JP2006105951A5 - - Google Patents

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Publication number
JP2006105951A5
JP2006105951A5 JP2004322905A JP2004322905A JP2006105951A5 JP 2006105951 A5 JP2006105951 A5 JP 2006105951A5 JP 2004322905 A JP2004322905 A JP 2004322905A JP 2004322905 A JP2004322905 A JP 2004322905A JP 2006105951 A5 JP2006105951 A5 JP 2006105951A5
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JP
Japan
Prior art keywords
substrate
defect
image
light
polarized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004322905A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006105951A (ja
JP4901090B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2004322905A external-priority patent/JP4901090B2/ja
Priority to JP2004322905A priority Critical patent/JP4901090B2/ja
Priority to CNA2005101133586A priority patent/CN1758022A/zh
Priority to KR1020050093138A priority patent/KR20060052010A/ko
Priority to US11/243,425 priority patent/US7643137B2/en
Priority to TW094134913A priority patent/TW200626888A/zh
Publication of JP2006105951A publication Critical patent/JP2006105951A/ja
Publication of JP2006105951A5 publication Critical patent/JP2006105951A5/ja
Priority to US12/591,298 priority patent/US8446578B2/en
Priority to KR1020120021482A priority patent/KR101275343B1/ko
Publication of JP4901090B2 publication Critical patent/JP4901090B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004322905A 2003-03-26 2004-10-06 欠陥検査方法及び欠陥検出装置 Expired - Lifetime JP4901090B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004322905A JP4901090B2 (ja) 2004-10-06 2004-10-06 欠陥検査方法及び欠陥検出装置
CNA2005101133586A CN1758022A (zh) 2004-10-06 2005-09-28 缺陷检查方法
KR1020050093138A KR20060052010A (ko) 2004-10-06 2005-10-04 결함 검사 방법
US11/243,425 US7643137B2 (en) 2003-03-26 2005-10-05 Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
TW094134913A TW200626888A (en) 2004-10-06 2005-10-06 Defect inspection method
US12/591,298 US8446578B2 (en) 2003-03-26 2009-11-16 Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
KR1020120021482A KR101275343B1 (ko) 2004-10-06 2012-02-29 결함 검사 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004322905A JP4901090B2 (ja) 2004-10-06 2004-10-06 欠陥検査方法及び欠陥検出装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011023349A Division JP5287891B2 (ja) 2011-02-04 2011-02-04 欠陥検査方法

Publications (3)

Publication Number Publication Date
JP2006105951A JP2006105951A (ja) 2006-04-20
JP2006105951A5 true JP2006105951A5 (enExample) 2007-10-18
JP4901090B2 JP4901090B2 (ja) 2012-03-21

Family

ID=36375851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004322905A Expired - Lifetime JP4901090B2 (ja) 2003-03-26 2004-10-06 欠陥検査方法及び欠陥検出装置

Country Status (4)

Country Link
JP (1) JP4901090B2 (enExample)
KR (2) KR20060052010A (enExample)
CN (1) CN1758022A (enExample)
TW (1) TW200626888A (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060099344A1 (en) 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
JP4548385B2 (ja) 2006-05-10 2010-09-22 株式会社ニコン 表面検査装置
JP4692892B2 (ja) * 2006-06-01 2011-06-01 株式会社ニコン 表面検査装置
CN101473219B (zh) 2006-07-14 2012-02-29 株式会社尼康 表面检查设备
JP2010503862A (ja) * 2006-09-12 2010-02-04 ルドルフテクノロジーズ インコーポレイテッド 偏光撮像
JP5083315B2 (ja) * 2007-06-13 2012-11-28 株式会社ニコン 検査装置、検査方法およびプログラム
US8497985B2 (en) * 2007-10-23 2013-07-30 Shibaura Mechatronics Corporation Inspection method based on captured image and inspection device
JPWO2009125805A1 (ja) * 2008-04-09 2011-08-04 株式会社ニコン 表面検査方法および表面検査装置
JP2009300216A (ja) * 2008-06-12 2009-12-24 Nikon Corp 観察装置
JP5252286B2 (ja) * 2008-11-14 2013-07-31 株式会社ニコン 表面検査方法、表面検査装置および検査方法
TW201100787A (en) * 2009-02-18 2011-01-01 Nikon Corp Surface examining device and surface examining method
JP5924267B2 (ja) 2010-12-14 2016-05-25 株式会社ニコン 検査方法、検査装置、露光管理方法、露光システムおよび半導体デバイスの製造方法
JP6406492B2 (ja) * 2014-01-27 2018-10-17 株式会社ニコン 評価方法、評価装置、及び露光システム
US9599573B2 (en) * 2014-12-02 2017-03-21 Kla-Tencor Corporation Inspection systems and techniques with enhanced detection
CN108180826B (zh) * 2017-12-20 2023-12-22 深圳湾新科技有限公司 一种锂电池卷绕层边界的检测设备及检测方法
CN110132996A (zh) * 2019-06-06 2019-08-16 德淮半导体有限公司 缺陷检测装置及其检测方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS643545A (en) * 1987-06-26 1989-01-09 Hitachi Ltd Method and apparatus for inspection
JPS649306A (en) * 1987-07-01 1989-01-12 Fujitsu Ltd Detector for light transmitting fine pattern
JP3692685B2 (ja) * 1997-02-19 2005-09-07 株式会社ニコン 欠陥検査装置
JPH10325805A (ja) * 1997-05-23 1998-12-08 Nikon Corp 半導体ウエハの自動検査装置
JP3982017B2 (ja) * 1997-08-05 2007-09-26 株式会社ニコン 欠陥検査装置
JPH1164234A (ja) * 1997-08-20 1999-03-05 Advantest Corp 異物検出方法、および異物検出装置
KR100374762B1 (ko) * 1998-07-28 2003-03-04 히다치 덴시 엔지니어링 가부시키 가이샤 결함 검사 장치 및 그 방법
JP4184543B2 (ja) * 1999-06-10 2008-11-19 株式会社日立製作所 光学像検出方法および外観検査装置
JP3769996B2 (ja) * 1999-09-20 2006-04-26 三菱電機株式会社 欠陥検査用半導体基板、半導体基板の検査方法および半導体基板検査用モニター装置
JP2001165632A (ja) * 1999-12-03 2001-06-22 Sony Corp 検査装置及び検査方法
JP4153652B2 (ja) * 2000-10-05 2008-09-24 株式会社東芝 パターン評価装置及びパターン評価方法
JP2002257747A (ja) * 2001-02-27 2002-09-11 Matsushita Electric Ind Co Ltd 欠陥検査装置
KR100492159B1 (ko) * 2002-10-30 2005-06-02 삼성전자주식회사 기판 검사 장치
JP4183492B2 (ja) * 2002-11-27 2008-11-19 株式会社日立製作所 欠陥検査装置および欠陥検査方法

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