ATE405622T1 - Wässrige phosphorsäurezusammensetzung zur reinigung von halbleiter-vorrichtungen - Google Patents

Wässrige phosphorsäurezusammensetzung zur reinigung von halbleiter-vorrichtungen

Info

Publication number
ATE405622T1
ATE405622T1 AT03777786T AT03777786T ATE405622T1 AT E405622 T1 ATE405622 T1 AT E405622T1 AT 03777786 T AT03777786 T AT 03777786T AT 03777786 T AT03777786 T AT 03777786T AT E405622 T1 ATE405622 T1 AT E405622T1
Authority
AT
Austria
Prior art keywords
phosphoric acid
semiconductor devices
acid composition
aqueous phosphoric
cleaning semiconductor
Prior art date
Application number
AT03777786T
Other languages
German (de)
English (en)
Inventor
Jerome Daviot
Christopher Reid
Douglas Holmes
Original Assignee
Ekc Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ekc Technology Inc filed Critical Ekc Technology Inc
Application granted granted Critical
Publication of ATE405622T1 publication Critical patent/ATE405622T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture
    • H10P70/27—Cleaning during device manufacture during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers
    • H10P70/273—Cleaning during device manufacture during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers the processing being a delineation of conductive layers, e.g. by RIE
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3227—Ethers thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AT03777786T 2002-10-22 2003-10-21 Wässrige phosphorsäurezusammensetzung zur reinigung von halbleiter-vorrichtungen ATE405622T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US41996802P 2002-10-22 2002-10-22
US43036502P 2002-12-03 2002-12-03

Publications (1)

Publication Number Publication Date
ATE405622T1 true ATE405622T1 (de) 2008-09-15

Family

ID=32179772

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03777786T ATE405622T1 (de) 2002-10-22 2003-10-21 Wässrige phosphorsäurezusammensetzung zur reinigung von halbleiter-vorrichtungen

Country Status (10)

Country Link
US (1) US7235188B2 (enExample)
EP (1) EP1576072B1 (enExample)
JP (1) JP2006503972A (enExample)
KR (1) KR20050084917A (enExample)
AT (1) ATE405622T1 (enExample)
AU (1) AU2003286584A1 (enExample)
DE (1) DE60323148D1 (enExample)
ES (1) ES2310677T3 (enExample)
TW (1) TWI309675B (enExample)
WO (1) WO2004037962A2 (enExample)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6825156B2 (en) * 2002-06-06 2004-11-30 Ekc Technology, Inc. Semiconductor process residue removal composition and process
US8003587B2 (en) * 2002-06-06 2011-08-23 Ekc Technology, Inc. Semiconductor process residue removal composition and process
TWI362415B (en) * 2003-10-27 2012-04-21 Wako Pure Chem Ind Ltd Novel detergent and method for cleaning
CN1918698B (zh) * 2004-02-09 2010-04-07 三菱化学株式会社 半导体装置用基板的洗涤液及洗涤方法
EP1628336B1 (en) * 2004-08-18 2012-01-04 Mitsubishi Gas Chemical Company, Inc. Cleaning liquid and cleaning method
WO2006081406A1 (en) * 2005-01-27 2006-08-03 Advanced Technology Materials, Inc. Compositions for processing of semiconductor substrates
US7923423B2 (en) * 2005-01-27 2011-04-12 Advanced Technology Materials, Inc. Compositions for processing of semiconductor substrates
KR100675284B1 (ko) * 2005-02-01 2007-01-26 삼성전자주식회사 마이크로일렉트로닉 세정제 및 이것을 사용하여반도체소자를 제조하는 방법
US7682458B2 (en) 2005-02-03 2010-03-23 Air Products And Chemicals, Inc. Aqueous based residue removers comprising fluoride
US7888302B2 (en) 2005-02-03 2011-02-15 Air Products And Chemicals, Inc. Aqueous based residue removers comprising fluoride
US7754668B2 (en) * 2005-05-06 2010-07-13 Mallinckrodt Baker. Inc Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
EP1949423A1 (en) * 2005-10-21 2008-07-30 Freescale Semiconductor, Inc. Method for removing etch residue and chemistry therefor
JP4693642B2 (ja) * 2006-01-30 2011-06-01 株式会社東芝 半導体装置の製造方法および洗浄装置
TW200734448A (en) * 2006-02-03 2007-09-16 Advanced Tech Materials Low pH post-CMP residue removal composition and method of use
KR20070088245A (ko) * 2006-02-24 2007-08-29 후지필름 가부시키가이샤 금속용 연마액
US20080039356A1 (en) * 2006-07-27 2008-02-14 Honeywell International Inc. Selective removal chemistries for semiconductor applications, methods of production and uses thereof
US20080139436A1 (en) * 2006-09-18 2008-06-12 Chris Reid Two step cleaning process to remove resist, etch residue, and copper oxide from substrates having copper and low-K dielectric material
US8685909B2 (en) 2006-09-21 2014-04-01 Advanced Technology Materials, Inc. Antioxidants for post-CMP cleaning formulations
US20080076688A1 (en) * 2006-09-21 2008-03-27 Barnes Jeffrey A Copper passivating post-chemical mechanical polishing cleaning composition and method of use
EP2082024A4 (en) * 2006-09-25 2010-11-17 Advanced Tech Materials COMPOSITIONS AND METHODS FOR REMOVING A PHOTORESISTANT AGENT FOR RECYCLING A SILICON GALETTE
JP4554665B2 (ja) * 2006-12-25 2010-09-29 富士フイルム株式会社 パターン形成方法、該パターン形成方法に用いられる多重現像用ポジ型レジスト組成物、該パターン形成方法に用いられるネガ現像用現像液及び該パターン形成方法に用いられるネガ現像用リンス液
KR100916353B1 (ko) * 2007-07-13 2009-09-11 제일모직주식회사 반도체 소자용 세정액 조성물 및 이를 이용한 반도체소자의 세정 방법
JP2011503899A (ja) * 2007-11-16 2011-01-27 イー．ケー．シー．テクノロジー．インコーポレーテッド 半導体基板から金属ハードマスクエッチング残留物を除去するための組成物
TWI460557B (zh) * 2008-03-07 2014-11-11 和光純藥工業股份有限公司 半導體表面用處理劑組成物及使用半導體表面用處理劑組成物之半導體表面處理方法
US20090270299A1 (en) * 2008-04-23 2009-10-29 Nissan Chemical Industries, Ltd. Composition for removing protective layer in fabrication of MEMS and method for removing same
WO2010048139A2 (en) 2008-10-21 2010-04-29 Advanced Technology Materials, Inc. Copper cleaning and protection formulations
US8765653B2 (en) 2009-07-07 2014-07-01 Air Products And Chemicals, Inc. Formulations and method for post-CMP cleaning
US8101561B2 (en) 2009-11-17 2012-01-24 Wai Mun Lee Composition and method for treating semiconductor substrate surface
US8324114B2 (en) 2010-05-26 2012-12-04 Lam Research Corporation Method and apparatus for silicon oxide residue removal
US20120276714A1 (en) * 2011-04-28 2012-11-01 Nanya Technology Corporation Method of oxidizing polysilazane
US20120288335A1 (en) * 2011-05-11 2012-11-15 Rodney Green Soil Stabilization Composition and Methods for Use
TWI577834B (zh) * 2011-10-21 2017-04-11 富士軟片電子材料美國股份有限公司 新穎的鈍化組成物及方法
US20140329184A1 (en) * 2011-11-22 2014-11-06 Taminco Stabilized choline solutions and methods for preparing the same
KR101261599B1 (ko) 2012-10-23 2013-05-06 (주)아이리스 친환경 장비 세척제 및 이의 제조방법
US8647445B1 (en) 2012-11-06 2014-02-11 International Business Machines Corporation Process for cleaning semiconductor devices and/or tooling during manufacturing thereof
US9058976B2 (en) 2012-11-06 2015-06-16 International Business Machines Corporation Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof
KR102227978B1 (ko) * 2014-05-22 2021-03-15 삼성전자주식회사 전기습윤 소자용 유체 및 이를 이용한 전기습윤 소자
WO2016068183A1 (ja) * 2014-10-31 2016-05-06 富士フイルム株式会社 ルテニウム除去組成物、及び、磁気抵抗メモリの製造方法
KR102456079B1 (ko) * 2014-12-24 2022-11-21 삼성디스플레이 주식회사 산화물 제거용 세정 조성물 및 이를 이용한 세정 방법
TWI629720B (zh) 2015-09-30 2018-07-11 Tokyo Electron Limited 用於濕蝕刻製程之溫度的動態控制之方法及設備
CN108573856B (zh) * 2018-04-13 2020-09-04 深圳市华星光电技术有限公司 一种阵列基板的制备方法及清洗液
WO2020165698A1 (ja) * 2019-02-15 2020-08-20 株式会社半導体エネルギー研究所 半導体装置の作製方法
CN115427547A (zh) * 2020-04-09 2022-12-02 昭和电工株式会社 组合物、及粘接性聚合物的洗涤方法
KR102944347B1 (ko) * 2020-11-06 2026-03-27 주식회사 케이씨텍 연마 입자 용해용 조성물 및 이를 이용한 세정 방법
KR102944353B1 (ko) * 2020-11-06 2026-03-27 주식회사 케이씨텍 연마 입자 용해용 조성물 및 이를 이용한 세정 방법
US12341054B2 (en) * 2022-03-30 2025-06-24 Nanya Technology Corporation Method for fabricating semiconductor device with chelating agent
KR102503999B1 (ko) * 2022-11-14 2023-02-27 강연중 질산과 약산을 일정 비율로 포함하여 반도체 설비 챔버하우징의 세정 시 발생하는 질소산화물 가스 발생을 줄이고 오염막을 효과적으로 제거하는 세정제 조성물
CN117327542A (zh) * 2023-09-27 2024-01-02 湖北宇浩高科新材料有限公司 一种清洗剂、无水磷酸铁生产装置的除垢方法及应用
US12599937B2 (en) * 2024-01-23 2026-04-14 Applied Materials, Inc. Water-based, high-efficiency chemical reagent for substrate surface particle removal
CN119410418B (zh) * 2024-09-30 2026-07-28 湖北兴福电子材料股份有限公司 一种去除聚酰亚胺蚀刻后残留物的清洗液
CN121500698A (zh) * 2025-09-30 2026-02-10 湖北兴福电子材料股份有限公司 酸性剥离液及其在硅基表面复合膜剥离中的应用

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5826399B2 (ja) * 1978-06-05 1983-06-02 花王株式会社 液体洗浄剤組成物
US5981454A (en) * 1993-06-21 1999-11-09 Ekc Technology, Inc. Post clean treatment composition comprising an organic acid and hydroxylamine
US5279771A (en) * 1990-11-05 1994-01-18 Ekc Technology, Inc. Stripping compositions comprising hydroxylamine and alkanolamine
US6110881A (en) * 1990-11-05 2000-08-29 Ekc Technology, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
JP3160344B2 (ja) * 1991-01-25 2001-04-25 アシュランド インコーポレーテッド 有機ストリッピング組成物
US5262285A (en) * 1992-05-04 1993-11-16 Eastman Kodak Company Methods and compositions for retouching film images
US6825156B2 (en) * 2002-06-06 2004-11-30 Ekc Technology, Inc. Semiconductor process residue removal composition and process
JPH06212193A (ja) * 1992-12-21 1994-08-02 Nitto Chem Ind Co Ltd レジスト剥離剤除去用洗浄剤
US5419779A (en) * 1993-12-02 1995-05-30 Ashland Inc. Stripping with aqueous composition containing hydroxylamine and an alkanolamine
US6030932A (en) * 1996-09-06 2000-02-29 Olin Microelectronic Chemicals Cleaning composition and method for removing residues
US6149828A (en) * 1997-05-05 2000-11-21 Micron Technology, Inc. Supercritical etching compositions and method of using same
JPH1116882A (ja) * 1997-06-19 1999-01-22 Toray Fine Chem Co Ltd フォトレジスト剥離用組成物
JP3160238B2 (ja) * 1997-08-04 2001-04-25 岸本産業株式会社 半導体デバイス製造プロセス用および液晶デバイス製造プロセス用洗浄剤
US6045817A (en) * 1997-09-26 2000-04-04 Diversey Lever, Inc. Ultramild antibacterial cleaning composition for frequent use
JP3693143B2 (ja) * 1997-12-26 2005-09-07 株式会社ジャパンエナジー ウエハ洗浄用組成物及びそれを用いた洗浄方法
KR100610387B1 (ko) * 1998-05-18 2006-08-09 말린크로트 베이커, 인코포레이티드 초소형 전자 기판 세정용 실리케이트 함유 알칼리성 조성물
US6162738A (en) * 1998-09-01 2000-12-19 Micron Technology, Inc. Cleaning compositions for high dielectric structures and methods of using same
US5998358A (en) * 1999-03-23 1999-12-07 Ecolab Inc. Antimicrobial acid cleaner for use on organic or food soil
US6346217B1 (en) * 1999-06-02 2002-02-12 Water Whole International, Inc. Composition and method for cleaning drink water tanks
JP3365980B2 (ja) * 1999-08-03 2003-01-14 花王株式会社 洗浄剤組成物
US6686297B1 (en) * 2000-08-17 2004-02-03 Georg Gogg Method of manufacturing a semiconductor device and apparatus to be used therefore
JP4614415B2 (ja) * 2000-08-30 2011-01-19 フアインポリマーズ株式会社 レジスト残渣除去剤
US6951221B2 (en) * 2000-09-22 2005-10-04 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US6599370B2 (en) * 2000-10-16 2003-07-29 Mallinckrodt Inc. Stabilized alkaline compositions for cleaning microelectronic substrates
JP4689855B2 (ja) * 2001-03-23 2011-05-25 イーケーシー テクノロジー，インコーポレイティド 残渣剥離剤組成物およびその使用方法
US6475967B1 (en) * 2002-03-05 2002-11-05 Colgate-Palmolive Company Liquid dish cleaning compositions containing a peroxide source

Also Published As

Publication number Publication date
DE60323148D1 (de) 2008-10-02
WO2004037962A3 (en) 2004-09-23
AU2003286584A1 (en) 2004-05-13
EP1576072A4 (en) 2006-05-17
TWI309675B (en) 2009-05-11
ES2310677T3 (es) 2009-01-16
EP1576072B1 (en) 2008-08-20
WO2004037962A2 (en) 2004-05-06
TW200420724A (en) 2004-10-16
KR20050084917A (ko) 2005-08-29
US7235188B2 (en) 2007-06-26
EP1576072A2 (en) 2005-09-21
US20040137736A1 (en) 2004-07-15
AU2003286584A8 (en) 2004-05-13
JP2006503972A (ja) 2006-02-02

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