KR100832509B1 - 수차 보정 성능을 구비한 평판 패널 디스플레이용 광시야투영 광학 시스템 - Google Patents

수차 보정 성능을 구비한 평판 패널 디스플레이용 광시야투영 광학 시스템 Download PDF

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Publication number
KR100832509B1
KR100832509B1 KR1020040050353A KR20040050353A KR100832509B1 KR 100832509 B1 KR100832509 B1 KR 100832509B1 KR 1020040050353 A KR1020040050353 A KR 1020040050353A KR 20040050353 A KR20040050353 A KR 20040050353A KR 100832509 B1 KR100832509 B1 KR 100832509B1
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South Korea
Prior art keywords
mirror
exposure apparatus
substrate
optical system
reticle
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Expired - Fee Related
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Korean (ko)
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KR20050002660A (ko
Inventor
하네드로버트디.
제이거패트릭데
구이쳉-쿤
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에이에스엠엘 홀딩 엔.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/061—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
KR1020040050353A 2003-06-30 2004-06-30 수차 보정 성능을 구비한 평판 패널 디스플레이용 광시야투영 광학 시스템 Expired - Fee Related KR100832509B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US48322003P 2003-06-30 2003-06-30
US60/483,220 2003-06-30
US10/831,210 2004-04-26
US10/831,210 US7158215B2 (en) 2003-06-30 2004-04-26 Large field of view protection optical system with aberration correctability for flat panel displays

Publications (2)

Publication Number Publication Date
KR20050002660A KR20050002660A (ko) 2005-01-10
KR100832509B1 true KR100832509B1 (ko) 2008-05-26

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KR1020040050353A Expired - Fee Related KR100832509B1 (ko) 2003-06-30 2004-06-30 수차 보정 성능을 구비한 평판 패널 디스플레이용 광시야투영 광학 시스템

Country Status (7)

Country Link
US (3) US7158215B2 (enExample)
EP (1) EP1494076A3 (enExample)
JP (2) JP2005025199A (enExample)
KR (1) KR100832509B1 (enExample)
CN (1) CN100587601C (enExample)
SG (1) SG110098A1 (enExample)
TW (1) TWI309754B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101080144B1 (ko) 2007-12-26 2011-11-07 캐논 가부시끼가이샤 노광장치 및 디바이스 제조방법

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7184124B2 (en) * 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US7426076B2 (en) * 2004-12-23 2008-09-16 Asml Holding N.V. Projection system for a lithographic apparatus
WO2007048506A1 (en) * 2005-10-28 2007-05-03 Carl Zeiss Laser Optics Gmbh Optical device for generating a line focus on a surface
JP5196869B2 (ja) 2007-05-15 2013-05-15 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5118407B2 (ja) * 2007-07-31 2013-01-16 キヤノン株式会社 光学系、露光装置及びデバイス製造方法
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
US7929129B2 (en) 2009-05-22 2011-04-19 Corning Incorporated Inspection systems for glass sheets
JP2011039172A (ja) * 2009-08-07 2011-02-24 Canon Inc 露光装置およびデバイス製造方法
US9007497B2 (en) * 2010-08-11 2015-04-14 Media Lario S.R.L. Three-mirror anastigmat with at least one non-rotationally symmetric mirror
US8223443B2 (en) 2010-09-01 2012-07-17 Kla-Tencor Corporation Collection optics
US8493670B2 (en) 2010-09-10 2013-07-23 Coherent, Inc. Large-field unit-magnification catadioptric projection system
US10095016B2 (en) 2011-01-04 2018-10-09 Nlight, Inc. High power laser system
US9429742B1 (en) * 2011-01-04 2016-08-30 Nlight, Inc. High power laser imaging systems
US9409255B1 (en) 2011-01-04 2016-08-09 Nlight, Inc. High power laser imaging systems
US8659823B2 (en) 2011-04-22 2014-02-25 Coherent, Inc. Unit-magnification catadioptric and catoptric projection optical systems
CN102981255B (zh) * 2011-09-07 2016-04-20 上海微电子装备有限公司 一种大视场投影物镜
US9720244B1 (en) 2011-09-30 2017-08-01 Nlight, Inc. Intensity distribution management system and method in pixel imaging
CN103105664B (zh) * 2011-11-10 2016-02-03 上海微电子装备有限公司 光刻投影物镜
DE102012217800A1 (de) * 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Diffraktives optisches Element sowie Messverfahren
US9310248B2 (en) 2013-03-14 2016-04-12 Nlight, Inc. Active monitoring of multi-laser systems
KR102099722B1 (ko) 2014-02-05 2020-05-18 엔라이트 인크. 단일-이미터 라인 빔 시스템
US10746994B2 (en) 2014-08-07 2020-08-18 Microsoft Technology Licensing, Llc Spherical mirror having a decoupled aspheric
CN105629668B (zh) * 2014-10-28 2018-03-06 中芯国际集成电路制造(上海)有限公司 测试装置、测试系统以及测试方法
CN105182510B (zh) * 2015-07-20 2017-07-14 中国科学院上海光学精密机械研究所 对有限远物面成像的球面卡塞格林系统及其调整方法
JP6661371B2 (ja) * 2015-12-25 2020-03-11 キヤノン株式会社 評価方法、露光方法、および物品の製造方法
US10353204B2 (en) * 2016-10-31 2019-07-16 Tectus Corporation Femtoprojector optical systems
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
US10527831B2 (en) 2017-09-11 2020-01-07 Toyota Motor Engineering & Manufacturing North America, Inc. Cloaking devices with planar and curved mirrors and vehicles comprising the same
CN108613673B (zh) * 2018-06-13 2021-06-18 北京航空航天大学 一种单目视觉位姿估计装置及方法
JP7204507B2 (ja) * 2019-02-05 2023-01-16 キオクシア株式会社 露光方法および露光装置
JP7357488B2 (ja) * 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法
CN111880306B (zh) * 2020-09-10 2022-05-20 深圳市点睛创视技术有限公司 一种用于微型投影的超短焦物镜系统的设计方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748015A (en) 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US4240707A (en) 1978-12-07 1980-12-23 Itek Corporation All-reflective three element objective
US4737021A (en) 1986-03-21 1988-04-12 Dietrich Korsch Wide-field three-mirror collimator
US5153898A (en) * 1986-07-11 1992-10-06 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
US20020041445A1 (en) 2000-08-08 2002-04-11 Kimihiko Nishioka Optical apparatus
US6522403B2 (en) 2000-12-04 2003-02-18 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Computed tomography imaging spectrometer (CTIS) with 2D reflective grating for ultraviolet to long-wave infrared detection especially useful for surveying transient events

Family Cites Families (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US529872A (en) * 1894-11-27 Separator
JPS4812039B1 (enExample) 1969-05-20 1973-04-17
US3821763A (en) 1971-06-21 1974-06-28 Perkin Elmer Corp Annular field optical imaging system
US4293186A (en) * 1977-02-11 1981-10-06 The Perkin-Elmer Corporation Restricted off-axis field optical system
US4693569A (en) * 1979-12-21 1987-09-15 The Perkin-Elmer Corporation Method and apparatus for optical system adjustments
JPS5775533U (enExample) * 1980-10-27 1982-05-10
JPS5883836A (ja) * 1981-11-13 1983-05-19 Hitachi Ltd 円弧状照明光形成スリツト
JPS58121017U (ja) * 1982-02-12 1983-08-17 株式会社日立製作所 線状光源装置
JPS58215621A (ja) * 1982-06-09 1983-12-15 Hitachi Ltd １「あ」１プロジエクシヨンアライナ
JPS58222522A (ja) * 1982-06-21 1983-12-24 Hitachi Ltd プロジエクシヨンアライナ
JPS6093410A (ja) * 1983-10-27 1985-05-25 Canon Inc 反射光学系
JPS612124A (ja) 1984-06-14 1986-01-08 Canon Inc 結像光学系
US4701035A (en) 1984-08-14 1987-10-20 Canon Kabushiki Kaisha Reflection optical system
JPS6147917A (ja) 1984-08-14 1986-03-08 Canon Inc 反射光学系
US4650315A (en) * 1985-05-10 1987-03-17 The Perkin-Elmer Corporation Optical lithographic system
US4711535A (en) * 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
US4743112A (en) * 1986-07-18 1988-05-10 Santa Barbara Research Center Imaging spectrometer
US4747678A (en) 1986-12-17 1988-05-31 The Perkin-Elmer Corporation Optical relay system with magnification
US4834517A (en) 1987-01-13 1989-05-30 Hughes Aircraft Company Method and apparatus for receiving optical signals
US4824517A (en) * 1987-08-20 1989-04-25 Dennison Manufacturing Company Multipurpose dispenser
US4769680A (en) 1987-10-22 1988-09-06 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
JP3047983B2 (ja) * 1990-03-30 2000-06-05 株式会社日立製作所 微細パターン転写方法およびその装置
WO1991017483A1 (de) 1990-05-02 1991-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Belichtungsvorrichtung
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6219015B1 (en) 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
JP3224041B2 (ja) 1992-07-29 2001-10-29 株式会社ニコン 露光方法及び装置
JPH0653113A (ja) * 1992-07-31 1994-02-25 Matsushita Electric Ind Co Ltd 走査投影露光装置
JP3259373B2 (ja) * 1992-11-27 2002-02-25 株式会社日立製作所 露光方法及び露光装置
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3477838B2 (ja) 1993-11-11 2003-12-10 株式会社ニコン 走査型露光装置及び露光方法
JP3339149B2 (ja) 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
US5530516A (en) 1994-10-04 1996-06-25 Tamarack Scientific Co., Inc. Large-area projection exposure system
US5677703A (en) 1995-01-06 1997-10-14 Texas Instruments Incorporated Data loading circuit for digital micro-mirror device
US5530482A (en) 1995-03-21 1996-06-25 Texas Instruments Incorporated Pixel data processing for spatial light modulator having staggered pixels
US6229595B1 (en) * 1995-05-12 2001-05-08 The B. F. Goodrich Company Lithography system and method with mask image enlargement
JP3525423B2 (ja) * 1995-09-14 2004-05-10 株式会社ニコン 反射光学系
US5710619A (en) 1995-10-31 1998-01-20 Anvik Corporation Large-area, scan-and-repeat, projection patterning system with unitary stage and magnification control capability
US6133986A (en) 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
US5880834A (en) * 1996-10-16 1999-03-09 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Convex diffraction grating imaging spectrometer
DE69711929T2 (de) 1997-01-29 2002-09-05 Micronic Laser Systems Ab, Taeby Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
US6177980B1 (en) 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US5982553A (en) 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
US6049325A (en) * 1997-05-27 2000-04-11 Hewlett-Packard Company System and method for efficient hit-testing in a computer-based system
US6226346B1 (en) 1998-06-09 2001-05-01 The Regents Of The University Of California Reflective optical imaging systems with balanced distortion
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6118577A (en) 1998-08-06 2000-09-12 Euv, L.L.C Diffractive element in extreme-UV lithography condenser
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
JP2000286189A (ja) * 1999-03-31 2000-10-13 Nikon Corp 露光装置および露光方法ならびにデバイス製造方法
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001290279A (ja) 2000-04-04 2001-10-19 Canon Inc 走査型露光装置
KR100827874B1 (ko) 2000-05-22 2008-05-07 가부시키가이샤 니콘 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법
JP2001339651A (ja) * 2000-05-29 2001-12-07 Matsushita Electric Ind Co Ltd 選局装置
US6707603B2 (en) * 2001-06-28 2004-03-16 Raytheon Company Apparatus and method to distort an optical beam to avoid ionization at an intermediate focus
JP3563384B2 (ja) 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
JP2003172858A (ja) * 2001-12-06 2003-06-20 Nikon Corp 光学部品保持装置及び露光装置
TW517403B (en) * 2002-01-10 2003-01-11 Epitech Technology Corp Nitride light emitting diode and manufacturing method for the same
KR100545297B1 (ko) 2002-06-12 2006-01-24 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
US6879383B2 (en) * 2002-12-27 2005-04-12 Ultratech, Inc. Large-field unit-magnification projection system
US6870554B2 (en) 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
EP1482373A1 (en) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
DE102004050893B4 (de) * 2003-10-31 2015-05-21 Carl Zeiss Meditec Ag Tubus mit zwei umschaltbaren Planoptikelementen zur wahlweisen Strahlengangvertauschung und Bildumkehr für ein Mikroskop sowie Mikroskop
US7184124B2 (en) * 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US7426076B2 (en) * 2004-12-23 2008-09-16 Asml Holding N.V. Projection system for a lithographic apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748015A (en) 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US4240707A (en) 1978-12-07 1980-12-23 Itek Corporation All-reflective three element objective
US4737021A (en) 1986-03-21 1988-04-12 Dietrich Korsch Wide-field three-mirror collimator
US5153898A (en) * 1986-07-11 1992-10-06 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
US20020041445A1 (en) 2000-08-08 2002-04-11 Kimihiko Nishioka Optical apparatus
US6522403B2 (en) 2000-12-04 2003-02-18 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Computed tomography imaging spectrometer (CTIS) with 2D reflective grating for ultraviolet to long-wave infrared detection especially useful for surveying transient events

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101080144B1 (ko) 2007-12-26 2011-11-07 캐논 가부시끼가이샤 노광장치 및 디바이스 제조방법

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US7158215B2 (en) 2007-01-02
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SG110098A1 (en) 2005-04-28
CN100587601C (zh) 2010-02-03
US20050237505A1 (en) 2005-10-27
JP5121588B2 (ja) 2013-01-16
US7405802B2 (en) 2008-07-29
EP1494076A2 (en) 2005-01-05
TW200508815A (en) 2005-03-01
EP1494076A3 (en) 2007-03-07
US7643128B2 (en) 2010-01-05
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JP2005025199A (ja) 2005-01-27
US20070195304A1 (en) 2007-08-23
CN1577102A (zh) 2005-02-09

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