SG110098A1 - Large field of view projection optical system with aberration correctability for flat panel displays - Google Patents

Large field of view projection optical system with aberration correctability for flat panel displays

Info

Publication number
SG110098A1
SG110098A1 SG200403806A SG200403806A SG110098A1 SG 110098 A1 SG110098 A1 SG 110098A1 SG 200403806 A SG200403806 A SG 200403806A SG 200403806 A SG200403806 A SG 200403806A SG 110098 A1 SG110098 A1 SG 110098A1
Authority
SG
Singapore
Prior art keywords
optical system
projection optical
flat panel
panel displays
large field
Prior art date
Application number
SG200403806A
Other languages
English (en)
Inventor
D Harned Robert
De Jager Patrick
Gui Cheng-Qun
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG110098A1 publication Critical patent/SG110098A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/061—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
SG200403806A 2003-06-30 2004-06-30 Large field of view projection optical system with aberration correctability for flat panel displays SG110098A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48322003P 2003-06-30 2003-06-30
US10/831,210 US7158215B2 (en) 2003-06-30 2004-04-26 Large field of view protection optical system with aberration correctability for flat panel displays

Publications (1)

Publication Number Publication Date
SG110098A1 true SG110098A1 (en) 2005-04-28

Family

ID=33436773

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200403806A SG110098A1 (en) 2003-06-30 2004-06-30 Large field of view projection optical system with aberration correctability for flat panel displays

Country Status (7)

Country Link
US (3) US7158215B2 (enExample)
EP (1) EP1494076A3 (enExample)
JP (2) JP2005025199A (enExample)
KR (1) KR100832509B1 (enExample)
CN (1) CN100587601C (enExample)
SG (1) SG110098A1 (enExample)
TW (1) TWI309754B (enExample)

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US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
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US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7184124B2 (en) * 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US7426076B2 (en) * 2004-12-23 2008-09-16 Asml Holding N.V. Projection system for a lithographic apparatus
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JP5201979B2 (ja) * 2007-12-26 2013-06-05 キヤノン株式会社 露光装置およびデバイス製造方法
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CN105629668B (zh) * 2014-10-28 2018-03-06 中芯国际集成电路制造(上海)有限公司 测试装置、测试系统以及测试方法
CN105182510B (zh) * 2015-07-20 2017-07-14 中国科学院上海光学精密机械研究所 对有限远物面成像的球面卡塞格林系统及其调整方法
JP6661371B2 (ja) * 2015-12-25 2020-03-11 キヤノン株式会社 評価方法、露光方法、および物品の製造方法
US10353204B2 (en) * 2016-10-31 2019-07-16 Tectus Corporation Femtoprojector optical systems
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
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CN108613673B (zh) * 2018-06-13 2021-06-18 北京航空航天大学 一种单目视觉位姿估计装置及方法
JP7204507B2 (ja) * 2019-02-05 2023-01-16 キオクシア株式会社 露光方法および露光装置
JP7357488B2 (ja) * 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法
CN111880306B (zh) * 2020-09-10 2022-05-20 深圳市点睛创视技术有限公司 一种用于微型投影的超短焦物镜系统的设计方法

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Also Published As

Publication number Publication date
TWI309754B (en) 2009-05-11
US7158215B2 (en) 2007-01-02
US20040263429A1 (en) 2004-12-30
JP2008233932A (ja) 2008-10-02
CN100587601C (zh) 2010-02-03
US20050237505A1 (en) 2005-10-27
JP5121588B2 (ja) 2013-01-16
US7405802B2 (en) 2008-07-29
EP1494076A2 (en) 2005-01-05
TW200508815A (en) 2005-03-01
EP1494076A3 (en) 2007-03-07
US7643128B2 (en) 2010-01-05
KR20050002660A (ko) 2005-01-10
JP2005025199A (ja) 2005-01-27
KR100832509B1 (ko) 2008-05-26
US20070195304A1 (en) 2007-08-23
CN1577102A (zh) 2005-02-09

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