ATE333114T1 - Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung - Google Patents
Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendungInfo
- Publication number
- ATE333114T1 ATE333114T1 AT99904452T AT99904452T ATE333114T1 AT E333114 T1 ATE333114 T1 AT E333114T1 AT 99904452 T AT99904452 T AT 99904452T AT 99904452 T AT99904452 T AT 99904452T AT E333114 T1 ATE333114 T1 AT E333114T1
- Authority
- AT
- Austria
- Prior art keywords
- methods
- compositions containing
- photopolymerizable compositions
- containing maleimide
- compositions
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 title 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 abstract 2
- 239000012965 benzophenone Substances 0.000 abstract 1
- -1 benzophenone compound Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/12—Esters of phenols or saturated alcohols
- C08F22/18—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J151/00—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
- C09J151/08—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Pyrrole Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7310098P | 1998-01-30 | 1998-01-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE333114T1 true ATE333114T1 (de) | 2006-08-15 |
Family
ID=22111727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT99904452T ATE333114T1 (de) | 1998-01-30 | 1999-01-29 | Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6555593B1 (https=) |
| EP (1) | EP1051665B1 (https=) |
| JP (1) | JP2002502056A (https=) |
| KR (1) | KR100594956B1 (https=) |
| CN (1) | CN1295680A (https=) |
| AT (1) | ATE333114T1 (https=) |
| AU (1) | AU2485199A (https=) |
| BR (1) | BR9908044A (https=) |
| CA (1) | CA2318809A1 (https=) |
| DE (1) | DE69932320T2 (https=) |
| TW (1) | TWI238841B (https=) |
| WO (1) | WO1999039247A1 (https=) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE516696C2 (sv) * | 1999-12-23 | 2002-02-12 | Perstorp Flooring Ab | Förfarande för framställning av ytelement vilka innefattar ett övre dekorativt skikt samt ytelement framställda enlit förfarandet |
| SE516275C2 (sv) * | 2000-03-13 | 2001-12-10 | Perstorp Flooring Ab | Ny oligomerförening samt användning därav |
| EP1167395B1 (en) * | 2000-06-19 | 2008-11-19 | Toagosei Co., Ltd. | Crosslinkable resin compositions |
| WO2002020500A2 (en) | 2000-09-01 | 2002-03-14 | Icos Corporation | Materials and methods to potentiate cancer treatment |
| WO2002083764A1 (en) * | 2001-04-09 | 2002-10-24 | Sekisui Chemical Co., Ltd. | Photoreactive composition |
| US20080103222A1 (en) * | 2002-04-26 | 2008-05-01 | Albemarle Corporation | New Class of Amine Coinitiators in Photoinitiated Polymerizations |
| US20040029044A1 (en) * | 2002-08-08 | 2004-02-12 | 3M Innovative Properties Company | Photocurable composition |
| WO2004085418A2 (en) | 2003-03-24 | 2004-10-07 | Luitpold Pharmaceuticals, Inc. | Xanthones, thioxanthones and acridinones as dna-pk inhibitors |
| US20040198859A1 (en) * | 2003-04-03 | 2004-10-07 | Nguyen Chau K. | Photopolymerization systems and their use |
| US20060293404A1 (en) * | 2003-04-24 | 2006-12-28 | Santobianco John G | New class of amine coinitiators in photoinitiated polymerizations |
| US20060009539A1 (en) * | 2004-07-12 | 2006-01-12 | Herr Donald E | Maleimide-based radiation curable compositions |
| JP4994036B2 (ja) * | 2004-07-15 | 2012-08-08 | 太陽ホールディングス株式会社 | 光硬化性及び熱硬化性樹脂組成物及びその硬化物 |
| KR100618864B1 (ko) * | 2004-09-23 | 2006-08-31 | 삼성전자주식회사 | 반도체 소자 제조용 마스크 패턴 및 그 형성 방법과 미세패턴을 가지는 반도체 소자의 제조 방법 |
| CN100360504C (zh) * | 2005-12-22 | 2008-01-09 | 上海交通大学 | 含硫可聚合的二苯甲酮光引发剂及其制备方法 |
| WO2007092935A1 (en) * | 2006-02-08 | 2007-08-16 | Albemarle Corporation | Hydroxyalkylaminoalkylthioxanthones |
| EP3222142A1 (en) | 2006-02-28 | 2017-09-27 | Kodiak Sciences Inc. | Acryloyloxyethylphosphorylcholine containing polymer conjugates and their preparation |
| CN100372832C (zh) * | 2006-04-20 | 2008-03-05 | 上海交通大学 | 一种含硫和二苯甲酮结构的二胺及其制备方法 |
| WO2008070737A1 (en) * | 2006-12-05 | 2008-06-12 | University Of Southern Mississippi | Benzophenone/thioxanthone derivatives and their use in photopolymerizable compositions |
| JP2009214428A (ja) * | 2008-03-11 | 2009-09-24 | Fujifilm Corp | 平版印刷版原版および平版印刷方法 |
| KR101099691B1 (ko) * | 2008-04-07 | 2011-12-28 | 주식회사 삼양이엠에스 | 음성 레지스트 조성물 |
| DE102008054611A1 (de) * | 2008-12-15 | 2010-06-17 | Evonik Röhm Gmbh | Verfahren zur Herstellung von methacrylierten Benzophenonen |
| WO2011075185A1 (en) * | 2009-12-18 | 2011-06-23 | Oligasis | Targeted drug phosphorylcholine polymer conjugates |
| US20130025495A1 (en) * | 2010-01-11 | 2013-01-31 | Isp Investments Inc. | Compositions comprising a reactive monomer and uses thereof |
| JP5615600B2 (ja) * | 2010-06-09 | 2014-10-29 | 富士フイルム株式会社 | インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物 |
| JP5724298B2 (ja) * | 2010-10-29 | 2015-05-27 | 大日本印刷株式会社 | ガスバリア性フィルムの製造方法及びガスバリア層の形成方法 |
| WO2015035342A2 (en) | 2013-09-08 | 2015-03-12 | Oligasis Llc | Factor viii zwitterionic polymer conjugates |
| US9840553B2 (en) | 2014-06-28 | 2017-12-12 | Kodiak Sciences Inc. | Dual PDGF/VEGF antagonists |
| KR20210013299A (ko) | 2014-10-17 | 2021-02-03 | 코디악 사이언시스 인코포레이티드 | 부티릴콜린에스테라제 양성이온성 중합체 컨쥬게이트 |
| EP3217954B1 (en) * | 2014-11-13 | 2020-01-08 | Rhodia Operations | Ablative, renewable, multi-functional protective coating for dental surfaces |
| KR20250057128A (ko) | 2015-12-30 | 2025-04-28 | 코디악 사이언시스 인코포레이티드 | 항체 및 이의 접합체 |
| EP3758737A4 (en) | 2018-03-02 | 2022-10-12 | Kodiak Sciences Inc. | IL-6 ANTIBODIES AND FUSION CONSTRUCTS AND CONJUGATES THEREOF |
| CA3121202A1 (en) | 2018-11-30 | 2020-06-04 | Nuvation Bio Inc. | Pyrrole and pyrazole compounds and methods of use thereof |
| CA3157509A1 (en) | 2019-10-10 | 2021-04-15 | Kodiak Sciences Inc. | Methods of treating an eye disorder |
| WO2021096751A1 (en) * | 2019-11-13 | 2021-05-20 | Piedmont Chemical Industries, LLC | Photopolymerization synergist |
| US11639398B2 (en) * | 2019-12-30 | 2023-05-02 | Rohm And Haas Electronic Materials Llc | Photosensitive bismaleimide composition |
| US11434313B2 (en) * | 2020-12-16 | 2022-09-06 | Canon Kabushiki Kaisha | Curable composition for making cured layer with high thermal stability |
| CN114163551A (zh) * | 2021-12-02 | 2022-03-11 | 广东博兴新材料科技有限公司 | 一种水性uv/eb敏感树脂及其制备方法和应用 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3129225A (en) | 1961-06-07 | 1964-04-14 | Us Vitamin Pharm Corp | Novel 4-oxy-3-maleimidyl betaines |
| US3729814A (en) | 1967-04-04 | 1973-05-01 | Gen Electric | Method for making a composite |
| US3855180A (en) | 1971-07-21 | 1974-12-17 | Gen Electric | Curable compositions from blend of maleimido compound and vinyl ether |
| US3850955A (en) | 1972-11-17 | 1974-11-26 | Dow Chemical Co | N-(trifluoromethyl-and trifluoromethylhalophenyl)maleimides |
| US3890270A (en) | 1974-04-10 | 1975-06-17 | Tenneco Chem | Polyvinyl halide resin compositions |
| CA1065085A (en) | 1974-05-20 | 1979-10-23 | John P. Guarino | Radiation curable coating |
| DE2457882B2 (de) | 1974-12-06 | 1977-06-02 | Siemens AG, 1000 Berlin und 8000 München | Waermebestaendige, lichtvernetzbare massen |
| US4025409A (en) | 1975-07-14 | 1977-05-24 | Scm Corporation | Dual cure cathodic electrocoating process |
| GB1575653A (en) | 1977-06-01 | 1980-09-24 | Ciba Geigy Ag | Reinforced composites |
| JPS607261B2 (ja) | 1978-10-02 | 1985-02-23 | 旭化成株式会社 | 感光性エラストマ−組成物 |
| DE2919841A1 (de) | 1979-05-16 | 1980-11-20 | Siemens Ag | Verfahren zur phototechnischen herstellung von reliefstrukturen |
| DE2919823A1 (de) | 1979-05-16 | 1980-11-20 | Siemens Ag | N-azidosulfonylaryl-maleinimide sowie deren verwendung |
| DE3069448D1 (en) | 1979-05-18 | 1984-11-22 | Ciba Geigy Ag | Photocrosslinkable copolymers, photosensitive recording material containing them, its utilisation in the production of photographic pictures and process for the production of photographic pictures |
| JPS5698245A (en) | 1980-01-09 | 1981-08-07 | Mitsubishi Gas Chem Co Inc | Curable resin composition |
| JPS56141321A (en) * | 1980-04-08 | 1981-11-05 | Mitsubishi Gas Chem Co Inc | Photosetting resin composition |
| US4416975A (en) | 1981-02-04 | 1983-11-22 | Ciba-Geigy Corporation | Photopolymerization process employing compounds containing acryloyl groups and maleimide groups |
| US4544621A (en) | 1982-05-19 | 1985-10-01 | Ciba Geigy Corporation | Photocrosslinkable water-soluble polymers, containing maleimidyl and quaternary ammonium groups process for their preparation and use thereof |
| US4656292A (en) | 1982-05-19 | 1987-04-07 | Ciba-Geigy Corporation | 2,3-dimethylmaleimido-alkyl haloacetates |
| JPS6210179A (ja) | 1985-07-09 | 1987-01-19 | Nippon Shokubai Kagaku Kogyo Co Ltd | 嫌気性接着剤組成物 |
| GB8719589D0 (en) | 1987-08-19 | 1987-09-23 | Ici Plc | Bismaleimide compositions |
| US5026625A (en) | 1987-12-01 | 1991-06-25 | Ciba-Geigy Corporation | Titanocenes, the use thereof, and n-substituted fluoroanilines |
| US4886842A (en) * | 1988-03-04 | 1989-12-12 | Loctite Corporation | Epoxy-amine compositions employing unsaturated imides |
| JPH02109052A (ja) | 1988-10-19 | 1990-04-20 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物 |
| CA2020378A1 (en) | 1989-07-28 | 1991-01-29 | Sangya Jain | Maleimide containing, negative working deep uv photoresist |
| US5171655A (en) | 1989-08-03 | 1992-12-15 | Fuji Photo Film Co., Ltd. | Photohardenable light-sensitive composition |
| JPH0384016A (ja) | 1989-08-28 | 1991-04-09 | Showa Highpolymer Co Ltd | 光硬化可能な組成物 |
| US5196550A (en) | 1990-04-30 | 1993-03-23 | The B. F. Goodrich Company | Maleimido group containing monomers |
| JP3008475B2 (ja) | 1990-10-24 | 2000-02-14 | 大日本インキ化学工業株式会社 | 光ファイバ被覆用紫外線硬化型樹脂組成物 |
| JPH061944A (ja) | 1992-06-19 | 1994-01-11 | Hitachi Chem Co Ltd | コーティング用樹脂組成物およびこれを用いたカラーフィルタ保護膜用樹脂組成物 |
| US5446073A (en) | 1993-03-31 | 1995-08-29 | Fusion Systems Corporation | Photopolymerization process employing a charge transfer complex without a photoinitiator |
| WO1998007759A1 (en) * | 1996-08-23 | 1998-02-26 | First Chemical Corporation | Polymerization processes using aliphatic maleimides |
| BR9809495A (pt) * | 1997-05-27 | 2000-10-17 | First Chemical Corp | "maleimidas aromáticas e métodos para seus usos" |
| NL1006621C2 (nl) | 1997-07-18 | 1999-01-19 | Dsm Nv | Stralingsuithardbare coatingsamenstelling. |
| JP3084016B2 (ja) | 1999-02-15 | 2000-09-04 | 悦旦 山本 | ロープおよびその製造方法 |
-
1999
- 1999-01-29 CN CN99804722A patent/CN1295680A/zh active Pending
- 1999-01-29 JP JP2000529640A patent/JP2002502056A/ja active Pending
- 1999-01-29 TW TW088101423A patent/TWI238841B/zh active
- 1999-01-29 BR BR9908044-3A patent/BR9908044A/pt not_active IP Right Cessation
- 1999-01-29 CA CA002318809A patent/CA2318809A1/en not_active Abandoned
- 1999-01-29 AT AT99904452T patent/ATE333114T1/de not_active IP Right Cessation
- 1999-01-29 US US09/240,020 patent/US6555593B1/en not_active Expired - Fee Related
- 1999-01-29 EP EP99904452A patent/EP1051665B1/en not_active Expired - Lifetime
- 1999-01-29 AU AU24851/99A patent/AU2485199A/en not_active Abandoned
- 1999-01-29 KR KR1020007008321A patent/KR100594956B1/ko not_active Expired - Fee Related
- 1999-01-29 DE DE69932320T patent/DE69932320T2/de not_active Expired - Fee Related
- 1999-01-29 WO PCT/US1999/001989 patent/WO1999039247A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP1051665B1 (en) | 2006-07-12 |
| KR20010040466A (ko) | 2001-05-15 |
| EP1051665A1 (en) | 2000-11-15 |
| BR9908044A (pt) | 2000-11-28 |
| US6555593B1 (en) | 2003-04-29 |
| KR100594956B1 (ko) | 2006-06-30 |
| AU2485199A (en) | 1999-08-16 |
| CA2318809A1 (en) | 1999-08-05 |
| TWI238841B (en) | 2005-09-01 |
| CN1295680A (zh) | 2001-05-16 |
| DE69932320D1 (de) | 2006-08-24 |
| JP2002502056A (ja) | 2002-01-22 |
| WO1999039247A1 (en) | 1999-08-05 |
| DE69932320T2 (de) | 2007-07-12 |
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