JP2002502056A - マレイミドを含む光重合組成物およびその使用方法 - Google Patents

マレイミドを含む光重合組成物およびその使用方法

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Publication number
JP2002502056A
JP2002502056A JP2000529640A JP2000529640A JP2002502056A JP 2002502056 A JP2002502056 A JP 2002502056A JP 2000529640 A JP2000529640 A JP 2000529640A JP 2000529640 A JP2000529640 A JP 2000529640A JP 2002502056 A JP2002502056 A JP 2002502056A
Authority
JP
Japan
Prior art keywords
maleimide
group
alkyl
compound
aryl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000529640A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002502056A5 (https=
Inventor
ホイル，チャールズ・イー
ナガラジャン，ラジャマニ
ミラー，クリストファー・ダブリュー
クラーク，シャン・クリストファー
イェンソン，イー・ソニー
シャオ，リーイン
Original Assignee
ファースト・ケミカル・コーポレイション
ユニヴァーシティ・オヴ・サザン・ミシシッピ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ファースト・ケミカル・コーポレイション, ユニヴァーシティ・オヴ・サザン・ミシシッピ filed Critical ファースト・ケミカル・コーポレイション
Publication of JP2002502056A publication Critical patent/JP2002502056A/ja
Publication of JP2002502056A5 publication Critical patent/JP2002502056A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/10—Esters
    • C08F22/12—Esters of phenols or saturated alcohols
    • C08F22/18—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J151/00—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C09J151/08—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Pyrrole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2000529640A 1998-01-30 1999-01-29 マレイミドを含む光重合組成物およびその使用方法 Pending JP2002502056A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US7310098P 1998-01-30 1998-01-30
US60/073,100 1998-01-30
PCT/US1999/001989 WO1999039247A1 (en) 1998-01-30 1999-01-29 Photopolymerization compositions including maleimides and processes for using the same

Publications (2)

Publication Number Publication Date
JP2002502056A true JP2002502056A (ja) 2002-01-22
JP2002502056A5 JP2002502056A5 (https=) 2006-03-23

Family

ID=22111727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000529640A Pending JP2002502056A (ja) 1998-01-30 1999-01-29 マレイミドを含む光重合組成物およびその使用方法

Country Status (12)

Country Link
US (1) US6555593B1 (https=)
EP (1) EP1051665B1 (https=)
JP (1) JP2002502056A (https=)
KR (1) KR100594956B1 (https=)
CN (1) CN1295680A (https=)
AT (1) ATE333114T1 (https=)
AU (1) AU2485199A (https=)
BR (1) BR9908044A (https=)
CA (1) CA2318809A1 (https=)
DE (1) DE69932320T2 (https=)
TW (1) TWI238841B (https=)
WO (1) WO1999039247A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008506032A (ja) * 2004-07-12 2008-02-28 ナショナル スターチ アンド ケミカル インベストメント ホールディング コーポレーション マレイミドに基づく放射線硬化性組成物
JPWO2006008995A1 (ja) * 2004-07-15 2008-05-01 太陽インキ製造株式会社 光硬化性・熱硬化性樹脂組成物及びその硬化物
JP2012096409A (ja) * 2010-10-29 2012-05-24 Dainippon Printing Co Ltd ガスバリア性フィルムの製造方法及びガスバリア層の形成方法
JP2021110930A (ja) * 2019-12-30 2021-08-02 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 感光性ビスマレイミド組成物

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CN100360504C (zh) * 2005-12-22 2008-01-09 上海交通大学 含硫可聚合的二苯甲酮光引发剂及其制备方法
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JP5615600B2 (ja) * 2010-06-09 2014-10-29 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物
JP6463361B2 (ja) 2013-09-08 2019-01-30 コディアック サイエンシーズ インコーポレイテッドＫｏｄｉａｋ Ｓｃｉｅｎｃｅｓ Ｉｎｃ． 第ｖｉｉｉ因子両性イオンポリマーコンジュゲート
US9840553B2 (en) 2014-06-28 2017-12-12 Kodiak Sciences Inc. Dual PDGF/VEGF antagonists
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BR112017009711B1 (pt) * 2014-11-13 2021-06-01 Rhodia Operations Composições, pasta de dentes, gel dental, dentifrício, pó dental, pasta profilática, enxaguante bucal, solução para enxágue, mousse dental, fio dental, goma de mascar, tira ou filme de cuidados bucais solúveis para aplicação direta ou fixação a uma superfície bucal, composto de fosfato e método de cuidados bucais
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Publication number Priority date Publication date Assignee Title
JP2008506032A (ja) * 2004-07-12 2008-02-28 ナショナル スターチ アンド ケミカル インベストメント ホールディング コーポレーション マレイミドに基づく放射線硬化性組成物
JPWO2006008995A1 (ja) * 2004-07-15 2008-05-01 太陽インキ製造株式会社 光硬化性・熱硬化性樹脂組成物及びその硬化物
JP4994036B2 (ja) * 2004-07-15 2012-08-08 太陽ホールディングス株式会社 光硬化性及び熱硬化性樹脂組成物及びその硬化物
JP2012096409A (ja) * 2010-10-29 2012-05-24 Dainippon Printing Co Ltd ガスバリア性フィルムの製造方法及びガスバリア層の形成方法
JP2021110930A (ja) * 2019-12-30 2021-08-02 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 感光性ビスマレイミド組成物
JP7160886B2 (ja) 2019-12-30 2022-10-25 ローム アンド ハース エレクトロニック マテリアルズ エルエルシー 感光性ビスマレイミド組成物

Also Published As

Publication number Publication date
KR20010040466A (ko) 2001-05-15
AU2485199A (en) 1999-08-16
ATE333114T1 (de) 2006-08-15
DE69932320T2 (de) 2007-07-12
EP1051665A1 (en) 2000-11-15
EP1051665B1 (en) 2006-07-12
BR9908044A (pt) 2000-11-28
TWI238841B (en) 2005-09-01
CN1295680A (zh) 2001-05-16
DE69932320D1 (de) 2006-08-24
CA2318809A1 (en) 1999-08-05
US6555593B1 (en) 2003-04-29
WO1999039247A1 (en) 1999-08-05
KR100594956B1 (ko) 2006-06-30

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