JP2005508086A5 - - Google Patents
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- Publication number
- JP2005508086A5 JP2005508086A5 JP2003541034A JP2003541034A JP2005508086A5 JP 2005508086 A5 JP2005508086 A5 JP 2005508086A5 JP 2003541034 A JP2003541034 A JP 2003541034A JP 2003541034 A JP2003541034 A JP 2003541034A JP 2005508086 A5 JP2005508086 A5 JP 2005508086A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- bipolar device
- type
- diode
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 19
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 15
- 229910010271 silicon carbide Inorganic materials 0.000 claims 15
- 230000000903 blocking effect Effects 0.000 claims 9
- 238000009792 diffusion process Methods 0.000 claims 6
- 230000002950 deficient Effects 0.000 claims 3
- 230000000694 effects Effects 0.000 claims 3
- 230000007547 defect Effects 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 2
- 239000007943 implant Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 239000000969 carrier Substances 0.000 claims 1
- 239000013078 crystal Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/046,346 US6849874B2 (en) | 2001-10-26 | 2001-10-26 | Minimizing degradation of SiC bipolar semiconductor devices |
| PCT/US2002/030230 WO2003038876A1 (en) | 2001-10-26 | 2002-09-24 | Sic bipolar semiconductor devices with few crystal defects |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005508086A JP2005508086A (ja) | 2005-03-24 |
| JP2005508086A5 true JP2005508086A5 (enExample) | 2006-01-05 |
| JP4597514B2 JP4597514B2 (ja) | 2010-12-15 |
Family
ID=21942959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003541034A Expired - Lifetime JP4597514B2 (ja) | 2001-10-26 | 2002-09-24 | 劣化を最少に抑えたSiCバイポーラ半導体デバイス |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US6849874B2 (enExample) |
| EP (1) | EP1438739B1 (enExample) |
| JP (1) | JP4597514B2 (enExample) |
| KR (1) | KR101036253B1 (enExample) |
| CN (1) | CN100369196C (enExample) |
| CA (1) | CA2457399A1 (enExample) |
| TW (1) | TWI229421B (enExample) |
| WO (1) | WO2003038876A1 (enExample) |
Families Citing this family (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6849874B2 (en) * | 2001-10-26 | 2005-02-01 | Cree, Inc. | Minimizing degradation of SiC bipolar semiconductor devices |
| US6900477B1 (en) * | 2001-12-07 | 2005-05-31 | The United States Of America As Represented By The Secretary Of The Army | Processing technique to improve the turn-off gain of a silicon carbide gate turn-off thyristor and an article of manufacture |
| US6982440B2 (en) * | 2002-02-19 | 2006-01-03 | Powersicel, Inc. | Silicon carbide semiconductor devices with a regrown contact layer |
| EP2398049A3 (en) * | 2003-08-22 | 2012-12-19 | The Kansai Electric Power Co., Inc. | Semiconductor device and method of producing the same, and power conversion apparatus incorporating this semiconductor device |
| US7018554B2 (en) * | 2003-09-22 | 2006-03-28 | Cree, Inc. | Method to reduce stacking fault nucleation sites and reduce forward voltage drift in bipolar devices |
| JP2005167035A (ja) | 2003-12-03 | 2005-06-23 | Kansai Electric Power Co Inc:The | 炭化珪素半導体素子およびその製造方法 |
| US7173285B2 (en) | 2004-03-18 | 2007-02-06 | Cree, Inc. | Lithographic methods to reduce stacking fault nucleation sites |
| US7109521B2 (en) * | 2004-03-18 | 2006-09-19 | Cree, Inc. | Silicon carbide semiconductor structures including multiple epitaxial layers having sidewalls |
| US20070290211A1 (en) * | 2004-03-26 | 2007-12-20 | The Kansai Electric Power Co., Inc. | Bipolar Semiconductor Device and Process for Producing the Same |
| EP1619276B1 (en) * | 2004-07-19 | 2017-01-11 | Norstel AB | Homoepitaxial growth of SiC on low off-axis SiC wafers |
| US7192482B2 (en) * | 2004-08-10 | 2007-03-20 | Cree, Inc. | Seed and seedholder combinations for high quality growth of large silicon carbide single crystals |
| US7294324B2 (en) * | 2004-09-21 | 2007-11-13 | Cree, Inc. | Low basal plane dislocation bulk grown SiC wafers |
| US7422634B2 (en) * | 2005-04-07 | 2008-09-09 | Cree, Inc. | Three inch silicon carbide wafer with low warp, bow, and TTV |
| US20060267043A1 (en) * | 2005-05-27 | 2006-11-30 | Emerson David T | Deep ultraviolet light emitting devices and methods of fabricating deep ultraviolet light emitting devices |
| US7391058B2 (en) * | 2005-06-27 | 2008-06-24 | General Electric Company | Semiconductor devices and methods of making same |
| EP1933386B1 (en) * | 2005-09-14 | 2012-11-07 | Central Research Institute of Electric Power Industry | Process for producing silicon carbide semiconductor device |
| US7304334B2 (en) * | 2005-09-16 | 2007-12-04 | Cree, Inc. | Silicon carbide bipolar junction transistors having epitaxial base regions and multilayer emitters and methods of fabricating the same |
| DE102005046707B3 (de) * | 2005-09-29 | 2007-05-03 | Siced Electronics Development Gmbh & Co. Kg | SiC-PN-Leistungsdiode |
| JP5386177B2 (ja) * | 2006-01-10 | 2014-01-15 | クリー インコーポレイテッド | 炭化珪素ディンプル基板 |
| KR100793607B1 (ko) * | 2006-06-27 | 2008-01-10 | 매그나칩 반도체 유한회사 | 에피텍셜 실리콘 웨이퍼 및 그 제조방법 |
| US8455269B2 (en) * | 2006-08-04 | 2013-06-04 | Central Research Institute Of Electric Power Industry | Method for recovering an on-state forward voltage and, shrinking stacking faults in bipolar semiconductor devices, and the bipolar semiconductor devices |
| CN101622620B (zh) | 2007-01-23 | 2014-06-18 | 卡内基梅隆大学 | 控制访问计算机系统和注释媒体文件的方法和装置 |
| SE532625C2 (sv) * | 2007-04-11 | 2010-03-09 | Transic Ab | Halvledarkomponent i kiselkarbid |
| US7915143B2 (en) * | 2008-04-30 | 2011-03-29 | The United States Of America As Represented By The Secretary Of The Navy | Method of mediating forward voltage drift in a SiC device |
| US8136167B1 (en) | 2008-10-20 | 2012-03-13 | Google Inc. | Systems and methods for providing image feedback |
| US8542251B1 (en) | 2008-10-20 | 2013-09-24 | Google Inc. | Access using image-based manipulation |
| US8621396B1 (en) | 2008-10-20 | 2013-12-31 | Google Inc. | Access using image-based manipulation |
| JP5628681B2 (ja) | 2008-10-21 | 2014-11-19 | ルネサスエレクトロニクス株式会社 | バイポーラトランジスタ |
| CN102246283B (zh) * | 2008-10-21 | 2014-08-06 | 瑞萨电子株式会社 | 双极晶体管 |
| US8196198B1 (en) | 2008-12-29 | 2012-06-05 | Google Inc. | Access using images |
| US8392986B1 (en) | 2009-06-17 | 2013-03-05 | Google Inc. | Evaluating text-based access strings |
| US8377806B2 (en) * | 2010-04-28 | 2013-02-19 | Cree, Inc. | Method for controlled growth of silicon carbide and structures produced by same |
| FR2960097A1 (fr) * | 2010-05-11 | 2011-11-18 | St Microelectronics Tours Sas | Composant de protection bidirectionnel |
| FR2963983B1 (fr) * | 2010-08-18 | 2012-09-07 | St Microelectronics Tours Sas | Composant de protection bidirectionnel dissymetrique |
| JP2013546161A (ja) | 2010-09-21 | 2013-12-26 | クワンタム エレクトロ オプト システムズ エスディーエヌ. ビーエイチディー. | 発光およびレーザ半導体方法およびデバイス |
| JP5639828B2 (ja) * | 2010-09-27 | 2014-12-10 | 株式会社日立製作所 | 半導体記憶装置およびその製造方法 |
| SE1051137A1 (sv) | 2010-10-29 | 2012-04-30 | Fairchild Semiconductor | Förfarande för tillverkning av en kiselkarbid bipolär transistor och kiselkarbid bipolär transistor därav |
| JP2012164790A (ja) | 2011-02-07 | 2012-08-30 | Sumitomo Electric Ind Ltd | 炭化珪素半導体装置およびその製造方法 |
| US9171977B2 (en) | 2011-06-17 | 2015-10-27 | Cree, Inc. | Optically assist-triggered wide bandgap thyristors having positive temperature coefficients |
| WO2013107508A1 (en) * | 2012-01-18 | 2013-07-25 | Fairchild Semiconductor Corporation | Bipolar junction transistor with spacer layer and method of manufacturing the same |
| CN102610638B (zh) * | 2012-03-22 | 2014-04-16 | 西安电子科技大学 | 用于功率集成电路的SiC-BJT器件及其制作方法 |
| TW201417150A (zh) * | 2012-10-31 | 2014-05-01 | Lg Innotek Co Ltd | 磊晶晶圓 |
| CN104919571B (zh) * | 2012-11-30 | 2018-01-23 | Lg伊诺特有限公司 | 外延晶元,以及使用其的开关元件和发光元件 |
| KR102053077B1 (ko) * | 2012-11-30 | 2020-01-08 | 엘지이노텍 주식회사 | 에피택셜 웨이퍼 및 그 제조 방법 |
| KR102098209B1 (ko) * | 2013-02-05 | 2020-04-08 | 엘지이노텍 주식회사 | 에피택셜 웨이퍼 및 그 제조 방법 |
| US9738991B2 (en) | 2013-02-05 | 2017-08-22 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion |
| US9797064B2 (en) | 2013-02-05 | 2017-10-24 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion |
| US9279192B2 (en) | 2014-07-29 | 2016-03-08 | Dow Corning Corporation | Method for manufacturing SiC wafer fit for integration with power device manufacturing technology |
| CN107109693B (zh) * | 2014-11-12 | 2019-08-09 | 住友电气工业株式会社 | 碳化硅外延基板的制造方法和碳化硅外延基板 |
| US10229836B2 (en) | 2015-05-18 | 2019-03-12 | Sumitomo Electric Industries, Ltd. | Method for manufacturing silicon carbide epitaxial substrate, silicon carbide epitaxial substrate, method for manufacturing silicon carbide semiconductor device, and silicon carbide semiconductor device |
| CN108026664B (zh) * | 2015-10-27 | 2020-11-13 | 住友电气工业株式会社 | 碳化硅基板 |
| JP6706786B2 (ja) * | 2015-10-30 | 2020-06-10 | 一般財団法人電力中央研究所 | エピタキシャルウェハの製造方法、エピタキシャルウェハ、半導体装置の製造方法及び半導体装置 |
| JP6762484B2 (ja) * | 2017-01-10 | 2020-09-30 | 昭和電工株式会社 | SiCエピタキシャルウェハ及びその製造方法 |
| CN112447498A (zh) * | 2019-08-29 | 2021-03-05 | 中国科学院苏州纳米技术与纳米仿生研究所 | 降低双极型器件正向导通SFs拓展的SiC外延层生长方法、结构及生长方法供气管路 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US93576A (en) * | 1869-08-10 | Improved machine for driving posts | ||
| US3988771A (en) | 1974-05-28 | 1976-10-26 | General Electric Company | Spatial control of lifetime in semiconductor device |
| US3988772A (en) | 1974-05-28 | 1976-10-26 | General Electric Company | Current isolation means for integrated power devices |
| US3988762A (en) | 1974-05-28 | 1976-10-26 | General Electric Company | Minority carrier isolation barriers for semiconductor devices |
| US4912063A (en) | 1987-10-26 | 1990-03-27 | North Carolina State University | Growth of beta-sic thin films and semiconductor devices fabricated thereon |
| US4912064A (en) | 1987-10-26 | 1990-03-27 | North Carolina State University | Homoepitaxial growth of alpha-SiC thin films and semiconductor devices fabricated thereon |
| US5230768A (en) * | 1990-03-26 | 1993-07-27 | Sharp Kabushiki Kaisha | Method for the production of SiC single crystals by using a specific substrate crystal orientation |
| US5093576A (en) * | 1991-03-15 | 1992-03-03 | Cree Research | High sensitivity ultraviolet radiation detector |
| JPH05129656A (ja) | 1991-10-31 | 1993-05-25 | Sharp Corp | pn接合型発光ダイオード |
| US5313078A (en) * | 1991-12-04 | 1994-05-17 | Sharp Kabushiki Kaisha | Multi-layer silicon carbide light emitting diode having a PN junction |
| JPH06338629A (ja) | 1993-03-29 | 1994-12-06 | Sanyo Electric Co Ltd | 炭化ケイ素発光ダイオード素子 |
| US5879962A (en) * | 1995-12-13 | 1999-03-09 | Minnesota Mining And Manufacturing Company | III-V/II-VI Semiconductor interface fabrication method |
| SE9603738D0 (sv) | 1996-10-14 | 1996-10-14 | Abb Research Ltd | A method for producing a bipolar semiconductor device and a bipolar semiconductor device |
| SE512259C2 (sv) * | 1998-03-23 | 2000-02-21 | Abb Research Ltd | Halvledaranordning bestående av dopad kiselkarbid vilken innefattar en pn-övergång som uppvisar åtminstone en ihålig defekt och förfarande för dess framställning |
| US6346821B1 (en) * | 1998-03-27 | 2002-02-12 | Infineon Technologies Ag | Method for nondestructive measurement of minority carrier diffusion length and minority carrier lifetime in semiconductor devices |
| US6054706A (en) | 1998-06-15 | 2000-04-25 | Northwestern University | Long wavelength infrared photodetectors |
| JP4185215B2 (ja) * | 1999-05-07 | 2008-11-26 | 弘之 松波 | SiCウエハ、SiC半導体デバイス、および、SiCウエハの製造方法 |
| JP4192353B2 (ja) * | 1999-09-21 | 2008-12-10 | 株式会社デンソー | 炭化珪素半導体装置及びその製造方法 |
| JP2001158696A (ja) * | 1999-11-29 | 2001-06-12 | Toyota Central Res & Dev Lab Inc | 炭化珪素単結晶の製造方法 |
| JP4329211B2 (ja) * | 2000-03-01 | 2009-09-09 | 株式会社デンソー | 炭化珪素単結晶を用いた炭化珪素半導体装置およびその製造方法 |
| US6512384B1 (en) * | 2000-06-29 | 2003-01-28 | Semiconductor Diagnostics, Inc. | Method for fast and accurate determination of the minority carrier diffusion length from simultaneously measured surface photovoltages |
| US6849874B2 (en) * | 2001-10-26 | 2005-02-01 | Cree, Inc. | Minimizing degradation of SiC bipolar semiconductor devices |
-
2001
- 2001-10-26 US US10/046,346 patent/US6849874B2/en not_active Expired - Lifetime
-
2002
- 2002-09-24 JP JP2003541034A patent/JP4597514B2/ja not_active Expired - Lifetime
- 2002-09-24 KR KR1020047003506A patent/KR101036253B1/ko not_active Expired - Lifetime
- 2002-09-24 EP EP02770545.8A patent/EP1438739B1/en not_active Expired - Lifetime
- 2002-09-24 CN CNB028187199A patent/CN100369196C/zh not_active Expired - Lifetime
- 2002-09-24 WO PCT/US2002/030230 patent/WO2003038876A1/en not_active Ceased
- 2002-09-24 CA CA002457399A patent/CA2457399A1/en not_active Abandoned
- 2002-10-09 TW TW091123295A patent/TWI229421B/zh not_active IP Right Cessation
-
2004
- 2004-12-22 US US11/022,544 patent/US20050118746A1/en not_active Abandoned
- 2004-12-22 US US11/022,520 patent/US7880171B2/en not_active Expired - Lifetime
-
2006
- 2006-11-16 US US11/560,575 patent/US7427326B2/en not_active Expired - Lifetime
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