JP2005520936A5 - - Google Patents

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Publication number
JP2005520936A5
JP2005520936A5 JP2003580104A JP2003580104A JP2005520936A5 JP 2005520936 A5 JP2005520936 A5 JP 2005520936A5 JP 2003580104 A JP2003580104 A JP 2003580104A JP 2003580104 A JP2003580104 A JP 2003580104A JP 2005520936 A5 JP2005520936 A5 JP 2005520936A5
Authority
JP
Japan
Prior art keywords
silver plating
silver
peeling method
plating peeling
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003580104A
Other languages
English (en)
Japanese (ja)
Other versions
JP3683896B2 (ja
JP2005520936A (ja
Filing date
Publication date
Priority claimed from US10/106,522 external-priority patent/US6783690B2/en
Application filed filed Critical
Publication of JP2005520936A publication Critical patent/JP2005520936A/ja
Application granted granted Critical
Publication of JP3683896B2 publication Critical patent/JP3683896B2/ja
Publication of JP2005520936A5 publication Critical patent/JP2005520936A5/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2003580104A 2002-03-25 2003-02-18 プリント配線基板からの銀メッキ剥離方法 Expired - Lifetime JP3683896B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/106,522 2002-03-25
US10/106,522 US6783690B2 (en) 2002-03-25 2002-03-25 Method of stripping silver from a printed circuit board
PCT/US2003/004784 WO2003082605A1 (en) 2002-03-25 2003-02-18 Method of stripping silver from a printed circuit board

Publications (3)

Publication Number Publication Date
JP2005520936A JP2005520936A (ja) 2005-07-14
JP3683896B2 JP3683896B2 (ja) 2005-08-17
JP2005520936A5 true JP2005520936A5 (enExample) 2005-12-22

Family

ID=28452509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003580104A Expired - Lifetime JP3683896B2 (ja) 2002-03-25 2003-02-18 プリント配線基板からの銀メッキ剥離方法

Country Status (8)

Country Link
US (1) US6783690B2 (enExample)
EP (1) EP1487646B1 (enExample)
JP (1) JP3683896B2 (enExample)
CN (1) CN1703327B (enExample)
AU (1) AU2003217557A1 (enExample)
ES (1) ES2410811T3 (enExample)
TW (1) TWI256423B (enExample)
WO (1) WO2003082605A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4268515B2 (ja) * 2003-12-26 2009-05-27 新光電気工業株式会社 電解剥離方法
KR100712879B1 (ko) * 2005-04-06 2007-04-30 주식회사 잉크테크 에칭액 조성물
US20070232510A1 (en) * 2006-03-29 2007-10-04 Kucera Alvin A Method and composition for selectively stripping silver from a substrate
DE112009000839T5 (de) * 2008-04-10 2011-05-12 World Properties, Inc., Lincolnwood Schaltungsmaterialien mit verbesserter Bindung, Verfahren zur Herstellung hiervon und hieraus hergestellte Artikel
US8753561B2 (en) * 2008-06-20 2014-06-17 Baxter International Inc. Methods for processing substrates comprising metallic nanoparticles
US8178120B2 (en) * 2008-06-20 2012-05-15 Baxter International Inc. Methods for processing substrates having an antimicrobial coating
US8277826B2 (en) 2008-06-25 2012-10-02 Baxter International Inc. Methods for making antimicrobial resins
US20090324738A1 (en) * 2008-06-30 2009-12-31 Baxter International Inc. Methods for making antimicrobial coatings
US20100227052A1 (en) * 2009-03-09 2010-09-09 Baxter International Inc. Methods for processing substrates having an antimicrobial coating
KR101701537B1 (ko) * 2009-05-08 2017-02-01 바스프 에스이 루테늄 비롯한 귀금속의 화학적 기계적 평탄화를 위한 산화 입자계 슬러리
CN103237419B (zh) * 2013-04-22 2016-04-20 胜华电子(惠阳)有限公司 一种化银线路板银面剥除方法
WO2015095664A2 (en) 2013-12-20 2015-06-25 Greene Lyon Group, Inc. Method and apparatus for recovery of noble metals, including recovery of noble metals from plated and/or filled scrap
WO2016210051A1 (en) 2015-06-24 2016-12-29 Greene Lyon Group, Inc. Selective removal of noble metals using acidic fluids, including fluids containing nitrate ions
US20220151795A1 (en) 2019-03-11 2022-05-19 Shoulder Innovations, Inc. Total reverse shoulder systems and methods
CN114074492B (zh) * 2020-08-18 2024-06-25 光群雷射科技股份有限公司 去除转印滚轮的拆版线的方法
TWI755229B (zh) * 2020-12-30 2022-02-11 力橋國際有限公司 無氰之電解剝銀劑及電解剝銀方法
CN113846326A (zh) * 2021-09-23 2021-12-28 江苏富乐德半导体科技有限公司 一种陶瓷覆铜基板表面化学镀银退镀方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1583955A (enExample) * 1968-04-19 1969-12-12
US3860423A (en) 1973-08-24 1975-01-14 Rca Corp Etching solution for silver
US4204013A (en) 1978-10-20 1980-05-20 Oxy Metal Industries Corporation Method for treating polymeric substrates prior to plating employing accelerating composition containing an alkyl amine
US4448637A (en) 1981-12-28 1984-05-15 Daicel Chemical Industries, Ltd. Etching method of conductive film
US4960490A (en) 1983-06-13 1990-10-02 Minnesota Mining And Manufacturing Company Method of making multiple-connector adhesive tape
US5002649A (en) 1988-03-28 1991-03-26 Sifco Industries, Inc. Selective stripping apparatus
JPH03232980A (ja) * 1990-02-06 1991-10-16 Shinko Electric Ind Co Ltd 銅もしくは銅合金上の銀剥離液
DE4031609A1 (de) 1990-03-16 1991-09-19 Kodak Ag Verfahren und vorrichtung zur aufbereitung von fluessigen rueckstaenden aus photographischen prozessen
USH1136H (en) 1991-11-29 1993-02-02 The United States Of America As Represented By The Secretary Of The Air Force Electrolytic deposition and recovery of silver
JPH07316845A (ja) * 1994-05-19 1995-12-05 Hitachi Cable Ltd 銀めっき部材の表面処理液
US5611905A (en) * 1995-06-09 1997-03-18 Shipley Company, L.L.C. Electroplating process
US6200451B1 (en) 1996-03-22 2001-03-13 Macdermid, Incorporated Method for enhancing the solderability of a surface
TW385375B (en) * 1996-07-26 2000-03-21 Asahi Glass Co Ltd Transparent conductive film and forming method for transparent electrode
US6126720A (en) 1997-06-16 2000-10-03 Mitsubishi Materials Corporation Method for smelting noble metal
US6238592B1 (en) 1999-03-10 2001-05-29 3M Innovative Properties Company Working liquids and methods for modifying structured wafers suited for semiconductor fabrication

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