending JP2006503972A (ja) 2002-10-22 2003-10-21 半導体デバイスを洗浄するための水性リン酸組成物

Country Status (10)

Country Link
US (1) US7235188B2 (enExample)
EP (1) EP1576072B1 (enExample)
JP (1) JP2006503972A (enExample)
KR (1) KR20050084917A (enExample)
AT (1) ATE405622T1 (enExample)
AU (1) AU2003286584A1 (enExample)
DE (1) DE60323148D1 (enExample)
ES (1) ES2310677T3 (enExample)
TW (1) TWI309675B (enExample)
WO (1) WO2004037962A2 (enExample)

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US20090131295A1 (en) * 2007-11-16 2009-05-21 Hua Cui Compositions for Removal of Metal Hard Mask Etching Residues from a Semiconductor Substrate
TWI460557B (zh) * 2008-03-07 2014-11-11 Wako Pure Chem Ind Ltd 半導體表面用處理劑組成物及使用半導體表面用處理劑組成物之半導體表面處理方法
US20090270299A1 (en) * 2008-04-23 2009-10-29 Nissan Chemical Industries, Ltd. Composition for removing protective layer in fabrication of MEMS and method for removing same
JP5873718B2 (ja) 2008-10-21 2016-03-01 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 銅の洗浄及び保護配合物
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US8324114B2 (en) 2010-05-26 2012-12-04 Lam Research Corporation Method and apparatus for silicon oxide residue removal
US20120276714A1 (en) * 2011-04-28 2012-11-01 Nanya Technology Corporation Method of oxidizing polysilazane
US20120288335A1 (en) * 2011-05-11 2012-11-15 Rodney Green Soil Stabilization Composition and Methods for Use
TWI577834B (zh) * 2011-10-21 2017-04-11 富士軟片電子材料美國股份有限公司 新穎的鈍化組成物及方法
US20140329184A1 (en) * 2011-11-22 2014-11-06 Taminco Stabilized choline solutions and methods for preparing the same
KR101261599B1 (ko) 2012-10-23 2013-05-06 (주)아이리스 친환경 장비 세척제 및 이의 제조방법
US9058976B2 (en) 2012-11-06 2015-06-16 International Business Machines Corporation Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof
US8647445B1 (en) 2012-11-06 2014-02-11 International Business Machines Corporation Process for cleaning semiconductor devices and/or tooling during manufacturing thereof
KR102227978B1 (ko) * 2014-05-22 2021-03-15 삼성전자주식회사 전기습윤 소자용 유체 및 이를 이용한 전기습윤 소자
JP6363724B2 (ja) * 2014-10-31 2018-07-25 富士フイルム株式会社 ルテニウム除去組成物、及び、磁気抵抗メモリの製造方法
KR102456079B1 (ko) * 2014-12-24 2022-11-21 삼성디스플레이 주식회사 산화물 제거용 세정 조성물 및 이를 이용한 세정 방법
TWI629720B (zh) 2015-09-30 2018-07-11 東京威力科創股份有限公司 用於濕蝕刻製程之溫度的動態控制之方法及設備
CN108573856B (zh) * 2018-04-13 2020-09-04 深圳市华星光电技术有限公司 一种阵列基板的制备方法及清洗液
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KR102503999B1 (ko) * 2022-11-14 2023-02-27 강연중 질산과 약산을 일정 비율로 포함하여 반도체 설비 챔버하우징의 세정 시 발생하는 질소산화물 가스 발생을 줄이고 오염막을 효과적으로 제거하는 세정제 조성물
CN117327542A (zh) * 2023-09-27 2024-01-02 湖北宇浩高科新材料有限公司 一种清洗剂、无水磷酸铁生产装置的除垢方法及应用
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