JPS643545A - Method and apparatus for inspection - Google Patents

Method and apparatus for inspection

Info

Publication number
JPS643545A
JPS643545A JP15767987A JP15767987A JPS643545A JP S643545 A JPS643545 A JP S643545A JP 15767987 A JP15767987 A JP 15767987A JP 15767987 A JP15767987 A JP 15767987A JP S643545 A JPS643545 A JP S643545A
Authority
JP
Japan
Prior art keywords
angle
polarized light
light
polarized
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15767987A
Other languages
Japanese (ja)
Inventor
Yoshikazu Tanabe
Toshiaki Yanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi High Tech Corp
Original Assignee
Hitachi Ltd
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Ltd
Priority to JP15767987A priority Critical patent/JPS643545A/en
Publication of JPS643545A publication Critical patent/JPS643545A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To improve detection sensitivity and accuracy by projecting S polarized light at a high angle and low angle and detecting the foreign matter sticking to the surface of an object to be inspected from the ratio of the quantity of light between the low-angle P polarized light component and high-angle S polarized light component in the reflected light. CONSTITUTION:The S polarized light of different wavelengths is projected at the high angle and low angle to the same section of a wafer 2 on a sample base 1 from laser diodes 3a, 3b, 4a, 4b. Part of the reflected light thereof enters a dichroic mirror 6, by which the low-angle reflected light from the diodes 3a, 3b is projected to a polarized beam splitter 7 and the high-angle reflected light from the diodes 4a, 4b is projected to a polarized beam splitter 8. The P polarized light component is then extracted in the splitter 7 and the P polarized light component in the splitter 8. These components are respectively transmitted via detecting parts 9, 10 to an arithmetic part 11. The arithmetic part 11 determines the ratio of the quantity of light between the P polarized light and the S polarized light. This ratio is compared with the prescribed set value P0 in a comparing part 12. The surface condition is thereby inspected with high sensitivity and accuracy.
JP15767987A 1987-06-26 1987-06-26 Method and apparatus for inspection Pending JPS643545A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15767987A JPS643545A (en) 1987-06-26 1987-06-26 Method and apparatus for inspection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15767987A JPS643545A (en) 1987-06-26 1987-06-26 Method and apparatus for inspection

Publications (1)

Publication Number Publication Date
JPS643545A true JPS643545A (en) 1989-01-09

Family

ID=15655015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15767987A Pending JPS643545A (en) 1987-06-26 1987-06-26 Method and apparatus for inspection

Country Status (1)

Country Link
JP (1) JPS643545A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0474951A (en) * 1990-07-17 1992-03-10 Hitachi Ltd Method and apparatus for inspection
JPH04318446A (en) * 1991-04-17 1992-11-10 Hitachi Electron Eng Co Ltd Foreign matter detecting system
JP2006105951A (en) * 2004-10-06 2006-04-20 Nikon Corp Defect inspection method
WO2009028709A1 (en) * 2007-08-30 2009-03-05 Ngk Insulators, Ltd. Method for inspecting defect of material to be inspected
WO2010095420A1 (en) * 2009-02-18 2010-08-26 株式会社ニコン Surface examining device and surface examining method
US8446578B2 (en) 2003-03-26 2013-05-21 Nikon Corporation Defect inspection apparatus, defect inspection method and method of inspecting hole pattern

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0474951A (en) * 1990-07-17 1992-03-10 Hitachi Ltd Method and apparatus for inspection
JPH04318446A (en) * 1991-04-17 1992-11-10 Hitachi Electron Eng Co Ltd Foreign matter detecting system
US8446578B2 (en) 2003-03-26 2013-05-21 Nikon Corporation Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
JP2006105951A (en) * 2004-10-06 2006-04-20 Nikon Corp Defect inspection method
WO2009028709A1 (en) * 2007-08-30 2009-03-05 Ngk Insulators, Ltd. Method for inspecting defect of material to be inspected
US8422014B2 (en) 2007-08-30 2013-04-16 Ngk Insulators, Ltd. Method for inspecting defect of article to be inspected
JP5508852B2 (en) * 2007-08-30 2014-06-04 日本碍子株式会社 Defect inspection method for specimen
WO2010095420A1 (en) * 2009-02-18 2010-08-26 株式会社ニコン Surface examining device and surface examining method
CN102334026A (en) * 2009-02-18 2012-01-25 株式会社尼康 Surface examining device and surface examining method
US8269969B2 (en) 2009-02-18 2012-09-18 Nikon Corporation Surface inspection device and surface inspection method

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