JP2005025199A - フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系 - Google Patents

フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系 Download PDF

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Publication number
JP2005025199A
JP2005025199A JP2004194590A JP2004194590A JP2005025199A JP 2005025199 A JP2005025199 A JP 2005025199A JP 2004194590 A JP2004194590 A JP 2004194590A JP 2004194590 A JP2004194590 A JP 2004194590A JP 2005025199 A JP2005025199 A JP 2005025199A
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Japan
Prior art keywords
mirror
exposure system
substrate
aspheric
reticle
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Pending
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JP2004194590A
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Japanese (ja)
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JP2005025199A5 (enExample
Inventor
Robert D Harned
ディー ハーネッド ロバート
Jager Patrick De
デ ヤーハー パトリック
Cheng-Qun Gui
グイ チェン−クン
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ASML Holding NV
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ASML Holding NV
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Publication of JP2005025199A publication Critical patent/JP2005025199A/ja
Publication of JP2005025199A5 publication Critical patent/JP2005025199A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/061—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2004194590A 2003-06-30 2004-06-30 フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系 Pending JP2005025199A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48322003P 2003-06-30 2003-06-30
US10/831,210 US7158215B2 (en) 2003-06-30 2004-04-26 Large field of view protection optical system with aberration correctability for flat panel displays

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008153338A Division JP5121588B2 (ja) 2003-06-30 2008-06-11 フラットパネルディスプレイ製造用露光システム

Publications (2)

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JP2005025199A true JP2005025199A (ja) 2005-01-27
JP2005025199A5 JP2005025199A5 (enExample) 2005-11-04

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JP2004194590A Pending JP2005025199A (ja) 2003-06-30 2004-06-30 フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系
JP2008153338A Expired - Fee Related JP5121588B2 (ja) 2003-06-30 2008-06-11 フラットパネルディスプレイ製造用露光システム

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Country Status (7)

Country Link
US (3) US7158215B2 (enExample)
EP (1) EP1494076A3 (enExample)
JP (2) JP2005025199A (enExample)
KR (1) KR100832509B1 (enExample)
CN (1) CN100587601C (enExample)
SG (1) SG110098A1 (enExample)
TW (1) TWI309754B (enExample)

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JP2008233932A (ja) * 2003-06-30 2008-10-02 Asml Holding Nv フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系
JP2008286888A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光装置
JP2009038152A (ja) * 2007-07-31 2009-02-19 Canon Inc 光学系、露光装置及びデバイス製造方法
JP2009158719A (ja) * 2007-12-26 2009-07-16 Canon Inc 露光装置およびデバイス製造方法
JP2019090819A (ja) * 2012-09-28 2019-06-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 回折光学素子及び測定方法
JP2021039282A (ja) * 2019-09-04 2021-03-11 キヤノン株式会社 露光装置、および物品製造方法

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JP7204507B2 (ja) * 2019-02-05 2023-01-16 キオクシア株式会社 露光方法および露光装置
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法
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JP2008233932A (ja) * 2003-06-30 2008-10-02 Asml Holding Nv フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系
JP2008286888A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光装置
JP2009038152A (ja) * 2007-07-31 2009-02-19 Canon Inc 光学系、露光装置及びデバイス製造方法
TWI397781B (zh) * 2007-07-31 2013-06-01 Canon Kk Optical system, exposure apparatus and apparatus manufacturing method
JP2009158719A (ja) * 2007-12-26 2009-07-16 Canon Inc 露光装置およびデバイス製造方法
JP2019090819A (ja) * 2012-09-28 2019-06-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 回折光学素子及び測定方法
JP2021039282A (ja) * 2019-09-04 2021-03-11 キヤノン株式会社 露光装置、および物品製造方法
KR20210028574A (ko) * 2019-09-04 2021-03-12 캐논 가부시끼가이샤 노광 장치 및 물품제조방법
JP7357488B2 (ja) 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
KR102747768B1 (ko) * 2019-09-04 2024-12-31 캐논 가부시끼가이샤 노광 장치 및 물품제조방법

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US7158215B2 (en) 2007-01-02
US20040263429A1 (en) 2004-12-30
JP2008233932A (ja) 2008-10-02
SG110098A1 (en) 2005-04-28
CN100587601C (zh) 2010-02-03
US20050237505A1 (en) 2005-10-27
JP5121588B2 (ja) 2013-01-16
US7405802B2 (en) 2008-07-29
EP1494076A2 (en) 2005-01-05
TW200508815A (en) 2005-03-01
EP1494076A3 (en) 2007-03-07
US7643128B2 (en) 2010-01-05
KR20050002660A (ko) 2005-01-10
KR100832509B1 (ko) 2008-05-26
US20070195304A1 (en) 2007-08-23
CN1577102A (zh) 2005-02-09

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