JP2005025199A5 - - Google Patents

Download PDF

Info

Publication number
JP2005025199A5
JP2005025199A5 JP2004194590A JP2004194590A JP2005025199A5 JP 2005025199 A5 JP2005025199 A5 JP 2005025199A5 JP 2004194590 A JP2004194590 A JP 2004194590A JP 2004194590 A JP2004194590 A JP 2004194590A JP 2005025199 A5 JP2005025199 A5 JP 2005025199A5
Authority
JP
Japan
Prior art keywords
mirror
exposure system
substrate
reticle
aspheric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004194590A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005025199A (ja
Filing date
Publication date
Priority claimed from US10/831,210 external-priority patent/US7158215B2/en
Application filed filed Critical
Publication of JP2005025199A publication Critical patent/JP2005025199A/ja
Publication of JP2005025199A5 publication Critical patent/JP2005025199A5/ja
Pending legal-status Critical Current

Links

JP2004194590A 2003-06-30 2004-06-30 フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系 Pending JP2005025199A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48322003P 2003-06-30 2003-06-30
US10/831,210 US7158215B2 (en) 2003-06-30 2004-04-26 Large field of view protection optical system with aberration correctability for flat panel displays

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008153338A Division JP5121588B2 (ja) 2003-06-30 2008-06-11 フラットパネルディスプレイ製造用露光システム

Publications (2)

Publication Number Publication Date
JP2005025199A JP2005025199A (ja) 2005-01-27
JP2005025199A5 true JP2005025199A5 (enExample) 2005-11-04

Family

ID=33436773

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004194590A Pending JP2005025199A (ja) 2003-06-30 2004-06-30 フラットパネルディスプレイ製造用露光システムおよびフラットパネルディスプレイ製造用ユニット拡大環状光学系
JP2008153338A Expired - Fee Related JP5121588B2 (ja) 2003-06-30 2008-06-11 フラットパネルディスプレイ製造用露光システム

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2008153338A Expired - Fee Related JP5121588B2 (ja) 2003-06-30 2008-06-11 フラットパネルディスプレイ製造用露光システム

Country Status (7)

Country Link
US (3) US7158215B2 (enExample)
EP (1) EP1494076A3 (enExample)
JP (2) JP2005025199A (enExample)
KR (1) KR100832509B1 (enExample)
CN (1) CN100587601C (enExample)
SG (1) SG110098A1 (enExample)
TW (1) TWI309754B (enExample)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7184124B2 (en) * 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US7426076B2 (en) * 2004-12-23 2008-09-16 Asml Holding N.V. Projection system for a lithographic apparatus
WO2007048506A1 (en) * 2005-10-28 2007-05-03 Carl Zeiss Laser Optics Gmbh Optical device for generating a line focus on a surface
JP5196869B2 (ja) 2007-05-15 2013-05-15 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5118407B2 (ja) * 2007-07-31 2013-01-16 キヤノン株式会社 光学系、露光装置及びデバイス製造方法
JP5201979B2 (ja) * 2007-12-26 2013-06-05 キヤノン株式会社 露光装置およびデバイス製造方法
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
US7929129B2 (en) 2009-05-22 2011-04-19 Corning Incorporated Inspection systems for glass sheets
JP2011039172A (ja) * 2009-08-07 2011-02-24 Canon Inc 露光装置およびデバイス製造方法
US9007497B2 (en) * 2010-08-11 2015-04-14 Media Lario S.R.L. Three-mirror anastigmat with at least one non-rotationally symmetric mirror
US8223443B2 (en) 2010-09-01 2012-07-17 Kla-Tencor Corporation Collection optics
US8493670B2 (en) 2010-09-10 2013-07-23 Coherent, Inc. Large-field unit-magnification catadioptric projection system
US10095016B2 (en) 2011-01-04 2018-10-09 Nlight, Inc. High power laser system
US9429742B1 (en) * 2011-01-04 2016-08-30 Nlight, Inc. High power laser imaging systems
US9409255B1 (en) 2011-01-04 2016-08-09 Nlight, Inc. High power laser imaging systems
US8659823B2 (en) 2011-04-22 2014-02-25 Coherent, Inc. Unit-magnification catadioptric and catoptric projection optical systems
CN102981255B (zh) * 2011-09-07 2016-04-20 上海微电子装备有限公司 一种大视场投影物镜
US9720244B1 (en) 2011-09-30 2017-08-01 Nlight, Inc. Intensity distribution management system and method in pixel imaging
CN103105664B (zh) * 2011-11-10 2016-02-03 上海微电子装备有限公司 光刻投影物镜
DE102012217800A1 (de) * 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Diffraktives optisches Element sowie Messverfahren
US9310248B2 (en) 2013-03-14 2016-04-12 Nlight, Inc. Active monitoring of multi-laser systems
KR102099722B1 (ko) 2014-02-05 2020-05-18 엔라이트 인크. 단일-이미터 라인 빔 시스템
US10746994B2 (en) 2014-08-07 2020-08-18 Microsoft Technology Licensing, Llc Spherical mirror having a decoupled aspheric
CN105629668B (zh) * 2014-10-28 2018-03-06 中芯国际集成电路制造(上海)有限公司 测试装置、测试系统以及测试方法
CN105182510B (zh) * 2015-07-20 2017-07-14 中国科学院上海光学精密机械研究所 对有限远物面成像的球面卡塞格林系统及其调整方法
JP6661371B2 (ja) * 2015-12-25 2020-03-11 キヤノン株式会社 評価方法、露光方法、および物品の製造方法
US10353204B2 (en) * 2016-10-31 2019-07-16 Tectus Corporation Femtoprojector optical systems
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
US10527831B2 (en) 2017-09-11 2020-01-07 Toyota Motor Engineering & Manufacturing North America, Inc. Cloaking devices with planar and curved mirrors and vehicles comprising the same
CN108613673B (zh) * 2018-06-13 2021-06-18 北京航空航天大学 一种单目视觉位姿估计装置及方法
JP7204507B2 (ja) * 2019-02-05 2023-01-16 キオクシア株式会社 露光方法および露光装置
JP7357488B2 (ja) * 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法
CN111880306B (zh) * 2020-09-10 2022-05-20 深圳市点睛创视技术有限公司 一种用于微型投影的超短焦物镜系统的设计方法

Family Cites Families (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US529872A (en) * 1894-11-27 Separator
JPS4812039B1 (enExample) 1969-05-20 1973-04-17
US3748015A (en) 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US3821763A (en) 1971-06-21 1974-06-28 Perkin Elmer Corp Annular field optical imaging system
US4293186A (en) * 1977-02-11 1981-10-06 The Perkin-Elmer Corporation Restricted off-axis field optical system
US4240707A (en) 1978-12-07 1980-12-23 Itek Corporation All-reflective three element objective
US4693569A (en) * 1979-12-21 1987-09-15 The Perkin-Elmer Corporation Method and apparatus for optical system adjustments
JPS5775533U (enExample) * 1980-10-27 1982-05-10
JPS5883836A (ja) * 1981-11-13 1983-05-19 Hitachi Ltd 円弧状照明光形成スリツト
JPS58121017U (ja) * 1982-02-12 1983-08-17 株式会社日立製作所 線状光源装置
JPS58215621A (ja) * 1982-06-09 1983-12-15 Hitachi Ltd 1「あ」1プロジエクシヨンアライナ
JPS58222522A (ja) * 1982-06-21 1983-12-24 Hitachi Ltd プロジエクシヨンアライナ
JPS6093410A (ja) * 1983-10-27 1985-05-25 Canon Inc 反射光学系
JPS612124A (ja) 1984-06-14 1986-01-08 Canon Inc 結像光学系
US4701035A (en) 1984-08-14 1987-10-20 Canon Kabushiki Kaisha Reflection optical system
JPS6147917A (ja) 1984-08-14 1986-03-08 Canon Inc 反射光学系
US4650315A (en) * 1985-05-10 1987-03-17 The Perkin-Elmer Corporation Optical lithographic system
US4711535A (en) * 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
US4737021A (en) 1986-03-21 1988-04-12 Dietrich Korsch Wide-field three-mirror collimator
EP0252734B1 (en) * 1986-07-11 2000-05-03 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
US4743112A (en) * 1986-07-18 1988-05-10 Santa Barbara Research Center Imaging spectrometer
US4747678A (en) 1986-12-17 1988-05-31 The Perkin-Elmer Corporation Optical relay system with magnification
US4834517A (en) 1987-01-13 1989-05-30 Hughes Aircraft Company Method and apparatus for receiving optical signals
US4824517A (en) * 1987-08-20 1989-04-25 Dennison Manufacturing Company Multipurpose dispenser
US4769680A (en) 1987-10-22 1988-09-06 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
JP3047983B2 (ja) * 1990-03-30 2000-06-05 株式会社日立製作所 微細パターン転写方法およびその装置
WO1991017483A1 (de) 1990-05-02 1991-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Belichtungsvorrichtung
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6219015B1 (en) 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
JP3224041B2 (ja) 1992-07-29 2001-10-29 株式会社ニコン 露光方法及び装置
JPH0653113A (ja) * 1992-07-31 1994-02-25 Matsushita Electric Ind Co Ltd 走査投影露光装置
JP3259373B2 (ja) * 1992-11-27 2002-02-25 株式会社日立製作所 露光方法及び露光装置
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3477838B2 (ja) 1993-11-11 2003-12-10 株式会社ニコン 走査型露光装置及び露光方法
JP3339149B2 (ja) 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
US5530516A (en) 1994-10-04 1996-06-25 Tamarack Scientific Co., Inc. Large-area projection exposure system
US5677703A (en) 1995-01-06 1997-10-14 Texas Instruments Incorporated Data loading circuit for digital micro-mirror device
US5530482A (en) 1995-03-21 1996-06-25 Texas Instruments Incorporated Pixel data processing for spatial light modulator having staggered pixels
US6229595B1 (en) * 1995-05-12 2001-05-08 The B. F. Goodrich Company Lithography system and method with mask image enlargement
JP3525423B2 (ja) * 1995-09-14 2004-05-10 株式会社ニコン 反射光学系
US5710619A (en) 1995-10-31 1998-01-20 Anvik Corporation Large-area, scan-and-repeat, projection patterning system with unitary stage and magnification control capability
US6133986A (en) 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
US5880834A (en) * 1996-10-16 1999-03-09 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Convex diffraction grating imaging spectrometer
DE69711929T2 (de) 1997-01-29 2002-09-05 Micronic Laser Systems Ab, Taeby Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
US6177980B1 (en) 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US5982553A (en) 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
US6049325A (en) * 1997-05-27 2000-04-11 Hewlett-Packard Company System and method for efficient hit-testing in a computer-based system
US6226346B1 (en) 1998-06-09 2001-05-01 The Regents Of The University Of California Reflective optical imaging systems with balanced distortion
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6118577A (en) 1998-08-06 2000-09-12 Euv, L.L.C Diffractive element in extreme-UV lithography condenser
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
JP2000286189A (ja) * 1999-03-31 2000-10-13 Nikon Corp 露光装置および露光方法ならびにデバイス製造方法
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001290279A (ja) 2000-04-04 2001-10-19 Canon Inc 走査型露光装置
KR100827874B1 (ko) 2000-05-22 2008-05-07 가부시키가이샤 니콘 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법
JP2001339651A (ja) * 2000-05-29 2001-12-07 Matsushita Electric Ind Co Ltd 選局装置
US6618209B2 (en) 2000-08-08 2003-09-09 Olympus Optical Co., Ltd. Optical apparatus
US6522403B2 (en) 2000-12-04 2003-02-18 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Computed tomography imaging spectrometer (CTIS) with 2D reflective grating for ultraviolet to long-wave infrared detection especially useful for surveying transient events
US6707603B2 (en) * 2001-06-28 2004-03-16 Raytheon Company Apparatus and method to distort an optical beam to avoid ionization at an intermediate focus
JP3563384B2 (ja) 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
JP2003172858A (ja) * 2001-12-06 2003-06-20 Nikon Corp 光学部品保持装置及び露光装置
TW517403B (en) * 2002-01-10 2003-01-11 Epitech Technology Corp Nitride light emitting diode and manufacturing method for the same
KR100545297B1 (ko) 2002-06-12 2006-01-24 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
US6879383B2 (en) * 2002-12-27 2005-04-12 Ultratech, Inc. Large-field unit-magnification projection system
US6870554B2 (en) 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
EP1482373A1 (en) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
DE102004050893B4 (de) * 2003-10-31 2015-05-21 Carl Zeiss Meditec Ag Tubus mit zwei umschaltbaren Planoptikelementen zur wahlweisen Strahlengangvertauschung und Bildumkehr für ein Mikroskop sowie Mikroskop
US7184124B2 (en) * 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US7426076B2 (en) * 2004-12-23 2008-09-16 Asml Holding N.V. Projection system for a lithographic apparatus

Similar Documents

Publication Publication Date Title
JP2005025199A5 (enExample)
CN100587601C (zh) 用于平板显示器的像差可校正大视场投影光学系统
CN101548240B (zh) 具有用于减小像差的可替换、可操纵的校正布置的光学系统
JP5876516B2 (ja) マイクロリソグラフィのための投影対物系、投影露光装置、投影露光方法、及び光学補正プレート
CN101819373B (zh) 投影型图像显示装置
JP5404931B2 (ja) 偏向ミラーを含む反射屈折投影対物系及び投影露光方法
JP2000031041A5 (enExample)
TWI414822B (zh) Projection optics, exposure apparatus and component manufacturing method
JP2004258218A (ja) 斜め投影光学系
US8068276B2 (en) Projection objective for lithography
US20240159988A1 (en) Support for an optical element
TWI486714B (zh) 照明裝置、曝光裝置以及微元件的製造方法
CN100443944C (zh) 投影型图像显示装置、投影光学单元、透过型透镜、自由曲面透镜
CN119907946A (zh) 光学组件、光学系统及投射曝光设备
US20250370357A1 (en) Optical assembly, optical system and projection exposure apparatus
TW202311805A (zh) 光學元件、投影光學單元及投影曝光裝置
US9645388B2 (en) Facet mirror device
CN111948886A (zh) 投影成像装置
JP2005024584A (ja) 走査型投影露光装置及び露光方法
JP5116726B2 (ja) 露光装置およびデバイス製造方法
WO2007023665A1 (ja) 投影光学系、露光装置、およびデバイスの製造方法
JP2004029458A (ja) 投影光学系及び縮小投影露光装置
JP2007266511A (ja) 光学系、露光装置、及び光学特性の調整方法
JP2009258461A (ja) 結像光学系、露光装置、およびデバイス製造方法
JP2009141333A (ja) 光学素子の位置決め装置