JP2005517026A5 - - Google Patents

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Publication number
JP2005517026A5
JP2005517026A5 JP2003566624A JP2003566624A JP2005517026A5 JP 2005517026 A5 JP2005517026 A5 JP 2005517026A5 JP 2003566624 A JP2003566624 A JP 2003566624A JP 2003566624 A JP2003566624 A JP 2003566624A JP 2005517026 A5 JP2005517026 A5 JP 2005517026A5
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JP
Japan
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twenty
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cycloalkyl
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oso
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Pending
Application number
JP2003566624A
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English (en)
Japanese (ja)
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JP2005517026A (ja
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Publication date
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Priority claimed from PCT/EP2003/000821 external-priority patent/WO2003067332A2/en
Publication of JP2005517026A publication Critical patent/JP2005517026A/ja
Publication of JP2005517026A5 publication Critical patent/JP2005517026A5/ja
Pending legal-status Critical Current

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JP2003566624A 2002-02-06 2003-01-28 スルホナート誘導体及び潜酸としてのその使用 Pending JP2005517026A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405082 2002-02-06
PCT/EP2003/000821 WO2003067332A2 (en) 2002-02-06 2003-01-28 Sulfonate derivatives and the use therof as latent acids

Publications (2)

Publication Number Publication Date
JP2005517026A JP2005517026A (ja) 2005-06-09
JP2005517026A5 true JP2005517026A5 (https=) 2006-03-16

Family

ID=27675790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003566624A Pending JP2005517026A (ja) 2002-02-06 2003-01-28 スルホナート誘導体及び潜酸としてのその使用

Country Status (11)

Country Link
US (2) US7326511B2 (https=)
EP (1) EP1472576B1 (https=)
JP (1) JP2005517026A (https=)
KR (1) KR20040089607A (https=)
CN (1) CN100475798C (https=)
AU (1) AU2003206787A1 (https=)
BR (1) BR0307501A (https=)
CA (1) CA2474532A1 (https=)
MX (1) MXPA04006581A (https=)
TW (1) TWI288859B (https=)
WO (1) WO2003067332A2 (https=)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003301344A1 (en) 2002-10-16 2004-05-04 Georgia Tech Research Corporation Polymers, methods of use thereof, and methods of decomposition thereof
EP1595182B1 (en) * 2003-02-19 2015-09-30 Basf Se Halogenated oxime derivatives and the use thereof as latent acids
WO2006008250A2 (en) * 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids
WO2006046398A1 (ja) * 2004-10-29 2006-05-04 Nissan Chemical Industries, Ltd. 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター
US7183036B2 (en) * 2004-11-12 2007-02-27 International Business Machines Corporation Low activation energy positive resist
JP4484681B2 (ja) * 2004-12-03 2010-06-16 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
JP4780586B2 (ja) * 2006-05-08 2011-09-28 旭化成イーマテリアルズ株式会社 ポジ型感光性樹脂組成物
WO2007147782A2 (en) * 2006-06-20 2007-12-27 Ciba Holding Inc. Oxime sulfonates and the use therof as latent acids
BRPI0715723A2 (pt) * 2006-08-24 2013-09-17 Ciba Holding Inc indicadores de doses de uv
JP4866783B2 (ja) * 2007-04-27 2012-02-01 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
CN102037409B (zh) * 2008-05-23 2013-12-11 康奈尔大学 在电子和电气设备中使用的有机材料的正交工艺
TW201016651A (en) * 2008-07-28 2010-05-01 Sumitomo Chemical Co Oxime compound and resist composition containing the same
EP2404315A4 (en) * 2009-03-06 2012-08-08 Du Pont METHOD FOR FORMING AN ELECTROACTIVE LAYER
EP2414894B1 (en) 2009-03-30 2014-02-12 Basf Se Uv-dose indicator films
KR101813298B1 (ko) * 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
TWI550338B (zh) * 2010-08-30 2016-09-21 富士軟片股份有限公司 感光性樹脂組成物、肟基磺酸酯化合物、硬化膜之形成方法、硬化膜、有機ｅｌ顯示裝置、及液晶顯示裝置
JP5840146B2 (ja) * 2011-01-17 2016-01-06 株式会社クラレ ビニルスルホン酸エステル誘導体、高分子化合物およびフォトレジスト組成物
WO2014025370A1 (en) 2012-08-10 2014-02-13 Hallstar Innovations Corp. Tricyclic energy quencher compounds for reducing singlet oxygen generation
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
US9125829B2 (en) 2012-08-17 2015-09-08 Hallstar Innovations Corp. Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds
JP6592896B2 (ja) * 2014-01-10 2019-10-23 住友化学株式会社 樹脂及びレジスト組成物
JP6904662B2 (ja) * 2016-01-29 2021-07-21 株式会社アドテックエンジニアリング 露光装置
US9950999B2 (en) 2016-08-12 2018-04-24 International Business Machines Corporation Non-ionic low diffusing photo-acid generators
ES2747768T3 (es) 2017-03-20 2020-03-11 Forma Therapeutics Inc Composiciones de pirrolopirrol como activadores de quinasa de piruvato (PKR)
ES2989438T3 (es) 2018-09-19 2024-11-26 Novo Nordisk Healthcare Ag Activación de la piruvato cinasa R
US12053458B2 (en) 2018-09-19 2024-08-06 Novo Nordisk Health Care Ag Treating sickle cell disease with a pyruvate kinase R activating compound
US20220378756A1 (en) 2019-09-19 2022-12-01 Forma Therapeutics, Inc. Activating pyruvate kinase r
IT201900022233A1 (it) * 2019-11-27 2021-05-27 Epta Inks S P A Inchiostro fotosensibile e embossabile
JP7041201B2 (ja) * 2020-06-30 2022-03-23 株式会社アドテックエンジニアリング 露光方法
US12128035B2 (en) 2021-03-19 2024-10-29 Novo Nordisk Health Care Ag Activating pyruvate kinase R
CN117042327B (zh) * 2022-12-27 2024-01-30 珠海浩奕电子科技有限公司 一种高强度低介电常数印刷电路板及其制备工艺

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4346094A (en) 1980-09-22 1982-08-24 Eli Lilly And Company 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels
US4540598A (en) 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
EP0199672B1 (de) * 1985-04-12 1988-06-01 Ciba-Geigy Ag Oximsulfonate mit reaktiven Gruppen
JPS6336240A (ja) 1986-07-28 1988-02-16 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン レジスト構造の作成方法
JPH0225850A (ja) 1988-07-15 1990-01-29 Hitachi Ltd 放射線感応性組成物およびそれを用いたパターン形成法
KR900005232A (ko) 1988-09-29 1990-04-13 존 에이 페니 음화 상 생성방법.
JPH03100657A (ja) * 1989-09-14 1991-04-25 Fuji Photo Film Co Ltd 電子写真感光体
JPH03223860A (ja) 1990-01-30 1991-10-02 Wako Pure Chem Ind Ltd 新規レジスト材料
JP3008594B2 (ja) 1990-08-31 2000-02-14 和光純薬工業株式会社 新規なレジスト材料及びパタ−ン形成方法
JPH04199152A (ja) * 1990-11-29 1992-07-20 Toshiba Corp 感光性組成物
JPH04295458A (ja) 1991-03-22 1992-10-20 Fuji Photo Film Co Ltd 光照射により酸を発生する化合物
JPH04328552A (ja) 1991-04-26 1992-11-17 Konica Corp 感光性組成物
DE4390097T1 (de) * 1992-01-10 1994-12-01 Fuji Photo Film Co Ltd Vorstufe für eine elektrophotographische Flachdruckplatte
US5714289A (en) * 1992-02-12 1998-02-03 Fuji Photo Film Co., Ltd. Method of preparation of electrophotographic printing plate
EP0571330B1 (de) * 1992-05-22 1999-04-07 Ciba SC Holding AG Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
DE4236068A1 (de) 1992-10-26 1994-04-28 Hoechst Ag Positiv arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial
US6159665A (en) 1993-06-17 2000-12-12 Lucent Technologies Inc. Processes using photosensitive materials including a nitro benzyl ester photoacid generator
DE59409351D1 (de) 1993-10-13 2000-06-21 Ciba Sc Holding Ag Pyrrolo[3,4-c]pyrrole
DE59408909D1 (de) 1993-10-13 1999-12-16 Ciba Sc Holding Ag Neue Fluoreszenzfarbstoffe
EP0654711B1 (en) 1993-11-22 1999-06-02 Ciba SC Holding AG Compositions for making structured color images and application thereof
DE69520655T2 (de) 1994-12-06 2001-11-29 Ocg Microelectronics Materials, Inc. Durch Belichtung einer Säure erzeugende Zusammensetzung für strahlungsempfindliche Zusammensetzungen
EP0742255B1 (en) 1995-05-12 2004-04-14 Ciba SC Holding AG Colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
JP3456808B2 (ja) 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
US20010037037A1 (en) * 1995-10-31 2001-11-01 Kurt Dietliker Oximesulfonic acid esters and the use thereof as latent sulfonic acids
MY117352A (en) * 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
JP3875271B2 (ja) * 1996-09-02 2007-01-31 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類
EP0877293B1 (en) 1997-05-09 2004-01-14 Fuji Photo Film Co., Ltd. Positive photosensitive composition
DE69803117T2 (de) 1997-05-12 2002-10-02 Fuji Photo Film Co., Ltd. Positiv arbeitende Resistzusammensetzung
TW550439B (en) 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
TW575792B (en) 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
SG78412A1 (en) * 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
NL1014545C2 (nl) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
TWI272451B (en) * 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
JP4210439B2 (ja) * 2001-04-05 2009-01-21 富士フイルム株式会社 ポジ型フォトレジスト組成物
DK1392675T3 (da) * 2001-06-01 2005-04-04 Ciba Sc Holding Ag Substituerede oximderivater og anvendelsen deraf som latente syrer
JP2003182218A (ja) * 2001-12-13 2003-07-03 Fuji Photo Film Co Ltd 感熱記録材料

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