BR0307501A - Derivados de sulfonato e o uso destes como ácidos latentes - Google Patents

Derivados de sulfonato e o uso destes como ácidos latentes

Info

Publication number
BR0307501A
BR0307501A BR0307501-0A BR0307501A BR0307501A BR 0307501 A BR0307501 A BR 0307501A BR 0307501 A BR0307501 A BR 0307501A BR 0307501 A BR0307501 A BR 0307501A
Authority
BR
Brazil
Prior art keywords
alkyl
optionally substituted
phenylene
phenyl
meanings given
Prior art date
Application number
BR0307501-0A
Other languages
English (en)
Inventor
Akira Matsumoto
Hitoshi Yamato
Toshikage Asakura
Peter Murer
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR0307501A publication Critical patent/BR0307501A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • C07C323/66—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfo, esterified sulfo or halosulfonyl groups, bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Hydrogenated Pyridines (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Indole Compounds (AREA)

Abstract

"DERIVADOS DE SULFONATO E O USO DESTES COMO áCIDOS LATENTES". A presente invenção refere-se a composições fotorresistentes quimicamente amplificadas compreendendo, (a) um composto que cura sob a ação de um ácido ou um composto cuja solubilidade é aumentada sob a ação de um ácido; e (b) um composto da fórmula Ia, Ib, IIa, IIb, IIIa, IIIb, IVa, IVb, Va, Vb ou Vla (Vla), em que n é 1 ou 2; m é 0 ou 1; X~ 0~ é -[CH~ 2~]~ h~-X ou -CH=CH~ 2~; h é 2, 3, 4, 5 ou 6; R~ 1~, quando n for 1, é, por exemplo, fenila opcionalmente substituída, naftila, antracila, fenantrila ou heteroarila; R~ 1~, quando n for 2, é,, por exemplo, fenileno ou naftileno opcionalmente substituído; R~ 2~, por exemplo, tem um dos significados de R~ 1~; X é,, por exemplo, -OR~ 20~, NR~ 21~R~ 22~ -SR~ 23~; X<39> é _x~ 1~_A~ 3~_X~ 2~_ ; São, por exemplo, -O-, -S- ou uma ligação direta; A~ 3~ é,, por exemplo, fenileno; R~ 3~ tem, por exemplo, um dos significados dados para R~ 1~; R~ 4~ tem, por exemplo, um dos significados dados para R~ 2~; R~ 5~ e R~ 6~, por exemplo, são hidrogênio; G i.a. é -S- ou -O-; R~ 7~, quando n for 1, por exemplo, é fenila, opcionalmente substituída, quando n for 2, é,, por exemplo, fenileno; R~ 8~ e R~ 9~, por exemplo, é C~ 1~-C~ 18~ alquila; R~ 10~ tem um dos significados dados para R~ 7~; R~ 11~ i.a. é C~ 1~-C~ 18~alquila; R~ 12~, R~ 13~, R~ 14~, R~ 15~ R~ 16~, R~ 17~ e R~ 18~, por exemplo, são hidrogênio ou C~ 1~-C~ 18~ alquila; R~ 20~, R~ 21~, R22 e R~ 23~ i.a. são fenila ou C~ 1~-C~ 18~alquila; dão alta resolução com bom perfil de resistentes.
BR0307501-0A 2002-02-06 2003-01-28 Derivados de sulfonato e o uso destes como ácidos latentes BR0307501A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405082 2002-02-06
PCT/EP2003/000821 WO2003067332A2 (en) 2002-02-06 2003-01-28 Sulfonate derivatives and the use therof as latent acids

Publications (1)

Publication Number Publication Date
BR0307501A true BR0307501A (pt) 2004-12-07

Family

ID=27675790

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0307501-0A BR0307501A (pt) 2002-02-06 2003-01-28 Derivados de sulfonato e o uso destes como ácidos latentes

Country Status (11)

Country Link
US (2) US7326511B2 (pt)
EP (1) EP1472576B1 (pt)
JP (1) JP2005517026A (pt)
KR (1) KR20040089607A (pt)
CN (1) CN100475798C (pt)
AU (1) AU2003206787A1 (pt)
BR (1) BR0307501A (pt)
CA (1) CA2474532A1 (pt)
MX (1) MXPA04006581A (pt)
TW (1) TWI288859B (pt)
WO (1) WO2003067332A2 (pt)

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Also Published As

Publication number Publication date
US20050153244A1 (en) 2005-07-14
CN1628268A (zh) 2005-06-15
EP1472576A2 (en) 2004-11-03
CN100475798C (zh) 2009-04-08
TWI288859B (en) 2007-10-21
AU2003206787A8 (en) 2003-09-02
EP1472576B1 (en) 2013-04-24
MXPA04006581A (es) 2004-10-04
CA2474532A1 (en) 2003-08-14
TW200302952A (en) 2003-08-16
US20080286693A1 (en) 2008-11-20
WO2003067332A2 (en) 2003-08-14
JP2005517026A (ja) 2005-06-09
WO2003067332A3 (en) 2003-12-24
US7326511B2 (en) 2008-02-05
AU2003206787A1 (en) 2003-09-02
KR20040089607A (ko) 2004-10-21

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