JP2003344866A5 - - Google Patents

Download PDF

Info

Publication number
JP2003344866A5
JP2003344866A5 JP2002151322A JP2002151322A JP2003344866A5 JP 2003344866 A5 JP2003344866 A5 JP 2003344866A5 JP 2002151322 A JP2002151322 A JP 2002151322A JP 2002151322 A JP2002151322 A JP 2002151322A JP 2003344866 A5 JP2003344866 A5 JP 2003344866A5
Authority
JP
Japan
Prior art keywords
semiconductor
film
electrode
capacitance
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002151322A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003344866A (ja
JP4179800B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2002151322A external-priority patent/JP4179800B2/ja
Priority to JP2002151322A priority Critical patent/JP4179800B2/ja
Priority to US10/442,374 priority patent/US6888164B2/en
Priority to TW092114012A priority patent/TWI227458B/zh
Priority to KR1020030033205A priority patent/KR100965948B1/ko
Publication of JP2003344866A publication Critical patent/JP2003344866A/ja
Priority to US10/899,689 priority patent/US7205172B2/en
Publication of JP2003344866A5 publication Critical patent/JP2003344866A5/ja
Priority to US11/106,392 priority patent/US7142201B2/en
Priority to US11/728,173 priority patent/US8026116B2/en
Publication of JP4179800B2 publication Critical patent/JP4179800B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

JP2002151322A 2002-05-24 2002-05-24 表示装置及びその製造方法 Expired - Fee Related JP4179800B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2002151322A JP4179800B2 (ja) 2002-05-24 2002-05-24 表示装置及びその製造方法
US10/442,374 US6888164B2 (en) 2002-05-24 2003-05-21 Display pixel having a capacitive electrode with different conductivity type from the switching element
TW092114012A TWI227458B (en) 2002-05-24 2003-05-23 Display device and method of manufacturing the same
KR1020030033205A KR100965948B1 (ko) 2002-05-24 2003-05-24 표시 장치 및 그 제조 방법
US10/899,689 US7205172B2 (en) 2002-05-24 2004-07-27 Display device and method of manufacturing the same
US11/106,392 US7142201B2 (en) 2002-05-24 2005-04-13 Display device and method of manufacturing the same
US11/728,173 US8026116B2 (en) 2002-05-24 2007-03-23 Display device and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002151322A JP4179800B2 (ja) 2002-05-24 2002-05-24 表示装置及びその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006319218A Division JP4544242B2 (ja) 2006-11-27 2006-11-27 表示装置

Publications (3)

Publication Number Publication Date
JP2003344866A JP2003344866A (ja) 2003-12-03
JP2003344866A5 true JP2003344866A5 (enExample) 2005-04-07
JP4179800B2 JP4179800B2 (ja) 2008-11-12

Family

ID=29768951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002151322A Expired - Fee Related JP4179800B2 (ja) 2002-05-24 2002-05-24 表示装置及びその製造方法

Country Status (4)

Country Link
US (4) US6888164B2 (enExample)
JP (1) JP4179800B2 (enExample)
KR (1) KR100965948B1 (enExample)
TW (1) TWI227458B (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6509616B2 (en) * 2000-09-29 2003-01-21 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and its manufacturing method
TWI231996B (en) 2003-03-28 2005-05-01 Au Optronics Corp Dual gate layout for thin film transistor
TWI224234B (en) * 2003-08-12 2004-11-21 Quanta Display Inc Pixel structure and fabricating method thereof
US7521368B2 (en) * 2004-05-07 2009-04-21 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
KR101112547B1 (ko) * 2005-01-18 2012-03-13 삼성전자주식회사 박막 트랜지스터 표시판 및 박막 트랜지스터 표시판의제조 방법
KR101112549B1 (ko) * 2005-01-31 2012-06-12 삼성전자주식회사 박막 트랜지스터 표시판
US7863612B2 (en) 2006-07-21 2011-01-04 Semiconductor Energy Laboratory Co., Ltd. Display device and semiconductor device
KR101352343B1 (ko) * 2006-12-11 2014-01-15 삼성디스플레이 주식회사 액정표시장치
JP2008209732A (ja) * 2007-02-27 2008-09-11 Sharp Corp 薄膜トランジスタアレイ基板、その製造方法および液晶表示装置
TWI339444B (en) 2007-05-30 2011-03-21 Au Optronics Corp Conductor structure, pixel structure, and methods of forming the same
KR100905940B1 (ko) * 2007-09-19 2009-07-06 세메스 주식회사 미세 회로 소자의 제조 방법 및 장치
JP4710953B2 (ja) * 2007-10-31 2011-06-29 カシオ計算機株式会社 液晶表示装置及びその駆動方法
KR101943293B1 (ko) 2009-10-16 2019-01-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치, 표시 장치 및 전자 장치
WO2012111586A1 (ja) * 2011-02-18 2012-08-23 シャープ株式会社 半導体装置及び表示装置
US9268427B2 (en) * 2011-09-23 2016-02-23 Apple Inc. Multi-mode voltages for touchscreens
KR101951365B1 (ko) 2012-02-08 2019-04-26 삼성디스플레이 주식회사 액정 표시 장치
US20140014948A1 (en) * 2012-07-12 2014-01-16 Semiconductor Energy Laboratory Co. Ltd. Semiconductor device
JP2014074908A (ja) * 2012-09-13 2014-04-24 Semiconductor Energy Lab Co Ltd 半導体装置及び半導体装置の駆動方法
US20150221677A1 (en) * 2012-09-24 2015-08-06 Sharp Kabushiki Kaisha Active matrix substrate, display device, and production method therefor
CN103746000B (zh) * 2013-12-25 2017-03-08 深圳市华星光电技术有限公司 一种多晶硅tft器件及其制造方法
CN105807520A (zh) * 2016-05-20 2016-07-27 深圳市华星光电技术有限公司 3t像素结构及液晶显示装置
JP2019117342A (ja) * 2017-12-27 2019-07-18 シャープ株式会社 アクティブマトリックス基板、アクティブマトリックス基板の製造方法および液晶表示装置
TWI836787B (zh) 2022-12-13 2024-03-21 友達光電股份有限公司 顯示面板

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0824193B2 (ja) * 1990-10-16 1996-03-06 工業技術院長 平板型光弁駆動用半導体装置の製造方法
JP2626451B2 (ja) * 1993-03-23 1997-07-02 日本電気株式会社 液晶表示装置の駆動方法
JP2898509B2 (ja) * 1993-06-23 1999-06-02 シャープ株式会社 アクティブマトリックス基板及びその製造方法
JPH07146489A (ja) * 1993-11-26 1995-06-06 Fujitsu Ltd 液晶表示装置
JPH08292449A (ja) * 1995-04-25 1996-11-05 Hitachi Ltd アクティブマトリクス型表示装置
JP3833327B2 (ja) * 1997-02-03 2006-10-11 三洋電機株式会社 薄膜トランジスタの製造方法、表示装置、密着型イメージセンサ、三次元ｉｃ
US6246070B1 (en) * 1998-08-21 2001-06-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device provided with semiconductor circuit made of semiconductor element and method of fabricating the same
JP4008133B2 (ja) * 1998-12-25 2007-11-14 株式会社半導体エネルギー研究所 半導体装置
JP4307635B2 (ja) * 1999-06-22 2009-08-05 株式会社半導体エネルギー研究所 半導体装置の作製方法
WO2001033292A1 (fr) * 1999-10-29 2001-05-10 Hitachi, Ltd. Dispositif d'affichage a cristaux liquides
JP2002040486A (ja) * 2000-05-19 2002-02-06 Seiko Epson Corp 電気光学装置、その製造方法および電子機器
JP2002006341A (ja) * 2000-06-26 2002-01-09 Seiko Epson Corp 液晶装置およびその製造方法
US6509616B2 (en) * 2000-09-29 2003-01-21 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and its manufacturing method
JP3832240B2 (ja) * 2000-12-22 2006-10-11 セイコーエプソン株式会社 液晶表示装置の駆動方法
TW577179B (en) * 2001-10-09 2004-02-21 Semiconductor Energy Lab Switching element, display device, light emitting device using the switching element, and semiconductor device

Similar Documents

Publication Publication Date Title
JP4179800B2 (ja) 表示装置及びその製造方法
JP2003344866A5 (enExample)
US5028122A (en) Liquid crystal active-matrix display device
EP0136509B1 (en) Active matrix type display apparatus
KR100418536B1 (ko) 표시 장치 및 표시 장치의 구동 방법
KR100442898B1 (ko) 액정표시장치및그제조방법
US5940151A (en) Liquid crystal display and method for fabricating the same
JP4403115B2 (ja) 表示装置及びその製造方法
JP2005077822A (ja) トランジスタアレイ基板の製造方法及びトランジスタアレイ基板
US20050190312A1 (en) [pixel structure and manufacturing method thereof]
US6278502B1 (en) Pixel capacitor formed from multiple layers
JP3777706B2 (ja) 表示装置
JPH10142636A (ja) アクティブマトリクス型表示回路
KR100647774B1 (ko) 폴리 실리콘형 박막 트랜지스터 기판 및 제조 방법
JP2898509B2 (ja) アクティブマトリックス基板及びその製造方法
JP4544242B2 (ja) 表示装置
US20040100434A1 (en) Wire structure of display device
JPH0850309A (ja) 電気光学装置
JP4167796B2 (ja) 液晶装置およびその製造方法ならびに電子機器
JP4065076B2 (ja) 表示装置
JP2002006341A (ja) 液晶装置およびその製造方法
TWI392941B (zh) 液晶顯示器及其製造方法
JP2006259241A (ja) 電気光学装置の製造方法
KR100939918B1 (ko) 액정표시패널 및 그 제조 방법
JP2000150897A (ja) 液晶表示装置