AU2003217557A1 - Method of stripping silver from a printed circuit board - Google Patents
Method of stripping silver from a printed circuit boardInfo
- Publication number
- AU2003217557A1 AU2003217557A1 AU2003217557A AU2003217557A AU2003217557A1 AU 2003217557 A1 AU2003217557 A1 AU 2003217557A1 AU 2003217557 A AU2003217557 A AU 2003217557A AU 2003217557 A AU2003217557 A AU 2003217557A AU 2003217557 A1 AU2003217557 A1 AU 2003217557A1
- Authority
- AU
- Australia
- Prior art keywords
- circuit board
- printed circuit
- stripping silver
- stripping
- silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910052709 silver Inorganic materials 0.000 title 1
- 239000004332 silver Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/40—Alkaline compositions for etching other metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0361—Stripping a part of an upper metal layer to expose a lower metal layer, e.g. by etching or using a laser
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
- H05K2203/0796—Oxidant in aqueous solution, e.g. permanganate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/106,522 | 2002-03-25 | ||
| US10/106,522 US6783690B2 (en) | 2002-03-25 | 2002-03-25 | Method of stripping silver from a printed circuit board |
| PCT/US2003/004784 WO2003082605A1 (en) | 2002-03-25 | 2003-02-18 | Method of stripping silver from a printed circuit board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2003217557A1 true AU2003217557A1 (en) | 2003-10-13 |
Family
ID=28452509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2003217557A Abandoned AU2003217557A1 (en) | 2002-03-25 | 2003-02-18 | Method of stripping silver from a printed circuit board |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6783690B2 (enExample) |
| EP (1) | EP1487646B1 (enExample) |
| JP (1) | JP3683896B2 (enExample) |
| CN (1) | CN1703327B (enExample) |
| AU (1) | AU2003217557A1 (enExample) |
| ES (1) | ES2410811T3 (enExample) |
| TW (1) | TWI256423B (enExample) |
| WO (1) | WO2003082605A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4268515B2 (ja) * | 2003-12-26 | 2009-05-27 | 新光電気工業株式会社 | 電解剥離方法 |
| KR100712879B1 (ko) * | 2005-04-06 | 2007-04-30 | 주식회사 잉크테크 | 에칭액 조성물 |
| US20070232510A1 (en) * | 2006-03-29 | 2007-10-04 | Kucera Alvin A | Method and composition for selectively stripping silver from a substrate |
| DE112009000839T5 (de) * | 2008-04-10 | 2011-05-12 | World Properties, Inc., Lincolnwood | Schaltungsmaterialien mit verbesserter Bindung, Verfahren zur Herstellung hiervon und hieraus hergestellte Artikel |
| US8753561B2 (en) * | 2008-06-20 | 2014-06-17 | Baxter International Inc. | Methods for processing substrates comprising metallic nanoparticles |
| US8178120B2 (en) * | 2008-06-20 | 2012-05-15 | Baxter International Inc. | Methods for processing substrates having an antimicrobial coating |
| US8277826B2 (en) | 2008-06-25 | 2012-10-02 | Baxter International Inc. | Methods for making antimicrobial resins |
| US20090324738A1 (en) * | 2008-06-30 | 2009-12-31 | Baxter International Inc. | Methods for making antimicrobial coatings |
| US20100227052A1 (en) * | 2009-03-09 | 2010-09-09 | Baxter International Inc. | Methods for processing substrates having an antimicrobial coating |
| KR101701537B1 (ko) * | 2009-05-08 | 2017-02-01 | 바스프 에스이 | 루테늄 비롯한 귀금속의 화학적 기계적 평탄화를 위한 산화 입자계 슬러리 |
| CN103237419B (zh) * | 2013-04-22 | 2016-04-20 | 胜华电子(惠阳)有限公司 | 一种化银线路板银面剥除方法 |
| WO2015095664A2 (en) | 2013-12-20 | 2015-06-25 | Greene Lyon Group, Inc. | Method and apparatus for recovery of noble metals, including recovery of noble metals from plated and/or filled scrap |
| WO2016210051A1 (en) | 2015-06-24 | 2016-12-29 | Greene Lyon Group, Inc. | Selective removal of noble metals using acidic fluids, including fluids containing nitrate ions |
| US20220151795A1 (en) | 2019-03-11 | 2022-05-19 | Shoulder Innovations, Inc. | Total reverse shoulder systems and methods |
| CN114074492B (zh) * | 2020-08-18 | 2024-06-25 | 光群雷射科技股份有限公司 | 去除转印滚轮的拆版线的方法 |
| TWI755229B (zh) * | 2020-12-30 | 2022-02-11 | 力橋國際有限公司 | 無氰之電解剝銀劑及電解剝銀方法 |
| CN113846326A (zh) * | 2021-09-23 | 2021-12-28 | 江苏富乐德半导体科技有限公司 | 一种陶瓷覆铜基板表面化学镀银退镀方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1583955A (enExample) * | 1968-04-19 | 1969-12-12 | ||
| US3860423A (en) | 1973-08-24 | 1975-01-14 | Rca Corp | Etching solution for silver |
| US4204013A (en) | 1978-10-20 | 1980-05-20 | Oxy Metal Industries Corporation | Method for treating polymeric substrates prior to plating employing accelerating composition containing an alkyl amine |
| US4448637A (en) | 1981-12-28 | 1984-05-15 | Daicel Chemical Industries, Ltd. | Etching method of conductive film |
| US4960490A (en) | 1983-06-13 | 1990-10-02 | Minnesota Mining And Manufacturing Company | Method of making multiple-connector adhesive tape |
| US5002649A (en) | 1988-03-28 | 1991-03-26 | Sifco Industries, Inc. | Selective stripping apparatus |
| JPH03232980A (ja) * | 1990-02-06 | 1991-10-16 | Shinko Electric Ind Co Ltd | 銅もしくは銅合金上の銀剥離液 |
| DE4031609A1 (de) | 1990-03-16 | 1991-09-19 | Kodak Ag | Verfahren und vorrichtung zur aufbereitung von fluessigen rueckstaenden aus photographischen prozessen |
| USH1136H (en) | 1991-11-29 | 1993-02-02 | The United States Of America As Represented By The Secretary Of The Air Force | Electrolytic deposition and recovery of silver |
| JPH07316845A (ja) * | 1994-05-19 | 1995-12-05 | Hitachi Cable Ltd | 銀めっき部材の表面処理液 |
| US5611905A (en) * | 1995-06-09 | 1997-03-18 | Shipley Company, L.L.C. | Electroplating process |
| US6200451B1 (en) | 1996-03-22 | 2001-03-13 | Macdermid, Incorporated | Method for enhancing the solderability of a surface |
| TW385375B (en) * | 1996-07-26 | 2000-03-21 | Asahi Glass Co Ltd | Transparent conductive film and forming method for transparent electrode |
| US6126720A (en) | 1997-06-16 | 2000-10-03 | Mitsubishi Materials Corporation | Method for smelting noble metal |
| US6238592B1 (en) | 1999-03-10 | 2001-05-29 | 3M Innovative Properties Company | Working liquids and methods for modifying structured wafers suited for semiconductor fabrication |
-
2002
- 2002-03-25 US US10/106,522 patent/US6783690B2/en not_active Expired - Lifetime
-
2003
- 2003-02-18 CN CN038066629A patent/CN1703327B/zh not_active Expired - Fee Related
- 2003-02-18 EP EP03713509.2A patent/EP1487646B1/en not_active Expired - Lifetime
- 2003-02-18 WO PCT/US2003/004784 patent/WO2003082605A1/en not_active Ceased
- 2003-02-18 JP JP2003580104A patent/JP3683896B2/ja not_active Expired - Lifetime
- 2003-02-18 ES ES03713509T patent/ES2410811T3/es not_active Expired - Lifetime
- 2003-02-18 AU AU2003217557A patent/AU2003217557A1/en not_active Abandoned
- 2003-02-27 TW TW092104260A patent/TWI256423B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| ES2410811T3 (es) | 2013-07-03 |
| JP3683896B2 (ja) | 2005-08-17 |
| TW200304507A (en) | 2003-10-01 |
| WO2003082605A1 (en) | 2003-10-09 |
| EP1487646A4 (en) | 2010-01-13 |
| EP1487646A1 (en) | 2004-12-22 |
| CN1703327B (zh) | 2010-06-09 |
| US20030183598A1 (en) | 2003-10-02 |
| TWI256423B (en) | 2006-06-11 |
| EP1487646B1 (en) | 2013-05-22 |
| JP2005520936A (ja) | 2005-07-14 |
| US6783690B2 (en) | 2004-08-31 |
| CN1703327A (zh) | 2005-11-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |